KR102444558B1 - 저온 배출물 제어를 위한 scr과 pna의 조합 - Google Patents
저온 배출물 제어를 위한 scr과 pna의 조합 Download PDFInfo
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- KR102444558B1 KR102444558B1 KR1020177016710A KR20177016710A KR102444558B1 KR 102444558 B1 KR102444558 B1 KR 102444558B1 KR 1020177016710 A KR1020177016710 A KR 1020177016710A KR 20177016710 A KR20177016710 A KR 20177016710A KR 102444558 B1 KR102444558 B1 KR 102444558B1
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- catalyst
- metal
- nox
- molecular sieve
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- 239000003054 catalyst Substances 0.000 claims abstract description 505
- 229910052751 metal Inorganic materials 0.000 claims abstract description 208
- 239000002184 metal Substances 0.000 claims abstract description 208
- 239000002808 molecular sieve Substances 0.000 claims abstract description 182
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 claims abstract description 181
- 239000003463 adsorbent Substances 0.000 claims abstract description 144
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 88
- 238000000034 method Methods 0.000 claims abstract description 49
- 229930195733 hydrocarbon Natural products 0.000 claims abstract description 47
- 150000002430 hydrocarbons Chemical class 0.000 claims abstract description 47
- 230000003197 catalytic effect Effects 0.000 claims abstract description 43
- 229910021529 ammonia Inorganic materials 0.000 claims abstract description 42
- 239000004215 Carbon black (E152) Substances 0.000 claims abstract description 31
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 184
- 239000000758 substrate Substances 0.000 claims description 109
- 229910052763 palladium Inorganic materials 0.000 claims description 86
- 239000010949 copper Substances 0.000 claims description 80
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 71
- 239000000203 mixture Substances 0.000 claims description 68
- 229910052802 copper Inorganic materials 0.000 claims description 47
- 229910052684 Cerium Inorganic materials 0.000 claims description 41
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims description 41
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 38
- UNYSKUBLZGJSLV-UHFFFAOYSA-L calcium;1,3,5,2,4,6$l^{2}-trioxadisilaluminane 2,4-dioxide;dihydroxide;hexahydrate Chemical compound O.O.O.O.O.O.[OH-].[OH-].[Ca+2].O=[Si]1O[Al]O[Si](=O)O1.O=[Si]1O[Al]O[Si](=O)O1 UNYSKUBLZGJSLV-UHFFFAOYSA-L 0.000 claims description 37
- 229910052676 chabazite Inorganic materials 0.000 claims description 37
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical group O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 37
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 36
- 229910052742 iron Inorganic materials 0.000 claims description 35
- 238000011068 loading method Methods 0.000 claims description 35
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 34
- 229910052709 silver Inorganic materials 0.000 claims description 34
- 239000004332 silver Substances 0.000 claims description 34
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 32
- 229910017052 cobalt Inorganic materials 0.000 claims description 32
- 239000010941 cobalt Substances 0.000 claims description 32
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 32
- 229910052725 zinc Inorganic materials 0.000 claims description 32
- 239000011701 zinc Substances 0.000 claims description 32
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 30
- 229910052721 tungsten Inorganic materials 0.000 claims description 30
- 239000010937 tungsten Substances 0.000 claims description 30
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 26
- 229910052750 molybdenum Inorganic materials 0.000 claims description 26
- 239000011733 molybdenum Substances 0.000 claims description 26
- 229910052758 niobium Inorganic materials 0.000 claims description 25
- 239000010955 niobium Substances 0.000 claims description 25
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 25
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 24
- 229910052746 lanthanum Inorganic materials 0.000 claims description 22
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 22
- 239000010457 zeolite Substances 0.000 claims description 22
- 238000001354 calcination Methods 0.000 claims description 21
- 229910021536 Zeolite Inorganic materials 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 19
- 229910000323 aluminium silicate Inorganic materials 0.000 claims description 18
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims description 17
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 16
- 238000001035 drying Methods 0.000 claims description 13
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 12
- 239000011651 chromium Substances 0.000 claims description 12
- 229910052759 nickel Inorganic materials 0.000 claims description 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 12
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 11
- 239000011230 binding agent Substances 0.000 claims description 11
- 229910052804 chromium Inorganic materials 0.000 claims description 11
- 150000002739 metals Chemical class 0.000 claims description 10
- 229910052723 transition metal Inorganic materials 0.000 claims description 10
- 150000003624 transition metals Chemical class 0.000 claims description 10
- 238000011144 upstream manufacturing Methods 0.000 claims description 10
- 239000004071 soot Substances 0.000 claims description 9
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 9
- 229910052680 mordenite Inorganic materials 0.000 claims description 8
- 239000000377 silicon dioxide Substances 0.000 claims description 8
- 229910052720 vanadium Inorganic materials 0.000 claims description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 7
- 239000010953 base metal Substances 0.000 claims description 7
- 229910001657 ferrierite group Inorganic materials 0.000 claims description 7
- 239000011135 tin Substances 0.000 claims description 7
- 229910052718 tin Inorganic materials 0.000 claims description 7
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 6
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 6
- 229910052733 gallium Inorganic materials 0.000 claims description 6
- 229910052738 indium Inorganic materials 0.000 claims description 6
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 6
- 229910052741 iridium Inorganic materials 0.000 claims description 6
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 6
- 230000003647 oxidation Effects 0.000 claims description 6
- 238000007254 oxidation reaction Methods 0.000 claims description 6
- 229910052697 platinum Inorganic materials 0.000 claims description 6
- 229910052702 rhenium Inorganic materials 0.000 claims description 6
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims description 6
- 229910052707 ruthenium Inorganic materials 0.000 claims description 6
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 4
- 239000002131 composite material Substances 0.000 claims description 4
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 3
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 3
- 239000004927 clay Substances 0.000 claims description 3
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 3
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 3
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 3
- 229910052675 erionite Inorganic materials 0.000 claims description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 abstract description 58
- 229910002091 carbon monoxide Inorganic materials 0.000 abstract description 58
- 238000006243 chemical reaction Methods 0.000 abstract description 39
- 238000003860 storage Methods 0.000 abstract description 12
- 230000008901 benefit Effects 0.000 abstract description 6
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 568
- 239000010410 layer Substances 0.000 description 165
- 239000007789 gas Substances 0.000 description 89
- 238000012360 testing method Methods 0.000 description 45
- 239000011148 porous material Substances 0.000 description 28
- 230000000694 effects Effects 0.000 description 22
- 230000001186 cumulative effect Effects 0.000 description 21
- 238000006722 reduction reaction Methods 0.000 description 21
- 230000009467 reduction Effects 0.000 description 20
- 230000000052 comparative effect Effects 0.000 description 17
- 238000001179 sorption measurement Methods 0.000 description 16
- 230000008569 process Effects 0.000 description 15
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 14
- 239000004202 carbamide Substances 0.000 description 14
- 238000000576 coating method Methods 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 10
- 239000003638 chemical reducing agent Substances 0.000 description 8
- 239000002002 slurry Substances 0.000 description 8
- 229910052760 oxygen Inorganic materials 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 230000032683 aging Effects 0.000 description 6
- 238000002485 combustion reaction Methods 0.000 description 6
- 238000005470 impregnation Methods 0.000 description 6
- 239000011449 brick Substances 0.000 description 5
- 239000011457 extruded brick Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 229910052878 cordierite Inorganic materials 0.000 description 4
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 description 4
- 239000012530 fluid Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- 229910000510 noble metal Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 230000000149 penetrating effect Effects 0.000 description 4
- GHOKWGTUZJEAQD-ZETCQYMHSA-N (D)-(+)-Pantothenic acid Chemical compound OCC(C)(C)[C@@H](O)C(=O)NCCC(O)=O GHOKWGTUZJEAQD-ZETCQYMHSA-N 0.000 description 3
- 238000010531 catalytic reduction reaction Methods 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 239000000446 fuel Substances 0.000 description 3
- 239000011572 manganese Substances 0.000 description 3
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 3
- 229910052755 nonmetal Inorganic materials 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- -1 silicalite Chemical compound 0.000 description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 3
- 229910010271 silicon carbide Inorganic materials 0.000 description 3
- 229910052715 tantalum Inorganic materials 0.000 description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 229910000505 Al2TiO5 Inorganic materials 0.000 description 2
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 2
- 229910018879 Pt—Pd Inorganic materials 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 230000004323 axial length Effects 0.000 description 2
- 230000033228 biological regulation Effects 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000001627 detrimental effect Effects 0.000 description 2
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
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- 239000004615 ingredient Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
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- 229910052863 mullite Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 231100000614 poison Toxicity 0.000 description 2
- AABBHSMFGKYLKE-SNAWJCMRSA-N propan-2-yl (e)-but-2-enoate Chemical compound C\C=C\C(=O)OC(C)C AABBHSMFGKYLKE-SNAWJCMRSA-N 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 1
- 101100167365 Caenorhabditis elegans cha-1 gene Proteins 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 230000010718 Oxidation Activity Effects 0.000 description 1
- 229910002668 Pd-Cu Inorganic materials 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000012018 catalyst precursor Substances 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
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- 150000004676 glycans Chemical class 0.000 description 1
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- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000002207 metabolite Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 230000018537 nitric oxide storage Effects 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- 150000002843 nonmetals Chemical class 0.000 description 1
- GPNDARIEYHPYAY-UHFFFAOYSA-N palladium(ii) nitrate Chemical compound [Pd+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O GPNDARIEYHPYAY-UHFFFAOYSA-N 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
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Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/92—Chemical or biological purification of waste gases of engine exhaust gases
- B01D53/94—Chemical or biological purification of waste gases of engine exhaust gases by catalytic processes
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
- F01N3/00—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust
- F01N3/08—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous
- F01N3/0807—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous by using absorbents or adsorbents
- F01N3/0814—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous by using absorbents or adsorbents combined with catalytic converters, e.g. NOx absorption/storage reduction catalysts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J29/00—Catalysts comprising molecular sieves
- B01J29/04—Catalysts comprising molecular sieves having base-exchange properties, e.g. crystalline zeolites
- B01J29/06—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof
- B01J29/70—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof of types characterised by their specific structure not provided for in groups B01J29/08 - B01J29/65
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Abstract
Description
도 1은 MVEG 테스트 프로토콜을 예시하는 그래프이다.
도 2a-2g는 SCR 촉매 및 NOx 흡착제 촉매의 위치를 도시한 촉매 물품의 구성형태의 도면이다.
도 3은 비교예 1 및 2와 실시예 3-5의 조성물을 사용한 NOx 전환을 예시한 그래프이다.
도 4는 750℃에서 노화 후 CHA 상에 분산된 1% Pd 및 상이한 양의 구리를 가진 촉매로부터 상이한 온도에서 g/L 단위의 흡착된 NO2의 양을 도시한 그래프이다.
도 5는 750℃에서 노화 후 CHA 상에 분산된 1% Pd 및 상이한 양의 구리를 가진 촉매로부터 TPD 동안 NOx 방출 및 150℃에서 NO 저장을 도시한 그래프이다.
도 6은 NH3 SCR 반응 동안 750℃에서 노화 후 CHA 상에 분산된 1% Pd 및 상이한 양의 구리를 가진 촉매로부터 NOx 전환 %에 대한 온도의 효과를 도시한 그래프이다.
도 7은 750℃에서 노화 후 CHA 상에 분산된 상이한 양의 Pd 및 2.5% Cu를 가진 촉매로부터 NOx 농도를 도시한 그래프이다.
도 8은 750℃에서 노화 후 CHA 상에 분산된 2.5% Cu 및 상이한 양의 Pd를 가진 촉매로부터 상이한 온도에서 g/L 단위의 흡착된 NO2의 양을 도시한 그래프이다.
도 9는 NH3 SCR 반응 동안 750℃에서 노화 후 CHA 상에 분산된 2.5% Cu 및 상이한 양의 Pd를 가진 촉매로부터 NOx 전환 %에 대한 온도의 효과를 도시한 그래프이다.
도 10은 NH3 SCR 반응 동안 비교예 1 및 2와 실시예 3-5의 조성을 사용한 NOx 전환을 예시한 그래프이다.
도 11은 비교예 1 및 2와 실시예 3-5의 조성을 사용한 CO 전환을 예시한 그래프이다.
도 12는 MVEG과정 동안 시간에 따른 SCR/PNA CSF 또는 DOC SCRF에서 SCR/PNA 또는 SCRF 전의 온도를 예시한 그래프이다.
도 13은 DOC SCRF 시스템에서 MVEG 테스트 동안 엔진아웃 NO2/NOx 비율(SCRF 이전)을 도시한다.
도 14는 SCR/PNA CSF 시스템에서 MVEG 테스트 동안 엔진아웃 NO2/NOx 비율(SCR/PNA 이전)을 도시한다.
도 15는 엔진으로부터 방출된 후(엔진아웃) 측정된, MVEG 과정 동안 시간에 따른 (a) 디젤 산화 촉매(DOC) + Cu SCRF 또는 (b) 팔라듐 소 기공 제올라이트 밑층을 가진 구리 SCR을 통과한 후 생성된 누적 총 탄화수소(THC) 질량(g)을 예시한 그래프이다.
도 16은 엔진으로부터 방출된 후(엔진아웃)에 측정된, MVEG 과정 동안 처음 250초 동안 (a) DOC + Cu SCRF 또는 (b) 팔라듐 소 기공 제올라이트 밑층을 가진 구리 SCR을 통과한 후 생성된 누적 NOx 질량(g)을 예시한 그래프이다.
도 17은 엔진으로부터 방출된 후(엔진아웃) 측정된, MVEG 과정 동안 시간에 따른, 요소 투입이 있을 때 (a) DOC + Cu SCRF 또는 (b) 팔라듐 소 기공 제올라이트 밑층을 가진 구리 SCR을 통과한 후 생성된 누적 NOx 질량(g)을 예시한 그래프이다.
도 18은 MVEG 과정 동안 시간에 따른, 요소 투입이 있을 때 (a) DOC + Cu SCRF 또는 (b) 팔라듐 소 기공 제올라이트 밑층을 가진 구리 SCR을 통과한 후 암모니아 슬립(ppm)을 예시한 그래프이다.
도 19는 엔진으로부터 방출된 후(엔진아웃) 측정된, MVEG 과정 동안 시간에 따른, 요소 투입이 있을 때 (a) DOC + Cu SCRF 또는 (b) 팔라듐 소 기공 제올라이트 밑층을 가진 구리 SCR을 통과한 후 생성된 누적 일산화탄소(CO) 질량(g)을 예시한 그래프이다.
한 가지 성분 | |
비교용 촉매 6 | 1 wt% Pd CHA |
비교용 촉매 7 | 2.5 wt% Cu CHA |
1 wt%의 고정된 Pd를 가진 제1 성분 | |
촉매 8 | 0.5 wt.% Cu CHA |
촉매 9 | 1.0 wt.% Cu CHA |
촉매 10 | 1.5 wt.% Cu CHA |
촉매 11 | 2.5 wt.% Cu CHA |
촉매 12 | 3.3 wt.% Cu CHA |
제2 성분과 함께 2.5 wt%의 고정된 Cu | |
촉매 13 | 0.2 wt% Pd |
촉매 14 | 0.5 wt% Pd |
촉매 15 | 1.0 wt% Pd |
상부층 | 바닥층 | |
촉매 3 | 2.5 g/in3 Cu CHA | 1.5 g/in3 Pd CHA |
촉매 4 | 1.5 g/in3 Cu CHA | 1.5 g/in3 Pd CHA |
촉매 5 | 1.5 g/in3 Cu CHA | 2.5 g/in3 Pd CHA |
Claims (117)
- SCR 촉매 및 NOx 흡착제 촉매를 포함하는 촉매 물품으로서, NOx 흡착제 촉매는 세리아 상의 팔라듐 또는 금속-함유 분자체를 포함하고, 상기 금속은 세륨, 크로뮴, 코발트, 구리, 철, 란타늄, 망간, 몰리브데늄, 니켈, 니오븀, 팔라듐, 텅스텐, 은, 바나듐, 및 아연, 및 이들의 혼합물로 구성되는 군으로부터 선택되는, 촉매 물품.
- 제 1 항에 있어서, SCR 촉매는 비금속, 비금속의 산화물, 분자체, 금속-함유 분자체, 혼합 산화물 상에 담지된 금속 또는 이들의 혼합물을 포함하고, 여기서 비금속은 세륨, 크로뮴, 코발트, 구리, 철, 망간, 몰리브데늄, 니켈, 텅스텐, 및 바나듐, 및 이들의 혼합물로 구성되는 군으로부터 선택되는 것을 특징으로 하는 촉매 물품.
- 삭제
- 제 2 항에 있어서, SCR 촉매는 금속-함유 분자체를 포함하며, 여기서 금속은 세륨, 크로뮴, 코발트, 구리, 갈륨, 인듐, 이리듐, 철, 망간, 몰리브데늄, 니켈, 팔라듐, 백금, 루테늄, 레늄, 은, 주석 및 아연으로 구성되는 군으로부터 선택되는 것을 특징으로 하는 촉매 물품.
- 제 4 항에 있어서, 금속-함유 분자체에서 금속은 구리를 포함하는 것을 특징으로 하는 촉매 물품.
- 제 1 항에 있어서, SCR 촉매는 알루미노실리케이트 분자체, 알루미노포스페이트 분자체, 실리코알루미노포스페이트 분자체, 금속-함유 알루미노실리케이트 분자체, 금속-함유 알루미노포스페이트 분자체, 또는 금속-함유 실리코알루미노포스페이트 분자체를 포함하는 것을 특징으로 하는 촉매 물품.
- 제 6 항에 있어서, SCR 촉매는 분자체 또는 금속-함유 분자체를 포함하고, 분자체 또는 금속-함유 분자체의 분자체는 에리오나이트 또는 AEI, BEA(베타 제올라이트), CHA(카바자이트), FAU(제올라이트 Y), FER(페리어라이트), MFI(ZSM-5) 및 MOR(모데나이트)로 구성되는 군으로부터 선택된 프레임워크 타입을 포함하는 것을 특징으로 하는 촉매 물품.
- 제 2 항에 있어서, 혼합 산화물 상에 담지된 금속은
(i) 세륨 및 지르코늄으로 구성된 담지체 물질로서 혼합 산화물 또는 복합 산화물 또는 이들의 혼합물 상에 분산된 적어도 하나의 전이금속; 또는
(ii) 비활성 산화물 담지체 물질 상에 분산된 단일 산화물 또는 이들의 복합 산화물 또는 단일 산화물과 복합 산화물의 혼합물로서, 그 위에 적어도 하나의 전이금속이 분산되는 세륨 산화물 및 지르코늄 산화물
로 구성되는 적어도 하나의 촉매 성분을 포함하며,
적어도 하나의 전이금속은 VIB족 금속, IB족 금속, IVA족 금속, VB족 금속, VIIB족 금속, VIII족 금속 및 이들 중 임의의 둘 이상의 혼합물로 구성되는 군으로부터 선택되며, 단, 적어도 하나의 선택된 전이금속은 텅스텐이고, 촉매 성분에서 산화물로서 세륨 및 지르코늄의 함량은 CexZr1-XO2이고, 여기서 X = 0.1-0.5인 것을 특징으로 하는 촉매 물품. - 제 2 항에 있어서, SCR 촉매는
(i) 세륨 및 지르코늄으로 구성된 담지체 물질로서 혼합 산화물 또는 복합 산화물 또는 이들의 혼합물 상에 분산된 둘 이상의 전이금속; 또는
(ii) 비활성 산화물 담지체 물질 상에 분산된 단일 산화물 또는 그것의 복합 산화물 또는 단일 산화물과 복합 산화물의 혼합물로서, 그 위에 적어도 2개의 전이금속이 분산되는 세륨 산화물 및 지르코늄 산화물
로 구성되는 적어도 하나의 촉매 성분을 포함하며, 단, 금속 중 적어도 하나는 텅스텐인 것을 특징으로 하는 촉매 물품. - 제 1 항에 있어서, NOx 흡착제 촉매에서 금속-함유 분자체의 분자체는 알루미노실리케이트, 알루미노포스페이트, 또는 실리코알루미노포스페이트를 포함하는 것을 특징으로 하는 촉매 물품.
- 제 1 항에 있어서, 금속-함유 분자체의 분자체는 10 내지 100의 SAR을 가진 알루미노실리케이트를 포함하는 것을 특징으로 하는 촉매 물품.
- 제 1 항에 있어서, NOx 흡착제 촉매에서 금속은 코발트, 망간, 팔라듐, 또는 아연인 것을 특징으로 하는 촉매 물품.
- 제 1 항에 있어서, NOx 흡착제 촉매에서 금속은 팔라듐 또는 아연을 포함하는 것을 특징으로 하는 촉매 물품.
- 제 5 항에 있어서, NOx 흡착제 촉매에서 금속은 팔라듐인 것을 특징으로 하는 촉매 물품.
- 제 1 항에 있어서, (a) SCR 촉매가 비금속 또는 그것의 산화물을 포함할 때 비금속은 SCR 촉매의 총 중량을 기준으로 0.01 내지 20 wt.%의 농도로 존재하거나; 또는 (b) SCR 촉매가 금속-함유 분자체를 포함할 때 SCR 촉매에서 금속은 분자체의 중량을 기준으로 0.01 내지 10 wt.%의 농도로 분자체에 존재하는 것을 특징으로 하는 촉매 물품.
- 제 1 항에 있어서, SCR 촉매는 0.5 내지 4.0 g/in3의 로딩으로 존재하는 것을 특징으로 하는 촉매 물품.
- 제 1 항에 있어서, NOx 흡착제 촉매에서 금속은 NOx 흡착제 촉매의 총 중량을 기준으로 0.01 내지 20 wt.%의 농도로 존재하는 것을 특징으로 하는 촉매 물품.
- 제 1 항에 있어서, 물품은
(a) SCR 촉매를 포함하는 제1 층 및 NOx 흡착제 촉매를 포함하는 제2 층, 또는
(b) NOx 흡착제 촉매를 포함하는 제1 층 및 SCR 촉매를 포함하는 제2 층
을 포함하는 것을 특징으로 하는 촉매 물품. - 삭제
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- 제 1 항에 있어서, 촉매 물품은 압출된 모노리스 기판을 포함하며, 여기서
(a) 압출된 기판은 SCR 촉매를 포함하고, NOx 흡착제 촉매는 층으로서 압출된 기판 상에 배치되거나; 또는
(b) 압출된 기판은 NOx 흡착제 촉매를 포함하고, SCR 촉매는 층으로서 압출된 기판 상에 배치되거나; 또는
(c) 압출된 기판은 SCR 촉매와 NOx 흡착제 촉매를 포함하는 것을 특징으로 하는 촉매 물품. - SCR 촉매, NOx 흡착제 촉매 및 적어도 하나의 바인더를 포함하는 촉매 워시코트로서, SCR 촉매는 세륨, 크로뮴, 코발트, 구리, 갈륨, 인듐, 이리듐, 철, 망간, 몰리브데늄, 니켈, 팔라듐, 백금, 루테늄, 레늄, 은, 주석 및 아연으로 구성되는 군으로부터 선택된 금속을 포함하고, NOx 흡착제 촉매는 분자체 및 세륨, 코발트, 철, 란타늄, 망간, 몰리브데늄, 니오븀, 팔라듐, 텅스텐, 은 및 아연으로 구성되는 군으로부터 선택된 금속을 포함하며, 여기서
(a) SCR 촉매의 금속과 NOx 흡착제 촉매의 금속은 상이하거나, 또는
(b) SCR 촉매의 금속과 NOx 흡착제 촉매의 금속은 동일하고, (i) NOx 흡착제 촉매만 분자체를 포함하거나, 또는 (ii) SCR 촉매는 분자체를 포함하고, SCR 촉매에서 분자체는 NOx 흡착제 촉매의 분자체와 상이하고, 적어도 하나의 바인더는 알루미나, 실리카, 비-제올라이트 실리카-알루미나, 천연 클레이, TiO2, ZrO2 및 SnO2로 구성되는 군으로부터 선택되는, 촉매 워시코트. - 암모니아 슬립 촉매를 제조하는 방법으로서,
(a) 세륨, 코발트, 철, 란타늄, 망간, 몰리브데늄, 니오븀, 팔라듐, 텅스텐, 은 및 아연으로 구성되는 군으로부터 선택된 금속을 포함하는 NOx 흡착제 촉매를 포함하는 바닥층 워시코트를 기판 위에 적용함으로써 기판 상에 바닥층을 형성하는 단계,
(b) 기판 상의 바닥층 워시코트를 건조시키는 단계,
(c) 기판 상의 바닥층 워시코트를 하소하는 단계,
(d) 단계 (c)에서 형성된 하소된 바닥층 위에 SCR 촉매를 포함하는 상부층 워시코트를 적용함으로써 바닥층 위에 위치된 상부층을 형성하는 단계,
(e) 기판 상의 하소된 바닥층 상의 상부층 워시코트를 건조시키는 단계, 및
(f) 기판 상의 바닥층 워시코트 상의 상부층 워시코트를 하소하는 단계
를 포함하는 방법. - 암모니아 슬립 촉매를 제조하는 방법으로서,
(a) SCR 촉매를 포함하는 바닥층 워시코트를 기판 위에 적용함으로써 기판 상에 바닥층을 형성하는 단계,
(b) 기판 상의 바닥층 워시코트를 건조시키는 단계,
(c) 기판 상의 바닥층 워시코트를 하소하는 단계,
(d) 단계 (c)에서 형성된 하소된 바닥층 위에 세륨, 코발트, 철, 란타늄, 망간, 몰리브데늄, 니오븀, 팔라듐, 텅스텐, 은 및 아연으로 구성되는 군으로부터 선택된 금속을 포함하는 NOx 흡착제 촉매를 포함하는 상부층 워시코트를 적용함으로써 바닥층 위에 위치된 상부층을 형성하는 단계,
(e) 기판 상의 하소된 바닥층 상의 상부층 워시코트를 건조시키는 단계, 및
(f) 기판 상의 바닥층 워시코트 상의 상부층 워시코트를 하소하는 단계
를 포함하는 방법. - 제 1 항의 촉매 물품, 수동적 NOx 흡착제(PNA), 디젤 산화 촉매(DOC) 및 촉매화된 그을음 필터(CSF)를 포함하는 배기 시스템으로서, 수동적 NOx 흡착제 또는 DOC는 CSF의 뒤에 있고, 제 1 항의 촉매 물품의 상류에 위치되며, 제 1 항의 물품은 필터 상에 위치되는, 배기 시스템.
- 제 1 항의 촉매 물품 및 가까운 결합된 촉매화된 그을음 필터(CSF) 또는 필터 상의 SCR(SCRF)를 포함하는 배기 시스템으로서, 여기서 촉매화된 그을음 필터는 제 1 항의 촉매 물품의 하류에 위치되는 것을 특징으로 하는 배기 시스템.
- 엔진의 냉 시동 동안 배기가스 스트림에서 NOx의 농도를 감소시키는 방법으로서, NOx를 함유하는 배기가스 스트림을 제 1 항의 촉매 물품과 접촉시키는 단계를 포함하고, 저장된 NOx는 탄화수소 SCR에 의해 환원되는, 방법.
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