KR102387756B1 - 단부면 접촉 확인 기구 - Google Patents
단부면 접촉 확인 기구 Download PDFInfo
- Publication number
- KR102387756B1 KR102387756B1 KR1020160072109A KR20160072109A KR102387756B1 KR 102387756 B1 KR102387756 B1 KR 102387756B1 KR 1020160072109 A KR1020160072109 A KR 1020160072109A KR 20160072109 A KR20160072109 A KR 20160072109A KR 102387756 B1 KR102387756 B1 KR 102387756B1
- Authority
- KR
- South Korea
- Prior art keywords
- grindstone
- flange
- end surface
- continuity
- conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000012790 confirmation Methods 0.000 title claims abstract description 35
- 238000005520 cutting process Methods 0.000 claims abstract description 66
- 238000012937 correction Methods 0.000 claims abstract description 27
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 abstract 1
- 229910052709 silver Inorganic materials 0.000 abstract 1
- 239000004332 silver Substances 0.000 abstract 1
- 230000002093 peripheral effect Effects 0.000 description 6
- 239000002184 metal Substances 0.000 description 5
- 238000003825 pressing Methods 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 238000012545 processing Methods 0.000 description 3
- 239000006061 abrasive grain Substances 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000007634 remodeling Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/10—Single-purpose machines or devices
- B24B7/16—Single-purpose machines or devices for grinding end-faces, e.g. of gauges, rollers, nuts, piston rings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/10—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
- B26D5/00—Arrangements for operating and controlling machines or devices for cutting, cutting-out, stamping-out, punching, perforating, or severing by means other than cutting
- B26D5/20—Arrangements for operating and controlling machines or devices for cutting, cutting-out, stamping-out, punching, perforating, or severing by means other than cutting with interrelated action between the cutting member and work feed
- B26D5/22—Arrangements for operating and controlling machines or devices for cutting, cutting-out, stamping-out, punching, perforating, or severing by means other than cutting with interrelated action between the cutting member and work feed having the cutting member and work feed mechanically connected
- B26D5/24—Arrangements for operating and controlling machines or devices for cutting, cutting-out, stamping-out, punching, perforating, or severing by means other than cutting with interrelated action between the cutting member and work feed having the cutting member and work feed mechanically connected including a metering device
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B26—HAND CUTTING TOOLS; CUTTING; SEVERING
- B26D—CUTTING; DETAILS COMMON TO MACHINES FOR PERFORATING, PUNCHING, CUTTING-OUT, STAMPING-OUT OR SEVERING
- B26D7/00—Details of apparatus for cutting, cutting-out, stamping-out, punching, perforating, or severing by means other than cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mechanical Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Forests & Forestry (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Dicing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2015-130113 | 2015-06-29 | ||
JP2015130113A JP6527034B2 (ja) | 2015-06-29 | 2015-06-29 | 端面接触確認器具 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20170002292A KR20170002292A (ko) | 2017-01-06 |
KR102387756B1 true KR102387756B1 (ko) | 2022-04-19 |
Family
ID=57651406
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020160072109A Active KR102387756B1 (ko) | 2015-06-29 | 2016-06-10 | 단부면 접촉 확인 기구 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6527034B2 (ja) |
KR (1) | KR102387756B1 (ja) |
CN (1) | CN106271936A (ja) |
TW (1) | TWI712476B (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7043346B2 (ja) * | 2018-05-18 | 2022-03-29 | 株式会社ディスコ | 切削装置 |
CN114346859A (zh) * | 2021-12-25 | 2022-04-15 | 广东海龙建筑科技有限公司 | 一种无机人造石上光机 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3472390B2 (ja) | 1995-06-09 | 2003-12-02 | 株式会社ディスコ | フランジ端面修正治具 |
JP2011011299A (ja) | 2009-07-02 | 2011-01-20 | Disco Abrasive Syst Ltd | マウントフランジの端面修正方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5715648A (en) * | 1980-06-23 | 1982-01-27 | Seiko Epson Corp | Determination of reference position between tool and work piece |
US6481939B1 (en) * | 2001-08-24 | 2002-11-19 | Robb S. Gillespie | Tool tip conductivity contact sensor and method |
JP5139720B2 (ja) * | 2007-06-05 | 2013-02-06 | 株式会社ディスコ | 切削装置 |
PL2676767T3 (pl) * | 2008-12-19 | 2016-01-29 | Etp Trans Ab | System przytrzymywania narzędzia i sposób ustawiania pozycji osiowej narzędzia lub części narzędzia |
JP5341564B2 (ja) * | 2009-03-05 | 2013-11-13 | 株式会社ディスコ | 工具取り付けマウントの修正冶具 |
CN201524940U (zh) * | 2009-11-12 | 2010-07-14 | 茂名职业技术学院 | 机械加工对刀装置 |
JP5549010B2 (ja) * | 2010-03-30 | 2014-07-16 | 独立行政法人理化学研究所 | 加工装置、及び当該装置の駆動方法 |
JP5613439B2 (ja) * | 2010-04-15 | 2014-10-22 | 株式会社ディスコ | 切削装置 |
JP5690646B2 (ja) * | 2011-04-28 | 2015-03-25 | 株式会社ディスコ | 電極ユニット |
-
2015
- 2015-06-29 JP JP2015130113A patent/JP6527034B2/ja active Active
-
2016
- 2016-05-12 TW TW105114752A patent/TWI712476B/zh active
- 2016-06-10 KR KR1020160072109A patent/KR102387756B1/ko active Active
- 2016-06-27 CN CN201610478630.9A patent/CN106271936A/zh active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3472390B2 (ja) | 1995-06-09 | 2003-12-02 | 株式会社ディスコ | フランジ端面修正治具 |
JP2011011299A (ja) | 2009-07-02 | 2011-01-20 | Disco Abrasive Syst Ltd | マウントフランジの端面修正方法 |
Also Published As
Publication number | Publication date |
---|---|
TWI712476B (zh) | 2020-12-11 |
JP2017013154A (ja) | 2017-01-19 |
TW201720605A (zh) | 2017-06-16 |
JP6527034B2 (ja) | 2019-06-05 |
CN106271936A (zh) | 2017-01-04 |
KR20170002292A (ko) | 2017-01-06 |
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Legal Events
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PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20160610 |
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Patent event code: PA02012R01D Patent event date: 20200610 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 20160610 Comment text: Patent Application |
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PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20220113 |
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GRNT | Written decision to grant | ||
PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20220413 Patent event code: PR07011E01D |
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PR1002 | Payment of registration fee |
Payment date: 20220414 End annual number: 3 Start annual number: 1 |
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