KR102324691B1 - 양극 활물질, 이의 제조 방법, 및 이를 포함하는 리튬 이차 전지 - Google Patents
양극 활물질, 이의 제조 방법, 및 이를 포함하는 리튬 이차 전지 Download PDFInfo
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- KR102324691B1 KR102324691B1 KR1020190171281A KR20190171281A KR102324691B1 KR 102324691 B1 KR102324691 B1 KR 102324691B1 KR 1020190171281 A KR1020190171281 A KR 1020190171281A KR 20190171281 A KR20190171281 A KR 20190171281A KR 102324691 B1 KR102324691 B1 KR 102324691B1
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- active material
- coating layer
- metal oxide
- lithium metal
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- Prior art date
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- 239000006182 cathode active material Substances 0.000 title claims abstract description 26
- 238000000034 method Methods 0.000 title claims abstract description 16
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 title description 8
- 229910001416 lithium ion Inorganic materials 0.000 title description 8
- 229910021450 lithium metal oxide Inorganic materials 0.000 claims abstract description 53
- 239000011247 coating layer Substances 0.000 claims abstract description 49
- 229910052744 lithium Inorganic materials 0.000 claims abstract description 21
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims abstract description 17
- 238000000026 X-ray photoelectron spectrum Methods 0.000 claims abstract description 9
- 239000007774 positive electrode material Substances 0.000 claims description 55
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 35
- 238000005406 washing Methods 0.000 claims description 28
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 24
- 239000000203 mixture Substances 0.000 claims description 22
- 239000011572 manganese Substances 0.000 claims description 16
- 239000013078 crystal Substances 0.000 claims description 15
- 239000012153 distilled water Substances 0.000 claims description 15
- 229910052759 nickel Inorganic materials 0.000 claims description 14
- 239000002243 precursor Substances 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 239000003792 electrolyte Substances 0.000 claims description 10
- 229940099596 manganese sulfate Drugs 0.000 claims description 10
- 239000011702 manganese sulphate Substances 0.000 claims description 10
- 235000007079 manganese sulphate Nutrition 0.000 claims description 10
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 claims description 10
- 239000002994 raw material Substances 0.000 claims description 10
- 150000002697 manganese compounds Chemical class 0.000 claims description 9
- 229910052748 manganese Inorganic materials 0.000 claims description 8
- 238000002156 mixing Methods 0.000 claims description 7
- 238000001354 calcination Methods 0.000 claims description 6
- 238000005259 measurement Methods 0.000 claims description 6
- 229910052596 spinel Inorganic materials 0.000 claims description 5
- 239000011029 spinel Substances 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 4
- 229910021380 Manganese Chloride Inorganic materials 0.000 claims description 2
- GLFNIEUTAYBVOC-UHFFFAOYSA-L Manganese chloride Chemical compound Cl[Mn]Cl GLFNIEUTAYBVOC-UHFFFAOYSA-L 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims description 2
- 229940071125 manganese acetate Drugs 0.000 claims description 2
- 239000011565 manganese chloride Substances 0.000 claims description 2
- 235000002867 manganese chloride Nutrition 0.000 claims description 2
- 229940099607 manganese chloride Drugs 0.000 claims description 2
- UOGMEBQRZBEZQT-UHFFFAOYSA-L manganese(2+);diacetate Chemical compound [Mn+2].CC([O-])=O.CC([O-])=O UOGMEBQRZBEZQT-UHFFFAOYSA-L 0.000 claims description 2
- MIVBAHRSNUNMPP-UHFFFAOYSA-N manganese(2+);dinitrate Chemical compound [Mn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MIVBAHRSNUNMPP-UHFFFAOYSA-N 0.000 claims description 2
- 239000006183 anode active material Substances 0.000 claims 1
- 230000000052 comparative effect Effects 0.000 description 24
- 239000000243 solution Substances 0.000 description 13
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 10
- 238000000975 co-precipitation Methods 0.000 description 10
- 239000007773 negative electrode material Substances 0.000 description 10
- 239000004020 conductor Substances 0.000 description 8
- 239000010410 layer Substances 0.000 description 8
- 239000002245 particle Substances 0.000 description 8
- 238000004458 analytical method Methods 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- -1 polyethylene Polymers 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 239000004698 Polyethylene Substances 0.000 description 5
- 239000004743 Polypropylene Substances 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 5
- IEJIGPNLZYLLBP-UHFFFAOYSA-N dimethyl carbonate Chemical compound COC(=O)OC IEJIGPNLZYLLBP-UHFFFAOYSA-N 0.000 description 5
- 229920000573 polyethylene Polymers 0.000 description 5
- 229920001155 polypropylene Polymers 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- 238000004627 transmission electron microscopy Methods 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000012266 salt solution Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 229910052723 transition metal Inorganic materials 0.000 description 3
- 150000003624 transition metals Chemical class 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910013870 LiPF 6 Inorganic materials 0.000 description 2
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 2
- 241000080590 Niso Species 0.000 description 2
- 239000002033 PVDF binder Substances 0.000 description 2
- 239000011149 active material Substances 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 229910052795 boron group element Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 229910052800 carbon group element Inorganic materials 0.000 description 2
- 239000002738 chelating agent Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 239000011258 core-shell material Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000009831 deintercalation Methods 0.000 description 2
- 238000000113 differential scanning calorimetry Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000006260 foam Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000009830 intercalation Methods 0.000 description 2
- 229910003002 lithium salt Inorganic materials 0.000 description 2
- 159000000002 lithium salts Chemical class 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 239000011356 non-aqueous organic solvent Substances 0.000 description 2
- 238000010979 pH adjustment Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 229910052761 rare earth metal Inorganic materials 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 229910000314 transition metal oxide Inorganic materials 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- 229910000733 Li alloy Inorganic materials 0.000 description 1
- 229910013290 LiNiO 2 Inorganic materials 0.000 description 1
- 229910008326 Si-Y Inorganic materials 0.000 description 1
- 229910006773 Si—Y Inorganic materials 0.000 description 1
- 229910020997 Sn-Y Inorganic materials 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 229910008859 Sn—Y Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- RLTFLELMPUMVEH-UHFFFAOYSA-N [Li+].[O--].[O--].[O--].[V+5] Chemical compound [Li+].[O--].[O--].[O--].[V+5] RLTFLELMPUMVEH-UHFFFAOYSA-N 0.000 description 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000003487 electrochemical reaction Methods 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 229910052730 francium Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 229910000686 lithium vanadium oxide Inorganic materials 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 239000012702 metal oxide precursor Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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- C01G53/00—Compounds of nickel
- C01G53/80—Compounds containing nickel, with or without oxygen or hydrogen, and containing one or more other elements
- C01G53/82—Compounds containing nickel, with or without oxygen or hydrogen, and containing two or more other elements
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- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G53/00—Compounds of nickel
- C01G53/40—Complex oxides containing nickel and at least one other metal element
- C01G53/42—Complex oxides containing nickel and at least one other metal element containing alkali metals, e.g. LiNiO2
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- C01G53/50—Complex oxides containing nickel and at least one other metal element containing alkali metals, e.g. LiNiO2 containing manganese of the type (MnO2)n-, e.g. Li(NixMn1-x)O2 or Li(MyNixMn1-x-y)O2
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- H01M4/505—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of manganese of mixed oxides or hydroxides containing manganese for inserting or intercalating light metals, e.g. LiMn2O4 or LiMn2OxFy
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- H01M4/525—Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides of nickel, cobalt or iron of mixed oxides or hydroxides containing iron, cobalt or nickel for inserting or intercalating light metals, e.g. LiNiO2, LiCoO2 or LiCoOxFy
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- C01P2004/84—Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases one phase coated with the other
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Abstract
[식 1]
c = b/a
(상기 식 1에서, a는 상기 코팅층의 XPS 스펙트럼에서 530 내지 533eV에서의 피크이고, b는 528 내지 531eV에서의 피크임)
Description
도 2는 실시예 1 및 비교예 1에 따라 제조된 양극 활물질의 코팅층에 대한 XPS(X-ray Photoelectron Spectroscopy) 분석 결과를 나타낸 것이다.
도 3(a) 및 도 3(b)는 각각 실시예 2 내지 3에 따라 제조된 양극 활물질에 대한 TEM 분석 결과이다.
도 3(c) 및 도 3(d)는 각각 비교예 1 및 2에 따라 제조된 양극 활물질에 대한 TEM 분석 결과이다.
도 3(e)는 도 3(d)의 A 영역에 대한 고속 퓨리에 변환T(Fast Fourier Transform, FFT) 분석 결과를 나타낸 것이다.
구분 | 수세액 조성 | 열처리 조건 | |
열처리 온도 (℃) |
시간 (hr) |
||
실시예 1 | 황산망간 0.082g + 증류수 100g | 750 | 5 |
실시예 2 | 황산망간 0.165g + 증류수 100g | 750 | 5 |
실시예 3 | 황산망간 0.248g + 증류수 100g | 750 | 5 |
비교예 1 | 증류수 100g | 750 | 5 |
비교예 2 | 황산망간 0.385g+ 수산화리튬 0.147g + 증류수 100g | 750 | 5 |
구분 | 입자 크기 [D50, ㎛] |
비표면적 [m2/g] |
C 값 | 45℃ 수명 [%] |
피크 온도 (Peak temperature) (℃) |
발열량 (w/g) |
비교예 1 | 14.9 | 0.94 | 0.28 | 86.69 | 219.8 | 1590 |
실시예 1 | 15.0 | 0.99 | 0.40 | 90.38 | - | - |
실시예 2 | 15.1 | 0.96 | 0.49 | 91.96 | 220.4 | 1428 |
실시예 3 | 14.8 | 0.92 | 0.57 | 90.85 | 220.6 | 1398 |
비교예 2 | 15.0 | 0.93 | 0.58 | 87.9 | 220.2 | 1402 |
Claims (15)
- 코어 및 상기 코어의 표면에 위치하는 쉘을 포함하는 리튬 금속 산화물; 그리고
상기 리튬 금속 산화물의 표면에 위치하는 코팅층을 포함하고,
하기 식 1을 만족하는 c 값의 범위가 0.3 내지 0.7이며,
상기 상기 코어 및 쉘은 층상 결정 구조(layered crystalline structure)를 갖는 것이며,
상기 코팅층에서 결정 구조의 면간 거리(d-spacing) 값은 0.24 내지 0.43nm 범위이고,
상기 코팅층은 Mn, S, Co 및 Ni로 이루어진 그룹으로부터 선택된 적어도 하나의 원소를 포함하는 양극 활물질.
[식 1]
c = b/a
(상기 식 1에서, a는 상기 코팅층의 XPS 스펙트럼에서 530 내지 533eV에서의 피크 강도이고, b는 528 내지 531eV에서의 피크 강도임) - 제1항에 있어서,
상기 코팅층에서 결정 구조의 면간 거리(d-spacing) 값은 상기 리튬 금속 산화물에서 결정 구조의 면간 거리(d-spacing) 값 보다 작은 양극 활물질. - 삭제
- 제1항에 있어서,
상기 리튬 금속 산화물에서 결정 구조의 면간 거리(d-spacing) 값은 0.465 내지 0.480nm 범위인 양극 활물질. - 제1항에 있어서,
상기 코팅층은 층상 결정 구조(layered crystalline structure) 및 스피넬 결정 구조(spinel crystalline structure) 중 적어도 하나의 구조를 포함하는 양극 활물질. - 삭제
- 제1항에 있어서,
상기 코팅층에 포함되는 Mn의 함량은 전체 양극 활물질을 기준으로 0.15 내지 0.45 몰%인 양극 활물질. - 제1항에 있어서,
상기 리튬 금속 산화물 내 금속 중 니켈의 함량은 80 몰% 이상인 양극 활물질. - 리튬 금속 산화물의 전구체 및 도핑 원소의 원료 물질을 혼합하여 혼합물을 제조하는 단계;
상기 혼합물을 소성하여 리튬 금속 산화물을 수득하는 단계; 및
상기 리튬 금속 산화물을 증류수 및 망간 화합물을 포함하는 수세액으로 수세하여 상기 리튬 금속 산화물의 표면에 코팅층을 형성하는 단계를 포함하고,
상기 코팅층이 형성된 리튬 금속 산화물은 하기 식 1을 만족하는 c 값의 범위가 0.3 내지 0.7이고,
상기 코팅층에서 결정 구조의 면간 거리(d-sapcing) 값은 0.24 내지 0.43nm 범위이고,
상기 코팅층은 Mn, S, Co 및 Ni로 이루어진 그룹으로부터 선택된 적어도 하나의 원소를 포함하는 것인 양극 활물질의 제조 방법.
[식 1]
c = b/a
(상기 식 1에서, a는 상기 코팅층의 XPS 스펙트럼에서 측정을 통하여 얻어진 530 내지 533eV에서의 피크 강도이고, b는 528 내지 531eV에서의 피크 강도임) - 제9항에 있어서,
상기 리튬 금속 산화물은 코어 및 상기 코어의 표면에 위치하는 셀을 포함하고, 상기 코어 및 쉘은 층상 결정 구조(layered crystalline structure)를 갖는 양극 활물질의 제조 방법. - 제9항에 있어서,
상기 망간 화합물은 황산 망간, 질산 망간, 염화 망간 및 망간 아세테이트로 이루어진 그룹으로부터 선택된 적어도 하나인 양극 활물질의 제조 방법. - 제9항에 있어서,
상기 수세액은,
수세액 전체를 기준으로, 1.5 내지 4.5 몰%의 망간 화합물을 포함하는 양극 활물질의 제조 방법. - 제9항에 있어서,
상기 코팅층에서 결정 구조의 면간 거리(d-spacing) 값은 상기 리튬 금속 산화물에서 결정 구조의 면간 거리(d-spacing) 값 보다 작은 양극 활물질의 제조 방법. - 제9항에 있어서,
상기 코팅층을 형성하는 단계는,
상기 수세액으로 수세한 이후에 열처리하는 단계를 더 포함하고,
상기 열처리하는 단계는, 600 내지 800℃ 온도 범위에서, 5 시간 내지 10 시간 동안 수행되는 양극 활물질의 제조방법. - 제1항, 제2항, 제4항, 제5항, 제7항 및 제8항 중 어느 한 항에 따른 양극 활물질을 포함하는 양극;
음극 활물질을 포함하는 음극; 및
상기 양극 및 음극 사이에 위치하는 전해질;을 포함하는 리튬 이차 전지.
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