KR102321262B1 - 소수성의 실리카 에어로겔 과립의 제조방법 - Google Patents
소수성의 실리카 에어로겔 과립의 제조방법 Download PDFInfo
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- KR102321262B1 KR102321262B1 KR1020190017384A KR20190017384A KR102321262B1 KR 102321262 B1 KR102321262 B1 KR 102321262B1 KR 1020190017384 A KR1020190017384 A KR 1020190017384A KR 20190017384 A KR20190017384 A KR 20190017384A KR 102321262 B1 KR102321262 B1 KR 102321262B1
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 361
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- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 claims description 62
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims description 59
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- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 claims description 8
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- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 claims description 2
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- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 3
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
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- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
- B01J13/0091—Preparation of aerogels, e.g. xerogels
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/157—After-treatment of gels
- C01B33/158—Purification; Drying; Dehydrating
- C01B33/1585—Dehydration into aerogels
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/157—After-treatment of gels
- C01B33/158—Purification; Drying; Dehydrating
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/157—After-treatment of gels
- C01B33/159—Coating or hydrophobisation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/50—Agglomerated particles
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/10—Solid density
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
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- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Silicon Compounds (AREA)
Abstract
Description
도 1은, 본 발명의 실시예 1의 실리카 에어로겔 과립을 촬영한 사진이다.
도 2는, 본 발명의 비교예 1의 실리카 에어로겔 분말을 촬영한 사진이다.
도 3은, 본 발명의 실시예 2의 실리카 에어로겔 과립의 시간에 따른 부피 변화를 보여주는 사진이다.
도 4는, 본 발명의 비교예 1의 실리카 에어로겔 분말의 시간에 따른 부피의 변화를 보여주는 사진이다.
구분 | 비표면적(m2/g) | 평균입경(D50) | 겉보기 밀도 | ||
3초 경과 후 (g/ml) |
1시간 경과 후 (g/ml) |
겉보기 밀도의 변화율(%) | |||
실시예 1 | 694 | 1.5 cm | 0.112 | 0.112 | 0 |
실시예 2 | 678 | 1.3 cm | 0.119 | 0.119 | 0 |
실시예 3 | 657 | 1.7 cm | 0.124 | 0.124 | 0 |
실시예 4 | 645 | 1.1 cm | 0.131 | 0.131 | 0 |
실시예 5 | 649 | 1.3 cm | 0.142 | 0.142 | 0 |
실시예 6 | 640 | 1.8 cm | 0.165 | 0.165 | 0 |
비교예 1 | 704 | 37 ㎛ | 0.034 | 0.054 | 58 |
비교예 2 | 697 | 42 ㎛ | 0.043 | 0.064 | 47 |
비교예 3 | 693 | 45 ㎛ | 0.076 | 0.092 | 21 |
비교예 4 | 578 | 0.8 cm | 0.242 | 0.242 | 0 |
비교예 5 | 483 | 0.8 cm | 0.293 | 0.293 | 0 |
비교예 6 | 475 | 0.6 cm | 0.324 | 0.324 | 0 |
Claims (12)
2) 반응기에 상기 물유리 분산액, 표면개질제 및 비극성 유기용매를 첨가하고 반응시켜 소수성의 실리카 습윤겔을 제조하는 단계; 및
3) 상기 소수성의 실리카 습윤겔을 건조하는 단계를 포함하고,
상기 비극성 유기용매는 상기 실리카 습윤겔의 부피 기준으로 83 부피% 초과 100 부피% 미만으로 첨가하는 것인 소수성의 실리카 에어로겔 과립의 제조방법.
상기 비극성 유기용매는 상기 실리카 습윤겔의 부피 기준으로 85 부피% 내지 97 부피%로 첨가하는 것인 소수성의 실리카 에어로겔 과립의 제조방법.
상기 비극성 유기용매는 헥산, 헵탄, 톨루엔 및 크실렌으로 이루어진 군으로부터 선택된 1종 이상인 것인 소수성의 실리카 에어로겔 과립의 제조방법.
상기 비극성 유기용매는 헵탄인 것인 소수성의 실리카 에어로겔 과립의 제조방법.
상기 무기산은 물유리 용액 내 물유리 대비 1 내지 3의 몰비로 첨가하는 것인 소수성의 실리카 에어로겔 과립의 제조방법.
상기 무기산은 질산, 염산, 황산 및 불산으로 이루어진 군으로부터 선택된 1종 이상인 것인 소수성의 실리카 에어로겔 과립의 제조방법.
상기 표면개질제는 트리메틸클로로실란(TMCS), 헥사메틸디실라잔(HMDS), 메틸트리메톡시실란, 트리메틸에톡시실란, 에틸트리에톡시실란 및 페닐트리에톡시실란으로 이루어진 군으로부터 선택된 1종 이상인 것인 소수성의 실리카 에어로겔 과립의 제조방법.
상기 표면개질제는 물유리 분산액 내 물유리 대비 표면개질제가 0.1 내지 10의 몰비가 되는 양으로 첨가하는 것인 소수성의 실리카 에어로겔 과립의 제조방법.
상기 단계 3)의 건조는 100℃ 내지 190℃의 온도 조건 하에서 1시간 내지 8시간 동안 상압건조하여 수행하는 것인 소수성의 실리카 에어로겔 과립의 제조방법.
상기 소수성의 실리카 에어로겔 과립은 비표면적이 600 m2/g 내지 1,000 m2/g인 것인 소수성의 실리카 에어로겔 과립의 제조방법.
상기 소수성의 실리카 에어로겔 과립은 실리카 에어로겔 입자가 물리적인 결합으로 응집된 것인 소수성의 실리카 에어로겔 과립의 제조방법.
상기 소수성의 실리카 에어로겔 과립은 평균입경(D50)이 0.1 내지 2.5 cm인 것인 소수성의 실리카 에어로겔 과립의 제조방법.
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US (1) | US12030782B2 (ko) |
EP (1) | EP3674263B1 (ko) |
JP (1) | JP6960044B2 (ko) |
KR (1) | KR102321262B1 (ko) |
CN (1) | CN111183113B (ko) |
WO (1) | WO2019160368A1 (ko) |
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EP3738941A1 (en) * | 2019-05-14 | 2020-11-18 | ETH Zurich | Method of manufacturing a composite element, device for manufacturing the composite element, the composite element itself and use of the composite element |
KR102581268B1 (ko) | 2019-09-03 | 2023-09-22 | 주식회사 엘지화학 | 에어로겔 블랭킷 제조방법 |
WO2021045533A1 (ko) | 2019-09-03 | 2021-03-11 | 주식회사 엘지화학 | 에어로겔 블랭킷 |
CN113226677A (zh) | 2019-09-03 | 2021-08-06 | 株式会社Lg化学 | 用于制备气凝胶毡的装置和方法 |
EP4011832A4 (en) * | 2020-06-19 | 2022-12-28 | LG Chem, Ltd. | Hydrophobic silica aerogel blanket and manufacturing method therefor |
CN112592149B (zh) * | 2020-12-31 | 2022-03-18 | 山东大学 | 一种单次溶剂交换制备二氧化硅气凝胶复合材料的方法 |
CN113429185B (zh) * | 2021-06-03 | 2022-11-01 | 北新集团建材股份有限公司 | 一种纸面石膏板及其制备方法 |
CN114162827B (zh) * | 2021-12-22 | 2023-10-03 | 中国人民解放军国防科技大学 | 一种耐高温疏水SiO2气凝胶隔热复合材料的制备方法 |
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- 2019-02-14 KR KR1020190017384A patent/KR102321262B1/ko active Active
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- 2019-02-14 US US16/754,545 patent/US12030782B2/en active Active
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JP6960044B2 (ja) | 2021-11-05 |
CN111183113A (zh) | 2020-05-19 |
CN111183113B (zh) | 2023-03-24 |
EP3674263A4 (en) | 2020-12-09 |
EP3674263A1 (en) | 2020-07-01 |
US20200255295A1 (en) | 2020-08-13 |
JP2020529961A (ja) | 2020-10-15 |
KR20190098728A (ko) | 2019-08-22 |
US12030782B2 (en) | 2024-07-09 |
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