KR101205476B1 - 광반응기를 갖는 말레이미드계 화합물 및 광반응성 중합체 - Google Patents
광반응기를 갖는 말레이미드계 화합물 및 광반응성 중합체 Download PDFInfo
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- KR101205476B1 KR101205476B1 KR1020110077048A KR20110077048A KR101205476B1 KR 101205476 B1 KR101205476 B1 KR 101205476B1 KR 1020110077048 A KR1020110077048 A KR 1020110077048A KR 20110077048 A KR20110077048 A KR 20110077048A KR 101205476 B1 KR101205476 B1 KR 101205476B1
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- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- DSNYFFJTZPIKFZ-UHFFFAOYSA-N propoxybenzene Chemical group CCCOC1=CC=CC=C1 DSNYFFJTZPIKFZ-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 125000002568 propynyl group Chemical group [*]C#CC([H])([H])[H] 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 125000004469 siloxy group Chemical group [SiH3]O* 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/44—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members
- C07D207/444—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5
- C07D207/448—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5 with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. maleimide
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/36—Amides or imides
- C08F222/40—Imides, e.g. cyclic imides
- C08F222/402—Alkyl substituted imides
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/36—Amides or imides
- C08F222/40—Imides, e.g. cyclic imides
- C08F222/404—Imides, e.g. cyclic imides substituted imides comprising oxygen other than the carboxy oxygen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/36—Amides or imides
- C08F222/40—Imides, e.g. cyclic imides
- C08F222/408—Imides, e.g. cyclic imides substituted imides comprising other heteroatoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G79/00—Macromolecular compounds obtained by reactions forming a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon with or without the latter elements in the main chain of the macromolecule
- C08G79/08—Macromolecular compounds obtained by reactions forming a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon with or without the latter elements in the main chain of the macromolecule a linkage containing boron
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
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- Pyrrole Compounds (AREA)
Abstract
Description
사용된 중합체 | 코팅성 | 배향성 | 열적안정성(열적스트레스 부가 후 배향성) |
실시예 6 | 5 | 4.5 | 4 |
실시예 7 | 5 | 5 | 5 |
실시예 8 | 5 | 5 | 5 |
실시예 9 | 5 | 5 | 5 |
실시예 10 | 5 | 4.5 | 4 |
Claims (11)
- 하기 화학식 1로 표시되는 광반응기를 갖는 말레이미드계 화합물:
[화학식 1]
상기 화학식 1 에서, S1은 단순결합; 치환 또는 비치환된 탄소수 1 내지 20의 알킬렌; 치환 또는 비치환된 탄소수 2 내지 20의 알케닐렌; 치환 또는 비치환된 탄소수 3 내지 12의 시클로알킬렌; 치환 또는 비치환된 탄소수 6 내지 40의 아릴렌; 치환 또는 비치환된 탄소수 7 내지 15의 아르알킬렌; 치환 또는 비치환된 탄소수 2 내지 20의 알키닐렌; 및 탄소 체인 중에 14족, 15족 또는 16족의 헤테로 원소를 포함하는 탄소수 6 내지 20의 헤테로알킬렌으로 이루어진 군에서 선택되고,
A는 하기 화학식 1a 또는 1b의 광반응기이며,
[화학식 1a]
[화학식 1b]
상기 화학식 1a 및 1b에서,
B는 단순결합; 치환 또는 비치환된 탄소수 1 내지 20의 알킬렌; 카보닐; 카르복시; 에스테르; 치환 또는 비치환된 탄소수 6 내지 40의 아릴렌; 및 치환 또는 비치환된 탄소수 6 내지 40의 헤테로아릴렌으로 이루어진 군에서 선택되고,
X는 산소 또는 황이고,
P는 단순결합; 치환 또는 비치환된 탄소수 1 내지 20의 알킬렌; 치환 또는 비치환된 탄소수 2 내지 20의 알케닐렌; 치환 또는 비치환된 탄소수 3 내지 12의 시클로알킬렌; 치환 또는 비치환된 탄소수 6 내지40의 아릴렌; 치환 또는 비치환된 탄소수 7 내지 15의 아르알킬렌; 치환 또는 비치환된 탄소수 2 내지 20의 알키닐렌; 및 치환 또는 비치환된 탄소수 4 내지 8의 고리형 알킬렌으로 이루어진 군에서 선택되며,
R10, R11, R12, R13 및 R14는 서로 동일하거나 상이하고, 각각 독립적으로 수소; 할로겐; 치환 또는 비치환된 탄소수 1 내지 20의 알킬; 치환 또는 비치환된 탄소수 4 내지 8의 고리형 알킬; 치환 또는 비치환된 탄소수 1 내지 20의 알콕시; 치환 또는 비치환된 탄소수 6 내지 30의 아릴옥시; 치환 또는 비치환된 탄소수 6 내지 40의 아릴; 14족, 15족 또는 16족의 헤테로 원소를 포함하는 탄소수 6 내지 40의 헤테로아릴; 치환 또는 비치환된 탄소수 6 내지 40의 알콕시아릴; 및 산소, 질소, 인, 황, 실리콘, 및 보론 중에서 선택된 적어도 하나 이상을 포함하는 극성 작용기로 이루어진 군에서 선택된다.
- 제 1 항에 있어서, 상기 산소, 질소, 인, 황, 실리콘, 및 보론 중에서 선택된 적어도 하나 이상을 포함하는 극성 작용기는 이하에서 나열된 작용기로 이루어진 군에서 선택되는 말레이미드계 화합물:
-R5OR6, -OR6, -OC(O)OR6, -R5OC(O)OR6, -C(O)OR6, -R5C(O)OR6, -C(O)R6, -R5C(O)R6, -OC(O)R6, -R5OC(O)R6, -(R5O)r-OR6, -(OR5)r-OR6, -C(O)-O-C(O)R6, -R5C(O)-O-C(O)R6, -SR6, -R5SR6, -SSR6, -R5SSR6, -S(=O)R6, -R5S(=O)R6, -R5C(=S)R6-, -R5C(=S)SR6, -R5SO3R6, -SO3R6, -R5N=C=S, -N=C=S, -NCO, -R5-NCO, -CN, -R5CN, -NNC(=S)R6, -R5NNC(=S)R6, -NO2, -R5NO2,
상기 작용기에서 각각 독립적으로, r은 1 내지 10의 정수이고, R5는 치환 또는 비치환된 탄소수 1 내지 20의 알킬렌; 치환 또는 비치환된 탄소수 2 내지 20의 알케닐렌; 치환 또는 비치환된 탄소수 2 내지 20의 알키닐렌; 치환 또는 비치환된 탄소수 3 내지 12의 시클로알킬렌; 치환 또는 비치환된 탄소수 6 내지 40의 아릴렌; 치환 또는 비치환된 탄소수 1 내지 20의 카보닐옥실렌; 또는 치환 또는 비치환된 탄소수 1 내지 20의 알콕실렌이고,
R6, R7, 및 R8은 수소; 할로겐; 치환 또는 비치환된 탄소수 1 내지 20의 알킬; 치환 또는 비치환된 탄소수 2 내지 20의 알케닐; 치환 또는 비치환된 탄소수 2 내지 20의 알키닐; 치환 또는 비치환된 탄소수 3 내지 12의 시클로알킬; 치환 또는 비치환된 탄소수 6 내지 40의 아릴; 치환 또는 비치환된 탄소수 1 내지 20의 알콕시; 및 치환 또는 비치환된 탄소수 1 내지 20의 카보닐옥시로 이루어진 군에서 선택된다.
- 제 1 항에 있어서, 상기 치환 또는 비치환된 탄소수 6 내지 40의 아릴; 또는 14족, 15족 또는 16족의 헤테로 원소를 포함하는 탄소수 6 내지 40의 헤테로 아릴은 이하에 나열된 작용기로 이루어진 군에서 선택되는 말레이미드계 화합물:
이러한 작용기에서, R’10 내지 R’18는 서로 동일하거나 상이하고, 각각 독립적으로 치환 또는 비치환된 탄소수 1 내지 20의 선형 또는 분지형 알킬, 치환 또는 비치환된 탄소수 1 내지 20의 알콕시, 치환 또는 비치환된 탄소수 6 내지 30의 아릴옥시, 및 치환 또는 비치환된 탄소수 6 내지 40의 아릴로 이루어진 군에서 선택된다.
- 하기 화학식 2로 표시되는 반복 단위를 포함하는 광반응성 중합체:
[화학식 2]
상기 화학식 2 에서, S1은 단순결합; 치환 또는 비치환된 탄소수 1 내지 20의 알킬렌; 치환 또는 비치환된 탄소수 2 내지 20의 알케닐렌; 치환 또는 비치환된 탄소수 3 내지 12의 시클로알킬렌; 치환 또는 비치환된 탄소수 6 내지 40의 아릴렌; 치환 또는 비치환된 탄소수 7 내지 15의 아르알킬렌; 치환 또는 비치환된 탄소수 2 내지 20의 알키닐렌; 및 탄소 체인 중에 14족, 15족 또는 16족의 헤테로 원소를 포함하는 탄소수 6 내지 20의 헤테로알킬렌으로 이루어진 군에서 선택되고,
n은 50 내지 5000이고,
A는 하기 화학식 1a 또는 1b의 광반응기이며,
[화학식 1a]
[화학식 1b]
상기 화학식 1a 및 1b에서,
B는 단순결합; 치환 또는 비치환된 탄소수 1 내지 20의 알킬렌; 카보닐; 카르복시; 에스테르; 치환 또는 비치환된 탄소수 6 내지 40의 아릴렌; 및 치환 또는 비치환된 탄소수 6 내지 40의 헤테로아릴렌으로 이루어진 군에서 선택되고,
X는 산소 또는 황이고,
P는 단순결합; 치환 또는 비치환된 탄소수 1 내지 20의 알킬렌; 치환 또는 비치환된 탄소수 2 내지 20의 알케닐렌; 치환 또는 비치환된 탄소수 3 내지 12의 시클로알킬렌; 치환 또는 비치환된 탄소수 6 내지40의 아릴렌; 치환 또는 비치환된 탄소수 7 내지 15의 아르알킬렌; 치환 또는 비치환된 탄소수 2 내지 20의 알키닐렌; 및 치환 또는 비치환된 탄소수 4 내지 8의 고리형 알킬렌으로 이루어진 군에서 선택되며,
R10, R11, R12, R13 및 R14는 서로 동일하거나 상이하고, 각각 독립적으로 수소; 할로겐; 치환 또는 비치환된 탄소수 1 내지 20의 알킬; 치환 또는 비치환된 탄소수 4 내지 8의 고리형 알킬; 치환 또는 비치환된 탄소수 1 내지 20의 알콕시; 치환 또는 비치환된 탄소수 6 내지 30의 아릴옥시; 치환 또는 비치환된 탄소수 6 내지 40의 아릴; 14족, 15족 또는 16족의 헤테로 원소를 포함하는 탄소수 6 내지 40의 헤테로아릴, 및 치환 또는 비치환된 탄소수 6 내지 40의 알콕시아릴로 이루어진 군에서 선택된다.
- 제 4 항에 있어서, 신나메이트계, 쿠마린계, 찰콘계 또는 아조계의 광반응기가 결합되거나, 결합되지 않은 올레핀계 반복 단위, 아크릴레이트계 반복 단위 또는 고리형 올레핀계 반복 단위를 더 포함하는 광반응성 중합체.
- 제 4 항에 있어서, 10000 내지 1000000의 중량 평균 분자량을 갖는 광반응성 중합체.
- 제 1 항에 있어서, 250 내지 450nm의 파장을 갖는 편광의 노광 하에 광반응성을 나타내는 광반응성 중합체.
- 제 4 항 내지 제 8 항 중 어느 한 항의 광반응성 중합체를 포함하는 배향막.
- 제 9 항의 배향막과, 배향막 상의 액정층을 포함하는 액정 위상차 필름.
- 제 9 항의 배향막을 포함하는 표시 소자.
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US20020034709A1 (en) | 2000-08-30 | 2002-03-21 | Dainippon Ink And Chemicals, Inc., Tokyo, Japan | Material for photo-alignment layer, photo-alignment layer and method of manufacturing the same |
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