KR101482621B1 - 말레이미드계 주사슬을 갖는 찰콘계 광배향 소재 - Google Patents
말레이미드계 주사슬을 갖는 찰콘계 광배향 소재 Download PDFInfo
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- KR101482621B1 KR101482621B1 KR20130048787A KR20130048787A KR101482621B1 KR 101482621 B1 KR101482621 B1 KR 101482621B1 KR 20130048787 A KR20130048787 A KR 20130048787A KR 20130048787 A KR20130048787 A KR 20130048787A KR 101482621 B1 KR101482621 B1 KR 101482621B1
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- DQFBYFPFKXHELB-VAWYXSNFSA-N trans-chalcone Chemical compound C=1C=CC=CC=1C(=O)\C=C\C1=CC=CC=C1 DQFBYFPFKXHELB-VAWYXSNFSA-N 0.000 title claims description 19
- DQFBYFPFKXHELB-UHFFFAOYSA-N Chalcone Natural products C=1C=CC=CC=1C(=O)C=CC1=CC=CC=C1 DQFBYFPFKXHELB-UHFFFAOYSA-N 0.000 title claims description 10
- 235000005513 chalcones Nutrition 0.000 title claims description 10
- 239000000463 material Substances 0.000 title abstract description 32
- 125000005439 maleimidyl group Chemical class C1(C=CC(N1*)=O)=O 0.000 title description 3
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 claims abstract description 22
- 125000004432 carbon atom Chemical group C* 0.000 claims description 43
- 150000001875 compounds Chemical class 0.000 claims description 38
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 21
- 125000006850 spacer group Chemical group 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 16
- 239000002904 solvent Substances 0.000 claims description 16
- 125000000732 arylene group Chemical group 0.000 claims description 14
- 239000000203 mixture Substances 0.000 claims description 10
- 125000002947 alkylene group Chemical group 0.000 claims description 9
- 125000000524 functional group Chemical group 0.000 claims description 8
- 125000005843 halogen group Chemical group 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 125000003860 C1-C20 alkoxy group Chemical group 0.000 claims description 3
- 125000004450 alkenylene group Chemical group 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 239000000126 substance Substances 0.000 abstract description 8
- 150000003923 2,5-pyrrolediones Chemical class 0.000 abstract description 6
- 238000006068 polycondensation reaction Methods 0.000 abstract description 4
- 238000006243 chemical reaction Methods 0.000 description 19
- 230000015572 biosynthetic process Effects 0.000 description 17
- 239000004973 liquid crystal related substance Substances 0.000 description 16
- 238000003786 synthesis reaction Methods 0.000 description 16
- 230000003287 optical effect Effects 0.000 description 10
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 238000002371 ultraviolet--visible spectrum Methods 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- -1 maleimide compound Chemical class 0.000 description 6
- 230000000704 physical effect Effects 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 239000000178 monomer Substances 0.000 description 5
- GVSPXQVUXHMUMA-MDWZMJQESA-N (e)-3-(3,5-ditert-butyl-4-hydroxyphenyl)-1-(4-methoxyphenyl)prop-2-en-1-one Chemical compound C1=CC(OC)=CC=C1C(=O)\C=C\C1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 GVSPXQVUXHMUMA-MDWZMJQESA-N 0.000 description 4
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 description 4
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 4
- 150000003141 primary amines Chemical class 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- ZDPAWHACYDRYIW-UHFFFAOYSA-N 1-(4-fluorophenyl)ethanone Chemical compound CC(=O)C1=CC=C(F)C=C1 ZDPAWHACYDRYIW-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 125000004419 alkynylene group Chemical group 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 150000001788 chalcone derivatives Chemical class 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- GOUHYARYYWKXHS-UHFFFAOYSA-N 4-formylbenzoic acid Chemical compound OC(=O)C1=CC=C(C=O)C=C1 GOUHYARYYWKXHS-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- 206010034960 Photophobia Diseases 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 125000002993 cycloalkylene group Chemical group 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 208000013469 light sensitivity Diseases 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical class O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 239000000906 photoactive agent Substances 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 1
- DYNFCHNNOHNJFG-UHFFFAOYSA-N 2-formylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C=O DYNFCHNNOHNJFG-UHFFFAOYSA-N 0.000 description 1
- UHDNUPHSDMOGCR-UHFFFAOYSA-N 3-Formylbenzoic acid Chemical compound OC(=O)C1=CC=CC(C=O)=C1 UHDNUPHSDMOGCR-UHFFFAOYSA-N 0.000 description 1
- MPEIIIWBVXISKP-UHFFFAOYSA-N 4-aminohexan-1-ol Chemical compound CCC(N)CCCO MPEIIIWBVXISKP-UHFFFAOYSA-N 0.000 description 1
- SUTWPJHCRAITLU-UHFFFAOYSA-N 6-aminohexan-1-ol Chemical compound NCCCCCCO SUTWPJHCRAITLU-UHFFFAOYSA-N 0.000 description 1
- OZAIFHULBGXAKX-VAWYXSNFSA-N AIBN Substances N#CC(C)(C)\N=N\C(C)(C)C#N OZAIFHULBGXAKX-VAWYXSNFSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- PMPVIKIVABFJJI-UHFFFAOYSA-N Cyclobutane Chemical compound C1CCC1 PMPVIKIVABFJJI-UHFFFAOYSA-N 0.000 description 1
- QOSSAOTZNIDXMA-UHFFFAOYSA-N Dicylcohexylcarbodiimide Chemical compound C1CCCCC1N=C=NC1CCCCC1 QOSSAOTZNIDXMA-UHFFFAOYSA-N 0.000 description 1
- 235000004434 Gaultheria shallon Nutrition 0.000 description 1
- 244000037922 Gaultheria shallon Species 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N NMP Substances CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 150000001733 carboxylic acid esters Chemical group 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 125000000332 coumarinyl group Chemical class O1C(=O)C(=CC2=CC=CC=C12)* 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- ODZPKZBBUMBTMG-UHFFFAOYSA-N sodium amide Chemical compound [NH2-].[Na+] ODZPKZBBUMBTMG-UHFFFAOYSA-N 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
- C08F22/36—Amides or imides
- C08F22/40—Imides, e.g. cyclic imides
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/14—Esterification
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L35/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least one other carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
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Abstract
Description
도 2는 본 발명의 보다 구체적인 형태의 구조를 예시한다.
도 3은 본 발명의 일실시예에 따른 화합물의 그래픽 모형이다.
도 4는 실시예 6, 7, 8, 9의 FT-IR 분광스펙트럼을 보여주며,
도 5는 실시예 6, 7, 8, 9의 H-NMR 분광스펙트럼을 보여준다.
(도 4, 도 5에서, 1 내지 4는 각각 실시예 6 내지 9를 나타낸다)
도 6은 스페이서의 n이 4인 것의 UV/Vis 스펙트럼을 보여준다.
도 7는 스페이서의 n이 6인 것의 UV/Vis 스펙트럼을 보여준다.
도 8에는 스페이서의 n이 4, 6인 것의 LPUV 노출에너지에 따른 광특성을 나타내었다.
도 9에는 광반응성기의 위치, 파라구조에 따른 UV/Vis 스펙트럼을 보여준다.
도 10에는 광반응성기의 위치, 메타구조에 따른 UV/Vis 스펙트럼을 보여준다.
도 11에는 광반응성기의 위치, 오쏘구조에 따른 UV/Vis 스펙트럼을 보여준다.
도 12에는 광반응성기의 위치에 따른 LPUV 노출 에너지별 Black/White image 나타내었으며,
도 13에는 실시예 6, 7번의 70도에서 72시간동안 위상차변화를 측정한 결과를 나타내었다.
No. |
Solvent (1mL) | Solubility |
1 | Acetone | ++ |
2 | Ethyl Acetate (EA) | ++ |
3 | Tetrahydrofuran(THF) | ++ |
4 | Choroform | ++ |
5 | Methylene Chloride | ++ |
6 | Methy Ethyl Ketone(MEK) | ++ |
7 | Toluene | - |
8 | Propylene Glycol Monomethyl Ether Acetate (PGMEA) |
++ |
Claims (11)
- 하기 화학식 1, 화학식 6 및 화학식 7로 이루어진 군에서 선택된 화합물인, 말레이미드계 주사슬을 갖는 샬콘계 광배향 화합물.
<화학식 1>
<화학식 6>
<화학식 7>
(여기서, k는 0 내지 10 이고, l은 1 내지 100,000이며, m은 1 내지 100,000이고, n은 1 내지 100,000이며, Y는 산소 또는 탄소수 2 내지 14의 알킬렌이며, R1 및 R2 는 각각 CH3 또는 CH2CH3이고, S는 스페이서로서, 단순결합, 치환 또는 비치환된 탄소수 1 내지 20의 알킬렌, 치환 또는 비치환된 탄소수 2 내지 20의 알케닐렌, 치환 또는 비치환된 탄소수 3 내지 13의 시클로 알킬렌, 치환 또는 비치환된 탄소수 6 내지 40의 아릴렌, 치환 또는 비치환된 탄소수 7 내지 15의 아르아릴렌, 치환 또는 비치환된 탄소수 7 내지 15의 아르알킬렌, 및 치환 또는 비치환된 탄소수 2 내지 20의 알키닐렌으로 이루어진 군에서 선택되며, A는 샬콘기를 포함하는 광반응성 작용기이다)
- 삭제
- 제 3항에 있어서,
상기 A는 하기 화학식 3으로 표현되는 화합물.
<화학식 3>
(여기서, B는 수소 또는 할로겐족 원소이거나, 하기 화학식 4로 표시되는 군에서 선택됨)
<화학식 4>
(여기서, X1, X2, X3, X4, 및 X5는 각각, 수소, 할로겐족 원소, 치환된 또는 비치환된 탄소수 1 내지 20의 알킬, 치환된 또는 비치환된 탄소수 4 내지 8의 시클로 알킬, 치환 또는 비치환된 탄소수 1 내지 20의 알콕시, 치환 또는 비치환된 탄소수 1 내지 20의 알콕실, 치환 또는 비치환된 탄소수 6 내지 40의 아릴로 이루어진 군에서 선택됨)
- 제 4항에 있어서,
상기 B는 메타위치에 결합되는 것을 특징으로 하는 화합물. - 제 3항에 있어서,
상기 화학식 2의 n은 4 내지 6인 것을 특징으로 하는 화합물. - 제 1항 및 제 3항 내지 제 6항 중 어느 한 항의 화합물을 포함하는 광배향 조성물.
- 제 7항에 있어서,
상기 화합물은 광배향 조성물을 기준으로 1 내지 15 중량%인 것을 특징으로 하는 광배향 조성물. - 제 7항에 있어서,
상기 광배향 조성물의 용매는 MEK:Toluene이 1:9 내지 9:1 인 것을 특징으로 하는 광배향 조성물. - 제 1항 및 제 3항 내지 제 6항 중 어느 한 항의 화합물을 포함하는 배향막.
- 제 1항 및 제 3항 내지 제 6항 중 어느 한 항의 화합물을 포함하는 배향필름.
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KR20020018028A (ko) * | 2000-08-30 | 2002-03-07 | 다이니뽄 잉끼 가가꾸 고오교오 가부시끼가이샤 | 광배향막용 재료, 광배향막 및 그 제조 방법 |
JP2002265541A (ja) | 2001-03-14 | 2002-09-18 | Dainippon Ink & Chem Inc | マレイミド誘導体を含有する光配向材料及び光配向膜の製造方法 |
KR100465445B1 (ko) * | 2001-07-31 | 2005-01-13 | 삼성전자주식회사 | 액정배향막용 광배향재 |
KR20120014543A (ko) * | 2010-08-09 | 2012-02-17 | 주식회사 엘지화학 | 광반응기를 갖는 말레이미드계 화합물 및 광반응성 중합체 |
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KR20020018028A (ko) * | 2000-08-30 | 2002-03-07 | 다이니뽄 잉끼 가가꾸 고오교오 가부시끼가이샤 | 광배향막용 재료, 광배향막 및 그 제조 방법 |
JP2002265541A (ja) | 2001-03-14 | 2002-09-18 | Dainippon Ink & Chem Inc | マレイミド誘導体を含有する光配向材料及び光配向膜の製造方法 |
KR100465445B1 (ko) * | 2001-07-31 | 2005-01-13 | 삼성전자주식회사 | 액정배향막용 광배향재 |
KR20120014543A (ko) * | 2010-08-09 | 2012-02-17 | 주식회사 엘지화학 | 광반응기를 갖는 말레이미드계 화합물 및 광반응성 중합체 |
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