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KR101055247B1 - 기판의 처리 장치 및 처리 방법 - Google Patents

기판의 처리 장치 및 처리 방법 Download PDF

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Publication number
KR101055247B1
KR101055247B1 KR1020040055566A KR20040055566A KR101055247B1 KR 101055247 B1 KR101055247 B1 KR 101055247B1 KR 1020040055566 A KR1020040055566 A KR 1020040055566A KR 20040055566 A KR20040055566 A KR 20040055566A KR 101055247 B1 KR101055247 B1 KR 101055247B1
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KR
South Korea
Prior art keywords
substrate
board
nozzle
liquid
processing
Prior art date
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Expired - Fee Related
Application number
KR1020040055566A
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English (en)
Korean (ko)
Other versions
KR20050009695A (ko
Inventor
이소아키노리
니시베유키노부
와카쓰키다카히코
Original Assignee
시바우라 메카트로닉스 가부시키가이샤
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Publication date
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Publication of KR20050009695A publication Critical patent/KR20050009695A/ko
Application granted granted Critical
Publication of KR101055247B1 publication Critical patent/KR101055247B1/ko
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/54—Arrangements for reducing warping-twist

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020040055566A 2003-07-18 2004-07-16 기판의 처리 장치 및 처리 방법 Expired - Fee Related KR101055247B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2003199087 2003-07-18
JPJP-P-2003-00199087 2003-07-18
JP2004191134A JP4421956B2 (ja) 2003-07-18 2004-06-29 基板の処理装置及び処理方法
JPJP-P-2004-00191134 2004-06-29

Publications (2)

Publication Number Publication Date
KR20050009695A KR20050009695A (ko) 2005-01-25
KR101055247B1 true KR101055247B1 (ko) 2011-08-08

Family

ID=34379735

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020040055566A Expired - Fee Related KR101055247B1 (ko) 2003-07-18 2004-07-16 기판의 처리 장치 및 처리 방법

Country Status (4)

Country Link
JP (1) JP4421956B2 (zh)
KR (1) KR101055247B1 (zh)
CN (1) CN100419501C (zh)
TW (1) TWI347629B (zh)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4627681B2 (ja) * 2005-04-20 2011-02-09 芝浦メカトロニクス株式会社 基板の処理装置及び処理方法
JP4557872B2 (ja) * 2005-11-28 2010-10-06 株式会社日立ハイテクノロジーズ 基板処理装置、基板処理方法、及び基板の製造方法
TWI319213B (en) * 2005-11-28 2010-01-01 Hitachi High Tech Corp A substrate processing device, a substrate processing method and a production method for a substrate
JP4685618B2 (ja) * 2005-12-13 2011-05-18 芝浦メカトロニクス株式会社 基板の処理装置
KR100835745B1 (ko) * 2006-12-29 2008-06-09 최찬규 하향식 유리 박형화 방법
JP2008277556A (ja) * 2007-04-27 2008-11-13 Shibaura Mechatronics Corp 基板の処理装置
JP4575932B2 (ja) * 2007-05-29 2010-11-04 化研テック株式会社 パレット洗浄装置およびパレット洗浄方法
KR100865475B1 (ko) * 2007-08-30 2008-10-27 세메스 주식회사 노즐 어셈블리, 이를 갖는 처리액 공급 장치 및 이를이용하는 처리액 공급 방법
JP5362623B2 (ja) * 2010-03-03 2013-12-11 大日本スクリーン製造株式会社 基板処理装置
DE102010013909A1 (de) * 2010-04-01 2011-10-06 Lp Vermarktungs Gmbh & Co. Kg Vorrichtung und Verfahren zum Besprühen einer Oberfläche eines Substrates
CN102094199A (zh) * 2010-11-23 2011-06-15 黄佳佳 一种电子软标签的蚀刻设备
US8458842B2 (en) * 2011-05-10 2013-06-11 Nanya Technology Corp. Post-CMP wafer cleaning apparatus
KR101342616B1 (ko) * 2013-04-26 2013-12-20 창성 주식회사 수직형 기판 박리 시스템
KR102223764B1 (ko) * 2013-12-27 2021-03-05 세메스 주식회사 기판처리장치 및 방법
CN105158829B (zh) * 2015-07-30 2019-06-04 京东方科技集团股份有限公司 基板、彩色滤光片模组、形成基板模组的方法和显示装置
JP6667241B2 (ja) * 2015-09-28 2020-03-18 株式会社Ｓｃｒｅｅｎホールディングス 処理液供給装置、基板処理システムおよび処理液供給方法
CN106992136B (zh) * 2017-04-20 2020-04-07 武汉华星光电技术有限公司 湿法蚀刻设备及湿法蚀刻方法
KR102433317B1 (ko) * 2017-10-11 2022-08-17 삼성디스플레이 주식회사 습식 식각 장치
CN111006262A (zh) * 2019-12-31 2020-04-14 美埃（中国）环境净化有限公司 一种水洗型除油烟净化装置及其水洗控制方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10118583A (ja) 1996-10-24 1998-05-12 Nippon Electric Glass Co Ltd 板状物の洗浄装置
JPH1133503A (ja) * 1997-07-24 1999-02-09 Dainippon Screen Mfg Co Ltd 基板処理装置
KR19990023551A (ko) * 1997-08-28 1999-03-25 이시다 아키라 기판처리장치
JP2000188272A (ja) * 1998-12-22 2000-07-04 Dainippon Screen Mfg Co Ltd 基板処理装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001343632A (ja) * 2000-06-02 2001-12-14 Sharp Corp 液晶表示素子の製造方法
JP3622842B2 (ja) * 2000-12-11 2005-02-23 住友精密工業株式会社 搬送式基板処理装置
KR20020084122A (ko) * 2000-12-12 2002-11-04 수미도모 프리시젼 프로덕츠 캄파니 리미티드 요동 샤워형 반송식 기판 처리 장치
JP4180250B2 (ja) * 2001-05-30 2008-11-12 東京エレクトロン株式会社 基板処理装置及び基板処理方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10118583A (ja) 1996-10-24 1998-05-12 Nippon Electric Glass Co Ltd 板状物の洗浄装置
JPH1133503A (ja) * 1997-07-24 1999-02-09 Dainippon Screen Mfg Co Ltd 基板処理装置
KR19990023551A (ko) * 1997-08-28 1999-03-25 이시다 아키라 기판처리장치
JP2000188272A (ja) * 1998-12-22 2000-07-04 Dainippon Screen Mfg Co Ltd 基板処理装置

Also Published As

Publication number Publication date
CN1576961A (zh) 2005-02-09
JP2005052825A (ja) 2005-03-03
JP4421956B2 (ja) 2010-02-24
TWI347629B (en) 2011-08-21
KR20050009695A (ko) 2005-01-25
TW200507038A (en) 2005-02-16
CN100419501C (zh) 2008-09-17

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