KR100973109B1 - 감광성 조성물 - Google Patents
감광성 조성물 Download PDFInfo
- Publication number
- KR100973109B1 KR100973109B1 KR1020080022721A KR20080022721A KR100973109B1 KR 100973109 B1 KR100973109 B1 KR 100973109B1 KR 1020080022721 A KR1020080022721 A KR 1020080022721A KR 20080022721 A KR20080022721 A KR 20080022721A KR 100973109 B1 KR100973109 B1 KR 100973109B1
- Authority
- KR
- South Korea
- Prior art keywords
- group
- photosensitive composition
- bond
- pigment
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/94—[b, c]- or [b, d]-condensed containing carbocyclic rings other than six-membered
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
Abstract
Description
Claims (10)
- 제1항에 있어서,상기 식 (1)에 있어서 α로 표시되는 N 원자와 β로 표시되는 O 원자의 결합 길이가 1.360Å 이상인 것을 특징으로 하는 감광성 조성물.
- 삭제
- 삭제
- 삭제
- 제1항에 있어서,상기 E는 공역 이중 결합성 환상기의 치환기에 N 원자를 가지는 것을 특징으로 하는 감광성 조성물.
- 제6항에 있어서,상기 치환기는 공역 이중 결합성 환상기에 직접 N 원자가 결합하고 있는 것을 특징으로 하는 감광성 조성물.
- 제7항에 있어서,상기 치환기는 -NR4R5(여기서, R4 및 R5는 각각 독립하여 알킬기, 알콕시기를 나타내고, 이들은 할로겐 원자로 치환되어 있어도 좋고, 이들 중 알킬기 및 알콕시기의 알킬렌 부분은 에테르결합, 티오에테르결합, 에스테르결합에 의해 중단되어 있어도 좋고, 또 R4 및 R5는 하나로 되어 환을 형성하고 있어도 좋다.)로 표시되는 것을 특징으로 하는 감광성 조성물.
- 제1항에 있어서,착색재를 포함하는 것을 특징으로 하는 감광성 조성물.
- 제9항에 있어서,상기 착색재는 차광재인 것을 특징으로 하는 감광성 조성물.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007082777A JP4855312B2 (ja) | 2007-03-27 | 2007-03-27 | 感光性組成物 |
JPJP-P-2007-00082777 | 2007-03-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20080087670A KR20080087670A (ko) | 2008-10-01 |
KR100973109B1 true KR100973109B1 (ko) | 2010-07-29 |
Family
ID=39913531
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020080022721A Active KR100973109B1 (ko) | 2007-03-27 | 2008-03-12 | 감광성 조성물 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4855312B2 (ko) |
KR (1) | KR100973109B1 (ko) |
TW (1) | TWI432899B (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5422244B2 (ja) * | 2009-04-01 | 2014-02-19 | 東洋インキScホールディングス株式会社 | 感光性着色組成物およびカラーフィルタ |
JP2021192068A (ja) * | 2018-08-30 | 2021-12-16 | 昭和電工株式会社 | 感光性樹脂組成物、ブラックカラムスペーサー及び画像表示装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004359639A (ja) | 2003-06-06 | 2004-12-24 | Asahi Denka Kogyo Kk | オキシムエステル化合物および該化合物を含有する光重合開始剤 |
JP2005220097A (ja) * | 2004-02-06 | 2005-08-18 | Asahi Denka Kogyo Kk | チオフェン構造を有するオキシムエステル化合物及び該化合物を含有する光重合開始剤 |
WO2006018405A1 (en) * | 2004-08-18 | 2006-02-23 | Ciba Specialty Chemicals Holding Inc. | Oxime ester photoinitiators |
KR20070027445A (ko) * | 2005-09-06 | 2007-03-09 | 도쿄 오카 고교 가부시키가이샤 | 감광성 조성물 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2505893A1 (en) * | 2002-12-03 | 2004-06-17 | Ciba Specialty Chemicals Holding Inc. | Oxime ester photoinitiators with heteroaromatic groups |
KR101370818B1 (ko) * | 2006-12-20 | 2014-03-07 | 미쓰비시 가가꾸 가부시키가이샤 | 옥심에스테르계 화합물, 광중합 개시제, 광중합성 조성물, 컬러 필터 및 액정 표시 장치 |
-
2007
- 2007-03-27 JP JP2007082777A patent/JP4855312B2/ja active Active
-
2008
- 2008-03-12 KR KR1020080022721A patent/KR100973109B1/ko active Active
- 2008-03-26 TW TW097110865A patent/TWI432899B/zh active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004359639A (ja) | 2003-06-06 | 2004-12-24 | Asahi Denka Kogyo Kk | オキシムエステル化合物および該化合物を含有する光重合開始剤 |
JP2005220097A (ja) * | 2004-02-06 | 2005-08-18 | Asahi Denka Kogyo Kk | チオフェン構造を有するオキシムエステル化合物及び該化合物を含有する光重合開始剤 |
WO2006018405A1 (en) * | 2004-08-18 | 2006-02-23 | Ciba Specialty Chemicals Holding Inc. | Oxime ester photoinitiators |
KR20070027445A (ko) * | 2005-09-06 | 2007-03-09 | 도쿄 오카 고교 가부시키가이샤 | 감광성 조성물 |
Also Published As
Publication number | Publication date |
---|---|
JP2008242089A (ja) | 2008-10-09 |
TW200839445A (en) | 2008-10-01 |
TWI432899B (zh) | 2014-04-01 |
JP4855312B2 (ja) | 2012-01-18 |
KR20080087670A (ko) | 2008-10-01 |
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