KR100446563B1 - 복합재료의 제조방법 및 그것에 의해 얻어지는 복합재료 - Google Patents
복합재료의 제조방법 및 그것에 의해 얻어지는 복합재료 Download PDFInfo
- Publication number
- KR100446563B1 KR100446563B1 KR10-2001-7013618A KR20017013618A KR100446563B1 KR 100446563 B1 KR100446563 B1 KR 100446563B1 KR 20017013618 A KR20017013618 A KR 20017013618A KR 100446563 B1 KR100446563 B1 KR 100446563B1
- Authority
- KR
- South Korea
- Prior art keywords
- composite material
- aluminum
- substrate
- bulk body
- base material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0005—Separation of the coating from the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0688—Cermets, e.g. mixtures of metal and one or more of carbides, nitrides, oxides or borides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Manufacture Of Alloys Or Alloy Compounds (AREA)
Abstract
Description
Claims (9)
- 알루미늄을 모재로 하고, 분산재로서 탄소를 분산시켜 이루어진 알루미늄계 복합재료의 제조방법으로서,알루미늄 또는 알루미늄 화합물에 의하여 이루어진 모재용 원료와, 상기 분산재로 이루어진 분산재용 원료를 동시에 또는 서로 번갈아 증발시켜, 기판상에 이들 증발입자를 퇴적시켜 벌크체로 하는 것을 특징으로 하는 알루미늄계 복합재료의 제조방법.
- 알루미늄을 모재로 하고, 분산재로서 탄소를 분산시켜 이루어진 알루미늄계복합재료의 제조방법으로서,알루미늄 또는 알루미늄 화합물에 의하여 이루어진 증발용 원료를 탄화수소계 가스 분위기 중에서 증발시켜, 기판상에 증발입자를 퇴적시켜 벌크체로 하는 것을 특징으로 하는 알루미늄계 복합재료의 제조방법.
- 제 1항 또는 제 2항의 방법에 의해 제조되는 벌크체와, 모재인 알루미늄을 용해, 혼합하고, 이것을 주조성형하는 것에 의해 분산재인 탄소의 농도를 조정하는 것을 특징으로 하는 알루미늄계 복합재료의 제조방법.
- 제 3항의 방법에 의해 제조되는 알루미늄계 복합재료를 압연가공 또는 열처리하는 것에 의해 결정구조를 조정하는 것을 특징으로 하는 알루미늄계 복합재료의 제조방법.
- 제 1항 또는 제 2항에 있어서,원료의 증발은 스퍼터링법에 의해 행하는 것을 특징으로 하는 알루미늄계 복합재료의 제조방법.
- 제 1항 또는 제 2항에 있어서,기판을 회전시키면서 증발입자를 퇴적시키는 것을 특징으로 하는 알루미늄계 복합재료의 제조방법.
- 제 1항 또는 제 2항에 있어서,기판은 모재와 같은 재질의 것을 사용하는 것을 특징으로 하는 알루미늄계 복합재료의 제조방법.
- 제 3항에 기재된 방법에 의하여 제조된 것을 특징으로 하는 알루미늄계 복합재료.
- 삭제
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000068049 | 2000-03-13 | ||
JPJP-P-2000-00068049 | 2000-03-13 | ||
JPJP-P-2000-00068048 | 2000-03-13 | ||
JP2000068048 | 2000-03-13 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010113893A KR20010113893A (ko) | 2001-12-28 |
KR100446563B1 true KR100446563B1 (ko) | 2004-09-04 |
Family
ID=26587272
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2001-7013618A Expired - Fee Related KR100446563B1 (ko) | 2000-03-13 | 2001-03-06 | 복합재료의 제조방법 및 그것에 의해 얻어지는 복합재료 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20030056928A1 (ko) |
JP (1) | JP4060595B2 (ko) |
KR (1) | KR100446563B1 (ko) |
CN (1) | CN1250766C (ko) |
TW (1) | TWI257431B (ko) |
WO (1) | WO2001068936A1 (ko) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040084305A1 (en) * | 2002-10-25 | 2004-05-06 | Semiconductor Energy Laboratory Co., Ltd. | Sputtering system and manufacturing method of thin film |
US20060189132A1 (en) * | 2003-04-16 | 2006-08-24 | Bridgestone Corporation | Method for forming porous thin film |
US7255757B2 (en) | 2003-12-22 | 2007-08-14 | General Electric Company | Nano particle-reinforced Mo alloys for x-ray targets and method to make |
US20050133121A1 (en) * | 2003-12-22 | 2005-06-23 | General Electric Company | Metallic alloy nanocomposite for high-temperature structural components and methods of making |
JP2006080170A (ja) * | 2004-09-08 | 2006-03-23 | Hitachi Cable Ltd | Cnt入り配線材の製造方法およびスパッタリング用ターゲット材 |
US7632761B2 (en) * | 2006-06-01 | 2009-12-15 | Wayne State University | Method of making thin film anatase titanium dioxide |
KR101149408B1 (ko) * | 2006-11-15 | 2012-06-01 | 삼성전자주식회사 | 연료 전지용 전극의 제조 방법 및 제조 장치 |
DE102007056678A1 (de) * | 2007-11-24 | 2009-05-28 | Bayerische Motoren Werke Aktiengesellschaft | Verfahren zur Herstellung eines Bauteils aus einem Metallmatrix-Verbundwerkstoff |
JP5117357B2 (ja) * | 2008-11-26 | 2013-01-16 | 株式会社アルバック | 永久磁石の製造方法 |
CN106048545A (zh) * | 2012-03-15 | 2016-10-26 | 吉坤日矿日石金属株式会社 | 磁性材料溅射靶及其制造方法 |
JP6586618B2 (ja) * | 2014-08-07 | 2019-10-09 | 国立大学法人豊橋技術科学大学 | Dlc膜形成方法及びdlc膜形成装置 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07216534A (ja) * | 1994-01-27 | 1995-08-15 | Riken Corp | 耐摩耗性皮膜及びその製造方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4292079A (en) * | 1978-10-16 | 1981-09-29 | The International Nickel Co., Inc. | High strength aluminum alloy and process |
US4624705A (en) * | 1986-04-04 | 1986-11-25 | Inco Alloys International, Inc. | Mechanical alloying |
JPH01125921A (ja) * | 1987-11-11 | 1989-05-18 | Meidensha Corp | 半導体化炭素薄膜の製造方法 |
US4834942A (en) * | 1988-01-29 | 1989-05-30 | The United States Of America As Represented By The Secretary Of The Navy | Elevated temperature aluminum-titanium alloy by powder metallurgy process |
US4832734A (en) * | 1988-05-06 | 1989-05-23 | Inco Alloys International, Inc. | Hot working aluminum-base alloys |
US5045278A (en) * | 1989-11-09 | 1991-09-03 | Allied-Signal Inc. | Dual processing of aluminum base metal matrix composites |
US5401587A (en) * | 1990-03-27 | 1995-03-28 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Anisotropic nanophase composite material and method of producing same |
US5169461A (en) * | 1990-11-19 | 1992-12-08 | Inco Alloys International, Inc. | High temperature aluminum-base alloy |
US5171381A (en) * | 1991-02-28 | 1992-12-15 | Inco Alloys International, Inc. | Intermediate temperature aluminum-base alloy |
JPH0578197A (ja) * | 1991-03-15 | 1993-03-30 | Kyocera Corp | TiO2−SnO2膜の製法 |
JP3221892B2 (ja) * | 1991-09-20 | 2001-10-22 | 帝国ピストンリング株式会社 | ピストンリング及びその製造法 |
JPH07207436A (ja) * | 1994-01-24 | 1995-08-08 | Sekisui Chem Co Ltd | スパッタリング装置 |
JP3367269B2 (ja) * | 1994-05-24 | 2003-01-14 | 株式会社豊田中央研究所 | アルミニウム合金およびその製造方法 |
-
2001
- 2001-03-06 WO PCT/JP2001/001712 patent/WO2001068936A1/ja active IP Right Grant
- 2001-03-06 JP JP2001567413A patent/JP4060595B2/ja not_active Expired - Fee Related
- 2001-03-06 US US09/926,486 patent/US20030056928A1/en not_active Abandoned
- 2001-03-06 KR KR10-2001-7013618A patent/KR100446563B1/ko not_active Expired - Fee Related
- 2001-03-06 CN CNB018001831A patent/CN1250766C/zh not_active Expired - Fee Related
- 2001-03-09 TW TW090105573A patent/TWI257431B/zh not_active IP Right Cessation
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07216534A (ja) * | 1994-01-27 | 1995-08-15 | Riken Corp | 耐摩耗性皮膜及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
TWI257431B (en) | 2006-07-01 |
US20030056928A1 (en) | 2003-03-27 |
JP4060595B2 (ja) | 2008-03-12 |
CN1250766C (zh) | 2006-04-12 |
WO2001068936A1 (fr) | 2001-09-20 |
CN1362998A (zh) | 2002-08-07 |
KR20010113893A (ko) | 2001-12-28 |
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