KR0175048B1 - 포토레지스트 분사장치 - Google Patents
포토레지스트 분사장치 Download PDFInfo
- Publication number
- KR0175048B1 KR0175048B1 KR1019960007379A KR19960007379A KR0175048B1 KR 0175048 B1 KR0175048 B1 KR 0175048B1 KR 1019960007379 A KR1019960007379 A KR 1019960007379A KR 19960007379 A KR19960007379 A KR 19960007379A KR 0175048 B1 KR0175048 B1 KR 0175048B1
- Authority
- KR
- South Korea
- Prior art keywords
- photoresist
- tank
- gas
- pressure
- pipe
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B9/00—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour
- B05B9/03—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material
- B05B9/04—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour characterised by means for supplying liquid or other fluent material with pressurised or compressible container; with pump
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/2931—Diverse fluid containing pressure systems
- Y10T137/3115—Gas pressure storage over or displacement of liquid
- Y10T137/3127—With gas maintenance or application
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Coating Apparatus (AREA)
- Materials For Photolithography (AREA)
Abstract
Description
Claims (3)
- 포토레지스트를 저장하기 위한 탱크(tank)와, 상기 탱크의 측면 소정위치에 연결된 포토레지스트 주입관과, 상기 탱크의 하면 소정위치에 연결된 포토레지스트 배출관과, 중앙 소정위치가 상기 탱크의 상단에 연결되어 탱크 내부의 압력을 조정하는 가스관과, 상기 가스관의 가스배출구에 장착되어 가스의 배출을 결정하는 밸브를 포함하여 구성된 것을 특징으로 하는 포토레지스트 분사장치.
- 제1항에 있어서, 상기 탱크의 상단 소정위치에는 상기 탱크 내부의 대기 압력을 감지하는 제1압력감지수단이 장착되고, 상기 포토레지스트 배출관의 소정위치에는 배출되는 포토레지스트의 압력을 감지하는 제2압력감지수단이 장착된 것을 특징으로 하는 포토레지스트 분사장치.
- 제1항에 있어서, 상기 가스관에서는 질소가스(N2)를 사용하는 것을 특징으로 하는 포토레지스트 분사장치.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960007379A KR0175048B1 (ko) | 1996-03-19 | 1996-03-19 | 포토레지스트 분사장치 |
JP02779197A JP3934194B2 (ja) | 1996-03-19 | 1997-02-12 | フォトレジスト噴射装置 |
TW086101732A TW317510B (ko) | 1996-03-19 | 1997-02-14 | |
US08/825,224 US5814151A (en) | 1996-03-19 | 1997-03-19 | Apparatus for spraying photoresist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960007379A KR0175048B1 (ko) | 1996-03-19 | 1996-03-19 | 포토레지스트 분사장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR970067704A KR970067704A (ko) | 1997-10-13 |
KR0175048B1 true KR0175048B1 (ko) | 1999-04-01 |
Family
ID=19453419
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960007379A KR0175048B1 (ko) | 1996-03-19 | 1996-03-19 | 포토레지스트 분사장치 |
Country Status (4)
Country | Link |
---|---|
US (1) | US5814151A (ko) |
JP (1) | JP3934194B2 (ko) |
KR (1) | KR0175048B1 (ko) |
TW (1) | TW317510B (ko) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3824030B2 (ja) * | 1997-04-28 | 2006-09-20 | 東京エレクトロン株式会社 | 気泡発生防止機構およびそれを用いた液処理装置 |
TW377879U (en) * | 1998-05-16 | 1999-12-21 | United Microelectronics Corp | Pressure sensing apparatus for liquid transmission |
US6248171B1 (en) | 1998-09-17 | 2001-06-19 | Silicon Valley Group, Inc. | Yield and line width performance for liquid polymers and other materials |
US6689215B2 (en) | 1998-09-17 | 2004-02-10 | Asml Holdings, N.V. | Method and apparatus for mitigating cross-contamination between liquid dispensing jets in close proximity to a surface |
US6302960B1 (en) | 1998-11-23 | 2001-10-16 | Applied Materials, Inc. | Photoresist coater |
TWI235284B (en) * | 1999-03-17 | 2005-07-01 | Winbond Electronics Corp | Photoresist supply device |
US6746826B1 (en) | 2000-07-25 | 2004-06-08 | Asml Holding N.V. | Method for an improved developing process in wafer photolithography |
JP3988676B2 (ja) * | 2003-05-01 | 2007-10-10 | セイコーエプソン株式会社 | 塗布装置、薄膜の形成方法、薄膜形成装置及び半導体装置の製造方法 |
KR100577563B1 (ko) * | 2004-04-07 | 2006-05-08 | 삼성전자주식회사 | 반도체 소자 제조장비에서의 감광액 공급방법 및 감광액공급장치 |
CN105381899A (zh) * | 2015-11-13 | 2016-03-09 | 平顶山市美伊金属制品有限公司 | 一种喷涂涂料的压力送料装置 |
EP3810250A4 (en) | 2018-05-14 | 2022-07-13 | Giner Life Sciences, Inc. | SYSTEM AND METHOD FOR CONTROLLING OXYGEN DELIVERY TO IMPLANTED CELLS |
CN109127186A (zh) * | 2018-08-01 | 2019-01-04 | 黔西南州万宏机械制造有限责任公司 | 一种新型喷雾装置 |
JP7594468B2 (ja) * | 2021-03-10 | 2024-12-04 | 株式会社Screenホールディングス | 基板処理装置および供給弁 |
CN113534610B (zh) * | 2021-08-05 | 2023-10-27 | 宁波润华全芯微电子设备有限公司 | 一种光刻胶空气隔绝系统 |
CN118083343B (zh) * | 2024-04-07 | 2024-10-29 | 深圳市向实泵业科技有限公司 | 一种高精度的光刻胶供给装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4235829A (en) * | 1979-05-07 | 1980-11-25 | Western Electric Company, Inc. | Vapor delivery system and method of maintaining a constant level of liquid therein |
US4676404A (en) * | 1983-10-17 | 1987-06-30 | Nippon Zeon Co., Ltd. | Method and apparatus for feeding drug liquid from hermetic returnable can |
IT1265539B1 (it) * | 1993-09-23 | 1996-11-22 | Manzini Comaco Spa | Procedimento e dispositivo per il controllo della regolarita' di drenaggio in un dispositivo di drenaggio per la separazione di |
US5568882A (en) * | 1995-02-03 | 1996-10-29 | Abc Techcorp | Precise volume fluid dispenser |
-
1996
- 1996-03-19 KR KR1019960007379A patent/KR0175048B1/ko not_active IP Right Cessation
-
1997
- 1997-02-12 JP JP02779197A patent/JP3934194B2/ja not_active Expired - Fee Related
- 1997-02-14 TW TW086101732A patent/TW317510B/zh active
- 1997-03-19 US US08/825,224 patent/US5814151A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH09260282A (ja) | 1997-10-03 |
TW317510B (ko) | 1997-10-11 |
JP3934194B2 (ja) | 2007-06-20 |
KR970067704A (ko) | 1997-10-13 |
US5814151A (en) | 1998-09-29 |
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