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JPS6465259A - Continuous composite coating equipment for band plate - Google Patents

Continuous composite coating equipment for band plate

Info

Publication number
JPS6465259A
JPS6465259A JP22130187A JP22130187A JPS6465259A JP S6465259 A JPS6465259 A JP S6465259A JP 22130187 A JP22130187 A JP 22130187A JP 22130187 A JP22130187 A JP 22130187A JP S6465259 A JPS6465259 A JP S6465259A
Authority
JP
Japan
Prior art keywords
band plate
coating
slits
continuous composite
slit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22130187A
Other languages
Japanese (ja)
Inventor
Seishiro Saida
Isao Ito
Toru Ito
Naotake Okubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP22130187A priority Critical patent/JPS6465259A/en
Publication of JPS6465259A publication Critical patent/JPS6465259A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To carry out continuous composite coating in a short time without injuring a band plate, by providing slits through which a band plate is passed to respective bulkheads among connected plural coating chambers and holding the band plate by means of guide rollers on respective upper edges of the slits. CONSTITUTION:Two or more kinds of coating devices, such as an ion plating device 2, a sputtering device 3, and a plasma CVD device 4, are arranged in series in the longitudinal direction of a band plate S via a multistage slit differential pressure sealing device 5 between two coiling and decoiling devices 1a, 1b on which the band plate S is stretched. In the above continuous composite coating equipment of the band plate S, slits 18, etc., through which the band plate S is passed are provided to respective bulkheads 14, 21, etc., among the devices. Further, a couple of guide rollers 19 is provided to the parts before and behind the upper edge of each slit 18, by which the band plate S is held so that it sags down longitudinally and also clearances are held respectively between the upper and lower edges of each slit 18 and the band plate S. By this method, dry coating can be carried out without injuring coating as well as the surfaces of the band plate S passing through the slits 18.
JP22130187A 1987-09-04 1987-09-04 Continuous composite coating equipment for band plate Pending JPS6465259A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22130187A JPS6465259A (en) 1987-09-04 1987-09-04 Continuous composite coating equipment for band plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22130187A JPS6465259A (en) 1987-09-04 1987-09-04 Continuous composite coating equipment for band plate

Publications (1)

Publication Number Publication Date
JPS6465259A true JPS6465259A (en) 1989-03-10

Family

ID=16764646

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22130187A Pending JPS6465259A (en) 1987-09-04 1987-09-04 Continuous composite coating equipment for band plate

Country Status (1)

Country Link
JP (1) JPS6465259A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03264676A (en) * 1990-03-13 1991-11-25 Canon Inc Continuous deposited film forming device
JPH04198480A (en) * 1990-11-29 1992-07-17 Canon Inc Apparatus for producing functional deposited film
JP2002538307A (en) * 1999-03-04 2002-11-12 エナージー コンバーション デバイセス インコーポレイテッド Apparatus and method for simultaneous vapor deposition by physical vapor deposition and chemical vapor deposition
JP2008051210A (en) * 2006-08-24 2008-03-06 Toyota Motor Corp Gas barrier structure and manufacturing method thereof
JP2011006737A (en) * 2009-06-25 2011-01-13 Hitachi Zosen Corp Vacuum film-forming apparatus and vacuum film-forming method
JP2012140694A (en) * 2011-01-06 2012-07-26 Choshu Industry Co Ltd Vacuum consistent film forming apparatus
WO2019188410A1 (en) * 2018-03-30 2019-10-03 Ｊｆｅスチール株式会社 Equipment for manufacturing grain-oriented electromagnetic steel sheet
CN111020522A (en) * 2019-12-09 2020-04-17 王殿儒 Composite type substrate continuous coating system based on gas discharge type high-power electron gun

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5746207A (en) * 1980-09-05 1982-03-16 Nippon Telegr & Teleph Corp <Ntt> Compound optical fiber
JPS57195753A (en) * 1981-05-29 1982-12-01 Shin Etsu Chem Co Ltd Batch-wise continuous type vacuum treatment apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5746207A (en) * 1980-09-05 1982-03-16 Nippon Telegr & Teleph Corp <Ntt> Compound optical fiber
JPS57195753A (en) * 1981-05-29 1982-12-01 Shin Etsu Chem Co Ltd Batch-wise continuous type vacuum treatment apparatus

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03264676A (en) * 1990-03-13 1991-11-25 Canon Inc Continuous deposited film forming device
JPH04198480A (en) * 1990-11-29 1992-07-17 Canon Inc Apparatus for producing functional deposited film
JP2002538307A (en) * 1999-03-04 2002-11-12 エナージー コンバーション デバイセス インコーポレイテッド Apparatus and method for simultaneous vapor deposition by physical vapor deposition and chemical vapor deposition
JP2008051210A (en) * 2006-08-24 2008-03-06 Toyota Motor Corp Gas barrier structure and manufacturing method thereof
JP2011006737A (en) * 2009-06-25 2011-01-13 Hitachi Zosen Corp Vacuum film-forming apparatus and vacuum film-forming method
JP2012140694A (en) * 2011-01-06 2012-07-26 Choshu Industry Co Ltd Vacuum consistent film forming apparatus
WO2019188410A1 (en) * 2018-03-30 2019-10-03 Ｊｆｅスチール株式会社 Equipment for manufacturing grain-oriented electromagnetic steel sheet
JPWO2019188410A1 (en) * 2018-03-30 2020-04-30 Ｊｆｅスチール株式会社 Equipment for manufacturing grain-oriented electrical steel
CN111971760A (en) * 2018-03-30 2020-11-20 杰富意钢铁株式会社 Apparatus for manufacturing grain-oriented electromagnetic steel sheet
EP3761326A4 (en) * 2018-03-30 2021-03-24 JFE Steel Corporation Equipment for manufacturing grain-oriented electromagnetic steel sheet
RU2761570C1 (en) * 2018-03-30 2021-12-10 ДжФЕ СТИЛ КОРПОРЕЙШН Equipment for producing grain-oriented sheets from electrical steel
KR20230008237A (en) * 2018-03-30 2023-01-13 제이에프이 스틸 가부시키가이샤 Equipment for manufacturing grain-oriented electromagnetic steel sheet
CN111020522A (en) * 2019-12-09 2020-04-17 王殿儒 Composite type substrate continuous coating system based on gas discharge type high-power electron gun
CN111020522B (en) * 2019-12-09 2022-05-27 王殿儒 Composite type substrate continuous coating system based on gas discharge type high-power electron gun

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