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JPS6464221A - Plasma treatment system - Google Patents

Plasma treatment system

Info

Publication number
JPS6464221A
JPS6464221A JP62219179A JP21917987A JPS6464221A JP S6464221 A JPS6464221 A JP S6464221A JP 62219179 A JP62219179 A JP 62219179A JP 21917987 A JP21917987 A JP 21917987A JP S6464221 A JPS6464221 A JP S6464221A
Authority
JP
Japan
Prior art keywords
ecr
microwaves
article
treated
reaction gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62219179A
Other languages
Japanese (ja)
Other versions
JPH0715901B2 (en
Inventor
Takuya Fukuda
Yasuhiro Mochizuki
Tadashi Sonobe
Kazuo Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Service Engineering Co Ltd
Hitachi Ltd
Original Assignee
Hitachi Service Engineering Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Service Engineering Co Ltd, Hitachi Ltd filed Critical Hitachi Service Engineering Co Ltd
Priority to JP21917987A priority Critical patent/JPH0715901B2/en
Priority to EP88107319A priority patent/EP0290036B1/en
Priority to DE3853551T priority patent/DE3853551T2/en
Priority to KR1019880005316A priority patent/KR950012712B1/en
Publication of JPS6464221A publication Critical patent/JPS6464221A/en
Priority to US08/131,519 priority patent/US5433788A/en
Publication of JPH0715901B2 publication Critical patent/JPH0715901B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To miniaturize a vacuum vessel without deteriorating plasma treatment characteristics by introducing a reaction gas into an electron cyclotron resonance (ECR) plane formed at approximately a right angle to the direction of propagation of microwaves and shaping the state in which the concentration of the reaction gas in the ECR plane is increased. CONSTITUTION:A microwave introducing window 10 is shaped at a position where the AC field strength of introducing microwaves 3 is brought to approximately zero, an ECR is positioned at the position of (1/4+n)lambda(n=0, 1, 2...) from the microwave introducing window 10 and an article to be treated is positioned at the position of (1/2+n)lambda in each relationship of the location of the microwave introducing window 10, the location of the ECR and the location of the article to be treated 11. A reaction gas is flowed in approximately parallel with an ECR plane and the concentration of the reaction gas on the ECR plane is increased, and the high absorption band of microwaves 3 is shaped. Accordingly, the transmittance of microwaves 3 to the article to be treated 11 is reduced remarkably, and distances between the microwave introducing window 10 and the article to be treated 11 and between the article to be treated 11 and the position of the ECR can be shortened, thus miniaturizing a vacuum vessel 1 in the axial direction, i.e., the direction of propagation of microwaves.
JP21917987A 1987-01-19 1987-09-03 Plasma processing device Expired - Lifetime JPH0715901B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP21917987A JPH0715901B2 (en) 1987-09-03 1987-09-03 Plasma processing device
EP88107319A EP0290036B1 (en) 1987-05-08 1988-05-06 Plasma treatment apparatus
DE3853551T DE3853551T2 (en) 1987-05-08 1988-05-06 Plasma treatment device.
KR1019880005316A KR950012712B1 (en) 1987-05-08 1988-05-07 Plasma processing equipment
US08/131,519 US5433788A (en) 1987-01-19 1993-10-04 Apparatus for plasma treatment using electron cyclotron resonance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21917987A JPH0715901B2 (en) 1987-09-03 1987-09-03 Plasma processing device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP5030873A Division JP2546596B2 (en) 1993-02-19 1993-02-19 Plasma processing device

Publications (2)

Publication Number Publication Date
JPS6464221A true JPS6464221A (en) 1989-03-10
JPH0715901B2 JPH0715901B2 (en) 1995-02-22

Family

ID=16731436

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21917987A Expired - Lifetime JPH0715901B2 (en) 1987-01-19 1987-09-03 Plasma processing device

Country Status (1)

Country Link
JP (1) JPH0715901B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04237123A (en) * 1991-01-22 1992-08-25 Anelva Corp Plasma processor
JPH05347260A (en) * 1993-02-19 1993-12-27 Hitachi Ltd Plasma treatment device
US5609774A (en) * 1989-06-15 1997-03-11 Semiconductor Energy Laboratory Co., Inc. Apparatus for microwave processing in a magnetic field

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5609774A (en) * 1989-06-15 1997-03-11 Semiconductor Energy Laboratory Co., Inc. Apparatus for microwave processing in a magnetic field
JPH04237123A (en) * 1991-01-22 1992-08-25 Anelva Corp Plasma processor
JPH05347260A (en) * 1993-02-19 1993-12-27 Hitachi Ltd Plasma treatment device

Also Published As

Publication number Publication date
JPH0715901B2 (en) 1995-02-22

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