[go: up one dir, main page]

JPS6370241A - Photosensitive elastomer composition - Google Patents

Photosensitive elastomer composition

Info

Publication number
JPS6370241A
JPS6370241A JP21484286A JP21484286A JPS6370241A JP S6370241 A JPS6370241 A JP S6370241A JP 21484286 A JP21484286 A JP 21484286A JP 21484286 A JP21484286 A JP 21484286A JP S6370241 A JPS6370241 A JP S6370241A
Authority
JP
Japan
Prior art keywords
photosensitive
compsn
block
block copolymer
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21484286A
Other languages
Japanese (ja)
Other versions
JPH0577067B2 (en
Inventor
Hiroto Kidokoro
広人 木所
Hideyoshi Sakurai
桜井 英嘉
Mitsuhiro Tamura
光宏 田村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zeon Corp
Original Assignee
Nippon Zeon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Zeon Co Ltd filed Critical Nippon Zeon Co Ltd
Priority to JP21484286A priority Critical patent/JPS6370241A/en
Priority to GB8719421A priority patent/GB2195349B/en
Priority to DE3727537A priority patent/DE3727537C2/en
Publication of JPS6370241A publication Critical patent/JPS6370241A/en
Priority to US07/192,641 priority patent/US4980269A/en
Priority to US08/064,482 priority patent/US5281510A/en
Publication of JPH0577067B2 publication Critical patent/JPH0577067B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F279/00Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00
    • C08F279/02Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00 on to polymers of conjugated dienes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F287/00Macromolecular compounds obtained by polymerising monomers on to block polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/04Polymers provided for in subclasses C08C or C08F
    • C08F290/048Polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To obtain a photosensitive elastomer compsn. which has excellent image reproducibility and is suitable for production of a flexographic printing plate by constituting the photosensitive elastomer compsn. of a specific block polymer, addition polymerizable compd. and photopolymn. initiator. CONSTITUTION:The photosensitive elastomer compsn. is constituted of the linear elastomer-like A-B type block copolymer bonded with a terminal group having polymerizable ethylenic double bonds at least one end of the molecular chain (A is the polymer block of a monovinyl arom. compd. and B is the polymer block of a conjugated diene monomer), the addition polymerizable compd. having at least one ethylenic double bonds and the photopolymn. initiator. The A-B type block polymer which is linear and has about 1-10 pieces, more preferably 1-3 pieces of the unit consisting of (A-B) and repeated in the molecular chain is used. The content thereof is preferably 60-95wt% of the compsn. The content of the addition polymerizable compd. is preferably 5-30wt% of the compsn.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は感光性エラストマー組成物に関するものである
DETAILED DESCRIPTION OF THE INVENTION (Industrial Field of Application) The present invention relates to a photosensitive elastomer composition.

(従来の技術) 従来、フレキソ印刷に用いられるゴム版は、ゴム板に直
接彫刻する方法と、金属板の腐食により原版を製造し、
グラスチック等による母凰を製造し、この母型版にコ9
ムを流し込み加硫する事で製造されてきた。しかし、こ
れらの方法は複雑で熟練を要したシ、多くの工程からな
るため経費や時間が多くかかる上に、得られたゴム版自
体の精度が低いため使用に際しては裏削りなどの後加工
を必要とする尤どの欠点を有していた。
(Prior art) Conventionally, rubber plates used for flexographic printing have been produced by directly engraving on a rubber plate, or by corroding a metal plate.
Manufacture a matrix using glass stick, etc., and add 9 pieces to this matrix.
It has been manufactured by pouring and vulcanizing the rubber. However, these methods are complex and require skill, and involve many steps, which require a lot of money and time. Furthermore, the precision of the obtained rubber plate itself is low, so post-processing such as back-shaving is required before use. It had all the drawbacks that it needed.

この欠点を解決するために、近年になって感光性エラス
トマー組成物を用いて直接的にフレキソ印刷版を製造す
る方法が提案されるようになった。
In order to solve this drawback, in recent years a method has been proposed in which a flexographic printing plate is directly manufactured using a photosensitive elastomer composition.

例えば特公昭51−43374号公報には、エラストマ
ー性ポリマーとして、25℃以上のガラス転移温度をも
つ少なくとも2個の熱可塑性非エラストマー状重合体ブ
ロック及びそれらの非エラストマー状重合体ブロック間
を、10℃以下のガラス転移温度をもつエラストマー状
ブロックで結合した構造の、溶媒可溶性熱可塑性エラス
トマー状ブロック共重合体を用いると効果があることが
示されている。しかしこのようなブロック共重合体を使
用する感光性組成物で成形し、光照射して得られたフレ
キソ印刷版は従来の加硫ゴム版に比べて版強度が弱く、
また印刷版製造における現像(溶剤による洗い出し)工
程で版が溶剤によシ膨潤し、像の再現性が低下するとい
う欠点があ)、改善が要望されている。
For example, Japanese Patent Publication No. 51-43374 discloses that at least two thermoplastic non-elastomeric polymer blocks having a glass transition temperature of 25° C. or higher and 10 It has been shown to be effective to use solvent soluble thermoplastic elastomeric block copolymers with structures bonded by elastomeric blocks having glass transition temperatures below .degree. However, a flexographic printing plate obtained by molding a photosensitive composition using such a block copolymer and irradiating it with light has weaker plate strength than a conventional vulcanized rubber plate.
In addition, there is a drawback that the plate swells with the solvent during the development (washing out with a solvent) process in the production of printing plates, resulting in a decrease in image reproducibility.) Improvements are desired.

(発明が解決しようとする問題点) 従って、本発明の目的は上記の欠点のないフレキソ印刷
版の製造に特に適した感光性エラストマー組成物の提供
にある。
(Problems to be Solved by the Invention) The object of the present invention is therefore to provide a photosensitive elastomer composition which is particularly suitable for the production of flexographic printing plates and which does not have the above-mentioned disadvantages.

(問題点を解決するための手段) 本発明のかかる目的は、(1)分子鎖の少なくとも1端
に重合可能なエチレン性二重結合を有する末端基が結合
した線状のエラストマー状A−B型ブロック共重合体(
Aはモノビニル芳香族化合物の重合体ブロックを、Bは
共役ジエン系単量体の重合体ブロックを表わす) 、 
(2)少なくとも1個のエチレン性二重結合を有する付
加重合性化合物及び光重合開始剤とから成る感光性エラ
ストマー組成物を使用することによシ達成される。
(Means for Solving the Problems) The object of the present invention is to (1) form a linear elastomer A-B in which a terminal group having a polymerizable ethylenic double bond is bonded to at least one end of the molecular chain; type block copolymer (
A represents a polymer block of a monovinyl aromatic compound, B represents a polymer block of a conjugated diene monomer),
(2) This is achieved by using a photosensitive elastomer composition comprising an addition polymerizable compound having at least one ethylenic double bond and a photopolymerization initiator.

本発明で使用される線状の、エラストマー状A−B型ブ
ロック共重合体は該共重合体鎖の少なくとも一端にラジ
カル重合可能なエチレン性二重結合を有する末端基が結
合したエラストマー状のブロック共重合体である。
The linear, elastomeric A-B type block copolymer used in the present invention is an elastomeric block in which a terminal group having a radically polymerizable ethylenic double bond is bonded to at least one end of the copolymer chain. It is a copolymer.

!ロックAはスチレン、α−メチルスチレンなどのモノ
ビニル芳香族化合物の重合体ブロックであシ、該化合物
の18i以上の重合体あるいは該化合物及びこれと共重
合可能な単量体との共重合体が含まれるガラス転移温度
が25℃以上の熱可塑性非エラストマー状重合体ブロッ
クである。特に好ましいのは?リスチレンのブロックで
ある。
! Lock A is a polymer block of a monovinyl aromatic compound such as styrene or α-methylstyrene, and is a polymer of 18i or more of the compound or a copolymer of the compound and a monomer copolymerizable with it. It is a thermoplastic non-elastomeric polymer block containing a glass transition temperature of 25° C. or higher. What do you particularly like? It is a block of listyrene.

ブロックBは1.3−ブタジェン、イソプ、レン、1.
3−ペンタジェン、クロログレンなどの共役ジエン系単
量体の重合体ブロックであシ、該単量体の1種以上の重
合体あるいは該単量体及びこれと共重合可能な単量体と
の共重合体が含まれるガラス転移温度が10℃以下のエ
ラストマー状重合体のブロックである。特に好ましいの
はポリブタジェンブロックあるいはポリイソプレンブロ
ックである。
Block B is 1,3-butadiene, isop, ren, 1.
It is a polymer block of a conjugated diene monomer such as 3-pentadiene or chloroglene, or one or more polymers of the monomer, or the monomer and a monomer copolymerizable therewith. It is an elastomeric polymer block containing a copolymer and having a glass transition temperature of 10°C or less. Particularly preferred are polybutadiene blocks or polyisoprene blocks.

本発明においてはA−B型ブロック共重合体は(A−B
)を単位としてこの単位が分子鎖中に1〜10個程度、
好ましくは1〜3個繰返す線状ものが使用される。ブロ
ック人とブロックBの割合はブロック共重合体がエラス
トマーとなる範囲でおれば特に制限はないが、全ブロッ
ク中のブロックBの好ましい割合は60〜90重i%で
ある。
In the present invention, the AB type block copolymer is (A-B
), and there are about 1 to 10 of these units in the molecular chain,
Preferably, 1 to 3 linear repeats are used. The ratio of block B to block B is not particularly limited as long as the block copolymer becomes an elastomer, but the preferred ratio of block B to all blocks is 60 to 90% by weight.

ブロックAのGPCによる重量平均分子量は通常2.0
00〜100,000の範囲であシ、ブロックBの重量
平均分子量は通常10.000〜1000.000の範
囲である。
The weight average molecular weight of block A by GPC is usually 2.0.
The weight average molecular weight of block B is usually in the range of 10.000 to 1000.000.

本発明のブロック共重合体は上記の構造と共にブロック
共重合体鎖の少なくとも一端にラジカル重合性のエチレ
ン性二重結合を有する末端基が結合していることが特徴
である。
The block copolymer of the present invention is characterized in that, in addition to the above structure, a terminal group having a radically polymerizable ethylenic double bond is bonded to at least one end of the block copolymer chain.

本発明のブロック共重合体の製造方法は通常のアニオン
重合方法によればよく特に制限されないが、米国特許第
3,786,116号明細書開示の方法が1例として挙
げられる。本方法に従えば遂次重合によシポリスチVン
ーポリイソプレンのリビングブロック共重合体を生成せ
しめた後、エチレンオキシドあるいはプロピレンオキシ
ドなどを添加して安定なアニオン末端基を有するブロッ
ク共重合体となし、しかる後メタクリル酸ノーライド等
と反応させてラジカル重合可能な二重結合を有する末端
基が重合体鎖の末端に結合したブロック共重合体が製造
される。
The method for producing the block copolymer of the present invention is not particularly limited and may be any conventional anionic polymerization method, but one example is the method disclosed in US Pat. No. 3,786,116. According to this method, a living block copolymer of polystyrene-polyisoprene is produced by sequential polymerization, and then ethylene oxide or propylene oxide is added to form a block copolymer having stable anionic end groups. Thereafter, it is reacted with methacrylic acid nolide or the like to produce a block copolymer in which a terminal group having a radically polymerizable double bond is bonded to the end of the polymer chain.

安定なアニオン末端基を有するブロック共重合体と反応
してラジカル重合可能な二重結合を有する末端基を形成
する化合物としては塩素、臭素、フッ素などのハロゲン
を含む単量体が使用される。
A monomer containing a halogen such as chlorine, bromine, or fluorine is used as a compound that reacts with the block copolymer having a stable anionic terminal group to form a terminal group having a radically polymerizable double bond.

このような単量体としては、1−クロロエチルビニルエ
ーテル、3−クロロプロピルビニルエーテルナトのハロ
アルキルビニルエーテル類、クロロ酢酸ビニル、3−ク
ロログロピオン酸ビニル、2−ブロモウンデカン酸ビニ
ルなどのハロゲン含有ビニルエーテル類、 2−りoo
)fAt−1,3−プクジエン、2−クロロメチル−3
−メチル−1゜3−ブタジェンなどのジエンハライド、
アクリル酸クロリド、メタクリル酸クロリドなどの(メ
タ)アクリル酸ハライド、ビニルペンジルクロリドプロ
ムノルボルネン、プロムメチルノルゴルネンなどが挙げ
られる。これらの化合物は、ブロック共重合体製造時に
1官能性の重合開始剤を使用すれば該共重合体鎖の一端
に、また2官能性の重合開始剤を使用すれば両端に結合
する。
Such monomers include halogen-containing vinyl ethers such as 1-chloroethyl vinyl ether, 3-chloropropyl vinyl ether, haloalkyl vinyl ethers, vinyl chloroacetate, vinyl 3-chloroglopionate, and vinyl 2-bromoundecanoate. , 2-rioo
) fAt-1,3-pucdiene, 2-chloromethyl-3
-diene halides such as methyl-1°3-butadiene,
Examples include (meth)acrylic acid halides such as acrylic acid chloride and methacrylic acid chloride, vinylpenzyl chloride promnorbornene, and prommethylnorgormene. These compounds are bonded to one end of the copolymer chain if a monofunctional polymerization initiator is used during the production of the block copolymer, and to both ends of the copolymer chain if a difunctional polymerization initiator is used.

本発明で使用するブロック共重合体は上記の如くラジカ
ル重合可能な末端基を有しているので、このブロック共
重合体とラジカル重合性単量体及び光重合開始剤を混合
してフレキソ版を製造し、露光することによジブロック
共重合体分子鎖間の架橋が生じ、その結果露光後のフレ
キソ版の強度が改善されると共にレリーフ像の再現性も
大幅に改善される。
Since the block copolymer used in the present invention has a radically polymerizable terminal group as described above, a flexo plate is prepared by mixing this block copolymer with a radically polymerizable monomer and a photopolymerization initiator. By producing and exposing the diblock copolymer to light, crosslinking occurs between molecular chains of the diblock copolymer, and as a result, the strength of the flexographic plate after exposure is improved and the reproducibility of the relief image is also significantly improved.

本発明の感光性エラストマー組成物中の本発明のブロッ
ク共重合体の含有量は通常30重量%以上であシゴム弾
性や成形のし易さを考慮すると60〜95重i−%の範
囲で使用されるのが好ましい。必要に応じ本発明の主旨
が損われない範囲で他のエラストマー状重合体を併用し
ても構わない。
The content of the block copolymer of the present invention in the photosensitive elastomer composition of the present invention is usually 30% by weight or more, but in consideration of rubber elasticity and ease of molding, it is used in the range of 60 to 95% by weight. Preferably. If necessary, other elastomeric polymers may be used in combination as long as the gist of the present invention is not impaired.

本発明の感光性エンストマー組成物においては本発明の
ブロック共重合体以外は従来から該組成物製造用に使用
されている少なくとも1個のCa、−C;基を有する付
加重合性化合物及び光重合開始剤が使用でき、これらは
特に限定されない。
In the photosensitive entomer composition of the present invention, in addition to the block copolymer of the present invention, addition polymerizable compounds having at least one Ca, -C; Polymerization initiators can be used, and these are not particularly limited.

少なくとも1個のcH2−cc基を有する付加重合性化
合物としては、エチレングリコール、ジエチレンクリコ
ール、フロピレンゲリコール、ジエチレンクリコール、
ポリエチレングリコール、ポリプロピレングリコール、
1,4ブタンジオール、1.6ヘキサンジオールなどの
ジアクリレート及びジメタアクリレート、あるいはトリ
メチロールプロノ臂ンのトリアクリレート及びトリメタ
クリレート、ペンタエリトリットテトラアクリレート及
びテトラメタクリレートなどや、猪′−\キサメチレン
ビスアクリルアミド及びメタクリルアミド、ジアセトン
アクリルアミド及びメタクリルアミド、スチレン、ビニ
ルトルエン、ジビニルベンゼン、ジアリルフタレート、
トリアリルシアヌレートなどが挙げられ、1種又は2種
以上で使用される。
Examples of the addition polymerizable compound having at least one cH2-cc group include ethylene glycol, diethylene glycol, phlopylene gelicol, diethylene glycol,
polyethylene glycol, polypropylene glycol,
Diacrylates and dimethacrylates such as 1,4-butanediol and 1.6-hexanediol, triacrylates and trimethacrylates of trimethylolprono-benzene, pentaerythritol tetraacrylate and tetramethacrylate, and boar'-\xamethylene. Bisacrylamide and methacrylamide, diacetone acrylamide and methacrylamide, styrene, vinyltoluene, divinylbenzene, diallyl phthalate,
Examples include triallyl cyanurate, which may be used alone or in combination of two or more.

該化合物の使用量は通常感光性組成物中(以下も同様)
5〜30重量%である。
The amount of the compound used is usually in the photosensitive composition (the same applies below)
It is 5 to 30% by weight.

光重合開始剤としては、ベンゾフェノン、ベンゾイン、
ベンゾインのアルキルエーテル例えばペンツインのメチ
ル、エチル、イソゾロビルおよびイソブチルエーテル、
α−メチルベンゾイン、α−メチルベンゾインメチルエ
ーテル、α−メトキシベンゾインメチルエーテル、ペン
ツインフェニルエーテル、α−t−ブチルペンツイン、
アントラキノン、ベンズアントラキノン、2−エチルア
ントラキノン、2−クロルアントラキノン、2−2′−
ジメトキシフェニルアセトフェノン、2.2−ジェトキ
シフェニルアセトフェノン、2,2−ジェトキシアセト
フェノン、ベンジル、ピバロインなどが例として挙げら
れる。これらの光重合開始剤は1種又は2種以上で使用
され、使用量は通常0.01〜5重量%である◇ 本発明においては上記以外の成分も必要に応じ感光性組
成物中に含有させることができる。このような成分とし
ては可塑剤、熱重合抑制剤、老化防止剤などが挙げられ
る。
As photopolymerization initiators, benzophenone, benzoin,
Alkyl ethers of benzoin, such as methyl, ethyl, isozolobyl and isobutyl ethers of benzoin,
α-Methylbenzoin, α-methylbenzoin methyl ether, α-methoxybenzoin methyl ether, pentuin phenyl ether, α-t-butyl pentuin,
Anthraquinone, benzanthraquinone, 2-ethylanthraquinone, 2-chloroanthraquinone, 2-2'-
Examples include dimethoxyphenylacetophenone, 2,2-jethoxyphenylacetophenone, 2,2-jethoxyacetophenone, benzyl, pivaloin, and the like. These photopolymerization initiators are used alone or in combination of two or more, and the amount used is usually 0.01 to 5% by weight◇ In the present invention, components other than the above may be included in the photosensitive composition as necessary. can be done. Examples of such components include plasticizers, thermal polymerization inhibitors, and antiaging agents.

可■剤は感光性エラストマー組成物の製造、放置を助成
し、また、感光性エラストマー組成物の未露光部分の除
去を促進し、さらに、露光硬化部分の硬さを調整する。
The curing agent assists in the production and storage of the photosensitive elastomer composition, promotes the removal of unexposed portions of the photosensitive elastomer composition, and further adjusts the hardness of the exposed and cured portions.

これらの目標とする特性に応じて可塑剤は2〜40重量
%の範囲で添加される。有用物質としては、ナフテン油
やノぐラフイン油のような炭化水素油、低分子量ポリス
チレン(分子量3000以下)、α−メチルスチレン−
ビニルトルエン共重合体、石油樹脂、ポリアクリレート
、ポリエチレン、ポリエステル樹脂、Iリテルペン樹脂
、液状1.2−及び1.4−ポリブタジェン、およびこ
れらの水酸化物、カルボキモル化物、液状アクリロニト
リル−ブタジェン共重合体、およびこれらのカルブキモ
ル化物、液状スチレンブタジェン共重合体などが例示で
きる。
Depending on these target properties, the plasticizer is added in an amount ranging from 2 to 40% by weight. Useful substances include hydrocarbon oils such as naphthenic oil and nografine oil, low molecular weight polystyrene (molecular weight 3000 or less), and α-methylstyrene.
Vinyltoluene copolymers, petroleum resins, polyacrylates, polyethylene, polyester resins, I-literpene resins, liquid 1,2- and 1,4-polybutadiene, and their hydroxides, carboxymolated products, liquid acrylonitrile-butadiene copolymers , carboxymolated products thereof, and liquid styrene-butadiene copolymers.

熱重合抑制剤としては例えば、2.6−ジーt−ブチル
−4−メチルフェノール、メトキシフェノール、2,6
−ジーt−ブチル−p−クレゾール、t−ブチルカテコ
ール、ピロガロール、ナフチルアミン、β−ナフトール
、t−プチルハイドロキシアニンール、ハイドロキノン
などを挙げることができる。使用量は通常0.001〜
2重量%である。
Examples of thermal polymerization inhibitors include 2,6-di-t-butyl-4-methylphenol, methoxyphenol, 2,6
Examples include -di-t-butyl-p-cresol, t-butylcatechol, pyrogallol, naphthylamine, β-naphthol, t-butylhydroxyanine, and hydroquinone. Usage amount is usually 0.001 ~
It is 2% by weight.

本発明の感光性エラストマー組成物は多くの方法で調整
することができる。例えば、通常のゴムの混練機械であ
るニーグーあるいはロールミル等を用いて混合混練し、
押出し機、プレス、カレンダーなどの成形機を用いて所
望の厚さのシートに調製することができる。また、所望
ならば本発明の感光性エラストマー組成物を溶媒、例え
ば、りe+oホルム、四塩化炭素、1.1.1−)リク
ロルエタン、トリクロルエチレン、テトラクロルエチレ
ン、メチルエチルケトン、ジエチルケトン、メチルイソ
ブチルケトン、ベンゼン、トルエン、テトラヒドロフラ
ン、などの適当な溶媒に溶解させた混合物を枠型の中に
注入して溶剤を蒸発させてシートを調整したり、さらに
、このシートを加熱プレス、押出しまたはカレンダー処
理すれば厚み精度のよいシートが得られる。
The photosensitive elastomer compositions of this invention can be prepared in many ways. For example, by mixing and kneading using a normal rubber kneading machine such as a Nigu or a roll mill,
A sheet of desired thickness can be prepared using a molding machine such as an extruder, press, or calendar. If desired, the photosensitive elastomer composition of the present invention can also be used in a solvent such as lye+oform, carbon tetrachloride, 1.1.1-)lychloroethane, trichlorethylene, tetrachlorethylene, methyl ethyl ketone, diethyl ketone, methyl isobutyl ketone. The sheet can be prepared by pouring a mixture dissolved in a suitable solvent such as benzene, toluene, tetrahydrofuran, etc. into a frame mold and evaporating the solvent, or the sheet can be heated, pressed, extruded or calendered. A sheet with good thickness accuracy can be obtained.

本発明のシート状に成形された感光性エラストマー組成
物は貯蔵または操作中に光感受性層が汚染または損傷す
ることを防ぐために光感受性層の表面にポリエチレン、
ポリプロピレン、ポリエステル、ポリスチレンなどの剥
離可能か薄い透明フィルム層を設けることができる。
The sheet-formed photosensitive elastomer composition of the present invention contains polyethylene on the surface of the photosensitive layer to prevent the photosensitive layer from being contaminated or damaged during storage or handling.
A peelable or thin transparent film layer of polypropylene, polyester, polystyrene, etc. can be provided.

また、本発明の感光性工2ストマー組成物は露光時に原
図を光感受性層の上に重ねて活性光線を照射するが、原
図との接触性をよくするため及びその原図の再利用を可
能にするために、溶剤可溶性の薄い可撓性の層を設けて
もよい。この場合光感受性層の露光が終了してから未露
光部分を溶剤で溶出する際にこの層も同時に除去される
ことが望ましい。
In addition, in the photosensitive two-stomer composition of the present invention, the original image is superimposed on the photosensitive layer during exposure and actinic rays are irradiated, but in order to improve contact with the original image and to enable reuse of the original image. A thin, flexible layer that is solvent soluble may be provided for this purpose. In this case, it is desirable that this layer be removed at the same time when the unexposed portions are eluted with a solvent after exposure of the photosensitive layer is completed.

本発明の感光性エラストマー組成物を用いることによシ
、露光後の強度が改善されたフレキソ版の製造が可能と
なるばかシでなく解像度が高いレリーフ画像が得られる
By using the photosensitive elastomer composition of the present invention, it is possible to obtain relief images with high resolution without being dull, which makes it possible to produce flexographic plates with improved strength after exposure.

本発明の感光性エラストマー組成物は感光性が高く、フ
レキソ印刷用印刷版として優れた特性を有しているが、
この他に7オトレジスト用やスクリーン印刷のスクリー
ン用さらに塗料、コーテイング材、接着剤、フィルム、
シート性物、含浸物、その他成形品等に利用することが
できる。
The photosensitive elastomer composition of the present invention has high photosensitivity and has excellent properties as a printing plate for flexographic printing.
In addition to these, there are also paints, coating materials, adhesives, films, etc. for photoresists and screen printing screens.
It can be used for sheet materials, impregnated materials, and other molded products.

(実施例) 以下に実施例を挙げて本発明をさらに具体的に説明する
。なお、実施例、比較例中の部数及び%はとくに断シの
ない限シ重量基準である。
(Example) The present invention will be described in more detail with reference to Examples below. In addition, the parts and percentages in Examples and Comparative Examples are based on weight without any particular omission.

実施例1 (A)末端変性ブロック共重合体の合成51の耐圧反応
器を用い、n−ブタン/シクロヘキサンク30/70の
割合の混合溶剤L875に!?、ジブチルエーテル20
ミリモル、開始剤n−ブチルリチウム10ミリモルを存
在させ、30℃で1時間、先ずスチレン112.!Mを
重合し、続いてイソプレン687.5 Fを添加して反
応温度が50℃から60℃の間となるように還流冷却に
よシ温度制御しながら1時間半重合した。続いてイソグ
レンブロックの活性末端を安定なアニオンとするためエ
チレンオキシド11ミリモルを加え、さらにアクリル酸
クロリド12ミリモルを加え活性ポリマー末端に反応さ
せた。反応混合物に反応停止剤としてメタノール5−1
酸化安定剤として4−メチル−2,6−ジーt−ブチル
フェノールを4g加えた後この混合溶液を少量ずつ、8
5〜95℃に加熱された水中に滴下し溶媒を揮発させた
。得られたポリマーを細片となし、85℃で熱風乾燥し
た。
Example 1 (A) Synthesis of terminally modified block copolymer Using the pressure-resistant reactor of 51, a mixed solvent L875 of n-butane/cyclohexane at a ratio of 30/70 was used! ? , dibutyl ether 20
112 mmol of styrene in the presence of 10 mmol of initiator n-butyllithium at 30° C. for 1 hour. ! M was polymerized, followed by addition of isoprene 687.5 F, and polymerization was carried out for 1.5 hours while controlling the temperature by reflux cooling so that the reaction temperature was between 50°C and 60°C. Subsequently, 11 mmol of ethylene oxide was added to make the active end of the isogrene block a stable anion, and 12 mmol of acrylic acid chloride was further added to react with the active polymer end. Methanol 5-1 was added to the reaction mixture as a reaction terminator.
After adding 4 g of 4-methyl-2,6-di-t-butylphenol as an oxidation stabilizer, this mixed solution was added little by little to 8
The solution was dropped into water heated to 5 to 95°C to evaporate the solvent. The obtained polymer was cut into strips and dried with hot air at 85°C.

かくしてラジカル重合可能な末端基を有するブロック共
重合体が得られた。
A block copolymer having radically polymerizable terminal groups was thus obtained.

(B)感光性組成物の調製 上記によシ得られたブロック共重合体100gにペンゾ
インメチルエーテ、vO,6,11,4−ブタンジオー
ルジメタクリレート5g、2,6−ジーt−ブチル−4
−メチルフェノール0.01Nを加えて充分に混合し感
光性組成物を調製した。
(B) Preparation of photosensitive composition 100 g of the block copolymer obtained above was mixed with penzoin methyl ether, 5 g of vO,6,11,4-butanediol dimethacrylate, and 2,6-di-t-butyl. -4
-Methylphenol 0.01N was added and thoroughly mixed to prepare a photosensitive composition.

(C)硬化物の物性 1)上記感光性組成物を300W高圧水銀灯を用いて5
分間露光処理して硬化物を得た。得られた硬化物は、硬
度40 (JIS K6301に従って測定)、反ばつ
弾性49%(ダンロップ ) IJプソメーターによシ
25℃で測定)であった。さらにS@(25℃)におけ
る強度、伸びおよび硬さ変化(加圧直後と10秒後の差
、ΔH8と表示する)をJISK6301に従って求め
、第1表に示す結果を得た・第  1  表 注)(1)デ、ボン社製サイレル(cyrsl)を使用
した。
(C) Physical properties of cured product 1) The above photosensitive composition was cured using a 300W high-pressure mercury lamp.
A cured product was obtained by exposure treatment for a minute. The obtained cured product had a hardness of 40 (measured according to JIS K6301) and an elasticity of 49% (measured at 25° C. using a Dunlop IJ psometer). Furthermore, the strength, elongation, and hardness change (difference immediately after pressurization and after 10 seconds, expressed as ΔH8) at S@ (25°C) were determined according to JISK6301, and the results shown in Table 1 were obtained.Table 1 Notes ) (1) Cyrsl manufactured by De Bonn was used.

2)上記の感光性組成物を0.1箇厚ポリエステルフイ
ルムにはさみ、真空プレス機により3簡厚のシートに成
形した。フィルムをはがし、ネガフィルムをあてて、該
フィルム面に前記紫外線ランプで3〜6分間照射した。
2) The above photosensitive composition was sandwiched between 0.1-thick polyester films and formed into a 3-thickness sheet using a vacuum press. The film was peeled off, a negative film was applied, and the film surface was irradiated with the ultraviolet lamp for 3 to 6 minutes.

露光後感光性原版をトリクロルエタン溶液で洗浄現像し
、レリーフ像(レリーフ高さ1.4 m )を得た。得
られた版の解像度は、得られたレリーフ像を目視及び写
真撮影によシ、6厖及び凹室の罫線(細線)と網点濃度
3%及び95%の網点の再現限界を評価した。結果を第
2表に示す。
After exposure, the photosensitive original plate was washed and developed with a trichloroethane solution to obtain a relief image (relief height: 1.4 m). The resolution of the obtained plate was determined by visually observing and photographing the obtained relief image, and evaluating the reproducibility limits of the ruled lines (thin lines) of the 6 cubic meters and concave chambers and the halftone dots at halftone density of 3% and 95%. . The results are shown in Table 2.

第  2  表 本発明組成物を用いて得られたレリーフ像は網点の再現
限界は150線/インチ、罫線については100μの細
線までと比較例の市販品よシも格段に優れた再現性を示
すと共にレリーフ像はシャープで精度が高いものであっ
た。又、比較例の市販品はレリーフ高が本発明品よりも
高く、現像時の溶剤による膨潤が大きく、凸罫線はツイ
スト(波状のゆがみ)を生じた。
Table 2 Relief images obtained using the composition of the present invention have a reproducibility limit of 150 lines/inch for halftone dots and a fine line of 100 μm for ruled lines, which is much better than the commercially available comparative example. The relief image was sharp and highly accurate. In addition, the relief height of the commercial product of the comparative example was higher than that of the product of the present invention, the swelling due to the solvent during development was large, and the convex ruled lines were twisted (wavy distortion).

本発明の組成物で得たフレキソ版を用いて段ゴール印刷
を45°Cの温度で連続して行ったが、耐刷性は50万
部以上であシ、「文字の太り」、「版のへたり」は認め
られなかった。
Corrugated printing was carried out continuously at a temperature of 45°C using a flexo plate obtained with the composition of the present invention, but the printing durability was more than 500,000 copies. No sagging was observed.

実施例2 実施例1と同様にして第3表記載の末端基が結合したブ
ロック共重合体を調製し、実施例1と同じ処方で感光性
組成物を調製し、それぞれの硬化物の強度特性及びフレ
キソ版の解像度(再現限界)を評価した。結果を第3表
に示す。
Example 2 A block copolymer with bonded terminal groups listed in Table 3 was prepared in the same manner as in Example 1, a photosensitive composition was prepared with the same formulation as in Example 1, and the strength characteristics of each cured product were determined. and the resolution (reproducibility limit) of the flexographic plate was evaluated. The results are shown in Table 3.

第3表 実施例3 実施例1と同様にして第4表記載の組成のラジカル重合
可能な二重結合を有する末端基(該末端基源としてアク
リル酸クロリドを使用)が結合したブロック共重合体を
調製した。これらのそれぞれを用い、実施例1と同じ処
方、方法で硬化物及び7レキソ版を得た。強度特性及び
解像度を計価し、第4表に示す結果を得た。
Table 3 Example 3 A block copolymer bonded with a terminal group having a radically polymerizable double bond (acrylic acid chloride was used as the source of the terminal group) having the composition shown in Table 4 in the same manner as in Example 1. was prepared. Using each of these, a cured product and a 7 lexo plate were obtained using the same recipe and method as in Example 1. The strength characteristics and resolution were evaluated and the results shown in Table 4 were obtained.

Claims (1)

【特許請求の範囲】[Claims] (1)分子鎖の少なくとも1端に重合可能なエチレン性
二重結合を有する末端基が結合した線状のエラストマー
状A−B型ブロック共重合体(Aはモノビニル芳香族化
合物の重合体ブロックを、Bは共役ジエン系単量体の重
合体ブロックを表わす)、(2)少なくとも1個のエチ
レン性二重結合を有する付加重合性化合物及び(3)光
重合開始剤とから成る感光性エラストマー組成物。
(1) A linear elastomeric A-B type block copolymer in which a terminal group having a polymerizable ethylenic double bond is bonded to at least one end of the molecular chain (A is a polymer block of a monovinyl aromatic compound). , B represents a polymer block of a conjugated diene monomer), (2) an addition polymerizable compound having at least one ethylenic double bond, and (3) a photopolymerization initiator. thing.
JP21484286A 1986-08-18 1986-09-11 Photosensitive elastomer composition Granted JPS6370241A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP21484286A JPS6370241A (en) 1986-09-11 1986-09-11 Photosensitive elastomer composition
GB8719421A GB2195349B (en) 1986-08-18 1987-08-17 Photosensitive elastomeric composition
DE3727537A DE3727537C2 (en) 1986-08-18 1987-08-18 Photosensitive elastomeric mass
US07/192,641 US4980269A (en) 1986-08-18 1988-05-11 Photosensitive elastomeric composition
US08/064,482 US5281510A (en) 1986-08-18 1992-12-30 Photosensitive elastomeric composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21484286A JPS6370241A (en) 1986-09-11 1986-09-11 Photosensitive elastomer composition

Publications (2)

Publication Number Publication Date
JPS6370241A true JPS6370241A (en) 1988-03-30
JPH0577067B2 JPH0577067B2 (en) 1993-10-25

Family

ID=16662445

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21484286A Granted JPS6370241A (en) 1986-08-18 1986-09-11 Photosensitive elastomer composition

Country Status (1)

Country Link
JP (1) JPS6370241A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5239742A (en) * 1975-09-25 1977-03-28 Nippon Soda Co Ltd Sensitized materials
JPS5240594A (en) * 1975-09-29 1977-03-29 Nippon Soda Co Ltd Preparation of photosensitive polymers
JPS5659230A (en) * 1980-07-07 1981-05-22 Tokyo Ohka Kogyo Co Ltd Photosensitive resin composition for flexographic plate

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5239742A (en) * 1975-09-25 1977-03-28 Nippon Soda Co Ltd Sensitized materials
JPS5240594A (en) * 1975-09-29 1977-03-29 Nippon Soda Co Ltd Preparation of photosensitive polymers
JPS5659230A (en) * 1980-07-07 1981-05-22 Tokyo Ohka Kogyo Co Ltd Photosensitive resin composition for flexographic plate

Also Published As

Publication number Publication date
JPH0577067B2 (en) 1993-10-25

Similar Documents

Publication Publication Date Title
JP3157295B2 (en) Photosensitive elastomeric polymer compositions for flexographic printing plates
EP0699961B1 (en) Photosensitive composition, photosensitive rubber plate and process for producing the plate, and flexographic plate and process for producing the plate
JPS607261B2 (en) Photosensitive elastomer composition
EP1676173B1 (en) Photopolymerizable compositions and flexographic plates prepared from controlled distribution block copolymers
KR100753261B1 (en) Photocurable compositions and flexographic printing plates comprising the same
JPH0495960A (en) Composition for photosensitive flexographic printing plate
WO1992015046A1 (en) Photosensitive elastomer composition
JPS606941A (en) Manufacture of printing plate
JP2000155418A (en) Photosensitive elastomer composition
JPS5922219B2 (en) Photosensitive resin composition for flexo printing plates
US7785765B2 (en) Photosensitive resin composition
US4980269A (en) Photosensitive elastomeric composition
GB2064151A (en) Photopolymerisable composition
JP3144870B2 (en) Photosensitive elastomer composition
JPS5950971B2 (en) curable composition
JPH059017B2 (en)
JP7105240B2 (en) Block copolymer for photosensitive printing plate material with excellent wear resistance and method for producing the same
US5281510A (en) Photosensitive elastomeric composition
TWI787816B (en) Photosensitive resin composition for flexographic printing
JPS6370241A (en) Photosensitive elastomer composition
WO2019188604A1 (en) Block copolymer composition for flexographic printing plate
JPH0541979B2 (en)
JPS6375740A (en) Photosensitive rubber composition
JPS62231248A (en) Photosensitive elastomer composition
CN117813552A (en) Photosensitive composition for pattern formation and flexographic plate