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JPS5659230A - Photosensitive resin composition for flexographic plate - Google Patents

Photosensitive resin composition for flexographic plate

Info

Publication number
JPS5659230A
JPS5659230A JP9235980A JP9235980A JPS5659230A JP S5659230 A JPS5659230 A JP S5659230A JP 9235980 A JP9235980 A JP 9235980A JP 9235980 A JP9235980 A JP 9235980A JP S5659230 A JPS5659230 A JP S5659230A
Authority
JP
Japan
Prior art keywords
liq
styrene
resin composition
prepolymer
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9235980A
Other languages
Japanese (ja)
Other versions
JPS5922219B2 (en
Inventor
Hiroyuki Toda
Eiichi Orukawa
Toshimi Aoyama
Hisashi Nakane
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP55092359A priority Critical patent/JPS5922219B2/en
Publication of JPS5659230A publication Critical patent/JPS5659230A/en
Publication of JPS5922219B2 publication Critical patent/JPS5922219B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

PURPOSE:To obtain a relief plate capable of performing clear printing by blending a specified styrene-butadiene block copolymer, a liq. perpolymer, a photopolymerizable monomer and a photopolymn. initiator. CONSTITUTION:The titled resin composition is obtd. by blending a styrene-butadiene block copolymer (a) contg. 35-50wt% styrene, a mixed liq. prepolymer (b) of a liq. prepolymer of polybutadiene or butadiene-styrene copolymer with 1,000- 3,000mol.wt. and a liq. prepolymer with 3,000-5,000mol.wt., a photopolymerizable monomer (c) having one or more vinyl groups and a photopolymn. initiator (d). A thermopolymn. inhibitor (e) may be added. This composition is irradiated with light to give a hardened substance with <=60 deg. Shore A hardness.
JP55092359A 1980-07-07 1980-07-07 Photosensitive resin composition for flexo printing plates Expired JPS5922219B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55092359A JPS5922219B2 (en) 1980-07-07 1980-07-07 Photosensitive resin composition for flexo printing plates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55092359A JPS5922219B2 (en) 1980-07-07 1980-07-07 Photosensitive resin composition for flexo printing plates

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP12509275A Division JPS52503A (en) 1975-03-15 1975-10-17 Photoosensitive resin composition for flexo graphic printing

Publications (2)

Publication Number Publication Date
JPS5659230A true JPS5659230A (en) 1981-05-22
JPS5922219B2 JPS5922219B2 (en) 1984-05-25

Family

ID=14052204

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55092359A Expired JPS5922219B2 (en) 1980-07-07 1980-07-07 Photosensitive resin composition for flexo printing plates

Country Status (1)

Country Link
JP (1) JPS5922219B2 (en)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5862639A (en) * 1981-09-19 1983-04-14 バスフ　アクチェンゲゼルシャフト Photopolymerizable mixture and use thereof
JPS6231858A (en) * 1984-06-29 1987-02-10 アサヒ・ケミカル・インダストリ−・（ユ−・ケ−）・リミテツド Connection of flexographic plates
JPS6248744A (en) * 1985-07-18 1987-03-03 ダブリユ．アール．グレイス　アンド　カンパニー　―　コネチカット Photosensitive elastomer composition
JPS6370241A (en) * 1986-09-11 1988-03-30 Nippon Zeon Co Ltd Photosensitive elastomer composition
JPS63208035A (en) * 1987-02-25 1988-08-29 Toray Ind Inc Flexographic printing plate material
WO1992015046A1 (en) * 1991-02-15 1992-09-03 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive elastomer composition
JPH04342258A (en) * 1990-09-05 1992-11-27 E I Du Pont De Nemours & Co Photosensitive elastomer member improved in resistance to solvent
WO2010098356A1 (en) * 2009-02-27 2010-09-02 日本ゼオン株式会社 Block copolymer composition for flexographic printing plates
US8470929B2 (en) 2009-03-31 2013-06-25 Zeon Corporation Composition for stretchable film
US8492480B2 (en) 2008-03-31 2013-07-23 Zeon Corporation Block copolymer composition, method for producing the same, and film of the same
US8501869B2 (en) 2008-12-26 2013-08-06 Zeon Corporation Block copolymer composition and hot-melt adhesive composition
US8598271B2 (en) 2008-12-26 2013-12-03 Zeon Corporation Block copolymer composition, film, and method for producing block copolymer composition
US8722800B2 (en) 2009-06-30 2014-05-13 Zeon Corporation Composition for stretchable film
US8791196B2 (en) 2009-03-31 2014-07-29 Zeon Corporation Adhesive composition for labels

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2137942A1 (en) * 1971-05-17 1972-12-29 Uniroyal Inc
JPS5271226A (en) * 1975-12-11 1977-06-14 Ricoh Co Ltd Two component type diazo copying material

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2137942A1 (en) * 1971-05-17 1972-12-29 Uniroyal Inc
JPS5271226A (en) * 1975-12-11 1977-06-14 Ricoh Co Ltd Two component type diazo copying material

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5862639A (en) * 1981-09-19 1983-04-14 バスフ　アクチェンゲゼルシャフト Photopolymerizable mixture and use thereof
JPH0336213B2 (en) * 1981-09-19 1991-05-30 Basf Ag
JPS6231858A (en) * 1984-06-29 1987-02-10 アサヒ・ケミカル・インダストリ−・（ユ−・ケ−）・リミテツド Connection of flexographic plates
JPS6248744A (en) * 1985-07-18 1987-03-03 ダブリユ．アール．グレイス　アンド　カンパニー　―　コネチカット Photosensitive elastomer composition
JPH0639547B2 (en) * 1985-07-18 1994-05-25 ダブリユ．アール．グレイス アンド カンパニー ― コネチカット Photosensitive elastomer composition
JPH0577067B2 (en) * 1986-09-11 1993-10-25 Nippon Zeon Co
JPS6370241A (en) * 1986-09-11 1988-03-30 Nippon Zeon Co Ltd Photosensitive elastomer composition
JPS63208035A (en) * 1987-02-25 1988-08-29 Toray Ind Inc Flexographic printing plate material
JPH04342258A (en) * 1990-09-05 1992-11-27 E I Du Pont De Nemours & Co Photosensitive elastomer member improved in resistance to solvent
WO1992015046A1 (en) * 1991-02-15 1992-09-03 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive elastomer composition
US8492480B2 (en) 2008-03-31 2013-07-23 Zeon Corporation Block copolymer composition, method for producing the same, and film of the same
US8501869B2 (en) 2008-12-26 2013-08-06 Zeon Corporation Block copolymer composition and hot-melt adhesive composition
US8598271B2 (en) 2008-12-26 2013-12-03 Zeon Corporation Block copolymer composition, film, and method for producing block copolymer composition
WO2010098356A1 (en) * 2009-02-27 2010-09-02 日本ゼオン株式会社 Block copolymer composition for flexographic printing plates
US8578852B2 (en) 2009-02-27 2013-11-12 Zeon Corporation Block copolymer composition for flexographic printing plates
JP5403048B2 (en) * 2009-02-27 2014-01-29 日本ゼオン株式会社 Block copolymer composition for flexographic plates
US8470929B2 (en) 2009-03-31 2013-06-25 Zeon Corporation Composition for stretchable film
US8791196B2 (en) 2009-03-31 2014-07-29 Zeon Corporation Adhesive composition for labels
US8722800B2 (en) 2009-06-30 2014-05-13 Zeon Corporation Composition for stretchable film

Also Published As

Publication number Publication date
JPS5922219B2 (en) 1984-05-25

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