JPS63119538A - Semiconductor sealing equipment - Google Patents
Semiconductor sealing equipmentInfo
- Publication number
- JPS63119538A JPS63119538A JP26620186A JP26620186A JPS63119538A JP S63119538 A JPS63119538 A JP S63119538A JP 26620186 A JP26620186 A JP 26620186A JP 26620186 A JP26620186 A JP 26620186A JP S63119538 A JPS63119538 A JP S63119538A
- Authority
- JP
- Japan
- Prior art keywords
- mold
- resin
- surface plate
- surface plates
- heaters
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 22
- 238000007789 sealing Methods 0.000 title claims abstract description 11
- 229920005989 resin Polymers 0.000 claims abstract description 14
- 239000011347 resin Substances 0.000 claims abstract description 14
- 238000005538 encapsulation Methods 0.000 claims description 5
- 230000002093 peripheral effect Effects 0.000 claims description 3
- 230000006835 compression Effects 0.000 abstract 1
- 238000007906 compression Methods 0.000 abstract 1
- 125000006850 spacer group Chemical group 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 229920003002 synthetic resin Polymers 0.000 description 3
- 239000000057 synthetic resin Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
- B29C45/17—Component parts, details or accessories; Auxiliary operations
- B29C45/1742—Mounting of moulds; Mould supports
- B29C45/1744—Mould support platens
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Injection Moulding Of Plastics Or The Like (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は合成樹脂により半導体素子を封止成形する半
導体封止装置の改良に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an improvement in a semiconductor sealing device for sealing and molding a semiconductor element using a synthetic resin.
従来、半導体素子をリードフレーム上に装着した後、合
成樹脂により封止成形する装置には第4図に示すものが
あった。図において、(I)は合成樹脂を注入する公知
のポット部(図示せず)、ラレナ部(図示せず)を有す
るチャンバーブロック(図示せず)と同一高さを有し、
リードフレーム(図示せず)の板厚と同寸法の凹溝(図
示せず)を有し、半導体素子(図示せず)を封止するキ
ャビティ部(図示せず)等を有した複数個のチェイスブ
ロック、(2)は前記チャンバーブロック、チェイスブ
ロックfi+を保持する為の定盤、(3)はチャンバー
ブロック(図示せず)、チェイスブロック(+1を加熱
及び保温する為のヒータで、前記定盤(2)に挿入され
ている。(4)は定盤(2)を支持するスペーサブロッ
ク、(5)は定盤(2)を部分的に支持をするボストで
あり、スペーサブロック(4)と同一高さ寸法で加工さ
れている。(6)は定盤(2)をスペーサブロック(4
)。Conventionally, there has been an apparatus shown in FIG. 4 that seals and molds a semiconductor element with synthetic resin after mounting it on a lead frame. In the figure, (I) has the same height as a chamber block (not shown) having a known pot part (not shown) and a larena part (not shown) for injecting synthetic resin,
A plurality of grooves (not shown) having the same size as the plate thickness of a lead frame (not shown), and a cavity part (not shown) for sealing a semiconductor element (not shown), etc. Chase block, (2) is a surface plate for holding the chamber block and chase block fi+, and (3) is a heater for heating and keeping warm the chamber block (not shown) and chase block (+1). It is inserted into the plate (2). (4) is a spacer block that supports the surface plate (2), (5) is a boss that partially supports the surface plate (2), and the spacer block (4) (6) is machined with the same height dimension as the spacer block (4).
).
ポスト(5)を介して支持するためのベースで、プレス
のスライドフレーム(10)に前記ヒータ(3)の熱が
伝わりに(いように断熱板を内蔵している。(7)はプ
レスへ固定する取付金具、(8)、及び(9)は上下の
型を合わせるガイド軸及びガイドブツシュ、(Il+は
前記チェイスブロックfilのパーティング面である。It is a base for supporting via the post (5), and has a built-in heat insulating plate so that the heat of the heater (3) is transmitted to the slide frame (10) of the press. Fixing fittings (8) and (9) are a guide shaft and guide bushing for matching the upper and lower molds, (Il+ is the parting surface of the chase block fil).
次に動作について説明する。封止成形時において、プレ
スの型締圧が作用すると、第5図のように、チェイスブ
ロックfi+のパーティング面(1))に等分布荷重が
作用する場合には、その荷重を受ける定盤(2)の変形
量は中央部近くが最も大きくなる。Next, the operation will be explained. During sealing molding, when the mold clamping pressure of the press acts, as shown in Figure 5, if a uniformly distributed load acts on the parting surface (1) of the chase block fi+, the surface plate that receives the load The amount of deformation in (2) is greatest near the center.
ところで一方、定盤(2)の熱変形をみると、第6図の
ように両端に対し、中央部が凸状となる。つまり、定盤
(2)の上表面に接近してヒータ(3)が配置されてい
るため、定盤(2)の上表面と下表面とで温度差が発生
し、上表面の方が織度が大となり、上表面が伸びて中央
部が凸状となる。On the other hand, when looking at the thermal deformation of the surface plate (2), as shown in FIG. 6, the central portion becomes convex with respect to both ends. In other words, since the heater (3) is placed close to the upper surface of the surface plate (2), a temperature difference occurs between the upper and lower surfaces of the surface plate (2), and the upper surface is more woven. The degree becomes large, the upper surface is elongated, and the central part becomes convex.
従って、パーティング面(II)は加圧時の歪による変
形と、加熱による熱変形とが相互に作用することになり
、通常は第4図のような加圧時の歪による変形量δ1の
方が、第5図のような熱変形量δ2よりも小さく、パー
ティング面(1))の外周側に隙間が発生することにな
る。Therefore, on the parting surface (II), deformation due to strain during pressurization and thermal deformation due to heating interact, and normally the amount of deformation δ1 due to strain during pressurization as shown in Figure 4 is This is smaller than the amount of thermal deformation δ2 as shown in FIG. 5, and a gap is generated on the outer peripheral side of the parting surface (1).
従来装置は以上のように構成されているので、外周側に
隙間が発生し、成形時に上下の金型のパーティング面の
隙間から樹脂がリードフレーム上に流出し、封止製品の
樹脂の歩留り低下及び後工程での流出したパリの収除き
工程が必要になるという問題点があった。Since the conventional equipment is configured as described above, a gap occurs on the outer periphery, and during molding, resin flows out onto the lead frame from the gap between the parting surfaces of the upper and lower molds, reducing the yield of resin in the sealed product. There were problems in that a process for removing the spilled paris in the subsequent process was required.
この発明は以上のような問題点を解消するためになされ
たもので、リードフレーム上の樹脂の流出を防止でき、
樹脂自体の歩留りの向上を図ることができるとともに、
後工程での流出したパリの除去工程を廃止できる半導体
封止装置を得ることを目的とする。This invention was made to solve the above problems, and can prevent the resin from flowing out on the lead frame.
It is possible to improve the yield of the resin itself, and
The object of the present invention is to obtain a semiconductor sealing device that can eliminate the step of removing leaked paris in a subsequent process.
この発明に係る半導体封止装置は、上、下の定盤に支持
された上型及び下型とを有し、これら上型及び下型内に
樹脂を注入して半導体素子を樹脂封止する半導体封止装
置において、上記上、下の定盤のうち少なくとも一方の
定盤には、上記上型又は下型装着面とは反対側面に近接
して複数のヒータを挿入したものであり、また、この発
明の他の発明では、上、下の定盤に支持された上型及び
下型とを有し、これら上型及び下型内に樹脂を注入して
半導体素子を樹脂封止する半導体封止装置において、上
記上、下の定盤のうち少なくとも一方の定盤には、上記
上型又は下型装着面とは反対側面に近接して複数のヒー
タを挿入すると共に、上記上、下の定盤の間には、上記
上型又は下型の外周側の平面度を調整するジヤツキ手段
を配置したものである。A semiconductor encapsulation device according to the present invention has an upper mold and a lower mold supported by upper and lower surface plates, and resin is injected into these upper mold and lower mold to resin-seal a semiconductor element. In the semiconductor encapsulation device, a plurality of heaters are inserted into at least one of the upper and lower surface plates in close proximity to a side surface opposite to the upper mold or lower mold mounting surface, and In another invention of the present invention, a semiconductor device has an upper mold and a lower mold supported by upper and lower surface plates, and resin is injected into the upper mold and the lower mold to seal a semiconductor element with the resin. In the sealing device, a plurality of heaters are inserted into at least one of the upper and lower surface plates in close proximity to a side surface opposite to the upper mold or lower mold mounting surface, and a plurality of heaters are inserted into at least one of the upper and lower surface plates. A jacking means for adjusting the flatness of the outer peripheral side of the upper mold or the lower mold is arranged between the surface plates.
この発明における半導体封止装置は、金型の外周に発生
しようとする隙間を小さくでき、また、他の発明ではパ
ーティング面の平面度を調整できることになる。The semiconductor sealing device according to the present invention can reduce the gap that tends to occur around the outer periphery of the mold, and according to other inventions, the flatness of the parting surface can be adjusted.
以下、この発明の一実施例を第1図で説明する。 An embodiment of the present invention will be described below with reference to FIG.
図において、軸はヒータで、定盤(2)のヒータ配置位
置は定盤(2)の下面側(スペーサブロック及びポスト
側)の温度が上面側(チェイスブロック側)の温度より
高くなるように下面側へ設定されている。この第1図は
樹脂封止装置の下型について表示しているが、同様に上
型についてもヒータ例の配置位置はスペーサブロック及
びポスト側の温度が高くなるように下面側へ設定される
。In the figure, the shaft is a heater, and the heater is placed on the surface plate (2) so that the temperature on the bottom side (spacer block and post side) of the surface plate (2) is higher than the temperature on the top side (chase block side). It is set towards the bottom side. Although FIG. 1 shows the lower mold of the resin sealing device, the arrangement position of the heater example for the upper mold is similarly set to the lower surface side so that the temperature on the spacer block and post sides is higher.
その他の符号の説明は従来装置と同様につき省略する。Descriptions of other symbols are omitted as they are the same as in the conventional device.
上記のように構成されたものにおいては、加圧力による
歪により定盤(2)が凹状に変形し、また−方ではヒー
タ(30)を定盤(2)の下面側に配置することにより
、従来のように熱変形で大きく凸状となることを抑制し
、パーティング面(1))を平面に近づけることも可能
となる。つまり、第3図の変形量δ3を第5図のような
加圧時の変形量δ1と同等にでき、互いに相殺させるこ
とも可能となる。In the structure as described above, the surface plate (2) is deformed into a concave shape due to the strain caused by the pressurizing force. It is also possible to prevent the parting surface (1) from forming a large convex shape due to thermal deformation as in the past, and to make the parting surface (1) close to a flat surface. In other words, the amount of deformation δ3 in FIG. 3 can be made equal to the amount of deformation δ1 during pressurization as shown in FIG. 5, and it is also possible to cancel each other out.
また、別の発明では、gIp、2図ないし第3図のよう
に、熱変形を凹状になるようにヒータ■を定盤(2)よ
り下面側に位置させるとともに、パーティング面(1)
)の平面度を調整する手段を備えている。In addition, in another invention, as shown in FIGS. 2 to 3, the heater (2) is positioned below the surface plate (2) so that thermal deformation becomes concave, and the parting surface (1)
) is provided with means for adjusting the flatness of the
つまり、■は上方の定盤(2)に結合されたガイドブツ
シュ、02)は下方の定盤(2)に結合されたねじ部(
12a)を有するガイド軸、Qlはこのガイド軸(12
)のねじ軸(12a)に螺合され、外周に目盛を有した
ダブルナツトであり、ガイドブツシュ硼とで上、下の定
盤(2)の離間寸法を調整して、上、下型の平面度を得
るようにしている。なお、ガイド軸02) 、ダブルナ
ラ)031でジヤツキ手段を構成している。この構成で
は、加圧力による歪による定盤(2)の凹状への変形と
、熱変形による定盤(2)の変形との相互の作用におい
て、定盤(2)を凹状に変形するように構成し、外周側
の隙間が小さくなるようにしており、平面度はダブルナ
ツト031を調整して得ることになる。その竜は、ダブ
ルナツトa31の目盛にて調整できる。In other words, ■ is the guide bushing connected to the upper surface plate (2), and 02) is the threaded part (02) connected to the lower surface plate (2).
Ql has a guide shaft (12a)
) is a double nut with a scale on its outer periphery, and is screwed onto the screw shaft (12a) of the mold. I'm trying to get flatness. Note that the guide shaft 02) and the double neck 031 constitute a jacking means. In this configuration, the surface plate (2) is deformed into a concave shape due to the interaction between the deformation of the surface plate (2) into a concave shape due to strain caused by the pressure and the deformation of the surface plate (2) due to thermal deformation. The gap on the outer circumferential side is made small, and the flatness is obtained by adjusting the double nut 031. The dragon can be adjusted on the scale of the double nut A31.
ところで、福反分布については、実測温度を基準に各部
接触熱抵抗を求め、計算によりヒータ容量及び位置での
シミュレーションにより求める。By the way, as for the distribution of heat resistance, the contact thermal resistance of each part is determined based on the actually measured temperature, and it is determined by simulation using the heater capacity and position.
従来の封止装胃では型締め力による変形及び金型昇温に
よる熱変形は各々定盤を、下に凸、上に凸であり、その
相互作用により金型の上下パーティング面の隙間を発生
させていた。この隙間をある量以下に低減させる為には
型締荷重の増加もしくは金型内外にスペーサを使用して
の調整による場合があるが、これは効率が悪い。この為
、従来の熱変形では、例えば下型の場合、定盤の中央部
が上に凸状の変形であり、上、下型を合せた場合最小隙
間部は定盤中央部であり、最大隙間部は定盤両端部であ
る為、型締荷重による調整しかできない。これに対して
、最小隙間部を故急に定盤の両端にすることにより任意
に隙間量を調整できる。In conventional sealed gaskets, deformation due to mold clamping force and thermal deformation due to mold temperature rise cause the surface plate to convex downward and convex upward, respectively, and due to their interaction, the gap between the upper and lower parting surfaces of the mold is reduced. It was occurring. In order to reduce this gap below a certain amount, it may be necessary to increase the mold clamping load or use spacers inside and outside the mold, but this is inefficient. For this reason, in conventional thermal deformation, for example, in the case of the lower mold, the center of the surface plate is deformed in an upwardly convex shape, and when the upper and lower molds are combined, the minimum gap is at the center of the surface plate, and the maximum Since the gap is at both ends of the surface plate, it can only be adjusted by the mold clamping load. On the other hand, the amount of gap can be adjusted arbitrarily by making the minimum gap portion suddenly located at both ends of the surface plate.
つまり、ダブルナツト02)を調整することにより平面
度を得ることができる。In other words, flatness can be obtained by adjusting the double nut 02).
以上のようにこの発明は、上、下の定盤に支持された上
型及び下型とを有し、これら上型及び下型内に樹脂を注
入して半導体素子を樹脂封止する半導体封止装置におい
て、上記上、下の定盤のうち少な(とも一方の定盤には
、上記上型又は下型装着面とは反対側面に近接して複数
のヒータを挿入したので、定盤の加圧時の変形と、熱変
形とを相殺することも可能となり、パーディング面の平
面度を得ることができる効果があり、また、別の発明の
上、下の定盤の間て、上型又は下型の外周面の平面度を
調整するジヤツキ手段を設けたのでパーティング面自体
の調整が任急に可能となり、平面度を更に向上できる効
果がある。As described above, the present invention has an upper mold and a lower mold supported by upper and lower surface plates, and a semiconductor package in which resin is injected into the upper mold and the lower mold to resin-seal a semiconductor element. In the stopping device, a plurality of heaters are inserted into one of the upper and lower surface plates in close proximity to the side opposite to the surface on which the upper mold or the lower mold is mounted, so that the surface plate It is also possible to offset deformation during pressurization and thermal deformation, which has the effect of obtaining flatness of the paring surface. Since the jacking means for adjusting the flatness of the outer circumferential surface of the mold or the lower mold is provided, the parting surface itself can be adjusted quickly, which has the effect of further improving the flatness.
第1図はこの発明の一実施例を示す断面図、第2図はこ
の発明の他の発明を示す断面図、gIJ3図はその動作
状態を示す断面図、第4図は従来装置の断面図、gfJ
5図、9J6図はその動作状態を示す断面図である。
図中、(2)は定盤、(淵はヒータ、(91はガイドブ
ツシュ、(Illはパーティング面、(12)はダブル
ナツト、(l(至)はガイド軸である。
なお、各図中、同一符号は同−又は相当部分を示す。Fig. 1 is a sectional view showing one embodiment of the present invention, Fig. 2 is a sectional view showing another invention of the invention, Fig. gIJ3 is a sectional view showing its operating state, and Fig. 4 is a sectional view of a conventional device. , gfJ
5 and 9J6 are cross-sectional views showing the operating state thereof. In the figure, (2) is the surface plate, (the edge is the heater, (91 is the guide bushing, (Ill is the parting surface, (12) is the double nut, and (l (to) is the guide shaft. In the figures, the same reference numerals indicate the same or equivalent parts.
Claims (2)
、これら上型及び下型内に樹脂を注入して半導体素子を
樹脂封止する半導体封止装置において、上記上、下の定
盤のうち少なくとも一方の定盤には、上記上型又は下型
装着面とは反対側面に近接して複数のヒータを挿入した
ことを特徴とする半導体封止装置。(1) In a semiconductor encapsulation device that has an upper mold and a lower mold supported by upper and lower surface plates, and injects resin into these upper mold and lower mold to resin-seal a semiconductor element, the above-mentioned A semiconductor encapsulation device characterized in that a plurality of heaters are inserted into at least one of the upper and lower surface plates in close proximity to a side surface opposite to the upper mold or lower mold mounting surface.
、これら上型及び下型内に樹脂を注入して半導体素子を
樹脂封止する半導体封止装置において、上記上、下の定
盤のうち少なくとも一方の定盤には、上記上型又は下型
装着面とは反対側面に近接して複数のヒータを挿入する
と共に、上記上、下の定盤の間には、上記上型又は下型
の外周側の平面度を調整するジャッキ手段を配置したこ
とを特徴とする半導体封止装置。(2) In a semiconductor encapsulation device that has an upper mold and a lower mold supported by upper and lower surface plates, and injects resin into these upper mold and lower mold to resin-seal a semiconductor element, the above-mentioned A plurality of heaters are inserted into at least one of the upper and lower surface plates in close proximity to the side opposite to the upper mold or lower mold mounting surface, and a plurality of heaters are inserted between the upper and lower surface plates. The semiconductor sealing device is characterized in that a jack means for adjusting the flatness of the outer peripheral side of the upper mold or the lower mold is arranged.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26620186A JPS63119538A (en) | 1986-11-07 | 1986-11-07 | Semiconductor sealing equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26620186A JPS63119538A (en) | 1986-11-07 | 1986-11-07 | Semiconductor sealing equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63119538A true JPS63119538A (en) | 1988-05-24 |
Family
ID=17427666
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP26620186A Pending JPS63119538A (en) | 1986-11-07 | 1986-11-07 | Semiconductor sealing equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63119538A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009099717A (en) * | 2007-10-16 | 2009-05-07 | Nikon Corp | Heating and pressurizing system |
JP2011193003A (en) * | 2011-04-05 | 2011-09-29 | Nikon Corp | Heating and pressurizing system |
-
1986
- 1986-11-07 JP JP26620186A patent/JPS63119538A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009099717A (en) * | 2007-10-16 | 2009-05-07 | Nikon Corp | Heating and pressurizing system |
JP2011193003A (en) * | 2011-04-05 | 2011-09-29 | Nikon Corp | Heating and pressurizing system |
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