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JPS59178609A - Thin film magnetic head - Google Patents

Thin film magnetic head

Info

Publication number
JPS59178609A
JPS59178609A JP5240083A JP5240083A JPS59178609A JP S59178609 A JPS59178609 A JP S59178609A JP 5240083 A JP5240083 A JP 5240083A JP 5240083 A JP5240083 A JP 5240083A JP S59178609 A JPS59178609 A JP S59178609A
Authority
JP
Japan
Prior art keywords
thin film
head
magnetic pole
high frequency
notches
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5240083A
Other languages
Japanese (ja)
Inventor
Kazuo Shiiki
椎木 一夫
Yoshihiro Shiroishi
芳博 城石
Isamu Yuhito
勇 由比藤
Hitoshi Nakamura
斉 中村
Yoshihiro Hamakawa
濱川 佳弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5240083A priority Critical patent/JPS59178609A/en
Publication of JPS59178609A publication Critical patent/JPS59178609A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details
    • G11B5/3113Details for improving the magnetic domain structure or avoiding the formation or displacement of undesirable magnetic domains

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To obtain a thin film magnetic head which can be used in a high frequency band of >=10MHz by providing notches in the end part of one magnetic pole pattern at least and allowing notches to face each other in parallel with the track breadthwise direction. CONSTITUTION:Notches are provided in the end part of one magnetic pole pattern, at least, of an upper magnetic pole 5 of a thin film magnetic head, and notches are allowed to face each other in parallel with the track breadthwise direction. This head is produced by changing a mask for magnetic pole pattern formation in the same process as a conventional head. When this head and an Fe2O3 recording medium are combined and the frequency dependence is measured at 40m/s relative speed, the frequency dependence is superior in high frequency characteristic as shown by a curve 20. It is guessed that the movement of a magnetic wall which is a cause of the degradation of the high frequency characteristic is prevented by notches. Consequently, the thin film magnetic head which can be used in the high frequency band of >=10MHz is obtained.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は薄膜磁気ヘッドに係シ、とくに高周波帯域で使
用するに適した薄膜磁気ヘッドの磁極構造に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a thin film magnetic head, and particularly to a magnetic pole structure of a thin film magnetic head suitable for use in a high frequency band.

〔背景技術〕[Background technology]

従来、磁気ヘッドは機械加工と巻線によって組み立てら
れたバルクヘッドが使われてきたが、巻線の浮遊容量や
インダクタンスが大きいため高い周波数帯域での使用が
困難であった。これに対し、最近、半導体作製技術と同
様の手法、スパッタ法などによる膜形成、ホトリソグラ
フィ技術による薄膜加工技術などを用いて作製した薄膜
磁気ヘッドは浮遊容量や、インダクタンスを小さくでき
ることから高い周波数帯域で使用可能と考えられ、注目
を集めている。しかし実際に薄膜ヘッドを作製してみる
とその高周波特性を向上するには磁極を形成する磁性薄
膜の高周波特性を良くする必要があり、一般には必ずし
も高周波帯域で使えるとは限らないことがわかっている
Conventionally, bulk heads assembled by machining and winding have been used for magnetic heads, but the large stray capacitance and inductance of the windings have made it difficult to use in high frequency bands. In contrast, recently, thin-film magnetic heads manufactured using techniques similar to semiconductor manufacturing techniques, film formation using sputtering, thin film processing technology using photolithography, etc., have a high frequency band because they can reduce stray capacitance and inductance. It is thought that it can be used in, and is attracting attention. However, when we actually fabricated a thin film head, we found that in order to improve its high frequency characteristics, it was necessary to improve the high frequency characteristics of the magnetic thin film that forms the magnetic pole, and in general, it was not always possible to use it in a high frequency band. There is.

〔発明の目的〕[Purpose of the invention]

本発明の目的はおよそIOMH2以上の高い周波数帯域
で使用可能な薄膜磁気ヘッドを提供することにある。
An object of the present invention is to provide a thin film magnetic head that can be used in a high frequency band of approximately IOMH2 or higher.

〔発明の概要〕[Summary of the invention]

本発明においては、磁極の端部にほぼトラック幅方向に
対応した切り欠けを作り、磁性薄膜の高周波特性劣化の
原因となる磁壁の移動を妨げることによって、目的を達
成するものである。
In the present invention, the object is achieved by creating a notch at the end of the magnetic pole that corresponds approximately to the track width direction to prevent movement of the domain wall, which causes deterioration of the high frequency characteristics of the magnetic thin film.

〔発明の実施例〕[Embodiments of the invention]

第1図(a)は従来の薄膜磁気ヘッドの上部磁極部の平
面図、第1図(b)はこの部分に対応する断面図を示す
。記号1は非磁性基板、2は下部磁極、3はコイル、4
は絶縁層、5は上部磁極である。下部磁極の平面形状は
上部磁極の平面形状とeなぼ同じである。実際のヘッド
においては、コイルに′電流を流すための引き出し線や
、保護膜などがあるが、ここではそれらは省略し主要部
のみを示しだ。
FIG. 1(a) is a plan view of the upper magnetic pole portion of a conventional thin film magnetic head, and FIG. 1(b) is a sectional view corresponding to this portion. Symbol 1 is a non-magnetic substrate, 2 is a lower magnetic pole, 3 is a coil, 4
is an insulating layer, and 5 is an upper magnetic pole. The planar shape of the lower magnetic pole is approximately the same as the planar shape of the upper magnetic pole. In an actual head, there are lead wires for passing current through the coil, a protective film, etc., but these are omitted here and only the main parts are shown.

磁極の形状としてはとの例に示すように、記録再生を行
なうための磁極端部Aにおける幅(トラック幅)よりも
磁路を形成する後部コアの幅を大きくして、磁気抵抗を
小さくすることが一般的であるが、種々の形状のものが
すでに考えられている。
As shown in the example below, the shape of the magnetic pole is to make the width of the rear core that forms the magnetic path larger than the width (track width) at the magnetic pole tip A for recording and reproducing, thereby reducing magnetic resistance. Although this is common, various shapes have already been considered.

しかしそれらはいずれも磁極パターン端部がなめらかで
あるという特徴を有していた。
However, all of them had the characteristic that the ends of the magnetic pole patterns were smooth.

第2図は本発明における薄膜磁気ヘッドの上部磁極部の
平面図を示す。この断面は第1図に示す従来の薄膜磁気
ヘッドと同じであるが、磁極パターン端部に切り欠けが
有り、その切り欠けがトラック幅方向(T↓)にほぼ平
行に存在しているところが、従来のヘッドと異々る。こ
のよう々ヘッドは従来とまったく同様のプロセスで、磁
極パターン形成時のマスクを変えることによって作製可
能である。
FIG. 2 shows a plan view of the upper magnetic pole portion of the thin film magnetic head according to the present invention. This cross section is the same as that of the conventional thin film magnetic head shown in Fig. 1, but there is a notch at the end of the magnetic pole pattern, and the notch exists almost parallel to the track width direction (T↓). Different from conventional heads. A head like this can be manufactured using the same process as the conventional method by changing the mask used when forming the magnetic pole pattern.

本実施例においては非極性基板としてAt203−Ti
C1上下磁極としてスパッタ法で作製したNi−19w
t%Fe合金(厚み約2 μm )、コイルとして蒸着
法で作製したAA−4wt%Cu合金(幅6μm厚み2
μm)、絶縁層としてAt203 およびPIQ(ポリ
イミド樹脂)を用いた。基板に所望の薄膜構造を形成後
、切断、研まなどの機械加工によって最終的に記録再生
を行なうための磁極端部Aを形成した。A点における上
下両磁極間の間隔は約0.6μm1両磁極間の最大間隔
は約10μm、)ラック幅TWは約30μmとした。切
欠きの深さと、その根元の幅はいずれも約1μmとした
In this example, At203-Ti is used as the non-polar substrate.
Ni-19w fabricated by sputtering as C1 upper and lower magnetic poles
t%Fe alloy (approximately 2 μm thick), AA-4wt% Cu alloy (width 6 μm thickness 2
μm), At203 and PIQ (polyimide resin) were used as the insulating layer. After forming a desired thin film structure on the substrate, a magnetic pole tip A for final recording and reproduction was formed by machining such as cutting and polishing. The distance between the upper and lower magnetic poles at point A was approximately 0.6 μm, the maximum distance between the two magnetic poles was approximately 10 μm, and the rack width TW was approximately 30 μm. The depth of the notch and the width of its base were both about 1 μm.

本実施例のヘッドとp 620!1 記録媒体とを絹み
合せ、相対速度4Qm/sで測定したときの記録再生出
力の周波数依存性を第3図に示す。曲線10は第1図に
示した従来のヘッド、20は第2図に示した本発明のヘ
ッドに対する結果であって、本発明の方が高周波特性に
すぐれていることがわかる。この理由の詳細は不明であ
るが、コイルに電流を流したときに磁極が磁化される状
態が両者で異なることによるもので、本発明においては
切シ欠き部に磁壁がトラップされて動きにくくなるため
、異常渦電流損失が減小して、高周波特性が改良される
と推測される。切シ欠き部はトラック幅方向に対応して
存在する、すなわち磁壁がトラック幅方向にのびていて
両端でトラップされるような場合に効果が犬であるが、
多少方向がずれていてもよい。切シ欠きと切り欠きとの
間隔は約20μm程度がよいが、最適値は磁極の厚みや
、磁極材料9組成などによって異なる。
FIG. 3 shows the frequency dependence of the recording and reproducing output when the head of this example and a p620!1 recording medium were combined and measured at a relative speed of 4 Qm/s. Curve 10 is the result for the conventional head shown in FIG. 1, and curve 20 is the result for the head of the present invention shown in FIG. 2. It can be seen that the present invention has better high frequency characteristics. The details of this reason are unknown, but it is because the state in which the magnetic poles are magnetized when current is passed through the coil is different between the two, and in the present invention, the domain wall is trapped in the notch and becomes difficult to move. Therefore, it is presumed that abnormal eddy current loss is reduced and high frequency characteristics are improved. This is most effective when the notch exists in the track width direction, that is, when the domain wall extends in the track width direction and is trapped at both ends.
The direction may be slightly off. The distance between the notches is preferably about 20 μm, but the optimum value varies depending on the thickness of the magnetic pole, the composition of the magnetic pole material 9, etc.

また不発明のヘッドは再生波形の再現性が良好であると
いう他の利点も有している。
The inventive head also has another advantage of good reproducibility of reproduced waveforms.

なお、上下両磁極とも切り欠けを有しているととが望ま
しいが少々くとも一方の磁極が切り欠けを有していても
効果は大きい。
Although it is desirable that both the upper and lower magnetic poles have notches, the effect is great even if at least one of the magnetic poles has a notch.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、従来と同じ作製プロセスで、高周波特
性の良好な薄膜磁気ヘッドを得ることが(5) できる。
According to the present invention, a thin film magnetic head with good high frequency characteristics can be obtained (5) using the same manufacturing process as the conventional method.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(a)は従来の薄膜磁気ヘッドの磁極部の平面図
、第1図(b)は主要部の断面、図、第2図は本発明の
薄膜磁気ヘッドの磁極部の平面図、第3図は本発明の薄
膜磁気ヘッドの周波数特性を示した図である。 1・・・基板、2・・・下部磁極、3・・・コイル導体
、4・・・絶縁層、5・・・上部磁極、1o・・・従来
の磁気ヘッドの周波数特性、20・・・本発明の磁気ヘ
ッドの周波数特性。 代理人 弁理士 高橋明夫
FIG. 1(a) is a plan view of the magnetic pole part of a conventional thin film magnetic head, FIG. 1(b) is a cross-sectional view of the main part, and FIG. 2 is a plan view of the magnetic pole part of the thin film magnetic head of the present invention. FIG. 3 is a diagram showing the frequency characteristics of the thin film magnetic head of the present invention. DESCRIPTION OF SYMBOLS 1... Substrate, 2... Lower magnetic pole, 3... Coil conductor, 4... Insulating layer, 5... Upper magnetic pole, 1o... Frequency characteristics of conventional magnetic head, 20... Frequency characteristics of the magnetic head of the present invention. Agent Patent Attorney Akio Takahashi

Claims (1)

【特許請求の範囲】[Claims] 1、少なくとも1つの磁極パターンの端部に切シ欠けを
有し、該切り欠けがトラック幅方向にほぼ平行に対応し
て存在することを特徴とする薄膜磁気ヘッド。
1. A thin film magnetic head characterized in that at least one magnetic pole pattern has a notch at the end thereof, and the notch exists substantially parallel to the track width direction.
JP5240083A 1983-03-30 1983-03-30 Thin film magnetic head Pending JPS59178609A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5240083A JPS59178609A (en) 1983-03-30 1983-03-30 Thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5240083A JPS59178609A (en) 1983-03-30 1983-03-30 Thin film magnetic head

Publications (1)

Publication Number Publication Date
JPS59178609A true JPS59178609A (en) 1984-10-09

Family

ID=12913750

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5240083A Pending JPS59178609A (en) 1983-03-30 1983-03-30 Thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS59178609A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6111723A (en) * 1990-04-16 2000-08-29 Hitachi, Ltd. Narrow track thin film magnetic head suitable for high density recording and reproducing operations and fabrication method thereof wherein an air bearing surface has at least one groove containing a non-magnetic electrically conductive layer

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57189322A (en) * 1981-05-18 1982-11-20 Nec Corp Thin film magnetic head

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57189322A (en) * 1981-05-18 1982-11-20 Nec Corp Thin film magnetic head

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6111723A (en) * 1990-04-16 2000-08-29 Hitachi, Ltd. Narrow track thin film magnetic head suitable for high density recording and reproducing operations and fabrication method thereof wherein an air bearing surface has at least one groove containing a non-magnetic electrically conductive layer
US6278578B1 (en) 1990-04-16 2001-08-21 Hitachi, Ltd. Narrow track thin film head having a focused ion beam etched air bearing surface
US6307707B1 (en) 1990-04-16 2001-10-23 Hitachi, Ltd. Narrow track thin film head including magnetic poles machined by focused ion beam etching
US6538844B2 (en) 1990-04-16 2003-03-25 Hitachi, Ltd. Method of fabricating a magnetic head by focused ion beam etching
US6665141B2 (en) 1990-04-16 2003-12-16 Hitachi, Ltd. Magnetic head having track width defined by trench portions filled with magnetic shield material
US6839200B2 (en) 1990-04-16 2005-01-04 Hitachi, Ltd. Combination perpendicular magnetic head having shield material formed at both ends of an upper pole of a write element

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