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JPS579870A - Formation of vapor-deposited film consisting of two or more elements - Google Patents

Formation of vapor-deposited film consisting of two or more elements

Info

Publication number
JPS579870A
JPS579870A JP8084580A JP8084580A JPS579870A JP S579870 A JPS579870 A JP S579870A JP 8084580 A JP8084580 A JP 8084580A JP 8084580 A JP8084580 A JP 8084580A JP S579870 A JPS579870 A JP S579870A
Authority
JP
Japan
Prior art keywords
film
vapor
elements
deposited film
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8084580A
Other languages
Japanese (ja)
Inventor
Masahiro Kameda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP8084580A priority Critical patent/JPS579870A/en
Publication of JPS579870A publication Critical patent/JPS579870A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To form a vapor-deposited film consisting of a plurality of elements having a uniform composition over the full thickness of the film on a substrate by forming a vapor-deposited film consisting of a plurality of elements on other substrate and reevaporating the film. CONSTITUTION:A mother alloy 3 consisting of >=2 constituent elements is put in a boat 2 in a bell jar 1 and evaporated by heating to form a vapor-deposited film 5 on a substrate 4. The film 5 has a concn. distribution in the thickness direction. The film 5 is set on a heat insulator 7 in the jar 1 with the film surface upward and evaporated by heating with an infrared heater 6 to form a vapor-deposited film 9 on a substrate 8. During this reevaporation the element segregated in the vicinity of the surface of the film 5 is heated at first and forced to be evaporated. As a result, the film 9 has a uniform concn. distribution. This method is advantageously applicable to be manufacture of an electrophotographic receptor, etc.
JP8084580A 1980-06-17 1980-06-17 Formation of vapor-deposited film consisting of two or more elements Pending JPS579870A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8084580A JPS579870A (en) 1980-06-17 1980-06-17 Formation of vapor-deposited film consisting of two or more elements

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8084580A JPS579870A (en) 1980-06-17 1980-06-17 Formation of vapor-deposited film consisting of two or more elements

Publications (1)

Publication Number Publication Date
JPS579870A true JPS579870A (en) 1982-01-19

Family

ID=13729681

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8084580A Pending JPS579870A (en) 1980-06-17 1980-06-17 Formation of vapor-deposited film consisting of two or more elements

Country Status (1)

Country Link
JP (1) JPS579870A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4929294A (en) * 1986-08-23 1990-05-29 Blome GmbH & Co. Kommanditgesellschaft, and Strabag Bau-Aktiengesellschaf t Method of creating profiling projections on plastic-covered steel parts
WO2011026971A1 (en) * 2009-09-04 2011-03-10 Von Ardenne Anlagentechnik Gmbh Method and device for coating substrates from the vapor phase
US8911555B2 (en) 2009-02-05 2014-12-16 Von Ardenne Anlagentechnik Gmbh Method and device for coating substrates from the vapor phase

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4929294A (en) * 1986-08-23 1990-05-29 Blome GmbH & Co. Kommanditgesellschaft, and Strabag Bau-Aktiengesellschaf t Method of creating profiling projections on plastic-covered steel parts
US8911555B2 (en) 2009-02-05 2014-12-16 Von Ardenne Anlagentechnik Gmbh Method and device for coating substrates from the vapor phase
WO2011026971A1 (en) * 2009-09-04 2011-03-10 Von Ardenne Anlagentechnik Gmbh Method and device for coating substrates from the vapor phase

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