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JPS57200567A - Photo engraving method - Google Patents

Photo engraving method

Info

Publication number
JPS57200567A
JPS57200567A JP8492181A JP8492181A JPS57200567A JP S57200567 A JPS57200567 A JP S57200567A JP 8492181 A JP8492181 A JP 8492181A JP 8492181 A JP8492181 A JP 8492181A JP S57200567 A JPS57200567 A JP S57200567A
Authority
JP
Japan
Prior art keywords
metal plate
photoresist film
pattern
prescribed shape
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8492181A
Other languages
Japanese (ja)
Inventor
Takeshi Shimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP8492181A priority Critical patent/JPS57200567A/en
Publication of JPS57200567A publication Critical patent/JPS57200567A/en
Pending legal-status Critical Current

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  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE: To form precisely a prescribed shape, by forming a photoresist film on a metal plate surface to be engraved, exposing and developing it, and immersing the metal plate in a chromic acid solution before it is baked.
CONSTITUTION: After a metal plate is pretreated, a photoresist is applied throughout the surface to form a photoresist film on it, and a mask having a pattern for obtaining a prescribed shape is placed on the photoresist film. The it is exposed to an ultraviolet light from an extra-high voltage mercury lamp as a light source, and is developed using a developing solution. At this time, according to the pattern the unrequired parts of the photoresist film are removed. Then the metal plate is immersed in a chromic acid solution (having a concentration of about 10wt%) for about 30sec. to prevent etched pits from being formed, and is heated to perform the postbaking. Further it is etched to obtain a lead frame having a prescribed shape in conformity with the pattern of the mask.
COPYRIGHT: (C)1982,JPO&Japio
JP8492181A 1981-06-04 1981-06-04 Photo engraving method Pending JPS57200567A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8492181A JPS57200567A (en) 1981-06-04 1981-06-04 Photo engraving method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8492181A JPS57200567A (en) 1981-06-04 1981-06-04 Photo engraving method

Publications (1)

Publication Number Publication Date
JPS57200567A true JPS57200567A (en) 1982-12-08

Family

ID=13844166

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8492181A Pending JPS57200567A (en) 1981-06-04 1981-06-04 Photo engraving method

Country Status (1)

Country Link
JP (1) JPS57200567A (en)

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