JPS5646538A - Manufacture of compound semiconductor device - Google Patents
Manufacture of compound semiconductor deviceInfo
- Publication number
- JPS5646538A JPS5646538A JP12304479A JP12304479A JPS5646538A JP S5646538 A JPS5646538 A JP S5646538A JP 12304479 A JP12304479 A JP 12304479A JP 12304479 A JP12304479 A JP 12304479A JP S5646538 A JPS5646538 A JP S5646538A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- compound semiconductor
- layers
- layer
- sold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 150000001875 compounds Chemical class 0.000 title abstract 3
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 5
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 abstract 4
- 229910001218 Gallium arsenide Inorganic materials 0.000 abstract 3
- 239000012535 impurity Substances 0.000 abstract 2
- 150000002500 ions Chemical class 0.000 abstract 2
- 229910017009 AsCl3 Inorganic materials 0.000 abstract 1
- 229910017214 AsGa Inorganic materials 0.000 abstract 1
- 230000003213 activating effect Effects 0.000 abstract 1
- OEYOHULQRFXULB-UHFFFAOYSA-N arsenic trichloride Chemical compound Cl[As](Cl)Cl OEYOHULQRFXULB-UHFFFAOYSA-N 0.000 abstract 1
- 239000012159 carrier gas Substances 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 230000002542 deteriorative effect Effects 0.000 abstract 1
- 230000001681 protective effect Effects 0.000 abstract 1
- 238000005979 thermal decomposition reaction Methods 0.000 abstract 1
- 239000012808 vapor phase Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
- H01L21/3245—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering of AIIIBV compounds
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Junction Field-Effect Transistors (AREA)
Abstract
PURPOSE:To obtain a desired impurity density layer in a compound semiconductor device by growing in vapor phase a Cr-doped high resistance layer on a compound semiconductor sold in a market, implanting selectively impurity ions and activating it without particular protective film. CONSTITUTION:A Cr-added high resistance GaAs substrate 1 sold in a market is disposed in a low temperature portion and a Ga22 is disposed in a high temperature portion in a reaction tube 20, and an AsCl3 is introduced thereinto together with a carrier gas H2. Further, a CrO2Cl3 in a tank 27 is introduced thereinto in bubbled state with the H2 from the opposite side to be supplied from the intermediate position between the Ga source and the substrate. As a result, there can be obtained a GaAs layer 4 thus increased in resistance by adding the Cr thereto. Then, ions are implanted with a resist mask 5, and n type layers 2, 3 are formed thereon. Subsequently, the substrate 6 is contained in a furnace core tube 30, the partial pressure of the As is so selected in the furnace core tube 30 as to become higher than the partial pressure of the As produced by the thermal decomposition of the AsGa 4 and the substrate 1, and is heat treated. Thus, the layers 2, 3 having desired density range can be obtained on the GaAs substrate 6 without entirely deteriorating the surfaces of the layers 2, 3 wherein no mask is employed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12304479A JPS5646538A (en) | 1979-09-25 | 1979-09-25 | Manufacture of compound semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12304479A JPS5646538A (en) | 1979-09-25 | 1979-09-25 | Manufacture of compound semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5646538A true JPS5646538A (en) | 1981-04-27 |
Family
ID=14850812
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12304479A Pending JPS5646538A (en) | 1979-09-25 | 1979-09-25 | Manufacture of compound semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5646538A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5742123A (en) * | 1980-08-28 | 1982-03-09 | Toshiba Corp | Manufacture of compound semiconductor device |
JPS60215719A (en) * | 1984-04-07 | 1985-10-29 | Nippon Steel Corp | Manufacture of electric welded steel pipe for front fork of bicycle |
JPH0463242A (en) * | 1990-07-02 | 1992-02-28 | Nippon Steel Corp | Steel tube for reinforcing car body |
-
1979
- 1979-09-25 JP JP12304479A patent/JPS5646538A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5742123A (en) * | 1980-08-28 | 1982-03-09 | Toshiba Corp | Manufacture of compound semiconductor device |
JPS60215719A (en) * | 1984-04-07 | 1985-10-29 | Nippon Steel Corp | Manufacture of electric welded steel pipe for front fork of bicycle |
JPH0463242A (en) * | 1990-07-02 | 1992-02-28 | Nippon Steel Corp | Steel tube for reinforcing car body |
US5181974A (en) * | 1990-07-02 | 1993-01-26 | Nippon Steel Corporation | Automobile body reinforcing steel pipe |
US5192376A (en) * | 1990-07-02 | 1993-03-09 | Nippon Steel Corporation | Process for producing automobile body reinforcing steel pipe |
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