JPS5641183B2 - - Google Patents
Info
- Publication number
- JPS5641183B2 JPS5641183B2 JP5144976A JP5144976A JPS5641183B2 JP S5641183 B2 JPS5641183 B2 JP S5641183B2 JP 5144976 A JP5144976 A JP 5144976A JP 5144976 A JP5144976 A JP 5144976A JP S5641183 B2 JPS5641183 B2 JP S5641183B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Local Oxidation Of Silicon (AREA)
- Element Separation (AREA)
- Weting (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Non-Volatile Memory (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5144976A JPS52134380A (en) | 1976-05-06 | 1976-05-06 | Production of mis type semiconductor circuits |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5144976A JPS52134380A (en) | 1976-05-06 | 1976-05-06 | Production of mis type semiconductor circuits |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52134380A JPS52134380A (en) | 1977-11-10 |
| JPS5641183B2 true JPS5641183B2 (da) | 1981-09-26 |
Family
ID=12887231
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5144976A Granted JPS52134380A (en) | 1976-05-06 | 1976-05-06 | Production of mis type semiconductor circuits |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52134380A (da) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08219021A (ja) * | 1995-02-14 | 1996-08-27 | Samsung Electronics Co Ltd | 圧縮機 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5498185A (en) * | 1978-01-19 | 1979-08-02 | Nec Corp | Preparation of semiconductor device |
| JPS5529110A (en) * | 1978-08-23 | 1980-03-01 | Hitachi Ltd | Manufacturing of semiconductor device |
| US4268951A (en) * | 1978-11-13 | 1981-05-26 | Rockwell International Corporation | Submicron semiconductor devices |
| JPS5739551A (en) * | 1980-08-21 | 1982-03-04 | Seiko Epson Corp | Manufacture of selectively oxidized mask |
| JPS59159571A (ja) * | 1983-03-01 | 1984-09-10 | Nec Corp | 絶縁ゲ−ト電界効果型半導体装置の製造方法 |
-
1976
- 1976-05-06 JP JP5144976A patent/JPS52134380A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08219021A (ja) * | 1995-02-14 | 1996-08-27 | Samsung Electronics Co Ltd | 圧縮機 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS52134380A (en) | 1977-11-10 |