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JPS5617350A - Exposing method - Google Patents

Exposing method

Info

Publication number
JPS5617350A
JPS5617350A JP9226279A JP9226279A JPS5617350A JP S5617350 A JPS5617350 A JP S5617350A JP 9226279 A JP9226279 A JP 9226279A JP 9226279 A JP9226279 A JP 9226279A JP S5617350 A JPS5617350 A JP S5617350A
Authority
JP
Japan
Prior art keywords
film
substrate
negative photoresist
crosslinking agent
prevent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9226279A
Other languages
Japanese (ja)
Inventor
Masao Kanazawa
Kazuaki Yamanochi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9226279A priority Critical patent/JPS5617350A/en
Publication of JPS5617350A publication Critical patent/JPS5617350A/en
Pending legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To prevent a film reduction of a photoresist film in exposure by applying a negative photoresist prepared by adding a specified amount of a crosslinking agent to a resin component to the surface of a substrate followed by projection exposure.
CONSTITUTION: The content of a crosslinking agent in a polyisoprene type negative photoresist is adjusted to 4W5.5 wt.%, and this resist is applied to the surface of substrate 4 to form polyisoprene type negative photoresist film 1. Projection exposure is then performed. Thus, a film thickness reduction of photoresist film 1 is reduced considerably to prevent film 1 from breaking at shoulders 5 of a surface protrusion of substrate 5, and a minute pattern can be formed on substrate 4 with accuracy.
COPYRIGHT: (C)1981,JPO&Japio
JP9226279A 1979-07-20 1979-07-20 Exposing method Pending JPS5617350A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9226279A JPS5617350A (en) 1979-07-20 1979-07-20 Exposing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9226279A JPS5617350A (en) 1979-07-20 1979-07-20 Exposing method

Publications (1)

Publication Number Publication Date
JPS5617350A true JPS5617350A (en) 1981-02-19

Family

ID=14049485

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9226279A Pending JPS5617350A (en) 1979-07-20 1979-07-20 Exposing method

Country Status (1)

Country Link
JP (1) JPS5617350A (en)

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