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JPS5211868A - Photoresist coating method - Google Patents

Photoresist coating method

Info

Publication number
JPS5211868A
JPS5211868A JP8808475A JP8808475A JPS5211868A JP S5211868 A JPS5211868 A JP S5211868A JP 8808475 A JP8808475 A JP 8808475A JP 8808475 A JP8808475 A JP 8808475A JP S5211868 A JPS5211868 A JP S5211868A
Authority
JP
Japan
Prior art keywords
coating method
photoresist coating
overall
coating film
semiconductor wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8808475A
Other languages
Japanese (ja)
Inventor
Hideo Sei
Makoto Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP8808475A priority Critical patent/JPS5211868A/en
Publication of JPS5211868A publication Critical patent/JPS5211868A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: An overall almost uniform resist coating film shall be made obtainable even if in ht e case of a microscopic semiconductor wafer.
COPYRIGHT: (C)1977,JPO&Japio
JP8808475A 1975-07-18 1975-07-18 Photoresist coating method Pending JPS5211868A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8808475A JPS5211868A (en) 1975-07-18 1975-07-18 Photoresist coating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8808475A JPS5211868A (en) 1975-07-18 1975-07-18 Photoresist coating method

Publications (1)

Publication Number Publication Date
JPS5211868A true JPS5211868A (en) 1977-01-29

Family

ID=13932987

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8808475A Pending JPS5211868A (en) 1975-07-18 1975-07-18 Photoresist coating method

Country Status (1)

Country Link
JP (1) JPS5211868A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5246903A (en) * 1975-10-08 1977-04-14 Mitsubishi Electric Corp Rotary coating apparatus
JPS5289072A (en) * 1976-01-20 1977-07-26 Toray Industries Method of spin coating
JPS55145455A (en) * 1979-04-27 1980-11-13 Nec Corp Backup system for center device
JP2020011199A (en) * 2018-07-19 2020-01-23 東レ株式会社 Coating method and coating device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5246903A (en) * 1975-10-08 1977-04-14 Mitsubishi Electric Corp Rotary coating apparatus
JPS5289072A (en) * 1976-01-20 1977-07-26 Toray Industries Method of spin coating
JPS55145455A (en) * 1979-04-27 1980-11-13 Nec Corp Backup system for center device
JP2020011199A (en) * 2018-07-19 2020-01-23 東レ株式会社 Coating method and coating device

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