JPS559426A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS559426A JPS559426A JP8201378A JP8201378A JPS559426A JP S559426 A JPS559426 A JP S559426A JP 8201378 A JP8201378 A JP 8201378A JP 8201378 A JP8201378 A JP 8201378A JP S559426 A JPS559426 A JP S559426A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- rectifier
- substrate
- expansion coefficient
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/35—Mechanical effects
- H01L2924/351—Thermal stress
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electrodes Of Semiconductors (AREA)
- Die Bonding (AREA)
Abstract
PURPOSE: To prevent damages due to uneven thermal stress of a substrate by selecting a thermal expansion coefficient of an electrode which contacts to the main surface that is closer to a rectifier junction, to be smaller than another electrode being located at the other side.
CONSTITUTION: A rectifier 1 consists of a n-type Si substrate and a p-type layer 2. An electrode 9 which has a coefficient of thermal expansion similar to a semiconductor such as a combination of copper and carbon filaments is fixed by a solder 7 to a layer 3 of the rectifier 1. A similar electrode 10 is also fixed to a substrate 2 by a solder 8. A thermal expansion coefficient of the electrode 9 at the layer 3 that is closer to a rectifier junction is chosen to be less than a termal expansion coefficient of the electrode 10. Consequently, uneven thermal stress at the both side of the rectifier is avoided, thus preventing damages of the substrate.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8201378A JPS559426A (en) | 1978-07-07 | 1978-07-07 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8201378A JPS559426A (en) | 1978-07-07 | 1978-07-07 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS559426A true JPS559426A (en) | 1980-01-23 |
Family
ID=13762626
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8201378A Pending JPS559426A (en) | 1978-07-07 | 1978-07-07 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS559426A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20130121664A (en) | 2010-10-25 | 2013-11-06 | 엔지케이 인슐레이터 엘티디 | Ceramic material, member for semiconductor manufacturing apparatus, sputtering target member and method for producing ceramic material |
KR20140035834A (en) | 2012-09-14 | 2014-03-24 | 엔지케이 인슐레이터 엘티디 | Laminated structure, member for semiconductor manufacturing apparatus, and method for producing laminated structure |
KR20140077910A (en) | 2011-10-11 | 2014-06-24 | 엔지케이 인슐레이터 엘티디 | Ceramic member, member for use in semiconductor production device, and method for producing ceramic member |
-
1978
- 1978-07-07 JP JP8201378A patent/JPS559426A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20130121664A (en) | 2010-10-25 | 2013-11-06 | 엔지케이 인슐레이터 엘티디 | Ceramic material, member for semiconductor manufacturing apparatus, sputtering target member and method for producing ceramic material |
KR20140077910A (en) | 2011-10-11 | 2014-06-24 | 엔지케이 인슐레이터 엘티디 | Ceramic member, member for use in semiconductor production device, and method for producing ceramic member |
KR20140035834A (en) | 2012-09-14 | 2014-03-24 | 엔지케이 인슐레이터 엘티디 | Laminated structure, member for semiconductor manufacturing apparatus, and method for producing laminated structure |
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