JPS5549014A - Electrode for vibrating element - Google Patents
Electrode for vibrating elementInfo
- Publication number
- JPS5549014A JPS5549014A JP12294278A JP12294278A JPS5549014A JP S5549014 A JPS5549014 A JP S5549014A JP 12294278 A JP12294278 A JP 12294278A JP 12294278 A JP12294278 A JP 12294278A JP S5549014 A JPS5549014 A JP S5549014A
- Authority
- JP
- Japan
- Prior art keywords
- film
- substrate
- molecular
- crystal
- grown
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
PURPOSE:To form a vibrator, mechanical filter and elastic surface-wave element which are excellent in Q value and aging characteristics, by forming an electrode film, great part of which is crystalline and the whole of which is nearly single crystal. CONSTITUTION:In a molecular-beam epitaxy method where an electrode film is obtained, the degree of vacuum inside of bell jar 16 is held between 10<-10> and 10<-11> Torr, ultrahigh vacuum. In this state, component elements 19 and 20 of a crystal film to be formed on substrate are contained in jet cells 17 and 18 which jetting molecular rays out and cells 17 and 18, and substrate 21 are held at adequate temperatures by setting, so that the crystal film of elements 19 and 20 can be grown on substrate 21. At this time, when the crystal film grown on substrate 21 consists of one kind of element, only one jet cell is required. In this way, the molecular- beam epitaxy methods makes use of thin-film growth under ultrahigh vacuum; the thin film is a clean film hardly containing impurities and a film grown under proper conditions is single crystal.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12294278A JPS5549014A (en) | 1978-10-04 | 1978-10-04 | Electrode for vibrating element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12294278A JPS5549014A (en) | 1978-10-04 | 1978-10-04 | Electrode for vibrating element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5549014A true JPS5549014A (en) | 1980-04-08 |
Family
ID=14848422
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12294278A Pending JPS5549014A (en) | 1978-10-04 | 1978-10-04 | Electrode for vibrating element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5549014A (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0314307A (en) * | 1989-06-13 | 1991-01-23 | Murata Mfg Co Ltd | Surface acoustic wave oscillator |
JPH0314308A (en) * | 1989-06-13 | 1991-01-23 | Murata Mfg Co Ltd | Surface acoustic wave filter |
JPH0314309A (en) * | 1989-06-13 | 1991-01-23 | Murata Mfg Co Ltd | Surface acoustic wave device |
JPH0314305A (en) * | 1989-06-13 | 1991-01-23 | Murata Mfg Co Ltd | Manufacture of surface acoustic wave device |
JPH0340510A (en) * | 1989-07-06 | 1991-02-21 | Murata Mfg Co Ltd | Elastic surface wave device |
JPH0348511A (en) * | 1989-04-14 | 1991-03-01 | Murata Mfg Co Ltd | Surface acoustic wave device |
US5162690A (en) * | 1989-04-14 | 1992-11-10 | Murata Manufacturing Co., Ltd. | Surface acoustic wave device |
US6316860B1 (en) | 1997-09-22 | 2001-11-13 | Tdk Corporation | Surface acoustic wave device, and its fabrication process |
US6903488B2 (en) | 2001-09-21 | 2005-06-07 | Tdk Corporation | SAW device and manufacturing method |
US7102461B2 (en) | 2003-07-28 | 2006-09-05 | Tdk Corporation | Surface acoustic wave element, surface acoustic wave device, surface acoustic wave duplexer, and method of manufacturing surface acoustic wave element |
US7352114B2 (en) | 2003-07-17 | 2008-04-01 | Tdk Corporation | Surface acoustic wave element, surface acoustic wave device, surface acoustic wave duplexer, and method of manufacturing surface acoustic wave element |
-
1978
- 1978-10-04 JP JP12294278A patent/JPS5549014A/en active Pending
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0348511A (en) * | 1989-04-14 | 1991-03-01 | Murata Mfg Co Ltd | Surface acoustic wave device |
JP2545983B2 (en) * | 1989-04-14 | 1996-10-23 | 株式会社村田製作所 | Surface acoustic wave device |
US5162690A (en) * | 1989-04-14 | 1992-11-10 | Murata Manufacturing Co., Ltd. | Surface acoustic wave device |
JPH0314305A (en) * | 1989-06-13 | 1991-01-23 | Murata Mfg Co Ltd | Manufacture of surface acoustic wave device |
JPH0314307A (en) * | 1989-06-13 | 1991-01-23 | Murata Mfg Co Ltd | Surface acoustic wave oscillator |
JPH0314309A (en) * | 1989-06-13 | 1991-01-23 | Murata Mfg Co Ltd | Surface acoustic wave device |
JPH0314308A (en) * | 1989-06-13 | 1991-01-23 | Murata Mfg Co Ltd | Surface acoustic wave filter |
JPH0340510A (en) * | 1989-07-06 | 1991-02-21 | Murata Mfg Co Ltd | Elastic surface wave device |
US6316860B1 (en) | 1997-09-22 | 2001-11-13 | Tdk Corporation | Surface acoustic wave device, and its fabrication process |
US6903488B2 (en) | 2001-09-21 | 2005-06-07 | Tdk Corporation | SAW device and manufacturing method |
US7467447B2 (en) | 2001-09-21 | 2008-12-23 | Tdk Corporation | Method of manufacturing a SAW device |
US7352114B2 (en) | 2003-07-17 | 2008-04-01 | Tdk Corporation | Surface acoustic wave element, surface acoustic wave device, surface acoustic wave duplexer, and method of manufacturing surface acoustic wave element |
US7102461B2 (en) | 2003-07-28 | 2006-09-05 | Tdk Corporation | Surface acoustic wave element, surface acoustic wave device, surface acoustic wave duplexer, and method of manufacturing surface acoustic wave element |
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