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JPS5539672A - Manufacturing semiconductor device - Google Patents

Manufacturing semiconductor device

Info

Publication number
JPS5539672A
JPS5539672A JP11330478A JP11330478A JPS5539672A JP S5539672 A JPS5539672 A JP S5539672A JP 11330478 A JP11330478 A JP 11330478A JP 11330478 A JP11330478 A JP 11330478A JP S5539672 A JPS5539672 A JP S5539672A
Authority
JP
Japan
Prior art keywords
film
positional setting
wafer
boundaries
level difference
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11330478A
Other languages
Japanese (ja)
Other versions
JPS5653208B2 (en
Inventor
Yukihiro Ooyama
Izumi Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11330478A priority Critical patent/JPS5539672A/en
Publication of JPS5539672A publication Critical patent/JPS5539672A/en
Publication of JPS5653208B2 publication Critical patent/JPS5653208B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To simplify a positional setting by forming a positional setting pattern on the insulating film fixed on a semiconductor base, followed by growing a level difference in the periphery of the positional setting pattern by forming a thermooxidizing film on the base, thus to make the distinct boundaries.
CONSTITUTION: To laminate and fix a SiO2 film 2' as well as Si3N4 film 2" on the whole surface of Si wafer 1' and to remove the other part than the part for treatment 7 purposed to be a territory on which the positional setting pattern 6 and the elements will be patterned. Next, to grow the level difference on the surface of the wafer 1' neighboring the pattern 6 as well as the part 7 by oxidizing the wafer 1', thus clarifying the boundaries both of them. Subsequently the whole surface will be applied with the photoresistance film 4 followed by patterning the film 4 performing the photomask positional setting, exposure and development. Next, the desired territory will be formed by ion injection etc. through the opening 5 produced. By doing so, the boundaries of level difference will be visible through the color difference thus to simplify the positional setting.
COPYRIGHT: (C)1980,JPO&Japio
JP11330478A 1978-09-14 1978-09-14 Manufacturing semiconductor device Granted JPS5539672A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11330478A JPS5539672A (en) 1978-09-14 1978-09-14 Manufacturing semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11330478A JPS5539672A (en) 1978-09-14 1978-09-14 Manufacturing semiconductor device

Publications (2)

Publication Number Publication Date
JPS5539672A true JPS5539672A (en) 1980-03-19
JPS5653208B2 JPS5653208B2 (en) 1981-12-17

Family

ID=14608825

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11330478A Granted JPS5539672A (en) 1978-09-14 1978-09-14 Manufacturing semiconductor device

Country Status (1)

Country Link
JP (1) JPS5539672A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5964677A (en) * 1982-10-05 1984-04-12 Dainippon Ink & Chem Inc Magenta ink for inkjet printers
JPS61125018A (en) * 1984-11-21 1986-06-12 Nec Corp Pattern and method for detecting pattern alignment error
JPS61293264A (en) * 1985-06-03 1986-12-24 Sumitomo Chem Co Ltd Monoazo compound and dyeing or printing method using same
EP0218131A1 (en) * 1985-09-30 1987-04-15 Hoechst Aktiengesellschaft Water soluble azo compounds, process for their preparation and their use as dyestuffs
JPH01131279A (en) * 1981-01-24 1989-05-24 Hoechst Ag Water-soluble mono-azo compound and dyeing or printing method using the same
US4902786A (en) * 1986-07-17 1990-02-20 Hoechst Aktiengesellschaft Phenylazonaphthol or naphthylazonaphthol compounds containing a fibre-reactive aminophenylamino-substituted halogen-s-triazinylamino group and a fibre-reactive group of the vinylsulfone series, suitable as dyestuffs
US5128283A (en) * 1988-06-08 1992-07-07 Nec Corporation Method of forming mask alignment marks
US5250670A (en) * 1991-09-27 1993-10-05 Hoechst Aktiengesellschaft Water-soluble monoazo compounds containing fiber-reactive groups of vinyl sulfone series as well as triazinyl radical, and process for dyeing with same

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5068065A (en) * 1973-10-17 1975-06-07

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5068065A (en) * 1973-10-17 1975-06-07

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01131279A (en) * 1981-01-24 1989-05-24 Hoechst Ag Water-soluble mono-azo compound and dyeing or printing method using the same
JPS5964677A (en) * 1982-10-05 1984-04-12 Dainippon Ink & Chem Inc Magenta ink for inkjet printers
JPS61125018A (en) * 1984-11-21 1986-06-12 Nec Corp Pattern and method for detecting pattern alignment error
JPS61293264A (en) * 1985-06-03 1986-12-24 Sumitomo Chem Co Ltd Monoazo compound and dyeing or printing method using same
EP0218131A1 (en) * 1985-09-30 1987-04-15 Hoechst Aktiengesellschaft Water soluble azo compounds, process for their preparation and their use as dyestuffs
US4740592A (en) * 1985-09-30 1988-04-26 Hoechst Aktiengesellschaft Water-soluble azo compounds containing fiber-reactive groups and having a sulfo-naphthal coupling component with a triazinylamino substituent suitable as dyestuffs
US4775746A (en) * 1985-09-30 1988-10-04 Hoechst Aktiengesellshaft Water-soluble monoazo compounds containing a fiber-reactive group of the vinylsulfone series and having a sulfonaphthol coupling component with a phenylaminotriazinylamino substituent, suitable as dyestuffs
US4902786A (en) * 1986-07-17 1990-02-20 Hoechst Aktiengesellschaft Phenylazonaphthol or naphthylazonaphthol compounds containing a fibre-reactive aminophenylamino-substituted halogen-s-triazinylamino group and a fibre-reactive group of the vinylsulfone series, suitable as dyestuffs
US5128283A (en) * 1988-06-08 1992-07-07 Nec Corporation Method of forming mask alignment marks
US5250670A (en) * 1991-09-27 1993-10-05 Hoechst Aktiengesellschaft Water-soluble monoazo compounds containing fiber-reactive groups of vinyl sulfone series as well as triazinyl radical, and process for dyeing with same

Also Published As

Publication number Publication date
JPS5653208B2 (en) 1981-12-17

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