[go: up one dir, main page]

JPS5516457A - Gap detecting method - Google Patents

Gap detecting method

Info

Publication number
JPS5516457A
JPS5516457A JP8949978A JP8949978A JPS5516457A JP S5516457 A JPS5516457 A JP S5516457A JP 8949978 A JP8949978 A JP 8949978A JP 8949978 A JP8949978 A JP 8949978A JP S5516457 A JPS5516457 A JP S5516457A
Authority
JP
Japan
Prior art keywords
wafer
mask
gap
holder
sensors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8949978A
Other languages
Japanese (ja)
Inventor
Eitaro Kawaguchi
Kazuo Minowa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP8949978A priority Critical patent/JPS5516457A/en
Publication of JPS5516457A publication Critical patent/JPS5516457A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To keep the gap between the mask and wafer at the specified value by effectively correcting the fluctuation in depth of the mask and wafer.
CONSTITUTION: Plural microdisplacement detecting sensors 5 are fixedly provided on a mask holder 1 oppositting to wafer 3. The sensors 5 detect the gap between the upper surface of the wafer fixed on a wafer holder 4 and the outer edges of the sensors 5. With use of this detected result, the level of the mask holder 1 or wafer holder 4 is controlled to keep the gap between the mask and the wafer at the specified value and make them parallel in plane.
COPYRIGHT: (C)1980,JPO&Japio
JP8949978A 1978-07-24 1978-07-24 Gap detecting method Pending JPS5516457A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8949978A JPS5516457A (en) 1978-07-24 1978-07-24 Gap detecting method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8949978A JPS5516457A (en) 1978-07-24 1978-07-24 Gap detecting method

Publications (1)

Publication Number Publication Date
JPS5516457A true JPS5516457A (en) 1980-02-05

Family

ID=13972447

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8949978A Pending JPS5516457A (en) 1978-07-24 1978-07-24 Gap detecting method

Country Status (1)

Country Link
JP (1) JPS5516457A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5716885U (en) * 1980-06-24 1982-01-28
JPS58103136A (en) * 1981-12-16 1983-06-20 Nippon Kogaku Kk <Nikon> Gap setter
JPS59107515A (en) * 1982-12-13 1984-06-21 Hitachi Ltd Gap control type exposure method
JPS62277726A (en) * 1986-05-27 1987-12-02 Canon Inc Parallelism forming device
JPS62279629A (en) * 1986-05-28 1987-12-04 Hitachi Ltd Exposure equipment
US5210514A (en) * 1990-08-17 1993-05-11 Tdk Corporation Coil device
WO2012028166A1 (en) 2010-09-03 2012-03-08 Ev Group E. Thallner Gmbh Device and method for reducing a wedge error

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5716885U (en) * 1980-06-24 1982-01-28
JPS616463Y2 (en) * 1980-06-24 1986-02-26
JPS58103136A (en) * 1981-12-16 1983-06-20 Nippon Kogaku Kk <Nikon> Gap setter
JPH035652B2 (en) * 1981-12-16 1991-01-28 Nippon Kogaku Kk
JPS59107515A (en) * 1982-12-13 1984-06-21 Hitachi Ltd Gap control type exposure method
JPH0454963B2 (en) * 1982-12-13 1992-09-01 Hitachi Ltd
JPS62277726A (en) * 1986-05-27 1987-12-02 Canon Inc Parallelism forming device
JPS62279629A (en) * 1986-05-28 1987-12-04 Hitachi Ltd Exposure equipment
US5210514A (en) * 1990-08-17 1993-05-11 Tdk Corporation Coil device
WO2012028166A1 (en) 2010-09-03 2012-03-08 Ev Group E. Thallner Gmbh Device and method for reducing a wedge error
US9194700B2 (en) 2010-09-03 2015-11-24 Ev Group E. Thallner Gmbh Device and method for reducing a wedge error

Similar Documents

Publication Publication Date Title
JPS5352483A (en) Detecting method for concrete construction destruction
JPS5516457A (en) Gap detecting method
JPS5377662A (en) Handling and processing apparatus of postal matter
JPS546437A (en) Discriminator for sheets of paper or the like
JPS54935A (en) Pattern detector
JPS53148442A (en) Paper size detector
JPS5376055A (en) Method of position detection
JPS5380247A (en) Position detector
JPS5321539A (en) Mark sensor
JPS52143882A (en) Vibration source position detection system
JPS523461A (en) Measuring, detecting and alarming device of land subsidence under a bu ilding
JPS5357596A (en) Grinding method of roll
JPS51116051A (en) Method of correcting level difference between top edge of manhole and road surface
JPS52153483A (en) Temperature detector
JPS51118477A (en) Detection method of fixed speed
JPS5337472A (en) Frequency comparator
JPS5344098A (en) Detecting apparatus of upper and lower limit
JPS5387179A (en) Creeping characteristic measuring method
JPS53145673A (en) Level measuring system
JPS5351851A (en) Position detector
JPS5335384A (en) Aligning method
JPS52124814A (en) Detection unit of minute pattern
JPS5223983A (en) Breakage detector
JPS52108877A (en) Apparatus for use with mass spectrometer for automatically detecting a nd setting peak-top of mass number
JPS5292779A (en) Method of flaw detection for rolls