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JPS55154574A - Forming method of film of high melting point substance - Google Patents

Forming method of film of high melting point substance

Info

Publication number
JPS55154574A
JPS55154574A JP6055379A JP6055379A JPS55154574A JP S55154574 A JPS55154574 A JP S55154574A JP 6055379 A JP6055379 A JP 6055379A JP 6055379 A JP6055379 A JP 6055379A JP S55154574 A JPS55154574 A JP S55154574A
Authority
JP
Japan
Prior art keywords
melting point
substrate
powder
point substance
high melting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6055379A
Other languages
Japanese (ja)
Other versions
JPS5832230B2 (en
Inventor
Koji Takei
Susumu Fujimori
Kazutoshi Nagai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP6055379A priority Critical patent/JPS5832230B2/en
Publication of JPS55154574A publication Critical patent/JPS55154574A/en
Publication of JPS5832230B2 publication Critical patent/JPS5832230B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
    • C23C24/10—Coating starting from inorganic powder by application of heat or pressure and heat with intermediate formation of a liquid phase in the layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacture Of Switches (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

PURPOSE:To form a dense and high purity film of high melting point substance on the substrate of low melting point substance, by making the powder of the high melting point substance as basic material and fusing by heating the above substance on the substrate made of the low melting point substance. CONSTITUTION:The powder of high melting point substance 1 is press-bonded on the substrate 2 by pressure at the first process and layer of the powder 1 is formed. Next, laser is irradiated on the layer of the powder 1 in a short time as the second process and the outermost layer of the powder 1 is melted and is made dense without melting the substrate 2. Continuously, the second laser irradiation is carried out in a longer time as the third process and temperature gradient in depth direction is made gentle by slow heating. Accordingly, face of the substrate 2 bordered on the outermost layer of the high melting point substance, is melted without melting the above layer and the middle layer 4 is formed by permeating the substrate substance in the layer of the powder 1. As a result of it, film of the high melting point is surely combined with the substrate 2.
JP6055379A 1979-05-18 1979-05-18 Method for forming high melting point material film Expired JPS5832230B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6055379A JPS5832230B2 (en) 1979-05-18 1979-05-18 Method for forming high melting point material film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6055379A JPS5832230B2 (en) 1979-05-18 1979-05-18 Method for forming high melting point material film

Publications (2)

Publication Number Publication Date
JPS55154574A true JPS55154574A (en) 1980-12-02
JPS5832230B2 JPS5832230B2 (en) 1983-07-12

Family

ID=13145584

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6055379A Expired JPS5832230B2 (en) 1979-05-18 1979-05-18 Method for forming high melting point material film

Country Status (1)

Country Link
JP (1) JPS5832230B2 (en)

Also Published As

Publication number Publication date
JPS5832230B2 (en) 1983-07-12

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