JPS54146975A - Protection circuit of semiconductor device - Google Patents
Protection circuit of semiconductor deviceInfo
- Publication number
- JPS54146975A JPS54146975A JP5577378A JP5577378A JPS54146975A JP S54146975 A JPS54146975 A JP S54146975A JP 5577378 A JP5577378 A JP 5577378A JP 5577378 A JP5577378 A JP 5577378A JP S54146975 A JPS54146975 A JP S54146975A
- Authority
- JP
- Japan
- Prior art keywords
- type
- gate
- drain
- external terminal
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title 1
- 230000006378 damage Effects 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
Landscapes
- Amplifiers (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE:To prevent the destruction of a gate film and the lowering of a switching speed by inserting a depletion-type MOSFET between the external terminal and a protected MOSFET. CONSTITUTION:N-type source drain 2 and electrode 5 are provided on P<->-type substrate 1 and gate insulating film 4 respectively to form a FET, and protection devices Q0 and Q0' are completed by providing N channel 8 between N-type drain 6 and source 7 and providing gate electrode 10 through insulating film 9, and p layer 12 is formed and is used as a resistance as well as a diode after forming N layer 11 for protecting film 9. The surface is covered with insulating gilm 13, and electrodes are formed selectively. In this constitution, each external terminal is connected to the drain of depletion-type FET even if external terminals provided in the case are independent respectively, and an on-state is held normally across the drain and the source unless a proper negative voltage is applied to the protection gate terminal. As a result, even if the external terminal is charged with a high voltage, the external terminal is short-circuited to the substrate immediately to prevent the destruction of the gate film.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5577378A JPS54146975A (en) | 1978-05-10 | 1978-05-10 | Protection circuit of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5577378A JPS54146975A (en) | 1978-05-10 | 1978-05-10 | Protection circuit of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54146975A true JPS54146975A (en) | 1979-11-16 |
Family
ID=13008185
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5577378A Pending JPS54146975A (en) | 1978-05-10 | 1978-05-10 | Protection circuit of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54146975A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0042305A2 (en) * | 1980-06-18 | 1981-12-23 | Kabushiki Kaisha Toshiba | MOS transistor circuit with breakdown protection |
FR2485808A1 (en) * | 1980-06-30 | 1981-12-31 | Mitsubishi Electric Corp | INPUT PROTECTION CIRCUIT FOR SEMICONDUCTOR DEVICE |
JPS5768071A (en) * | 1980-10-14 | 1982-04-26 | Nec Corp | Semiconductor device with protective element |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50109682A (en) * | 1974-02-04 | 1975-08-28 | ||
JPS5117655A (en) * | 1974-08-05 | 1976-02-12 | Hitachi Ltd |
-
1978
- 1978-05-10 JP JP5577378A patent/JPS54146975A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50109682A (en) * | 1974-02-04 | 1975-08-28 | ||
JPS5117655A (en) * | 1974-08-05 | 1976-02-12 | Hitachi Ltd |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0042305A2 (en) * | 1980-06-18 | 1981-12-23 | Kabushiki Kaisha Toshiba | MOS transistor circuit with breakdown protection |
FR2485808A1 (en) * | 1980-06-30 | 1981-12-31 | Mitsubishi Electric Corp | INPUT PROTECTION CIRCUIT FOR SEMICONDUCTOR DEVICE |
JPS5768071A (en) * | 1980-10-14 | 1982-04-26 | Nec Corp | Semiconductor device with protective element |
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