JPS54116887A - Mos type semiconductor device - Google Patents
Mos type semiconductor deviceInfo
- Publication number
- JPS54116887A JPS54116887A JP2408878A JP2408878A JPS54116887A JP S54116887 A JPS54116887 A JP S54116887A JP 2408878 A JP2408878 A JP 2408878A JP 2408878 A JP2408878 A JP 2408878A JP S54116887 A JPS54116887 A JP S54116887A
- Authority
- JP
- Japan
- Prior art keywords
- drain
- gate
- source
- wiring
- resistance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
- H10D89/811—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using FETs as protective elements
Landscapes
- Amplifiers (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Protection Of Static Devices (AREA)
- Electronic Switches (AREA)
Abstract
PURPOSE:To obtain a protective circuit which can prevent a short between a drain and gate and has low PN-junction dielectric strength and high discharge performance. CONSTITUTION:Input terminal 3 is connected to N-type drain layer 12 of MOSFET9 via N layer 6 in a P-type substrate, and Al wiring 11 is led to input gate 1. The gate electrode of protective FET9 is connected to earth line 17. Source 14 and poly-Si resistance 10 are connected together via the Al wiring and then connected to earth line 17 at opening part 16. Source and drain terminals are pointeed. When a large electrostatic voltage is applied, an avalanche breakdown starts in the pointed region at a low voltage and produced positive holes decrease the potential of the substrate to discharge static charges. By this current and resistance 10, the source potential risis, so that the discharge will stop. Since those are carried out momently, charges are not injected until a short occurs between the drain and gate. In this way, MOSFET1 can be protected.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2408878A JPS54116887A (en) | 1978-03-02 | 1978-03-02 | Mos type semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2408878A JPS54116887A (en) | 1978-03-02 | 1978-03-02 | Mos type semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS54116887A true JPS54116887A (en) | 1979-09-11 |
JPS626662B2 JPS626662B2 (en) | 1987-02-12 |
Family
ID=12128627
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2408878A Granted JPS54116887A (en) | 1978-03-02 | 1978-03-02 | Mos type semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54116887A (en) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4481521A (en) * | 1978-11-06 | 1984-11-06 | Nippon Electric Co., Ltd. | Insulated gate field effect transistor provided with a protective device for a gate insulating film |
US4489245A (en) * | 1980-09-10 | 1984-12-18 | Kabushiki Kaisha Toshiba | D.C. Voltage bias circuit in an integrated circuit |
US4509067A (en) * | 1981-06-23 | 1985-04-02 | Tokyo Shibaura Denki Kabushiki Kaisha | Semiconductor integrated circuit devices with protective means against overvoltages |
US4541002A (en) * | 1981-06-30 | 1985-09-10 | Fujitsu Limited | Protective device for a semiconductor integrated circuit including double polysilicon resistor |
JPS6132562A (en) * | 1984-07-25 | 1986-02-15 | Hitachi Ltd | Semiconductor device |
US4580063A (en) * | 1981-12-04 | 1986-04-01 | Sgs-Ates Componenti Elettronics S.P.A. | Circuit for the protection of IGFETs from overvoltage |
JPS61128553A (en) * | 1984-11-27 | 1986-06-16 | Mitsubishi Electric Corp | input protection circuit |
US4630084A (en) * | 1981-02-02 | 1986-12-16 | Siemens Aktiengesellschaft | Vertical mis-field effect transistor with low forward resistance |
US4633283A (en) * | 1985-03-11 | 1986-12-30 | Rca Corporation | Circuit and structure for protecting integrated circuits from destructive transient voltages |
JPS6276676A (en) * | 1985-09-30 | 1987-04-08 | Toshiba Corp | Mos type semiconductor integrated circuit device |
US5019883A (en) * | 1987-01-28 | 1991-05-28 | Mitsubishi Denki Kabushiki Kaisha | Input protective apparatus of semiconductor device |
JPH08227976A (en) * | 1994-10-19 | 1996-09-03 | Siliconix Inc | Static discharge protective device for integrated circuit |
-
1978
- 1978-03-02 JP JP2408878A patent/JPS54116887A/en active Granted
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4481521A (en) * | 1978-11-06 | 1984-11-06 | Nippon Electric Co., Ltd. | Insulated gate field effect transistor provided with a protective device for a gate insulating film |
US4489245A (en) * | 1980-09-10 | 1984-12-18 | Kabushiki Kaisha Toshiba | D.C. Voltage bias circuit in an integrated circuit |
US4630084A (en) * | 1981-02-02 | 1986-12-16 | Siemens Aktiengesellschaft | Vertical mis-field effect transistor with low forward resistance |
US4509067A (en) * | 1981-06-23 | 1985-04-02 | Tokyo Shibaura Denki Kabushiki Kaisha | Semiconductor integrated circuit devices with protective means against overvoltages |
US4541002A (en) * | 1981-06-30 | 1985-09-10 | Fujitsu Limited | Protective device for a semiconductor integrated circuit including double polysilicon resistor |
US4580063A (en) * | 1981-12-04 | 1986-04-01 | Sgs-Ates Componenti Elettronics S.P.A. | Circuit for the protection of IGFETs from overvoltage |
JPS6132562A (en) * | 1984-07-25 | 1986-02-15 | Hitachi Ltd | Semiconductor device |
JPS61128553A (en) * | 1984-11-27 | 1986-06-16 | Mitsubishi Electric Corp | input protection circuit |
US4633283A (en) * | 1985-03-11 | 1986-12-30 | Rca Corporation | Circuit and structure for protecting integrated circuits from destructive transient voltages |
JPS6276676A (en) * | 1985-09-30 | 1987-04-08 | Toshiba Corp | Mos type semiconductor integrated circuit device |
US5019883A (en) * | 1987-01-28 | 1991-05-28 | Mitsubishi Denki Kabushiki Kaisha | Input protective apparatus of semiconductor device |
JPH08227976A (en) * | 1994-10-19 | 1996-09-03 | Siliconix Inc | Static discharge protective device for integrated circuit |
Also Published As
Publication number | Publication date |
---|---|
JPS626662B2 (en) | 1987-02-12 |
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