JPH0821502B2 - Thin film permanent magnet - Google Patents
Thin film permanent magnetInfo
- Publication number
- JPH0821502B2 JPH0821502B2 JP60032655A JP3265585A JPH0821502B2 JP H0821502 B2 JPH0821502 B2 JP H0821502B2 JP 60032655 A JP60032655 A JP 60032655A JP 3265585 A JP3265585 A JP 3265585A JP H0821502 B2 JPH0821502 B2 JP H0821502B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- permanent magnet
- film
- coercive force
- film permanent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Thin Magnetic Films (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】 〔発明の利用分野〕 本発明は薄膜永久磁石に係わり、特に磁気媒体，磁性
デバイスに好適なCo−Ptを主成分とする薄膜永久磁石に
係わる。TECHNICAL FIELD The present invention relates to a thin film permanent magnet, and more particularly to a thin film permanent magnet containing Co—Pt as a main component, which is suitable for magnetic media and magnetic devices.
CoおよびPtを主成分とする薄膜永久磁石はスパッタ法
等（特開昭58−7806号公報）で形成されていた。しか
し、従来の方法では当該永久磁石の特性、たとえば保磁
力が製法や作製の条件、たとえばスパッタの方法、スパ
ッタ時のスパッタガス圧力，投入電力，スパッタ前の到
達真空度等に極めて強く依存し、常に一定の磁気特性を
得ることが難かしく、作製された永久磁石膜の磁気特性
ばらつきが極めて大きかった。The thin film permanent magnet containing Co and Pt as the main components was formed by a sputtering method or the like (Japanese Patent Laid-Open No. 58-7806). However, in the conventional method, the characteristics of the permanent magnet, such as the coercive force, are extremely strongly dependent on the manufacturing method and the manufacturing conditions such as the sputtering method, the sputtering gas pressure during sputtering, the input power, and the ultimate vacuum before sputtering. It was difficult to always obtain constant magnetic properties, and the magnetic properties of the manufactured permanent magnet films had extremely large variations.
本発明は、極めて磁気特性ばらつきの少ないCoおよび
Ptを主成分とする薄膜永久磁石を提供することにある。The present invention provides Co and
It is to provide a thin-film permanent magnet whose main component is Pt.
本発明においては、多層にしたCoおよびPt薄膜の金属
間反応を利用して適当な組成および組成分布とすること
によって当該薄膜の磁気特性を向上せしめるものであ
る。これによって、スパッタ条件等の極めて微妙な調整
が不必要となり、適当な温度で所定時間熱処理すれば容
易に目的とする磁気特性を有するCo−Pt系永久磁石膜を
得ることができるようになった。In the present invention, the magnetic properties of the thin film are improved by utilizing the intermetallic reaction of the multi-layered Co and Pt thin films to obtain an appropriate composition and composition distribution. As a result, it becomes unnecessary to make extremely delicate adjustments of the sputtering conditions and the like, and it becomes possible to easily obtain a Co-Pt-based permanent magnet film having the desired magnetic properties by heat treatment at a suitable temperature for a predetermined time. .
以下、本発明を実施例によって詳細に説明する。 Hereinafter, the present invention will be described in detail with reference to examples.
実施例1. ガラス，アルミナ，表面を酸化したAl,Tiなどの基板
上にCoを70nm,Ptを30nm、順次蒸着あるいはスパッタす
る。当該Pt/Co2層膜を真空中あるいは不活性雰囲気中で
300〜500℃に１〜3hr加熱するるこの熱処理によって、C
oとPtは相互に拡散を起こし両者の界面から混合状態に
なる。この混合領域（反応層）における両者の組成がCo
−（10〜30）％Ptとなる時に、当該薄膜の保磁力は最大
値を示す。その値は60〜80kA/mである。第１図に上記試
料における保磁力と熱処理温度の関係を示す。保磁力は
400〜450℃の間で最大値を示すが、300℃でも永久磁石
としては十分な値を示す。反応層の組成はCoおよびPtの
膜厚、熱処理の温度および時間により変化する。これら
を系統的に変化させることにより、形成される薄膜永久
磁石は、その深さ方向の組成分布が均一あるいは不均一
（波形の組成分布）になる。また、組成分布が不均一な
場合、膜全体が反応するのではなく、その一部のみが反
応し、他の部分は純Ptあるいは純Coの層が残留すること
になる。Example 1. Co, 70 nm, and Pt, 30 nm of Co are sequentially deposited or sputtered on a substrate such as glass, alumina, and Al, Ti whose surface is oxidized. The Pt / Co2 layer film is vacuumed or in an inert atmosphere.
By this heat treatment of heating at 300-500 ° C for 1-3 hours, C
O and Pt diffuse into each other and become mixed at the interface between them. The composition of both in this mixed region (reaction layer) is Co
At − (10 to 30)% Pt, the coercive force of the thin film shows a maximum value. Its value is 60-80 kA / m. FIG. 1 shows the relationship between the coercive force and the heat treatment temperature in the above sample. The coercive force is
It shows the maximum value between 400 and 450 ℃, but it shows sufficient value as a permanent magnet even at 300 ℃. The composition of the reaction layer changes depending on the film thickness of Co and Pt, the temperature and time of the heat treatment. By systematically changing these, the thin film permanent magnet to be formed has a uniform or non-uniform composition distribution in the depth direction (corrugated composition distribution). Further, when the composition distribution is non-uniform, the whole film does not react, but only a part thereof reacts, and the pure Pt or pure Co layer remains in the other part.
実施例2. 実施例１で示したPtあるいはCo膜中に、特性の改善あ
るいは調整の目的でFe,Ni,Ru,Re,Rh,Ir,Os,Mn,Ti,Sm等
を添加した場合にも、実施例１と同様の薄膜永久磁石が
作製される。この場合添加する元素によってその効果は
異なり、例えばNiを添加すると保磁力の最大値はCo−Pt
系の3/4程度になるが、角形比は増大する。例えばFeを
添加した場合には、残留磁化が1.2〜1.3倍となる。Example 2. When Fe, Ni, Ru, Re, Rh, Ir, Os, Mn, Ti, Sm, etc. were added to the Pt or Co film shown in Example 1 for the purpose of improving or adjusting the characteristics. Also, a thin film permanent magnet similar to that of Example 1 is manufactured. In this case, the effect differs depending on the element to be added.For example, when Ni is added, the maximum value of coercive force is Co-Pt.
It becomes about 3/4 of the system, but the squareness ratio increases. For example, when Fe is added, the residual magnetization becomes 1.2 to 1.3 times.
実施例3. CoとPtの組合せに於て、Ptの厚さを若干大きめにし、
適当に熱処理することによって表面にPtの残留層を形成
する。これによって、合金層が化学的あるいは機械的に
保護される。このPt層の厚さは熱処理を最適化すること
によって数10Åから数100Å以上まで容易にコントロー
ルすることができる。Example 3 In the combination of Co and Pt, the thickness of Pt was slightly increased,
A Pt residual layer is formed on the surface by appropriate heat treatment. This protects the alloy layer chemically or mechanically. The thickness of this Pt layer can be easily controlled from several 10Å to several 100Å or more by optimizing the heat treatment.
たとえば、Ptを400Å,Coを800Åとした二層膜で450℃
で１時間熱処理すると完全に混合してHcは40kA/mと低く
Pt層も残留しない。ところが400℃で２時間熱処理する
とPtの一部が反応し、Hcは80kA/mとなり、表面にPt層が
残る。For example, a two-layer film with Pt of 400Å and Co of 800Å is 450 ℃.
When heat treated for 1 hour, it is completely mixed and Hc is as low as 40kA / m.
The Pt layer also does not remain. However, when heat-treated at 400 ° C. for 2 hours, part of Pt reacts, Hc becomes 80 kA / m, and a Pt layer remains on the surface.
実施例4. CoとPtを所定の厚さにする場合、CoとPtの厚さを所定
の比とし、繰返し蒸着して多層化した膜でも実施例１と
同様の効果が得られるとともに、熱処理温度の低下、熱
処理時間の短縮をすることができる。例えばCoを7nm,Pt
を3nmとし、それぞれを繰返し10層、すなわち合計20層
の多層膜とした場合には350℃の熱処理で第１図が示し
た450℃で得られた値と同じ高保磁力の膜が得られる。
また、同じ450℃で焼鈍する場合、80kA/mの保磁力を得
るためには３〜4hr必要だが、上述の多層にすると10〜3
0minの焼鈍で済む。また、多層化した場合には、組成が
均一にならなくても（波状の組成分布）保磁力は高くな
る。Example 4 In the case where Co and Pt have a predetermined thickness, the thickness of Co and Pt are set to a predetermined ratio, and the same effect as in Example 1 can be obtained with a multilayer film formed by repeated vapor deposition and heat treatment. It is possible to reduce the temperature and the heat treatment time. For example, Co is 7nm, Pt
Is set to 3 nm and each is repeated to form a multilayer film having 10 layers, that is, a total of 20 layers, a film having a high coercive force similar to the value obtained at 450 ° C. shown in FIG. 1 can be obtained by heat treatment at 350 ° C.
When annealing at the same temperature of 450 ℃, it takes 3-4 hours to obtain a coercive force of 80kA / m.
Annealing for 0 min is enough. Further, when the layers are formed, the coercive force becomes high even if the composition is not uniform (corrugated composition distribution).
実施例5. Pt薄膜あるいはCo薄膜の上に、それぞれCoあるいはPt
膜をめっきまたは蒸着で形成し、熱処理しても実施例１
と同様の高保磁力層が形成された。Example 5. Co or Pt on Pt or Co thin film, respectively.
Even if the film is formed by plating or vapor deposition and heat-treated, Example 1
A high coercive force layer similar to that was formed.
実施例６ 当該Co−Pt合金（形成された薄膜永久磁石）の上にSi
O2,Al2O3,Re,TiN,Si3N4,Os,Ir,Rh,などを形成するとCo
−Pt合金層が保護され、損傷防止ができた。Example 6 Si is formed on the Co-Pt alloy (formed thin film permanent magnet).
When O 2 , Al 2 O 3 , Re, TiN, Si 3 N 4 , Os, Ir, Rh, etc. are formed, Co
-The Pt alloy layer was protected and damage was prevented.
本発明によれば、極めて磁気特性ばらつきの少ないCo
およびPtを主成分とする薄膜永久磁石を提供できる。According to the present invention, Co having extremely little variation in magnetic properties
A thin film permanent magnet containing Pt and Pt as a main component can be provided.
たとえば、従来の薄膜永久磁石の保磁力Hcは、スパッ
タに関する条件（これについては〔発明の背景〕の項で
記載した。）以外の条件（Pt,Coの膜厚等）を同一にし
ても、例えば500〜1500Oeのバラツキが生じる。For example, the coercive force Hc of a conventional thin film permanent magnet is the same even if the conditions (Pt, Co film thickness, etc.) are the same except for the conditions related to sputtering (this is described in the section of [Background of the Invention]). For example, a variation of 500 to 1500 Oe occurs.
これに対し、本発明の薄膜永久磁石では例えば、800
±50Oeとバラツキが著しく小さくなった。On the other hand, in the thin film permanent magnet of the present invention, for example, 800
The variation was ± 50 Oe, which was extremely small.
第１図は熱処理したCo−Pt合金層の保磁力と熱処理温度
との関係図である。FIG. 1 is a graph showing the relationship between the coercive force of the heat-treated Co—Pt alloy layer and the heat treatment temperature.
Claims (1)
該Co薄膜とPt薄膜の界面にCoとPtの反応層が形成された
薄膜永久磁石において、上記反応層の平均的組成がCoが
70％ないし90％、Ptが10ないし30％であることを特徴と
する薄膜永久磁石。1. A Co thin film and a Pt thin film are alternately laminated in two or more,
In a thin film permanent magnet having a reaction layer of Co and Pt formed at the interface between the Co thin film and the Pt thin film, the average composition of the reaction layer is Co
A thin film permanent magnet characterized by having 70% to 90% and Pt of 10 to 30%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60032655A JPH0821502B2 (en) | 1985-02-22 | 1985-02-22 | Thin film permanent magnet |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60032655A JPH0821502B2 (en) | 1985-02-22 | 1985-02-22 | Thin film permanent magnet |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61194635A JPS61194635A (en) | 1986-08-29 |
| JPH0821502B2 true JPH0821502B2 (en) | 1996-03-04 |
Family
ID=12364876
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60032655A Expired - Lifetime JPH0821502B2 (en) | 1985-02-22 | 1985-02-22 | Thin film permanent magnet |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0821502B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02186801A (en) * | 1989-01-13 | 1990-07-23 | Murata Mfg Co Ltd | Magnetostatic wave device |
| JP2763165B2 (en) * | 1989-07-10 | 1998-06-11 | 株式会社東芝 | Manufacturing method of magnetic recording medium |
| JPH04105309A (en) * | 1990-08-24 | 1992-04-07 | Nec Corp | Manufacture of metallic magnetic substance film |
| US6144534A (en) * | 1997-03-18 | 2000-11-07 | Seagate Technology Llc | Laminated hard magnet in MR sensor |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58147540A (en) * | 1982-02-26 | 1983-09-02 | Hitachi Ltd | Thin film permanent magnet and its manufacture |
-
1985
- 1985-02-22 JP JP60032655A patent/JPH0821502B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61194635A (en) | 1986-08-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |