JPH0610848B2 - Laminated magnetic material - Google Patents
Laminated magnetic materialInfo
- Publication number
- JPH0610848B2 JPH0610848B2 JP1082086A JP1082086A JPH0610848B2 JP H0610848 B2 JPH0610848 B2 JP H0610848B2 JP 1082086 A JP1082086 A JP 1082086A JP 1082086 A JP1082086 A JP 1082086A JP H0610848 B2 JPH0610848 B2 JP H0610848B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- magnetic material
- laminated
- films
- laminated magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/313—Disposition of layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は磁気ヘッド等に適した積層磁性材料に関するも
のである。TECHNICAL FIELD The present invention relates to a laminated magnetic material suitable for a magnetic head and the like.
従来の技術 従来より、周波数特性の改善の為に磁性体の間に絶縁体
をはさんだ積層磁性材料が案出されており、又近年磁性
体自体を多層膜化して軟磁性を改良しようとする試みが
なされている。例えば前者の例としては、第2図に示す
ように、磁歪定数の小さい6.5wt%Fe-Si膜4を多層膜化
し、その間に上記Fe-Si膜4よりも薄い非磁性体のSiO2
絶縁層5を配したものがある。後者の例としては第3図
に示すように、30〜100Åぐらい極めて薄いNi-Fe
膜6を介在させる事によりFe-Si膜4の磁気特性を改善
しようとするものがある。2. Description of the Related Art Conventionally, a laminated magnetic material in which an insulator is sandwiched between magnetic materials has been devised to improve frequency characteristics, and in recent years, the magnetic material itself has been multilayered to improve soft magnetism. Attempts are being made. For example, as an example of the former, as shown in FIG. 2, a 6.5 wt% Fe-Si film 4 having a small magnetostriction constant is formed into a multi-layer film, and a non-magnetic SiO 2 film thinner than the Fe-Si film 4 is formed between them.
There is one in which the insulating layer 5 is arranged. As an example of the latter, as shown in FIG. 3, extremely thin Ni-Fe of about 30 to 100Å
There is an attempt to improve the magnetic characteristics of the Fe-Si film 4 by interposing the film 6.
発明が解決しようとする問題点 上記従来多層膜において、非磁性層SiO2の膜厚を増大さ
せれば、全体での耐摩耗性は向上するが、磁性体部Fe-S
iが偏摩耗を生じかつFe-Siの軟磁気特性が劣化すると同
時に、相対的にFe-Si膜部が積層膜全体に占める割合が
減って、積層膜全体としての飽和磁化が減少し望ましく
ない。一方軟磁性体であるNi-Fe膜をFe-Si膜の間にはさ
んだ場合、比較的Ni-Fe膜が厚くなってもFe-Si膜の軟磁
性はそこなわれにくいが、全体としての耐摩耗性はNi-F
e,Fe-Si膜ともに低い為、これら多層膜を磁気ヘッド等
に応用する場合問題となっていた。Problems to be Solved by the Invention In the above conventional multilayer film, if the thickness of the non-magnetic layer SiO 2 is increased, the wear resistance as a whole is improved.
i causes uneven wear and deteriorates the soft magnetic characteristics of Fe-Si, and at the same time, the ratio of the Fe-Si film portion to the whole laminated film decreases, and the saturation magnetization of the entire laminated film decreases, which is not desirable. . On the other hand, if the Ni-Fe film, which is a soft magnetic material, is sandwiched between the Fe-Si films, the soft magnetism of the Fe-Si film is hard to be damaged even if the Ni-Fe film is relatively thick, but as a whole, Wear resistance is Ni-F
Since both e and Fe-Si films are low, it has been a problem when these multilayer films are applied to magnetic heads and the like.
本発明は、上記のような問題点を解決し、耐摩耗性と磁
気特性の両者を兼ね備えた磁性材料を実現することを目
的とする。It is an object of the present invention to solve the above problems and to realize a magnetic material having both wear resistance and magnetic properties.
問題点を解決するための手段 磁歪定数λが1×10-5以下のFeとSiを主成分とする薄膜
1と、上記λが1×10-5以下で耐摩耗性に優れた非晶質
合金もしくはFe-Si-Al系合金より成る薄膜2とを、前記
薄膜1,2の一層分の膜厚をそれぞれt1,t2とするとき t1,t2<1000Åでかつt1<2t2 であるように交互に積層して多層膜を作成する。Means for Solving Problems A thin film 1 composed mainly of Fe and Si having a magnetostriction constant λ of 1 × 10 -5 or less, and an amorphous material having λ of 1 × 10 -5 or less and excellent in wear resistance. A thin film 2 made of an alloy or Fe-Si-Al alloy, where t 1 and t 2 are film thicknesses of the thin films 1 and 2, respectively, t 1 and t 2 <1000Å and t 1 <2t Alternately laminated as in 2 to make a multilayer film.
作用 本発明者らは2種類の膜を多層化し、その各々の1層の
薄膜を極めて薄くして行けば、異なる膜の間の偏摩耗が
小さくなり、全体としての摩耗も一方の膜に耐摩耗性の
良好な非晶質合金やFe-Si-Al系合金膜を用いる事により
改善される事を発見した。全体としての飽和磁化が高く
磁気ヘッド用材に用いる事が出来るような軟磁性を示す
ものとしては、磁歪λが1×10-5以下のFe-Si系合金膜1
と、同じくλが1×10-5以下の耐摩耗性に優れた非晶質
合金膜もしくはFe-Si-Al系合金膜2との多層膜が適して
おり、各々の膜の厚みを上述のように制御することによ
り、良好な耐摩耗性を得ることができる。Effect The inventors of the present invention make two kinds of films into a multi-layer, and if one thin film of each of them is made extremely thin, uneven wear between different films becomes small, and the wear as a whole also resists one film. It has been discovered that the improvement can be achieved by using an amorphous alloy or a Fe-Si-Al alloy film having good wear properties. Fe-Si alloy film 1 having a magnetostriction λ of 1 × 10 −5 or less is one that has a high saturation magnetization as a whole and exhibits soft magnetism that can be used for magnetic head materials.
Also, a multilayer film including an amorphous alloy film or Fe—Si—Al alloy film 2 having excellent wear resistance with a λ of 1 × 10 −5 or less is suitable, and the thickness of each film is as described above. By controlling in this manner, good wear resistance can be obtained.
実施例 本発明は高飽和磁化を有し、かつ耐摩耗性に優れた積層
磁性材料を可能とするものである。本発明の積層磁性体
の概要を第1図に示した。同図(a),(b)において、1は
磁歪定数λが1×10-5以下のFeとSiを主成分とする軟磁
性体のFe-Si膜で、飽和磁化4πMsが約16000〜18000Gau
ssの膜であり、2はやはりλが1×10-5以下でかつ耐摩
耗性に優れた非晶質磁性合金膜もしくはFe-Si-Al(セン
ダスト)膜である。又同図(b)の3はSiO2,Si3N4などの
層間絶縁膜である。ただし t1,t2<1000Å,t1<2t2 である事が後で実施例で示すように偏摩耗が生じない為
に重要な条件である。同図(b)において層間絶縁膜3
は、この積層磁性材料が使用される周波数領域に応じて
その表皮深さを考慮して入れればよく、同図(b)は一例
であって必らずしもこのように入れる必要はなく、周波
数に応じてもっと間隔をおいて入れてもよいし、又全膜
厚が使用される周波数での表皮深さより薄い場合は必ら
ずしも必要なものではない。Example The present invention enables a laminated magnetic material having high saturation magnetization and excellent wear resistance. An outline of the laminated magnetic body of the present invention is shown in FIG. In the figures (a) and (b), 1 is a Fe-Si film of a soft magnetic material whose main component is Fe and Si having a magnetostriction constant λ of 1 × 10 -5 or less, and a saturation magnetization of 4πM s is about 16000 ~. 18000Gau
A film of ss, 2 is an amorphous magnetic alloy film or Fe-Si-Al (sendust) film having a λ of 1 × 10 -5 or less and excellent in wear resistance. Reference numeral 3 in FIG. 3 (b) is an interlayer insulating film such as SiO 2 or Si 3 N 4 . However, t 1 , t 2 <1000Å and t 1 <2t 2 are important conditions because uneven wear does not occur as will be shown later in Examples. In the same figure (b), the interlayer insulating film 3
Can be taken in consideration of the skin depth depending on the frequency region in which this laminated magnetic material is used, and the figure (b) is an example, and it is not always necessary to insert it in this way. It may be more spaced depending on the frequency, and is not absolutely necessary if the total film thickness is less than the skin depth at the frequency used.
第1図に示した本発明の積層磁性材と第2図及び第3図
に示した従来の積層磁性材を比較的耐摩耗性に優れたセ
ラミック基板でサンドイッチしヘッドチップ形状にした
後、これを通常のVTRデッキに取付けテープを走らせ
て耐摩耗性試験を行なった。試験結果の概要を第4図に
示す。図中(a),(b)は第2図及び第3図に示した従来の
タイプの積層磁性材を基板でサンドイッチしたもの、図
中(c)は第1図(a)に示した本発明の積層磁性材を基板で
サンドイッチしたものである。具体的実施例は以下で詳
しく述べる事にするが、一般的傾向は第4図に示した通
りで、同図(a)の場合図中5で示したSiO2などの絶縁膜
は一般的に耐摩耗性が良い為、図中4で示したFe-Si膜
が偏摩耗しテープとのタッチが悪くなる。これを避ける
為に図中5のSiO2等の膜厚を薄くすると全体の摩耗がよ
り大きくなってしまい、逆にこの部分の膜厚を厚くする
と相対的にFe-Si磁性膜部の占める割合が減少し全体と
しての飽和磁化が減少すると共に、Fe-Si合金膜自体の
軟磁性がそこなわれる事が知られており好ましくない。
又同図(b)においては6で示されたNi-Fe膜が相対的に4
で示されたFe-Si膜部より薄い方が全体としての飽和磁
化も高く、Fe-Si膜の軟磁性も改良されて磁気特性には
好ましいが、どちらも耐摩耗性が低く基板部に比べて摩
耗料が大きくなってしまう欠点がある。同図(c)に示し
た本発明の磁性積層膜においては、Fe-Si膜1と非晶質
合金もしくはFe-Si-Al(センダスト)合金膜2の膜厚を
それぞれt1,t2とするとき、 t1<1000Å,かつt1<2t2 であるかぎり、同図(c)に示したように偏摩耗も全体の
摩耗も小さく押さえる事が出来る事がわかった。これは
t1自体を1000Å以下と十分小さくすると同時に、t1
<2t2とする事により耐摩耗性の低いFe-Si膜1が隣接
する耐摩耗性の良好な磁性膜部2により保護される為と
思われる。実際にt1>1000Åにしたり、t1<1000Åでも
t1>2t2とすなるとFe-Si膜部1が偏摩耗して同図(a)の
場合と同様な結果になる事がわかった。又膜部2の厚さ
t2を1000Åより厚くするとFe-Si膜の軟磁性がそこ
なわれる事がわかったので結局、 t1,t2<1000Åかつt1<2t2 ……(1) である事が望ましい。一方t2を500Å以下にすると、
膜部1のFe-Si膜の軟磁性がより改良される事がわかっ
たが、この時膜部2にFe-Si-Al合金を用いた場合これの
軟磁性が多少劣化する事がわかつた。しかし膜部2に非
晶質合金を用いた場合はt2<500Åでも軟磁性はそこ
なわれず、 t1,t2<500Åかつt1<2t2 ……(2) でより全体としての磁気特性が改善され、かつ(1)の条
件よりも更に膜部1の偏摩耗が小さく押さえられる事が
わかった。After sandwiching the laminated magnetic material of the present invention shown in FIG. 1 and the conventional laminated magnetic material shown in FIGS. 2 and 3 with a ceramic substrate having relatively excellent wear resistance to form a head chip, Was attached to a normal VTR deck and a tape was run to perform an abrasion resistance test. The outline of the test results is shown in FIG. In the figure, (a) and (b) are sandwiched between the conventional type laminated magnetic materials shown in FIGS. 2 and 3 with a substrate, and (c) is the book shown in FIG. 1 (a). The laminated magnetic material of the invention is sandwiched between substrates. Although specific examples will be described in detail below, the general tendency is as shown in FIG. 4, and in the case of FIG. 4 (a), the insulating film such as SiO 2 shown in FIG. Since the wear resistance is good, the Fe-Si film shown by 4 in the figure is unevenly worn and the touch with the tape is deteriorated. In order to avoid this, if the film thickness of SiO 2 etc. in Fig. 5 is made thin, the overall wear becomes larger, and conversely, if the film thickness at this part is made thicker, the proportion of the Fe-Si magnetic film portion occupies relatively. Is decreased, and the saturation magnetization as a whole is decreased, and soft magnetism of the Fe—Si alloy film itself is impaired, which is not preferable.
In addition, in FIG. 2B, the Ni-Fe film indicated by 6 is relatively 4
Thinner than the Fe-Si film shown in Fig. 3 has a higher saturation magnetization as a whole, and the soft magnetism of the Fe-Si film is also improved, which is preferable for magnetic properties, but both have low wear resistance compared to the substrate. There is a disadvantage that the wear material becomes large. In the magnetic laminated film of the present invention shown in FIG. 3C, the film thicknesses of the Fe—Si film 1 and the amorphous alloy or the Fe—Si—Al (sendust) alloy film 2 are t 1 and t 2 , respectively. It was found that, as long as t 1 <1000Å and t 1 <2t 2 , both the uneven wear and the overall wear can be suppressed to be small as shown in FIG. this is
At the same time the t 1 itself following a sufficiently small 1000 Å, t 1
It is considered that by setting <2 t 2 , the Fe-Si film 1 having low wear resistance is protected by the adjacent magnetic film portion 2 having good wear resistance. Actually t 1 > 1000Å, or even t 1 <1000Å
It has been found that when t 1 > 2t 2 , the Fe-Si film portion 1 is unevenly worn and results similar to those in the case of FIG. Also the thickness of the film part 2
Since it has been found that the soft magnetism of the Fe-Si film is impaired when t 2 is made thicker than 1000Å, it is desirable that t 1 , t 2 <1000Å and t 1 <2t 2 (1) after all. On the other hand, if t 2 is less than 500Å,
It was found that the soft magnetism of the Fe-Si film of the film part 1 was further improved, but it was found that when the Fe-Si-Al alloy was used for the film part 2, the soft magnetism of the Fe-Si film was slightly deteriorated. . However, when an amorphous alloy is used for the film part 2, soft magnetism is not impaired even at t 2 <500Å, and t 1 , t 2 <500Å and t 1 <2t 2 (2) It was found that the magnetic properties were improved, and the uneven wear of the film part 1 was suppressed to be smaller than the condition (1).
磁気特性の改善には熱処理が有効であるが、t1,t2が極
めて小さくなると熱処理中に膜1と膜2との間での相互
拡散が問題になる。この場合膜1と2の間に固溶しにく
いAg,Cu,Mgなどの膜を介在させるとこの相互拡散が押さ
えられる事がわかった。Heat treatment is effective for improving the magnetic properties, but when t 1 and t 2 are extremely small, interdiffusion between the film 1 and the film 2 becomes a problem during the heat treatment. In this case, it was found that the interdiffusion can be suppressed by interposing a film of Ag, Cu, Mg or the like, which is difficult to form a solid solution, between the films 1 and 2.
高透磁率を得るには磁歪定数λを1×10-5以下に押さえ
る必要があるがFe-Si合金膜ではSiが6.5重量パーセン
ト(残部Fe)付近でこれが満足される。なこFe-Si合
金膜は耐食性にやや難があるが、Cr,Ni,Nb,Ti,Ru等を添
加したり窒化する事によりこれは改良できる。ただしこ
の時添加量もしくは窒化量に対応してSi量を変化させ
てλを小さくする必要がある。In order to obtain high magnetic permeability, the magnetostriction constant λ needs to be suppressed to 1 × 10 −5 or less, but in the Fe—Si alloy film, this is satisfied when Si is around 6.5 weight percent (the balance is Fe). Although the Nako Fe-Si alloy film has a little difficulty in corrosion resistance, this can be improved by adding Cr, Ni, Nb, Ti, Ru, etc. or by nitriding. However, at this time, it is necessary to change the amount of Si in accordance with the amount of addition or the amount of nitriding to reduce λ.
Fe-Si-Al系ではいわゆるセンダスト組成領域でλ<1×1
0-5となるが、非晶質合金の場合は、Coを主成分とす
るCo-Mn-(Fe)-(Si)-B系,Co-Nb-Zr系などでλが十分小
さくなる事がわかっている。In the Fe-Si-Al system, λ <1 × 1 in the so-called sendust composition region.
0 -5 and becomes, in the case of amorphous alloy, Co-Mn- mainly composed of Co (Fe) - (Si) -B system, that Co-Nb-Zr-based λ, etc. is sufficiently small I know.
λ<1×10-5のFe-Si系で飽和磁化4πMsが16000〜18000
Gauss、上記Fe-Si-Al(センダスト)合金系及び非晶質
合金系で4πMsが9000〜10000Gaussであるので、この積
層材料の平均<4πMs>は13000〜14000Gaussで、かつ
相方の一層当りの膜厚を本特許のように極めて薄くして
行くと、実用上両合金系の平均的な特性が得られ、高透
磁率高飽和磁束密度を有する磁性材料が得られる事がわ
かった。Fe-Si system with λ <1 × 10 -5 and saturation magnetization 4πM s 16000 ~ 18000
Gauss, Fe-Si-Al (Sendust) alloy system and amorphous alloy system, 4πM s is 9000 ~ 10000Gauss, so the average <4πM s > of this laminated material is 13000 ~ 14000Gauss, It has been found that when the film thickness is made extremely thin as in this patent, the average characteristics of both alloy systems can be obtained practically, and a magnetic material having high permeability and high saturation magnetic flux density can be obtained.
以上より本発明積層磁性材料は耐摩耗性と高飽和磁化を
兼ね備えた軟磁性材料であり実用上極めて有用なもので
ある。以下具体的実施例により本発明の効果を示す事に
する。As described above, the laminated magnetic material of the present invention is a soft magnetic material having both wear resistance and high saturation magnetization, and is extremely useful in practice. The effects of the present invention will be shown by the following specific examples.
<実施例1> セラミック基板上にスパッター法にて6.5wt%Fe-Si合金
膜1とCo87Nb9Zr4(at%)非晶質合金膜2とを交互に積
層した。膜1,2の一層の膜厚t1,t2を変化させ種々の
多層膜を作成したが、その諸特性は以下の通りであっ
た。By laminating a <Example 1> 6.5wt% Fe-Si alloy film 1 and the Co 87 Nb 9 Zr 4 (at %) by sputtering on a ceramic substrate an amorphous alloy film 2 alternately. Various multilayer films were prepared by changing the film thicknesses t 1 and t 2 of the films 1 and 2, and the various characteristics were as follows.
なお4πMsは振動磁力計を用い、Hcは60HzでのB
−H曲線より求めた、耐摩耗テストは通常のVTRデッ
キに試料をヘッドチップ形状に加工して取付け、室温に
てメタルテープを100時間走行し、第5図に示したよ
うに基板面よりの膜1,2の偏摩耗量をTalyステップで
測定した。 Note that 4πM s uses a vibrating magnetometer, and H c is B at 60 Hz.
The abrasion resistance test, which was obtained from the −H curve, was performed by mounting the sample on a normal VTR deck after processing it into a head chip shape, running the metal tape for 100 hours at room temperature, and removing it from the substrate surface as shown in FIG. The amount of uneven wear of the films 1 and 2 was measured by the Taly step.
<実施例2> 実施例1と同様スパッター法にて6.5wt%Fe-Si合金膜1
とFe85Si9.6Al5.4(wt%)合金膜2とを交互に積層し同
様の実験を行なった。結果は以下の通りであった。<Example 2> A 6.5 wt% Fe-Si alloy film 1 was formed by the same sputtering method as in Example 1.
The same experiment was conducted by alternately stacking Fe 85 Si 9.6 Al 5.4 (wt%) alloy film 2. The results were as follows.
<実施例3> 実施例1と同様にスパッター法にて6.5wt%Si-Fe膜(膜
1)とNi80-Fe20(at%)合金膜(膜1′)を積層した試
料FP,6.5wt%Si-Fe膜(膜1)とSiO2膜(膜3)を積層
した試料FI,及び6.5wt%Si-Fe膜とCo87Nb9Zr4非晶質合
金膜(膜2)とSiO2膜とを積層した試料FAIを作成し、
実施例1と同様の実験をして特性の比較をした結果を下
に示す。 <Example 3> A sample FP, 6.5 in which a 6.5 wt% Si-Fe film (film 1) and a Ni 80 -Fe 20 (at%) alloy film (film 1 ') were laminated by the sputtering method as in Example 1 Sample FI in which a wt% Si-Fe film (film 1) and a SiO 2 film (film 3) are laminated, and a 6.5 wt% Si-Fe film, a Co 87 Nb 9 Zr 4 amorphous alloy film (film 2) and SiO Create a sample FAI in which two films are laminated,
The same experiment as in Example 1 was performed to compare the characteristics, and the results are shown below.
なお試料FI51,FP51,及びFAIの摩耗の様子は第4図
(a),(b),及び第6図のようになる。 Figure 4 shows the wear of samples FI51, FP51, and FAI.
It becomes like (a), (b), and FIG.
以上の結果より本発明は軟磁性と高飽和磁化、かつ耐摩
耗性を兼ね備えた積層磁性材である事がわかる。From the above results, it is understood that the present invention is a laminated magnetic material having both soft magnetism, high saturation magnetization, and wear resistance.
<実施例4> 実施例1と同様に6.5wt%Fe-Si膜1とCo87Nb9Zr4非晶質
合金膜2とをスパッター法により積層したものと、更に
これらの膜の間に12ÅのAg膜を介在させたものを4
00℃30分間回転磁界中で熱処理した。結果を以下に
示す。<Example 4> As in Example 1, a 6.5 wt% Fe-Si film 1 and a Co 87 Nb 9 Zr 4 amorphous alloy film 2 were laminated by a sputtering method, and 12 Å was provided between these films. 4 with an Ag film in between
Heat treatment was performed in a rotating magnetic field at 00 ° C. for 30 minutes. The results are shown below.
即ち熱処理によりt1,t2が300Å以上のものはより軟
磁性が改善されるが、t1,t2が50Åぐらいになると恐
らく膜1,2の間で相互拡散が生じて軟磁性がそこなわ
れると思われる。従って膜1,2の間に非固溶のAg膜
を介在させたものは相互拡散の障壁となり熱処理により
常に軟磁性が改善される事がわかる。又Cu,Mg等でもAg
と同様の効果がある事が実験よりわかった。 That is, the soft magnetism is more improved in the case where t 1 and t 2 are 300 Å or more by the heat treatment, but when t 1 and t 2 are about 50 Å, interdiffusion probably occurs between the films 1 and 2, and the soft magnetism is deteriorated. It seems to be done. Therefore, it is understood that the one in which the non-solid solution Ag film is interposed between the films 1 and 2 becomes a barrier of mutual diffusion and the soft magnetism is always improved by the heat treatment. Also Cu, Mg, etc.
Experiments showed that it had the same effect as.
発明の効果 本発明によれば、磁気特性に優れ、しかも高い耐摩耗性
を有する磁性材料を実現することができる。EFFECTS OF THE INVENTION According to the present invention, it is possible to realize a magnetic material having excellent magnetic properties and high wear resistance.
第1図は本発明の実施例における積層磁性材料の断面
図、第2図,第3図は従来の積層磁性材料の断面図、第
4図,第5図,第6図は耐摩耗試験後の試料の偏摩耗を
示す断面図である。 1……Fe-Si膜、2……非晶質合金もしくはFe-Si-Al合
金膜。FIG. 1 is a sectional view of a laminated magnetic material in an embodiment of the present invention, FIGS. 2 and 3 are sectional views of a conventional laminated magnetic material, and FIGS. 4, 5, and 6 are after an abrasion resistance test. FIG. 6 is a cross-sectional view showing uneven wear of the sample. 1 ... Fe-Si film, 2 ... Amorphous alloy or Fe-Si-Al alloy film.
Claims (5)
分とする第1の薄膜と、前記λが1×10-5以下で耐摩性
に優れた非晶質合金もしくはFe-Si-Al系合金の第2の薄
膜とを交互に積層するとともに、前記第1,第2の膜の
一層分の膜厚をそれぞれt1,t2とするとき、 t1,t2<1000Åでかつt1<2t2 である事を特徴とする積層磁性材料。1. A first thin film mainly composed of Fe and Si having a magnetostriction constant λ of 1 × 10 −5 or less, and an amorphous alloy having the λ of 1 × 10 −5 or less and excellent in abrasion resistance, or When the second thin films of the Fe-Si-Al-based alloy are alternately laminated and the film thicknesses of one layer of the first and second films are t 1 and t 2 , respectively, t 1 and t 2 <1000Å and t 1 <2t 2 < 1 > A laminated magnetic material characterized by the following:
とする特許請求の範囲第1項記載の積層磁性材料。2. The laminated magnetic material according to claim 1 , wherein t 1 , t 2 <500Å and t 1 <2t 2 .
特徴とする特許請求の範囲第1項記載の積層磁性材料。3. The laminated magnetic material according to claim 1, wherein an amorphous alloy film is used as the second film.
しにくい膜を適当な間隔で第1,第2の膜との間に配し
た事を特徴とする特許請求の範囲第1項記載の積層磁性
材料。4. A patent characterized in that a film which is hard to form a solid solution with Fe-Si such as Ag, Cu, and Mg and an amorphous alloy is arranged between the first and second films at an appropriate interval. The laminated magnetic material according to claim 1.
の間に配した事を特徴とする特許請求の範囲第2項〜第
4項のいずれかに記載の積層磁性材料。5. A laminated magnetic layer according to any one of claims 2 to 4, wherein an insulating film is arranged between the first and second films at an appropriate interval. material.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1082086A JPH0610848B2 (en) | 1986-01-21 | 1986-01-21 | Laminated magnetic material |
US07/298,788 US4897318A (en) | 1986-01-21 | 1989-01-18 | Laminated magnetic materials |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1082086A JPH0610848B2 (en) | 1986-01-21 | 1986-01-21 | Laminated magnetic material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62170008A JPS62170008A (en) | 1987-07-27 |
JPH0610848B2 true JPH0610848B2 (en) | 1994-02-09 |
Family
ID=11760990
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1082086A Expired - Lifetime JPH0610848B2 (en) | 1986-01-21 | 1986-01-21 | Laminated magnetic material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0610848B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0357706U (en) * | 1989-10-09 | 1991-06-04 | ||
WO1993011531A1 (en) * | 1991-12-02 | 1993-06-10 | Nikko Kyodo Company, Limited | Thin film magnetic head |
-
1986
- 1986-01-21 JP JP1082086A patent/JPH0610848B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS62170008A (en) | 1987-07-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH0722044B2 (en) | High frequency high permeability magnetic material | |
US4943879A (en) | Thin film magnetic head including magnetic layers having high saturation magnetic flux density and metal film for avoiding deterioration during manufacturing | |
EP0219714B1 (en) | Multi-layered ferromagnetic film and method of manufacturing the same | |
JPH0610848B2 (en) | Laminated magnetic material | |
US4897318A (en) | Laminated magnetic materials | |
JP2950917B2 (en) | Soft magnetic thin film | |
JPH09293207A (en) | Magnetic head | |
JP2690893B2 (en) | Laminated magnetic thin film and magnetic head using the same | |
JPH05263170A (en) | Magnetic alloy film and its production | |
JPH1116120A (en) | Thin film magnetic head and magnetic recording / reproducing device | |
JPS6197906A (en) | High permeability artificial lattice magnetic thin film | |
JP2995784B2 (en) | Magnetic head | |
JP2790159B2 (en) | Thin-film magnetic head | |
JPH0821502B2 (en) | Thin film permanent magnet | |
KR0179266B1 (en) | Magnetic thin film structure for magnetic head | |
JP2002123906A (en) | Thin film magnetic head | |
JP2639719B2 (en) | Magnetic film for magnetic head | |
JP2675062B2 (en) | Ferromagnetic thin film and manufacturing method thereof | |
JP2000114041A (en) | Thin-film laminated body manufacture thereof and thin- film transformer using the same, thin-film inductor, and thin-film magnetic head | |
JP2677226B2 (en) | Magnetoresistive thin film magnetic head | |
JP2696120B2 (en) | Magnetic multilayer film | |
JPH01143312A (en) | Amorphous soft magnetic laminated film | |
JP2551008B2 (en) | Soft magnetic thin film | |
JPH09330503A (en) | Magnetic head | |
JPS62291719A (en) | Magnetic recording medium |