JP7217165B2 - チャックテーブル及び検査装置 - Google Patents
チャックテーブル及び検査装置 Download PDFInfo
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- JP7217165B2 JP7217165B2 JP2019024850A JP2019024850A JP7217165B2 JP 7217165 B2 JP7217165 B2 JP 7217165B2 JP 2019024850 A JP2019024850 A JP 2019024850A JP 2019024850 A JP2019024850 A JP 2019024850A JP 7217165 B2 JP7217165 B2 JP 7217165B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating or a hardness or a material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
- B23K26/032—Observing, e.g. monitoring, the workpiece using optical means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/0823—Devices involving rotation of the workpiece
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
- B23K26/0853—Devices involving movement of the workpiece in at least in two axial directions, e.g. in a plane
- B23K26/0861—Devices involving movement of the workpiece in at least in two axial directions, e.g. in a plane in at least in three axial directions
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K37/00—Auxiliary devices or processes, not specially adapted for a procedure covered by only one of the other main groups of this subclass
- B23K37/02—Carriages for supporting the welding or cutting element
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K37/00—Auxiliary devices or processes, not specially adapted for a procedure covered by only one of the other main groups of this subclass
- B23K37/04—Auxiliary devices or processes, not specially adapted for a procedure covered by only one of the other main groups of this subclass for holding or positioning work
- B23K37/0426—Fixtures for other work
- B23K37/0452—Orientable fixtures
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0064—Devices for the automatic drive or the program control of the machines
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
- B28D5/0094—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being of the vacuum type
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/56—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26 semiconducting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
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- Analytical Chemistry (AREA)
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- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Dicing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Description
本発明の実施形態1に係るチャックテーブル及び検査装置を図面に基いて説明する。図1は、実施形態1に係るチャックテーブル及び検査装置を備える加工装置の構成例を示す斜視図である。図2は、図1に示された加工装置の加工対象の被加工物を備えるフレームユニットの斜視図である。図3は、実施形態1に係る検査装置の構成例を示す斜視図である。図4は、実施形態1に係るチェックテーブルの構成例を示す斜視図である。図5は、実施形態1に係るチェックテーブルの構成例の断面図である。
本発明の実施形態2に係るチャックテーブル及び検査装置を図面に基いて説明する。図11は、実施形態2に係るチャックテーブルを備える検査装置が加工装置に搭載された構成例を示す斜視図である。なお、図11は、実施形態1と同一部分に同一符号を付して説明を省略する。
本発明の実施形態1及び実施形態2の変形例1に係るチャックテーブル及び検査装置を図面に基いて説明する。図12は、変形例1に係るチャックテーブル及び検査装置の検査対象の被加工物を備えるフレームユニットの斜視図である。図13は、図12に示されたフレームユニットがチャックテーブルに吸引保持された状態を示す斜視図である。なお、図12及び図13は、実施形態1及び実施形態2と同一部分に同一符号を付して説明を省略する。
本発明の実施形態1及び実施形態2の変形例2に係るチャックテーブル及び検査装置を図面に基いて説明する。図14は、変形例2に係る検査装置が搭載された加工装置の構成例の斜視図である。なお、図14は、実施形態1及び実施形態2と同一部分に同一符号を付して説明を省略する。
2 保持面
3 保持部
4 枠体
4-1 開口
5 吸引孔
7 内周面
10,10-2,10-3 検査装置
11 カメラユニット
12 X軸移動ユニット(移動ユニット)
40 移動ユニット
120 切削ユニット(加工ユニット)
120-3 レーザー光線照射ユニット(加工ユニット)
121 切削ブレード
121-3 レーザー光線
140-3 Y軸移動ユニット(移動ユニット)
200 被加工物
205 テープ
206 フレーム
207 開口
210 フレームユニット
Claims (4)
- テープを介してフレームの開口に被加工物が固定されたフレームユニットを保持するチャックテーブルであって、
テープを介して被加工物を保持する保持面を有し、透明体からなる保持部と、
該保持部の周囲に立設して該保持部を囲繞する枠体と、
該枠体の内周面に設けられた吸引孔と、を備え、
該枠体の内径は、該フレームの内径以下であり、
該枠体の開口を該フレームユニットのテープで覆った状態で該吸引孔から吸引力が伝達され、テープと該保持面の間の大気が排出されテープと該保持面が密着し、該フレームユニットの被加工物が該保持面に固定されるチャックテーブル。 - 該保持部の該保持面は、全面が平坦で、吸引用の溝が形成されていない請求項1に記載のチャックテーブル。
- テープを介してフレームの開口に被加工物が固定されたフレームユニットを保持面で保持する保持する保持テーブルと、
該保持テーブルに保持された被加工物を該保持面側から該保持面越しに撮像するカメラユニットと、
該保持テーブルと該カメラユニットとを該保持面と平行なX軸方向又は該X軸方向に垂直なY軸方向に相対的に送る移動ユニットとを備える検査装置であって、
該保持テーブルは、請求項1に記載のチャックテーブルである検査装置。 - 該検査装置は、被加工物を切削ブレード又はレーザー光線で加工する加工ユニットを備える加工装置に搭載され、加工ユニットは、該保持テーブルで保持された被加工物を加工し、該加工ユニットで加工する被加工物を該保持テーブル越しに撮像して検査する請求項3に記載の検査装置。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019024850A JP7217165B2 (ja) | 2019-02-14 | 2019-02-14 | チャックテーブル及び検査装置 |
US16/773,358 US11152246B2 (en) | 2019-02-14 | 2020-01-27 | Chuck table and inspection apparatus |
SG10202000762WA SG10202000762WA (en) | 2019-02-14 | 2020-01-28 | Chuck table and inspection apparatus |
CN202010084513.0A CN111564406A (zh) | 2019-02-14 | 2020-02-10 | 卡盘工作台和检查装置 |
TW109104332A TWI821521B (zh) | 2019-02-14 | 2020-02-12 | 卡盤台及檢查裝置 |
KR1020200016890A KR102735299B1 (ko) | 2019-02-14 | 2020-02-12 | 척 테이블 및 검사 장치 |
DE102020201863.4A DE102020201863B4 (de) | 2019-02-14 | 2020-02-14 | Einspanntisch und Untersuchungsvorrichtung |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019024850A JP7217165B2 (ja) | 2019-02-14 | 2019-02-14 | チャックテーブル及び検査装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020136357A JP2020136357A (ja) | 2020-08-31 |
JP7217165B2 true JP7217165B2 (ja) | 2023-02-02 |
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Application Number | Title | Priority Date | Filing Date |
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JP2019024850A Active JP7217165B2 (ja) | 2019-02-14 | 2019-02-14 | チャックテーブル及び検査装置 |
Country Status (7)
Country | Link |
---|---|
US (1) | US11152246B2 (ja) |
JP (1) | JP7217165B2 (ja) |
KR (1) | KR102735299B1 (ja) |
CN (1) | CN111564406A (ja) |
DE (1) | DE102020201863B4 (ja) |
SG (1) | SG10202000762WA (ja) |
TW (1) | TWI821521B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7587099B2 (ja) | 2021-03-22 | 2024-11-20 | 滋 坂手 | 畳等に内装備する連結敷設器・装置 |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7370265B2 (ja) * | 2020-01-30 | 2023-10-27 | 株式会社ディスコ | 加工方法及び加工装置 |
JP7430449B2 (ja) * | 2020-02-04 | 2024-02-13 | 株式会社ディスコ | 加工装置 |
CN112059422A (zh) * | 2020-09-12 | 2020-12-11 | 北京航空航天大学 | 用于半导体晶圆研磨的激光加工设备 |
TWI759915B (zh) * | 2020-10-19 | 2022-04-01 | 財團法人金屬工業研究發展中心 | 加工裝置之進給結構 |
CN113523591B (zh) * | 2021-06-25 | 2023-08-18 | 深圳市大族半导体装备科技有限公司 | 一种可变载台及激光切割设备 |
JP2023102048A (ja) * | 2022-01-11 | 2023-07-24 | Towa株式会社 | 加工装置、及び、加工品の製造方法 |
TW202414547A (zh) | 2022-07-13 | 2024-04-01 | 日商三星鑽石工業股份有限公司 | 刻劃台及刻劃裝置 |
CN115376950B (zh) * | 2022-08-25 | 2024-09-03 | 魅杰光电科技(上海)有限公司 | 一种用于切割后的半导体晶圆级芯片透射检测载台系统 |
CN118180660B (zh) * | 2024-05-16 | 2024-09-06 | 江苏盛捷半导体材料有限公司 | 一种半导体器件加工用激光切割设备 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2006281434A (ja) | 2005-03-11 | 2006-10-19 | Disco Abrasive Syst Ltd | ウェーハの保持機構 |
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