JP7282461B2 - 検査装置、及び加工装置 - Google Patents
検査装置、及び加工装置 Download PDFInfo
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- JP7282461B2 JP7282461B2 JP2019077853A JP2019077853A JP7282461B2 JP 7282461 B2 JP7282461 B2 JP 7282461B2 JP 2019077853 A JP2019077853 A JP 2019077853A JP 2019077853 A JP2019077853 A JP 2019077853A JP 7282461 B2 JP7282461 B2 JP 7282461B2
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- 238000007689 inspection Methods 0.000 claims description 191
- 230000007246 mechanism Effects 0.000 claims description 106
- 238000003384 imaging method Methods 0.000 claims description 102
- 238000012545 processing Methods 0.000 claims description 71
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- 239000011347 resin Substances 0.000 claims description 4
- 229920005989 resin Polymers 0.000 claims description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 2
- 229910052731 fluorine Inorganic materials 0.000 claims description 2
- 239000011737 fluorine Substances 0.000 claims description 2
- 230000032258 transport Effects 0.000 description 22
- 238000004140 cleaning Methods 0.000 description 15
- 238000005520 cutting process Methods 0.000 description 15
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- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 2
- 229910002601 GaN Inorganic materials 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 2
- 230000004075 alteration Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
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- 239000011521 glass Substances 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
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- 230000004048 modification Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000007306 turnover Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N2021/0106—General arrangement of respective parts
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N2021/8411—Application to online plant, process monitoring
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30148—Semiconductor; IC; Wafer
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Quality & Reliability (AREA)
- Theoretical Computer Science (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Signal Processing (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Dicing (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Investigating Or Analysing Biological Materials (AREA)
Description
1a 表面
1b 裏面
3 ストリート
3a 加工痕
5 デバイス
7 テープ
9 フレーム
11 フレームユニット
2 加工装置
4 基台
6 カセット支持台
8 搬送レール
10 開口
10a 防塵防滴カバー
12 移動テーブル
14 被加工物保持ユニット
16,42 搬送ユニット
18,44,66a,66b,86,98a,98b ガイドレール
20,46,68a,68b,88,100a,100b 移動体
22,48,70,90,102a,102b ボールネジ
24,50,72,92,104a,104b パルスモータ
26,52 腕部
28 吸引部
30 プッシュプル機構
32 加工ユニット
34 切削ブレード
36 スピンドルハウジング
38 開口
40 洗浄装置
54 保持機構
56 検査装置
58 被検査物保持機構
60 基台
62 開口
64a,64b 移動ユニット
74,84,94a,94b 支持構造
76 載置部
76a 載置面
78 テープ保持部
78a 吸引溝
78b テープ吸引保持面
80 フレーム支持部
82 撮像機構
96a,96b 昇降機構
106a,106b 撮像ユニット
108 連結部
110 表示部
112 警報ランプ
Claims (5)
- テープが貼着され該テープを介してフレームに装着された被検査物を検査する検査装置であって、
上下に露出した透明体を有する載置部を有し、該透明体の上面が該テープを介して該被検査物が載置される載置面となり、該載置面に載せられた該被検査物を保持できる被検査物保持機構と、
該載置部の上方に配設された第1の撮像ユニットと、該載置部の下方に配設された第2の撮像ユニットと、該第1の撮像ユニット及び該第2の撮像ユニットを連結する連結部と、を有する撮像機構と、
該撮像機構を該載置部に対して該載置面に平行な方向に相対的に移動できる移動ユニットと、を備え、
該撮像機構は、該載置部の該載置面に載せられ該被検査物保持機構に保持された被検査物を該第1の撮像ユニットにより上面側から撮像できるとともに該第2の撮像ユニットにより下面側から撮像でき、
該撮像機構は、該被検査物の該上面側と該下面側の同一位置を同時に撮像できることを特徴とする検査装置。 - 該被検査物保持機構は、
該被検査物保持機構に載せられた該被検査物の外周と、該被検査物に該テープを介して装着された該フレームの内周と、の間の領域において該テープを吸引保持できるテープ吸引保持面を該載置部の外周側に備えるテープ保持部と、
該テープ保持部の周囲に配置され、該フレームを支持できるフレーム支持部と、を備えることを特徴とする請求項1に記載の検査装置。 - 該載置部の該載置面の高さは、該テープ保持部の該テープ吸引保持面の高さより低いことを特徴とする請求項2に記載の検査装置。
- 該載置部の該載置面は、フッ素樹脂でコーティングされていることを特徴とする請求項1に記載の検査装置。
- 請求項1乃至4のいずれか一に記載の該検査装置と、
被加工物を保持する被加工物保持ユニットと、
該被加工物保持ユニットで保持された該被加工物を加工する加工ユニットと、
該被加工物保持ユニットから該被検査物保持機構の該載置部へと該被加工物を搬送する搬送ユニットと、を備えた加工装置であって、
該検査装置は、該加工ユニットで加工された該被加工物を該被検査物として該撮像機構により撮像できることを特徴とする加工装置。
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019077853A JP7282461B2 (ja) | 2019-04-16 | 2019-04-16 | 検査装置、及び加工装置 |
KR1020200036083A KR20200121727A (ko) | 2019-04-16 | 2020-03-25 | 검사 장치, 및 가공 장치 |
SG10202002976XA SG10202002976XA (en) | 2019-04-16 | 2020-03-30 | Inspecting apparatus and processing apparatus including the same |
US16/837,067 US11105752B2 (en) | 2019-04-16 | 2020-04-01 | Inspecting apparatus and processing apparatus including the same |
MYPI2020001736A MY195430A (en) | 2019-04-16 | 2020-04-03 | Inspecting Apparatus And Processing Apparatus Including The Same |
CN202010278411.2A CN111834243A (zh) | 2019-04-16 | 2020-04-10 | 检查装置和加工装置 |
TW109112458A TWI868124B (zh) | 2019-04-16 | 2020-04-14 | 檢查裝置,及加工裝置 |
DE102020204746.4A DE102020204746A1 (de) | 2019-04-16 | 2020-04-15 | Überprüfvorrichtung und bearbeitungsvorrichtung mit derselben |
Applications Claiming Priority (1)
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JP2019077853A JP7282461B2 (ja) | 2019-04-16 | 2019-04-16 | 検査装置、及び加工装置 |
Publications (2)
Publication Number | Publication Date |
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JP2020177975A JP2020177975A (ja) | 2020-10-29 |
JP7282461B2 true JP7282461B2 (ja) | 2023-05-29 |
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JP2019077853A Active JP7282461B2 (ja) | 2019-04-16 | 2019-04-16 | 検査装置、及び加工装置 |
Country Status (7)
Country | Link |
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US (1) | US11105752B2 (ja) |
JP (1) | JP7282461B2 (ja) |
KR (1) | KR20200121727A (ja) |
CN (1) | CN111834243A (ja) |
DE (1) | DE102020204746A1 (ja) |
MY (1) | MY195430A (ja) |
SG (1) | SG10202002976XA (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
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JP7254416B2 (ja) | 2019-01-11 | 2023-04-10 | 株式会社ディスコ | 被加工物の切削方法 |
JP7370265B2 (ja) * | 2020-01-30 | 2023-10-27 | 株式会社ディスコ | 加工方法及び加工装置 |
CN112875216B (zh) * | 2021-01-18 | 2022-09-30 | 惠州市德赛自动化技术有限公司 | 外观检测设备 |
US20240273869A1 (en) * | 2021-07-19 | 2024-08-15 | Agency For Science, Technology And Research | Data collection apparatus and computer-implemented data collection method using same |
JP2023127749A (ja) * | 2022-03-02 | 2023-09-14 | 株式会社ディスコ | 検査装置 |
JP2023128800A (ja) * | 2022-03-04 | 2023-09-14 | 株式会社ディスコ | 分割装置 |
JP2024000700A (ja) * | 2022-06-21 | 2024-01-09 | 株式会社ディスコ | 位置合わせ方法及び基準位置の更新方法 |
CN115157153B (zh) * | 2022-08-22 | 2023-10-17 | 深圳市赛马精密科技有限公司 | 一种激光检测定位结构 |
CN116106320B (zh) * | 2023-02-20 | 2023-09-19 | 苏州天准科技股份有限公司 | 用于笔记本电脑外壳表面的检测装置及检测方法 |
CN119156694A (zh) * | 2023-04-12 | 2024-12-17 | 株式会社东光高岳 | 工件输送装置及工件检查装置 |
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JP2019025583A (ja) | 2017-07-28 | 2019-02-21 | 株式会社ディスコ | 切削方法 |
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-
2019
- 2019-04-16 JP JP2019077853A patent/JP7282461B2/ja active Active
-
2020
- 2020-03-25 KR KR1020200036083A patent/KR20200121727A/ko active Pending
- 2020-03-30 SG SG10202002976XA patent/SG10202002976XA/en unknown
- 2020-04-01 US US16/837,067 patent/US11105752B2/en active Active
- 2020-04-03 MY MYPI2020001736A patent/MY195430A/en unknown
- 2020-04-10 CN CN202010278411.2A patent/CN111834243A/zh active Pending
- 2020-04-15 DE DE102020204746.4A patent/DE102020204746A1/de active Pending
Patent Citations (6)
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JP2008053624A (ja) | 2006-08-28 | 2008-03-06 | Matsushita Electric Ind Co Ltd | アライメント装置 |
JP2012256749A (ja) | 2011-06-09 | 2012-12-27 | Disco Abrasive Syst Ltd | 切削装置 |
JP2014022575A (ja) | 2012-07-18 | 2014-02-03 | Disco Abrasive Syst Ltd | 加工装置 |
JP2017527990A (ja) | 2014-07-29 | 2017-09-21 | エルジー シルトロン インコーポレイテッド | ウェハーの欠陥測定装置 |
JP2018107309A (ja) | 2016-12-27 | 2018-07-05 | 株式会社ディスコ | 粘着テープ、被加工物の加工方法、及び粘着テープ貼着装置 |
JP2019025583A (ja) | 2017-07-28 | 2019-02-21 | 株式会社ディスコ | 切削方法 |
Also Published As
Publication number | Publication date |
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US20200333261A1 (en) | 2020-10-22 |
SG10202002976XA (en) | 2020-11-27 |
KR20200121727A (ko) | 2020-10-26 |
MY195430A (en) | 2023-01-20 |
JP2020177975A (ja) | 2020-10-29 |
US11105752B2 (en) | 2021-08-31 |
TW202040715A (zh) | 2020-11-01 |
DE102020204746A1 (de) | 2020-10-22 |
CN111834243A (zh) | 2020-10-27 |
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