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JP7113907B2 - 組成物、膜、光学フィルタ、固体撮像素子、赤外線センサ、光学フィルタの製造方法、カメラモジュール、化合物、及び、分散組成物 - Google Patents

組成物、膜、光学フィルタ、固体撮像素子、赤外線センサ、光学フィルタの製造方法、カメラモジュール、化合物、及び、分散組成物 Download PDF

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JP7113907B2
JP7113907B2 JP2020548284A JP2020548284A JP7113907B2 JP 7113907 B2 JP7113907 B2 JP 7113907B2 JP 2020548284 A JP2020548284 A JP 2020548284A JP 2020548284 A JP2020548284 A JP 2020548284A JP 7113907 B2 JP7113907 B2 JP 7113907B2
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JPWO2020059484A1 (ja
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賢 鮫島
季彦 松村
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Fujifilm Corp
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Fujifilm Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/02—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain containing an odd number of >CH- or >C[alkyl]- groups
    • C09B23/04—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain containing an odd number of >CH- or >C[alkyl]- groups one >CH- group, e.g. cyanines, isocyanines, pseudocyanines
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B55/00—Azomethine dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • C09B57/04—Isoindoline dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02—Boron compounds

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optical Filters (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2020548284A 2018-09-18 2019-09-04 組成物、膜、光学フィルタ、固体撮像素子、赤外線センサ、光学フィルタの製造方法、カメラモジュール、化合物、及び、分散組成物 Active JP7113907B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018173869 2018-09-18
JP2018173869 2018-09-18
PCT/JP2019/034691 WO2020059484A1 (ja) 2018-09-18 2019-09-04 組成物、膜、光学フィルタ、固体撮像素子、赤外線センサ、光学フィルタの製造方法、カメラモジュール、化合物、及び、分散組成物

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JPWO2020059484A1 JPWO2020059484A1 (ja) 2021-08-30
JP7113907B2 true JP7113907B2 (ja) 2022-08-05

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JP (1) JP7113907B2 (zh)
KR (1) KR102513131B1 (zh)
TW (1) TWI841599B (zh)
WO (1) WO2020059484A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102388487B1 (ko) * 2019-02-28 2022-04-19 주식회사 엘지화학 화합물, 이를 포함하는 색변환 필름, 백라이트 유닛 및 디스플레이 장치
US11937494B2 (en) * 2019-08-28 2024-03-19 Universal Display Corporation Organic electroluminescent materials and devices
JP7416950B2 (ja) * 2020-07-15 2024-01-17 富士フイルム株式会社 インクセット及び印刷物
WO2022216449A1 (en) * 2021-04-07 2022-10-13 Becton, Dickinson And Company Water-soluble yellow green absorbing dyes

Citations (6)

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JP2012224593A (ja) 2011-04-21 2012-11-15 Adeka Corp 新規化合物、近赤外線吸収剤及びこれを含有する合成樹脂組成物
JP2018025433A (ja) 2016-08-09 2018-02-15 コニカミノルタ株式会社 コアシェル型蛍光色素含有ナノ粒子およびその製造方法
WO2018043260A1 (ja) 2016-08-31 2018-03-08 富士フイルム株式会社 硬化性組成物、平版印刷版原版、及び、平版印刷版の作製方法
JP2018048217A (ja) 2016-09-20 2018-03-29 富士フイルム株式会社 顔料分散液の製造方法および硬化性組成物の製造方法
JP2018123093A (ja) 2017-02-01 2018-08-09 公立大学法人首都大学東京 ジベンゾピロメテンホウ素キレート化合物、近赤外光吸収色素、光電変換素子、近赤外光センサー及び撮像素子
WO2018155050A1 (ja) 2017-02-24 2018-08-30 富士フイルム株式会社 近赤外線カットフィルタ、固体撮像素子、カメラモジュールおよび画像表示装置

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US7387856B2 (en) 2005-06-20 2008-06-17 Industrial Technology Research Institute Display comprising liquid crystal droplets in a hydrophobic binder
TWI582176B (zh) 2012-07-19 2017-05-11 住友化學股份有限公司 染料用鹽
KR101852804B1 (ko) * 2014-05-01 2018-04-27 후지필름 가부시키가이샤 적외선 센서, 근적외선 흡수 조성물, 감광성 수지 조성물, 화합물, 근적외선 흡수 필터 및 촬상 장치
JP6480728B2 (ja) * 2014-12-26 2019-03-13 住友化学株式会社 化合物
CN108291874B (zh) 2015-11-10 2021-07-27 香港科技大学 聚集诱导发光应用于掺杂型聚合物：玻璃化转变温度的检测和相分离形貌可视化
JP6896718B2 (ja) * 2016-05-27 2021-06-30 富士フイルム株式会社 硬化性組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子、画像表示装置、及び硬化膜の製造方法
NL1042130B1 (nl) * 2016-11-08 2018-05-23 Comforthome B V Expansie Wol

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Publication number Priority date Publication date Assignee Title
JP2012224593A (ja) 2011-04-21 2012-11-15 Adeka Corp 新規化合物、近赤外線吸収剤及びこれを含有する合成樹脂組成物
JP2018025433A (ja) 2016-08-09 2018-02-15 コニカミノルタ株式会社 コアシェル型蛍光色素含有ナノ粒子およびその製造方法
WO2018043260A1 (ja) 2016-08-31 2018-03-08 富士フイルム株式会社 硬化性組成物、平版印刷版原版、及び、平版印刷版の作製方法
JP2018048217A (ja) 2016-09-20 2018-03-29 富士フイルム株式会社 顔料分散液の製造方法および硬化性組成物の製造方法
JP2018123093A (ja) 2017-02-01 2018-08-09 公立大学法人首都大学東京 ジベンゾピロメテンホウ素キレート化合物、近赤外光吸収色素、光電変換素子、近赤外光センサー及び撮像素子
WO2018155050A1 (ja) 2017-02-24 2018-08-30 富士フイルム株式会社 近赤外線カットフィルタ、固体撮像素子、カメラモジュールおよび画像表示装置

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Organometallics，2009年，Vol.28, No.6，pp.4845-4851

Also Published As

Publication number Publication date
WO2020059484A1 (ja) 2020-03-26
TWI841599B (zh) 2024-05-11
KR102513131B1 (ko) 2023-03-23
KR20210009375A (ko) 2021-01-26
TW202026365A (zh) 2020-07-16
JPWO2020059484A1 (ja) 2021-08-30

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