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WO2020059484A1 - 組成物、膜、光学フィルタ、固体撮像素子、赤外線センサ、光学フィルタの製造方法、カメラモジュール、化合物、及び、分散組成物 - Google Patents

組成物、膜、光学フィルタ、固体撮像素子、赤外線センサ、光学フィルタの製造方法、カメラモジュール、化合物、及び、分散組成物 Download PDF

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Publication number
WO2020059484A1
WO2020059484A1 PCT/JP2019/034691 JP2019034691W WO2020059484A1 WO 2020059484 A1 WO2020059484 A1 WO 2020059484A1 JP 2019034691 W JP2019034691 W JP 2019034691W WO 2020059484 A1 WO2020059484 A1 WO 2020059484A1
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Prior art keywords
group
compound
composition
formula
dye structure
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Application number
PCT/JP2019/034691
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English (en)
French (fr)
Japanese (ja)
Inventor
賢 鮫島
季彦 松村
Original Assignee
富士フイルム株式会社
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Application filed by 富士フイルム株式会社 filed Critical 富士フイルム株式会社
Priority to KR1020207036406A priority Critical patent/KR102513131B1/ko
Priority to JP2020548284A priority patent/JP7113907B2/ja
Publication of WO2020059484A1 publication Critical patent/WO2020059484A1/ja

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/02—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain containing an odd number of >CH- or >C[alkyl]- groups
    • C09B23/04—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain containing an odd number of >CH- or >C[alkyl]- groups one >CH- group, e.g. cyanines, isocyanines, pseudocyanines
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B55/00—Azomethine dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • C09B57/04—Isoindoline dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02—Boron compounds

Definitions

  • the present disclosure relates to a composition, a film, an optical filter, a solid-state imaging device, an infrared sensor, a method for manufacturing an optical filter, a camera module, a compound, and a dispersion composition.
  • Video cameras, digital still cameras, mobile phones with a camera function, and the like use CCDs (charge-coupled devices) and CMOSs (complementary metal oxide semiconductors), which are solid-state imaging devices for color images.
  • CCDs charge-coupled devices
  • CMOSs complementary metal oxide semiconductors
  • These solid-state imaging devices use a silicon photodiode having sensitivity to infrared rays in a light receiving portion thereof. For this reason, visibility correction may be performed using an infrared cut filter.
  • Patent Document 1 describes a salt of an anion represented by the formula (1) and an onium cation derived from a dye capable of forming a salt with the anion.
  • Z 1 and Z 2 each independently represent a group having two substituents each releasing a proton from a monovalent proton donating substituent.
  • Patent Document 2 discloses a toner composition containing a 5,5′-spirobi (5H-dibenzoborole) salt having a specific structure. Further, Patent Document 3 describes a boron compound having a specific structure that exhibits aggregation-induced emission (AIE).
  • AIE aggregation-induced emission
  • an infrared cut filter has been used as a flat film.
  • pattern formation of an infrared cut filter has been studied. For example, it has been studied to form and use each pixel of a color filter (for example, a red pixel, a blue pixel, a green pixel, etc.) on an infrared cut filter.
  • a color filter for example, a red pixel, a blue pixel, a green pixel, etc.
  • the present inventors have studied and found that infrared absorbing dyes used in infrared cut filters and the like do not have sufficient durability, especially light resistance.
  • the problem to be solved by one embodiment of the present invention is to provide a composition having excellent light fastness.
  • a problem to be solved by another embodiment of the present invention is to provide a film using the composition, an optical filter, a solid-state imaging device, an infrared sensor, a method for manufacturing an optical filter, and a camera module. is there.
  • a problem to be solved by another embodiment of the present invention is to provide a novel compound.
  • Still another object of another embodiment of the present invention is to provide a dispersion composition having excellent light resistance.
  • a composition comprising a compound having a structure represented by the following formula (1) and at least one compound selected from the group consisting of a binder and a curable compound.
  • X each independently represents a single bond or a linking group
  • Z 1 and Z 2 each independently represent a group forming an aliphatic ring or an aromatic ring
  • R 9 and R 10 In at least one selected from the group, a group having a dye structure is bonded or coordinated, and R 9 or R 10 in which the group having the dye structure is not bonded or coordinated represents a substituent, R 9 and R 10 may combine with each other to form a ring together with the boron atom.
  • R 11 represents a hydrogen atom, an alkyl group, or an aryl group.
  • ⁇ 3> The composition according to ⁇ 1> or ⁇ 2>, wherein the compound having the structure represented by the formula (1) is a compound represented by the following formula (2).
  • X represents a single bond or a linking group
  • R 1 to R 8 each independently represent a hydrogen atom or a substituent, and at least one selected from the group consisting of R 9 and R 10 A group having a dye structure is bonded or coordinated, and R 9 or R 10 to which the group having the dye structure is not bonded or coordinated represents a substituent, and R 9 and R 10 are bonded to each other. May form a ring together with the boron atom.
  • ⁇ 5> The composition according to any one of ⁇ 1> to ⁇ 4>, wherein the compound having the structure represented by the formula (1) has a maximum absorption wavelength of 650 nm to 1,500 nm.
  • the dye structure in the group having a dye structure is a pyrrolopyrrole dye structure, a pyrromethene dye structure, a squarylium dye structure, a croconium dye structure, an indigo dye structure, an anthraquinone dye structure, a diimmonium dye structure, a phthalocyanine dye structure, or a naphthalocyanine dye.
  • ⁇ 7> The composition according to any one of ⁇ 1> to ⁇ 6>, including the curable compound, and further including a photopolymerization initiator.
  • ⁇ 8> The composition according to any one of ⁇ 1> to ⁇ 7>, wherein the binder contains a binder polymer.
  • ⁇ 9> A film comprising the composition according to any one of ⁇ 1> to ⁇ 8> or a film obtained by curing the composition.
  • An optical filter having the film according to ⁇ 9>.
  • the optical filter according to ⁇ 10> which is an infrared cut filter or an infrared transmission filter.
  • ⁇ 12> A solid-state imaging device having the film according to ⁇ 9>.
  • ⁇ 13> An infrared sensor having the film according to ⁇ 9>.
  • ⁇ 14> a step of forming a composition layer by applying the composition according to any one of ⁇ 1> to ⁇ 8> on a support; and exposing the composition layer to a pattern. Forming a pattern by developing and removing unexposed portions after the exposing step.
  • ⁇ 17> A compound represented by the following formula (P1).
  • R P1 and R P2 each independently represent an alkyl group, an aryl group, a heteroaryl group or a group represented by the following formula (P2)
  • R P3 to R P6 each independently represent a cyano group, an acyl group, an alkoxy group, A carbonyl group, an alkyl group, an arylsulfinyl group or a heteroaryl group
  • R P7 to R P10 each independently represent a hydrogen atom or a substituent
  • R P11 represents a hydrogen atom, an alkyl group or an aryl group
  • To p4 each independently represent an integer of 0 to 4.
  • X P11 represents an m-phenylene group, a p-phenylene group, a divalent fused polycyclic aromatic ring group in which two or more aromatic rings are fused, or a divalent heteroaromatic ring group
  • L P11 represents Represents a single bond or a divalent linking group
  • Y P11 represents a substituent
  • * represents a linking site to a pyrrolopyrrole ring in formula (P1).
  • a dispersion composition comprising a compound having a structure represented by the following formula (1) and at least one compound selected from the group consisting of a solvent, a binder, and a curable compound.
  • X each independently represents a single bond or a linking group
  • Z 1 and Z 2 each independently represent a group forming an aliphatic ring or an aromatic ring
  • R 9 and R 10 In at least one selected from the group, a group having a dye structure is bonded or coordinated, and R 9 or R 10 in which the group having the dye structure is not bonded or coordinated represents a substituent, R 9 and R 10 may combine with each other to form a ring together with the boron atom.
  • a composition having excellent light resistance can be provided. Further, according to another embodiment of the present invention, it is possible to provide a film using the composition, an optical filter, a solid-state imaging device, an infrared sensor, a method for manufacturing an optical filter, and a camera module. Further, according to another embodiment of the present invention, a novel compound can be provided. According to still another embodiment of the present invention, a dispersion composition having excellent light resistance can be provided.
  • FIG. 1 is a schematic diagram illustrating an embodiment of an infrared sensor according to the present disclosure.
  • total solids refers to the total mass of components excluding the solvent from the total composition of the composition.
  • solid content is a component excluding the solvent, and may be a solid or a liquid at 25 ° C., for example.
  • the notation not indicating substituted or unsubstituted includes not only a group having no substituent but also a group having a substituent.
  • the “alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
  • exposure includes not only exposure using light but also drawing using a particle beam such as an electron beam or an ion beam, unless otherwise specified.
  • the light used for exposure generally includes an emission line spectrum of a mercury lamp, deep ultraviolet rays represented by excimer lasers, extreme ultraviolet rays (EUV light), X-rays, active rays such as electron beams, or radiation.
  • EUV light extreme ultraviolet rays
  • active rays such as electron beams, or radiation.
  • “to” is used to mean that the numerical values described before and after it are included as the lower limit and the upper limit.
  • (meth) acrylate represents both or any of acrylate and methacrylate
  • (meth) acryl represents both or any of acryl and methacryl
  • “Acryloyl” represents both or any of acryloyl and methacryloyl.
  • Me in the chemical formula is a methyl group
  • Et is an ethyl group
  • Pr is a propyl group
  • Bu is a butyl group
  • Ac is an acetyl group
  • Bn is a benzyl group
  • Ph is a phenyl group. Show.
  • the term "step” is included not only in an independent step but also in the case where the intended action of the step is achieved even if it cannot be clearly distinguished from other steps. .
  • “mass%” and “wt%” have the same meaning, and “mass part” and “part by weight” have the same meaning.
  • a combination of two or more preferred embodiments is a more preferred embodiment.
  • the transmittance in the present disclosure is a transmittance at 25 ° C. unless otherwise specified.
  • the weight average molecular weight and the number average molecular weight are defined as values in terms of polystyrene measured by gel permeation chromatography (GPC).
  • composition includes a compound having a structure represented by the following formula (1), and at least one compound selected from the group consisting of a binder and a curable compound.
  • X each independently represents a single bond or a linking group
  • Z 1 and Z 2 each independently represent a group forming an aliphatic ring or an aromatic ring
  • R 9 and R 10 In at least one selected from the group, a group having a dye structure is bonded or coordinated, and R 9 or R 10 in which the group having the dye structure is not bonded or coordinated represents a substituent, Further, R 9 and R 10 may combine with each other to form a ring together with the boron atom.
  • the composition according to the present embodiment can be suitably used as a composition for pattern formation.
  • the pattern forming composition may be a negative pattern forming composition or a positive pattern forming composition, but from the viewpoint of resolution, the negative pattern forming composition It is preferably an object. Further, the composition according to this embodiment can be suitably used as an infrared absorbing composition.
  • the infrared-absorbing dye used in the infrared cut filter or the like has insufficient light resistance, is decomposed by light to reduce the infrared-absorbing ability, and is obtained from a composition containing the infrared-absorbing dye. Many cured films were insufficient in durability, particularly in light resistance.
  • the composition described above can provide a composition having excellent light resistance. Although the mechanism of action of this excellent effect is not clear, it is presumed as follows.
  • the compound having the structure represented by the formula (1) includes a boron complex having a dye structure, and the compound has a ring structure having a boron atom as a ring member, whereby the dye structure associates, particularly, J-association. It is presumed that light resistance is improved.
  • each component of the composition according to the present disclosure will be described.
  • the composition according to the present disclosure includes a compound having a structure represented by the above formula (1).
  • the compound having the structure represented by the above formula (1) may have only one structure represented by the above formula (1) or may have two or more structures. From the viewpoint of heat resistance, it is preferable to have one to four structures represented by the above formula (1), more preferably one to three structures, and one or two structures. It is particularly preferred to have.
  • a bond or a bond is formed in at least one selected from the group consisting of R 9 and R 10 in the two structures represented by the above formula (1).
  • the dye structure in the group having a coordinated dye structure may be the same dye structure or a different dye structure, but from the viewpoint of light resistance, and heat resistance, the dye structure may be the same. preferable.
  • the molecular weight of the compound having the structure represented by the above formula (1) is preferably 2,500 or less, more preferably 300 or more and 2,500 or less, and preferably 400 or more and 2,000 or less. More preferably, it is particularly preferably 500 or more and 2,000 or less.
  • the compound having the structure represented by the above formula (1) is preferably an infrared absorbing dye.
  • the infrared absorbing dye means a material having at least absorption in an infrared region.
  • the compound having the structure represented by the above formula (1) preferably has a wavelength of 650 nm to 1,500 nm, more preferably has a wavelength of 680 nm to 1,300 nm, and has a wavelength of 700 nm to 1,100 nm. It is more preferable to have a maximum absorption wavelength in the range.
  • the compound having the structure represented by the above formula (1) may be a pigment or a dye, but is preferably a pigment from the viewpoints of light resistance and heat resistance. More preferably, it is a pigment.
  • the dye structure in the group having a dye structure by bonding or coordinating in at least one selected from the group consisting of R 9 and R 10 is light fastness, and From the viewpoint of heat resistance, pyrrolopyrrole dye structure, pyromethene dye structure, squarylium dye structure, croconium dye structure, indigo dye structure, anthraquinone dye structure, diimmonium dye structure, phthalocyanine dye structure, naphthalocyanine dye structure, polymethine dye structure, xanthene It is preferably at least one dye structure selected from the group consisting of a dye structure, a quinacridone dye structure, an azo dye structure, and a quinoline dye structure, and a pyrrolopyrrole dye structure, a
  • the portion other than the dye structure in the group having the dye structure is not particularly limited and may be any structure, and a structure as described in a specific example described below is preferable.
  • the substituent in R 9 or R 10 to which the group having the dye structure is not bonded or coordinated is preferably an alkyl group or an aryl group, and more preferably an aryl group.
  • R 9 or R 10 is a substituent, and the boron atom in the structure represented by the above formula (1) becomes a boron anion, it may have a counter cation.
  • the counter cation is not particularly limited, and may be any known cation.
  • the boron atom in the compound having the structure represented by the formula (1) preferably has at least a coordination bond from the viewpoint of light resistance and heat resistance, and has three covalent bonds and one coordination bond. It is more preferred to have. Further, from the viewpoints of light resistance and heat resistance, one of R 9 and R 10 in the compound having the structure represented by the above formula (1) is bonded to the dye structure via a covalent bond, and the other is linked to the dye structure. Is preferably a coordination bond, one is bonded to the dye structure by a covalent bond, the other is more preferably a coordination bond with a hetero atom, one is bonded to the dye structure by a covalent bond, The other is particularly preferably a coordination bond with a nitrogen atom.
  • the coordination bond does not need to be always coordinated, and the coordination bond may be temporarily lost due to heat rotation or vibrational motion of the molecule.
  • the linking group in X of the formula (1) is preferably an oxygen atom (O), a sulfur atom (S), an alkylene group, a nitrogen atom (N or NR 11 ), an alkenylene group, or the like.
  • R 11 represents a hydrogen atom, an alkyl group or an aryl group.
  • the number of carbon atoms (the number of carbon atoms) of the linking group in X in the formula (1) is not particularly limited, but is preferably 0 to 8 carbon atoms, more preferably 0 to 2 carbon atoms, and More preferably, it is 0.
  • two Xs bonded to the boron atom are more preferably a single bond or —O— from the viewpoints of light resistance and heat resistance, and are a single bond. Is particularly preferred.
  • X not bonded to a boron atom is particularly preferably a single bond, —O—, or —S— from the viewpoints of light resistance and heat resistance.
  • the boron atom in the formula (1) is preferably a 5- or 6-membered ring from the viewpoints of light resistance and heat resistance.
  • Z 1 and Z 2 may have a substituent on the aliphatic ring or aromatic ring to be formed, but preferably do not have a substituent. Examples of the substituent include an alkyl group, an aryl group, an alkoxy group, and a halogen atom. Further, it is preferable that Z 1 and Z 2 are the same group from the viewpoint of light resistance and heat resistance.
  • the compound having the structure represented by the above formula (1) is preferably a compound having a structure represented by the following formula (2) from the viewpoint of light resistance and heat resistance.
  • X represents a single bond or a linking group
  • R 1 to R 8 each independently represent a hydrogen atom or a substituent, and at least one selected from the group consisting of R 9 and R 10
  • a group having a dye structure is bonded or coordinated
  • R 9 or R 10 to which the group having the dye structure is not bonded or coordinated represents a substituent
  • R 9 and R 10 are mutually linked. It may combine to form a ring with the boron atom.
  • R 9 and R 10 in Formula (2) has the same meaning as R 9 and R 10 in the formula (1), a preferable embodiment thereof is also the same.
  • R 11 represents a hydrogen atom, an alkyl group or an aryl group.
  • R 1 to R 8 are each independently preferably a hydrogen atom, a halogen atom, an alkyl group, an aryl group or an alkoxy group, more preferably a hydrogen atom or an alkyl group, and more preferably a hydrogen atom. It is particularly preferred that there is.
  • the compound having the structure represented by the above formula (1) is particularly preferably a compound represented by the following formula (P1) from the viewpoints of light resistance and heat resistance.
  • R P1 and R P2 each independently represent an alkyl group, an aryl group, a heteroaryl group or a group represented by the following formula (P2)
  • R P3 to R P6 each independently represent a cyano group, an acyl group, an alkoxy group, A carbonyl group, an alkyl group, an arylsulfinyl group or a heteroaryl group
  • R P7 to R P10 each independently represent a hydrogen atom or a substituent
  • R P11 represents a hydrogen atom, an alkyl group or an aryl group
  • To p4 each independently represent an integer of 0 to 4.
  • X P11 represents an m-phenylene group, a p-phenylene group, a divalent fused polycyclic aromatic ring group in which two or more aromatic rings are fused, or a divalent heteroaromatic ring group
  • L P11 represents Represents a single bond or a divalent linking group
  • Y P11 represents a substituent
  • * represents a linking site to a pyrrolopyrrole ring in formula (P1).
  • X P1 , X P2 , X P4 and X P5 are each independently preferably a single bond or —O— from the viewpoints of light resistance and heat resistance, and are a single bond. Is particularly preferred. Further, it is preferable that X P1 , X P2 , X P4 and X P5 in the formula (P1) are the same group. It is preferable that X P3 and X P6 in the formula (P1) are each independently a single bond, —O—, or —S— from the viewpoints of light resistance and heat resistance. Further, X P3 and X P6 in the formula (P1) are preferably the same group.
  • R P1 and R P2 in the formula (P1) are each independently preferably an aryl group, a heteroaryl group or a group represented by the above formula (P2), and particularly preferably an aryl group or a group represented by the above formula (P2). preferable.
  • the alkyl group, aryl group and heteroaryl group represented by R P1 and R P2 may have a substituent or may be unsubstituted. Examples of the substituent include an alkoxy group, a hydroxy group, a halogen atom, a cyano group, a nitro group, —OCOR 11p , —SOR 12p , and —SO 2 R 13p .
  • R 11p to R 13p each independently represent a hydrocarbon group or a heteroaryl group.
  • substituents include those described in paragraphs 0020 to 0022 of JP-A-2009-263614. Among them, as the substituent, an alkoxy group, a hydroxy group, a cyano group, a nitro group, —OCOR 11p , —SOR 12p , and —SO 2 R 13p are preferable.
  • the aryl group in R P1 and R P2 is an aryl group having an alkoxy group having a branched alkyl group as a substituent, an aryl group having a hydroxy group as a substituent, or a group represented by —OCOR 11p as a substituent.
  • the aryl group preferably has The carbon number of the branched alkyl group is preferably 3 to 30, more preferably 3 to 20.
  • X P11 in the formula (P2) is preferably an m-phenylene group, a p-phenylene group, a naphthylene group, a furandiyl group, or a thiophendiyl group.
  • a phenylene group or a naphthylene group is more preferred, an m-phenylene group or a p-phenylene group is still more preferred, and a p-phenylene group is particularly preferred.
  • L P11 in the formula (P2) is preferably a divalent linking group from the viewpoint of dispersibility.
  • the carbon number of the divalent linking group in LP11 is preferably 1 or more and 30 or less, more preferably 1 or more and 20 or less, and still more preferably 1 or more and 10 or less from the viewpoint of dispersibility.
  • the divalent linking group in LP11 is preferably an alkylene group, an ester bond, an ether bond, or an arylene group from the viewpoint of dispersibility.
  • the divalent linking group in LP11 is preferably a group having an oxygen atom from the viewpoint of dispersibility, and is a group having at least one structure selected from the group consisting of an ester bond and an ether bond. More preferably, it is more preferably a group having an ester bond.
  • Y P11 in the formula (P2) is, from the viewpoint of dispersibility, an imide structure, an acid anhydride structure, a cyano group, an alkylsulfone group, an arylsulfone group, an alkylsulfoxide group, an arylsulfoxide group, a sulfonamide group, an amide group, a urethane group.
  • urea group and a group having at least one structure selected from the group consisting of a hydroxy group; an imide structure, an acid anhydride structure, a cyano group, an alkylsulfone group, an arylsulfone group, an alkylsulfoxide Group, an arylsulfoxide group, a sulfonamide group, an amide group, a urethane group, and a urea group, and more preferably a group having at least one structure selected from the group consisting of an N-substituted imide structure and an acid anhydride.
  • cyano group, alkyl sulfone group, aryl sulfone group, alkyl sulfoxy More preferably, it is a group having at least one structure selected from the group consisting of a side group, an arylsulfoxide group, an N-disubstituted sulfonamide group, and an N-disubstituted amide group, Particularly preferred is a group having at least one structure selected from the group consisting of an N-disubstituted sulfonamide group and an N-disubstituted amide group, most preferably a group having an N-substituted imide structure. preferable.
  • Y P11 it preferably has no acidic group described below in the dye derivative, a group having a basic group or a salt structure.
  • Y P11 is preferably a group represented by any of the following formulas Y-1 to Y-14 from the viewpoint of dispersibility, and is preferably a group represented by any of the following formulas Y-1 to Y-8 It is more preferably a group represented by any of the following formulas Y-1 to Y-3, and further preferably a group represented by the following formula Y-1 or Y-2 A group is particularly preferred, and a group represented by the following formula Y-1 is most preferred.
  • R Y each independently represent a hydrogen atom, an alkyl group or an aryl group, if having an R Y 2 or more in one formula, two R Y is an alkylene group Alternatively, a ring may be formed by an alkylene group -O-alkylene group, and * represents a linking site to LP11 in the formula (P2).
  • R Y is preferably an alkyl group or an aryl group, more preferably an alkyl group, further preferably an alkyl group having 1 to 8 carbon atoms, and a methyl group. Is particularly preferred.
  • R P3 to R P6 in the formula (P1) are each independently a cyano group or a heteroaryl group from the viewpoint of infrared absorption.
  • two of R P3 to R P6 are preferably cyano groups, and R P5 and R P6 are more preferably cyano groups.
  • two of R P3 to R P6 are preferably a heteroaryl group, and more preferably R P3 and R P4 are a heteroaryl group.
  • the heteroaryl group in R P3 to R P6 preferably has at least a nitrogen atom from the viewpoint of infrared absorption.
  • the heteroaryl group in R P3 to R P6 is preferably a heteroaryl group in which a benzene ring or a naphthalene ring is fused to a heteroaryl ring from the viewpoint of infrared absorption, and a benzene ring is fused to a heteroaryl ring.
  • a heteroaryl group having a benzoxazole ring structure, a benzothiazole ring structure, or a quinoxaline ring structure and more preferably a 2-quinoxalyl group or 6,7-dichloro group
  • Particularly preferred is a -2-quinoxalyl group.
  • the heteroaryl ring in the heteroaryl group in R P3 to R P6 is preferably a 5-membered ring or a 6-membered ring, and may be an oxazole ring, a thiazole ring, a pyridine ring, a pyrimidine ring, or a pyrazine ring. More preferably, it is an oxazole ring, a thiazole ring, or a pyrazine ring.
  • R P7 to R P10 in the formula (P1) are each independently preferably a hydrogen atom, a halogen atom, an alkyl group, an aryl group or an alkoxy group, more preferably a hydrogen atom or an alkyl group, and more preferably a hydrogen atom. It is particularly preferred that there is.
  • p1 to p4 are each independently preferably an integer of 0 to 2, more preferably 0 or 1, and particularly preferably 0.
  • Specific examples of the compound having the structure represented by the above formula (1) preferably include compounds used in Examples described later.
  • the compound having the structure represented by the above formula (1) is particulate from the viewpoint of dispersibility. Is preferred.
  • the compound having the structure represented by the above formula (1) is a pigment, preferably an infrared absorbing pigment
  • the volume average particle diameter of the compound having the structure represented by the above formula (1) is determined by the dispersibility. From the viewpoint, it is preferably from 1 nm to 500 nm, more preferably from 1 nm to 100 nm, even more preferably from 1 nm to 50 nm.
  • the volume average particle diameter of the compound having the structure represented by the above formula (1) is measured using MICROTRAC UPA 150 manufactured by Nikkiso Co., Ltd.
  • composition according to the present disclosure may contain one kind of the compound having the structure represented by the above formula (1), or may contain two or more kinds.
  • the content of the compound having the structure represented by the above formula (1) is preferably 1% by mass to 90% by mass with respect to the total solid content of the composition from the viewpoint of infrared absorption and dispersibility.
  • the lower limit is more preferably 5% by mass or more, and even more preferably 10% by mass or more.
  • the upper limit is more preferably 80% by mass or less, and even more preferably 70% by mass or less.
  • the composition according to the present disclosure contains at least one compound selected from the group consisting of a binder and a curable compound, and preferably contains a binder from the viewpoint of film-forming properties.
  • the binder is preferably a binder polymer from the viewpoints of film formability and dispersibility.
  • a dispersant may be included as a binder polymer.
  • binder polymer examples include (meth) acrylic resin, epoxy resin, ene-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyphenylene resin, and polyarylene ether phosphine oxide resin.
  • One of these resins may be used alone, or two or more thereof may be used in combination.
  • a norbornene resin can be preferably used from the viewpoint of improving heat resistance.
  • Examples of commercially available norbornene resins include ARTON series (for example, ARTON F4520) manufactured by JSR Corporation.
  • Commercially available polyimide resins include Neoprim (registered trademark) series (for example, C3450) manufactured by Mitsubishi Gas Chemical Company, Ltd.
  • Examples of the epoxy resin include an epoxy resin which is a glycidyl etherified product of a phenol compound, an epoxy resin which is a glycidyl etherified product of various novolak resins, an alicyclic epoxy resin, an aliphatic epoxy resin, a heterocyclic epoxy resin, and a glycidyl ester resin.
  • Epoxy resin glycidylamine-based epoxy resin, epoxy resin obtained by glycidylation of halogenated phenols, condensate of silicon compound having epoxy group with other silicon compound, polymerizable unsaturated compound having epoxy group and other Copolymers with other polymerizable unsaturated compounds and the like can be mentioned.
  • Epoxy resins include Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, G-01758 (JP An oil-containing polymer manufactured by Yui Co., Ltd.) can also be used.
  • As the urethane resin 8UH-1006 and 8UH-1012 (manufactured by Taisei Fine Chemical Co., Ltd.) can also be used.
  • binder polymer examples include resins described in Examples of International Publication No. WO 2016/088645, resins described in JP-A-2017-57265, resins described in JP-A-2017-32685, and others. Resins described in JP-A-2017-075248 and resins described in JP-A-2017-66240 can also be used, and the contents thereof are incorporated herein. Further, a resin having a fluorene skeleton can be preferably used as the binder polymer. Regarding the resin having a fluorene skeleton, the description in U.S. Patent Application Publication No. 2017/0102610 can be referred to, and the contents thereof are incorporated herein.
  • the weight average molecular weight (Mw) of the binder polymer is preferably from 2,000 to 2,000,000.
  • the upper limit is more preferably 1,000,000 or less, and even more preferably 500,000 or less.
  • the lower limit is more preferably 3,000 or more, and still more preferably 5,000 or more.
  • the content of the binder polymer is preferably from 10% by mass to 80% by mass, more preferably from 15% by mass to 60% by mass, based on the total solid content of the composition.
  • the composition may include only one type of resin, or may include two or more types of resin. When two or more types are included, the total amount is preferably within the above range.
  • the composition according to the present disclosure may include a dispersant.
  • a dispersant for example, a resin having an amine group (such as polyamidoamine and a salt thereof), an oligoimine-based resin, a polycarboxylic acid and a salt thereof, a high-molecular unsaturated acid ester, a modified polyurethane, a modified polyester, Modified poly (meth) acrylate, (meth) acrylic copolymer, and naphthalenesulfonic acid formalin condensate].
  • a polymer dispersant for example, a resin having an amine group (such as polyamidoamine and a salt thereof), an oligoimine-based resin, a polycarboxylic acid and a salt thereof, a high-molecular unsaturated acid ester, a modified polyurethane, a modified polyester, Modified poly (meth) acrylate, (meth) acrylic copolymer, and naphthalenesulf
  • the polymer dispersant can be further classified into a linear polymer, a terminal-modified polymer, a graft polymer, and a block polymer based on its structure. Further, as the polymer dispersant, a resin having an acid value of 60 mgKOH / g or more (more preferably, an acid value of 60 mgKOH / g or more and 300 mgKOH / g or less) can also be suitably mentioned.
  • Examples of the terminal-modified polymer include polymers having a phosphate group at a terminal described in JP-A-3-112992 and JP-A-2003-533455, and JP-A-2002-273191.
  • Examples of the polymer include a polymer having a sulfonic acid group at a terminal and a polymer having a partial skeleton or a heterocyclic ring of an organic dye described in JP-A-9-77994.
  • Examples of the graft-type polymer include reaction products of a poly (lower alkylene imine) and a polyester described in JP-A-54-37082, JP-A-8-507960, JP-A-2009-258668, and the like.
  • Copolymers of a macromonomer and an acid group-containing monomer described in gazettes and the like are exemplified.
  • a known macromonomer can be used, and a macromonomer AA-6 manufactured by Toagosei Co., Ltd. (polymethacryl having a methacryloyl group as a terminal group) Acid), AS-6 (polystyrene whose terminal group is a methacryloyl group), AN-6S (copolymer of styrene and acrylonitrile whose terminal group is a methacryloyl group), AB-6 (polystyrene whose terminal group is a methacryloyl group) Butyl acrylate), Praxel FM5 (addition product of 2-hydroxyethyl methacrylate of 5 mol equivalent of ⁇ -caprolactone), FA10L (product of addition of 10 mol equivalent of ⁇ -caprolactone of 2-hydroxyethyl acrylate) manufactured by Daicel Chemical Industries, Ltd.
  • polyesters described in JP-A-2-272009. Macromonomer and the like polyester-based macromonomers having excellent flexibility and solvent affinity are particularly preferable from the viewpoints of the dispersibility and dispersion stability of the pigment dispersion and the developability of the composition using the pigment dispersion.
  • the polyester-based macromonomer represented by the polyester-based macromonomer described in JP-A-2-272009 is most preferred.
  • block type polymer block type polymers described in JP-A-2003-49110, JP-A-2009-52010 and the like are preferable.
  • the resin is also available as a commercial product, and specific examples of such a resin include “Disperbyk-101 (polyamidoamine phosphate), 107 (carboxylate), 110, 111 (acid) manufactured by BYK Chemie.
  • an alkali-soluble resin described below can also be used as a dispersant.
  • the alkali-soluble resin include (meth) acrylic acid copolymer, itaconic acid copolymer, crotonic acid copolymer, maleic acid copolymer, partially esterified maleic acid copolymer, and carboxylic acid in the side chain.
  • examples thereof include an acidic cellulose derivative and a resin obtained by modifying a polymer having a hydroxyl group with an acid anhydride, and a (meth) acrylic acid copolymer is particularly preferable.
  • the resin preferably contains a resin having a polyester chain, and more preferably contains a resin having a polycaprolactone chain.
  • the polyester chain interacts with R 1 and R 2 of the compound represented by the formula (1), the polyester chain is more excellent in dispersibility.
  • the resin preferably an acrylic resin
  • the resin preferably has a structural unit having an ethylenically unsaturated group from the viewpoint of dispersibility, transparency, and suppression of film defects due to foreign matter.
  • the ethylenically unsaturated group is not particularly limited, but is preferably a (meth) acryloyl group.
  • the resin has an ethylenically unsaturated group, particularly a (meth) acryloyl group in a side chain
  • the resin has a divalent linkage having an alicyclic structure between the main chain and the ethylenically unsaturated group. It preferably has a group.
  • the content of the dispersant includes a compound represented by the formula (1) and a pigment, dye, or pigment derivative other than the compound represented by the formula (1)
  • the compound represented by the formula (1) And 1 to 100 parts by mass, preferably 5 to 90 parts by mass, based on 100 parts by mass of the total content of pigments, dyes and pigment derivatives other than the compound represented by the formula (1). Is more preferably 10 parts by mass to 80 parts by mass.
  • the composition according to the present disclosure preferably contains an alkali-soluble resin as a binder polymer from the viewpoint of developability.
  • the alkali-soluble resin is a linear organic high molecular polymer, which promotes at least one alkali solubility in a molecule (preferably, a molecule having an acrylic copolymer or a styrene copolymer as a main chain). It can be appropriately selected from alkali-soluble resins having a group. From the viewpoint of heat resistance, a polyhydroxystyrene resin, a polysiloxane resin, an acrylic resin, an acrylamide resin, and an acryl / acrylamide copolymer resin are preferred.
  • an acrylic / acrylamide copolymer resin examples include, for example, a carboxy group, a phosphoric acid group, a sulfonic acid group, and a phenolic hydroxyl group. Possible ones are preferred, and (meth) acrylic acid is particularly preferred. These acid groups may be used alone or in combination of two or more.
  • the alkali-soluble resin the description in paragraphs 0558 to 0571 of JP-A-2012-208494 (paragraphs 0685 to 0700 of the corresponding US Patent Application Publication No. 2012/0235099) can be referred to, and the contents thereof are described in the present specification. Will be incorporated into the book.
  • a resin having a structural unit represented by the following formula (ED) is also preferable.
  • RE1 and RE2 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent, and z represents 0 or 1.
  • the hydrocarbon group having 1 to 25 carbon atoms represented by R E1 and R E2 is not particularly limited, and examples thereof include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group and an isobutyl group.
  • a primary or secondary hydrocarbon group which is hardly eliminated by an acid or heat such as a methyl group, an ethyl group, a cyclohexyl group, and a benzyl group, is particularly preferable from the viewpoint of heat resistance.
  • R E1 and R E2 may be the same type of substituent or different substituents.
  • Examples of the compound forming the structural unit represented by the formula (ED) include dimethyl-2,2 ′-[oxybis (methylene)] bis-2-propenoate and diethyl-2,2 ′-[oxybis (methylene) ] Bis-2-propenoate, di (n-propyl) -2,2 '-[oxybis (methylene)] bis-2-propenoate, di (n-butyl) -2,2'-[oxybis (methylene)] bis -2-propenoate, di (t-butyl) -2,2 '-[oxybis (methylene)] bis-2-propenoate, di (isobutyl) -2,2'-[oxybis (methylene)] bis-2-propenoate And the like.
  • dimethyl-2,2 '-[oxybis (methylene)] bis-2-propenoate is particularly preferred.
  • the alkali-soluble resin may have a structural unit other than the structural unit represented by the formula (ED).
  • the monomer forming the structural unit include, for example, aryl (meth) acrylate, alkyl (meth) acrylate, and polyethyleneoxy (meth) acrylate that impart oil solubility from the viewpoint of ease of handling such as solubility in a solvent. It is also preferable to include it as a copolymer component, and it is more preferable to use aryl (meth) acrylate or alkyl (meth) acrylate.
  • monomers having a carboxy group such as (meth) acrylic acid and itaconic acid containing an acidic group
  • monomers having a phenolic hydroxyl group such as N-hydroxyphenylmaleimide, maleic anhydride and itaconic anhydride
  • a monomer having a carboxylic anhydride group such as an acid is contained as a copolymer component, and (meth) acrylic acid is more preferable.
  • the alkali-soluble resin include a structural unit represented by the formula (ED), a structural unit formed from benzyl methacrylate, and at least one monomer selected from the group consisting of methyl methacrylate and methacrylic acid.
  • a resin having the following structural unit Regarding the resin having the structural unit represented by the formula (ED), the description in paragraphs 0079 to 999 of JP-A-2012-198408 can be referred to, and the contents thereof are incorporated herein.
  • the weight average molecular weight (Mw) of the alkali-soluble resin is preferably from 2,000 to 50,000.
  • the lower limit is more preferably 5,000 or more, and even more preferably 7,000 or more.
  • the upper limit is more preferably 45,000 or less, and still more preferably 43,000 or less.
  • the acid value of the alkali-soluble resin is preferably from 30 to 200 mgKOH / g.
  • the lower limit is more preferably at least 50 mgKOH / g, even more preferably at least 70 mgKOH / g.
  • the upper limit is more preferably equal to or less than 150 mgKOH / g, and still more preferably equal to or less than 120 mgKOH / g.
  • the acid value in the present disclosure is measured by the following method.
  • the acid value represents the mass of potassium hydroxide required to neutralize acidic components per 1 g of solid content.
  • AT-510 trade name: AT-510, manufactured by Kyoto Electronics Industry Co., Ltd.
  • the acid value is calculated by the following equation, using the inflection point of the titration pH curve as the end point of the titration.
  • A 56.11 ⁇ Vs ⁇ 0.1 ⁇ f / w
  • Vs amount of 0.1 mol / L aqueous sodium hydroxide solution required for titration (mL)
  • f titer of 0.1 mol / L aqueous sodium hydroxide solution
  • w Measurement sample mass (g) (solid content conversion)
  • the composition according to the present disclosure preferably contains a curable compound from the viewpoint of pattern formability, and more preferably contains a curable compound and further contains a photopolymerization initiator described below.
  • a curable compound a compound having a polymerizable group (hereinafter, also referred to as “polymerizable compound”) is preferable.
  • the curable compound may be in any chemical form such as a monomer, oligomer, prepolymer, polymer, and the like.
  • curable compound examples include paragraphs 0070 to 0191 of JP-A-2014-41318 (corresponding paragraphs 0071 to 0192 of WO 2014/017669), paragraphs 0045 to 0216 of JP-A-2014-32380, and the like. Can be referred to, and the contents thereof are incorporated in the specification of the present application.
  • Commercially available urethane resins having a methacryloyl group include 8UH-1006 and 8UH-1012 (all manufactured by Taisei Fine Chemical Co., Ltd.).
  • the curable compound is preferably a polymerizable compound.
  • the polymerizable compound may be a radical polymerizable compound or a cationic polymerizable compound.
  • a compound containing a polymerizable group such as an ethylenically unsaturated group or a cyclic ether group (epoxy, oxetane) may be used. No. Among them, ethylenically unsaturated compounds are preferred.
  • a vinyl group, styryl group, (meth) acryloyl group, and (meth) allyl group are preferable.
  • the polymerizable compound may be a monofunctional compound having one polymerizable group or a polyfunctional polymerizable compound having two or more polymerizable groups. Is preferable, and a polyfunctional (meth) acrylate compound is more preferable. When the composition contains the polyfunctional polymerizable compound, the film strength can be improved.
  • the curable compound include monofunctional (meth) acrylate compounds, polyfunctional (meth) acrylate compounds (preferably 3 to 6 functional (meth) acrylate compounds), polybasic acid-modified acrylic oligomers, epoxy resins, and polyfunctional epoxy resins. Resins.
  • an ethylenically unsaturated compound can be suitably used.
  • the description in paragraphs 0033 to 0034 of JP-A-2013-253224 can be referred to, and the contents thereof are incorporated herein.
  • Examples of the ethylenically unsaturated compound include ethyleneoxy-modified pentaerythritol tetraacrylate (a commercially available product is NK Ester ATM-35E, manufactured by Shin-Nakamura Chemical Co., Ltd.) and dipentaerythritol triacrylate (a commercially available product is KAYARAD D -330, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetraacrylate (commercially available: KAYARAD D-320, manufactured by Nippon Kayaku Co., Ltd.) dipentaerythritol penta (meth) acrylate (commercially available: KAYARAD D-310, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa (meth) acrylate (commercially available products: KAYARAD DPHA, manufactured by Nippon Kayaku Co., Ltd., A-DPH-12E, Shin-Nakamur
  • the ethylenically unsaturated compound may have an acid group such as a carboxy group, a sulfonic acid group, and a phosphoric acid group.
  • Examples of the ethylenically unsaturated compound having an acid group include esters of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid.
  • a compound obtained by reacting a non-aromatic carboxylic anhydride with an unreacted hydroxyl group of an aliphatic polyhydroxy compound to have an acid group is preferable, and in this ester, the aliphatic polyhydroxy compound is preferably pentaerythritol. Or, it is dipentaerythritol.
  • the acid value of the ethylenically unsaturated compound having an acid group is preferably from 0.1 mgKOH / g to 40 mgKOH / g.
  • the lower limit is more preferably 5 mgKOH / g or more.
  • the upper limit is more preferably 30 mgKOH / g or less.
  • a compound having an epoxy group or an oxetanyl group can be used as the curable compound.
  • the compound having an epoxy group or an oxetanyl group include a polymer having an epoxy group in a side chain, and a monomer or oligomer having two or more epoxy groups in a molecule.
  • a bisphenol A type epoxy resin, a bisphenol F type epoxy resin, a phenol novolak type epoxy resin, a cresol novolak type epoxy resin, an aliphatic epoxy resin and the like can be mentioned.
  • monofunctional or polyfunctional glycidyl ether compounds are also exemplified, and polyfunctional aliphatic glycidyl ether compounds are preferable.
  • the weight average molecular weight is preferably from 500 to 5,000,000, more preferably from 1,000 to 500,000.
  • commercially available products may be used, or those obtained by introducing an epoxy group into a side chain of a polymer may be used.
  • Cyclomer P ACA 200M, ACA 230AA, ACA Z250, ACA Z251, ACA Z300, and ACA Z320 all manufactured by Daicel Chemical Industries, Ltd.).
  • the curable compound may be only one kind or two or more kinds. In the case of two or more types, the total amount is preferably within the above range.
  • the content of the curable compound is preferably from 1% by mass to 90% by mass based on the total solid content of the composition.
  • the lower limit is more preferably 5% by mass or more, still more preferably 10% by mass or more, and even more preferably 20% by mass or more.
  • the upper limit is more preferably equal to or less than 80% by mass and further preferably equal to or less than 75% by mass.
  • the composition according to the present disclosure preferably includes a polymerization initiator together with the curable compound.
  • the polymerization initiator may be a photopolymerization initiator or a thermal polymerization initiator, but is preferably a photopolymerization initiator. Further, the polymerization initiator may be a radical polymerization initiator or a cationic polymerization initiator.
  • Examples of the photoradical polymerization initiator include halogenated hydrocarbon derivatives (eg, compounds having a triazine skeleton, compounds having an oxadiazole skeleton), acylphosphine compounds such as acylphosphine oxide, hexaarylbiimidazole, oxime derivatives And the like, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, ketoxime ethers, aminoacetophenone compounds, hydroxyacetophenone, and the like.
  • halogenated hydrocarbon compounds having a triazine skeleton include those described in Wakabayashi et al., Bull. Chem. Soc.
  • the photo-radical polymerization initiator is preferably an oxime compound, a trihalomethyltriazine compound, a benzyldimethylketal compound, an ⁇ -hydroxyketone compound, an ⁇ -aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, an oxime compound.
  • oxime compounds are more preferred.
  • Specific examples of the oxime compound include compounds described in JP-A-2001-233842, compounds described in JP-A-2000-80068, compounds described in JP-A-2006-342166, and JP-A-2016-21012. Examples include compounds described in the gazette. Also, J.I. C. S.
  • TR-PBG-304 (manufactured by Changzhou Strong Electronics New Materials Co., Ltd.), ADEKA ARKULS NCI-831 (manufactured by ADEKA), ADEKA ARKULS NCI-930 (manufactured by ADEKA), Adeka Optomer N -1919 (manufactured by ADEKA Corporation) can also be used.
  • the oxime compound may be an oxime compound in which the NO bond of the oxime is in the (E) form, an oxime compound in which the NO bond of the oxime is in the (Z) form, or an (E) form. And a mixture of (Z) -isomer.
  • R O1 and R O2 each independently represent a monovalent substituent
  • R O3 represents a divalent organic group
  • Ar O1 represents an aryl group.
  • the monovalent substituent represented by R O1 is preferably a monovalent nonmetallic atomic group.
  • the monovalent nonmetallic atomic group include an alkyl group, an aryl group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heterocyclic group, an alkylthiocarbonyl group, and an arylthiocarbonyl group. Further, these groups may have one or more substituents. Further, the above-described substituent may be further substituted with another substituent.
  • the substituent examples include a halogen atom, an aryloxy group, an alkoxycarbonyl group or an aryloxycarbonyl group, an acyloxy group, an acyl group, an alkyl group, and an aryl group.
  • the monovalent substituent represented by R 02 is preferably an aryl group, a heterocyclic group, an arylcarbonyl group, or a heterocyclic carbonyl group. These groups may have one or more substituents. Examples of the substituent include the substituents described above.
  • the divalent organic group represented by R 03 is preferably an alkylene group having 1 to 12 carbon atoms, a cycloalkylene group, or an alkynylene group. These groups may have one or more substituents. Examples of the substituent include the substituents described above.
  • a compound represented by the following formula (X-1) or (X-2) can also be used.
  • R X1 and R X2 each independently represent an alkyl group having 1 to 20 carbon atoms, an alicyclic hydrocarbon group having 4 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, or And when R X1 and R X2 are phenyl groups, the phenyl groups may be bonded to each other to form a fluorene group, and R X3 and R X4 each independently represent represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group or a heterocyclic group having 4 to 20 carbon atoms having 7 to 30 carbon atoms, X a represents a single bond or Indicates a carbonyl group.
  • R X1, R X2, R X3 and R X4 has the same meaning as R X1, R X2, R X3 and R X4 in Formula (X1)
  • R X5 is, -R X6, -OR X6, -SR X6, -COR X6, -CONR X6 R X6, -NR X6 COR X6, -OCOR X6, -COOR X6, -SCOR X6, -OCSR X6, -COSR X6, -CSOR X6, —CN represents a halogen atom or a hydroxyl group, and R X6 represents an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 30 carbon atoms, an arylalkyl group having 7 to 30 carbon atoms, or a heterocyclic ring having 4 to 20 carbon atoms. represents a group, X a represents a single bond or a carbonyl group,
  • R 1 and R 2 are each independently preferably a methyl group, an ethyl group, an n-propyl group, an i-propyl, a cyclohexyl group or a phenyl group.
  • R X3 is a methyl group, an ethyl group, a phenyl group, a tolyl group or a xylyl group.
  • R X4 is preferably an alkyl group having 1 to 6 carbon atoms or a phenyl group.
  • R X5 is preferably a methyl group, an ethyl group, a phenyl group, a tolyl group or a naphthyl group.
  • X A is a single bond is preferable.
  • Specific examples of the compounds represented by the formulas (X-1) and (X-2) include the compounds described in paragraphs 0076 to 0079 of JP-A-2014-137466. This content is incorporated herein.
  • An oxime compound having a nitro group can be used as the photopolymerization initiator.
  • the oxime compound having a nitro group is preferably a dimer.
  • Specific examples of the oxime compound having a nitro group include paragraphs 0031 to 0047 of JP-A-2013-114249, paragraphs 0008 to 0012 and 0070 to 0079 of JP-A-2014-137466, and JP-A No. 4223071. And the compounds described in paragraphs 0007 to 0025, and Adeka Arculs NCI-831 (manufactured by ADEKA Corporation).
  • the oxime compound preferably has a maximum absorption wavelength in a wavelength region of 350 nm to 500 nm, more preferably has an absorption wavelength in a wavelength region of 360 nm to 480 nm, and particularly preferably has high absorbance at 365 nm and 405 nm.
  • the molar extinction coefficient at 365 nm or 405 nm is preferably from 1,000 to 300,000, more preferably from 2,000 to 300,000, and more preferably from 5,000 to 3,000, from the viewpoint of sensitivity. More preferably, it is 200,000.
  • the molar extinction coefficient of a compound can be measured using a known method. For example, it is preferable to measure with an ultraviolet-visible spectrophotometer (Cary-5 spectrophotometer manufactured by Varian) using an ethyl acetate solvent at a concentration of 0.01 g / L.
  • Examples of —OC 9 F 17 in the above (C-12) include the following groups.
  • An oxime compound having a fluorine atom can also be used as the photopolymerization initiator.
  • Specific examples of the oxime compound having a fluorine atom include compounds described in JP-A-2010-262028, compounds 24 and 36 to 40 described in JP-A-2014-500852, and compounds described in JP-A-2013-164471 ( C-3). This content is incorporated herein.
  • Examples of the photocationic polymerization initiator include a photoacid generator.
  • Examples of the photoacid generator include onium salt compounds such as diazonium salts, phosphonium salts, sulfonium salts, iodonium salts, and the like, which decompose upon irradiation with light to generate an acid, imidosulfonate, oxime sulfonate, diazodisulfone, disulfone, and o-nitrobenzyl. Examples thereof include sulfonate compounds such as sulfonates.
  • the description of paragraphs 0139 to 0214 of JP-A-2009-258603 can be referred to, and the contents thereof are incorporated herein.
  • photocationic polymerization initiators include Adeka Aquel's SP series (for example, Adeka Aquel's SP-606) manufactured by ADEKA Corporation, and IRGACURE250, IRGACURE270, and IRGACURE290 manufactured by BASF.
  • the polymerization initiator may be only one kind or two or more kinds, and in the case of two or more kinds, the total amount is preferably in the above range.
  • the content of the polymerization initiator is preferably 0.01% by mass to 30% by mass based on the total solid content of the composition.
  • the lower limit is more preferably 0.1% by mass or more, and even more preferably 0.5% by mass or more.
  • the upper limit is more preferably 20% by mass or less, and further preferably 15% by mass or less.
  • the composition according to the present disclosure may include a solvent.
  • the solvent is not particularly limited, and can be appropriately selected depending on the purpose as long as it can uniformly dissolve or disperse each component of the composition.
  • water and an organic solvent can be used, and an organic solvent is preferable.
  • Preferred examples of the organic solvent include alcohols (eg, methanol), ketones, esters, aromatic hydrocarbons, halogenated hydrocarbons, dimethylformamide, dimethylacetamide, dimethylsulfoxide, and sulfolane. . These may be used alone or in combination of two or more. Of these, at least one organic solvent selected from the group consisting of esters having a cyclic alkyl group and ketones is preferred.
  • alcohols, aromatic hydrocarbons, and halogenated hydrocarbons include those described in paragraph 0136 of JP-A-2012-194534, the contents of which are incorporated herein.
  • esters, ketones and ethers include those described in JP-A-2012-208494, paragraph 0497 (corresponding to U.S. Patent Application Publication No. 2012/0235099, paragraph 0609).
  • Solvents include ethanol, methanol, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, N-methyl-2-pyrrolidone, ethyl cellosolve acetate, ethyl lactate Butyl acetate, cyclohexyl acetate, diethylene glycol dimethyl ether, 2-heptanone, cyclopentanone, cyclohexanone, ethyl carbitol acetate, butyl carbitol acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether and propylene glycol monomethyl ether acetate One or more are preferred.
  • the content of the solvent is preferably such that the total solid content of the composition is 10% by mass to 90% by mass.
  • the lower limit is more preferably 15% by mass or more, and even more preferably 20% by mass or more.
  • the upper limit is more preferably equal to or less than 80% by mass, and still more preferably equal to or less than 70% by mass.
  • the solvent may be only one kind or two or more kinds, and in the case of two or more kinds, the total amount is preferably in the above range.
  • the composition according to the present disclosure preferably further contains a dye derivative other than the compound having the structure represented by the formula (1) (hereinafter, also simply referred to as “dye derivative”).
  • a dye derivative other than the compound having the structure represented by the formula (1) hereinafter, also simply referred to as “dye derivative”.
  • the compound having the structure represented by the formula (1) is a pigment by including a dye derivative, the dispersibility of the compound having the structure represented by the formula (1) is increased, and the compound represented by the formula (1) Aggregation of the compound having the represented structure can be efficiently suppressed.
  • the pigment derivative is preferably a pigment derivative.
  • the dye derivative preferably has a structure in which a part of the dye is substituted with an acid group, a basic group, or a group having a salt structure, and a dye derivative represented by the following formula (3) is more preferable.
  • the dye structure P is easily adsorbed on the surface of a compound having the structure represented by the formula (1), and thus is represented by the formula (1) in the composition.
  • the dispersibility of the compound having a structure can be improved.
  • the terminal portion X of the dye derivative is adsorbed on the resin by interaction with an adsorbing portion (such as a polar group) of the resin, so that the structure represented by the formula (1) is The dispersibility of the compound can be further improved.
  • P 3 represents a dye structure
  • L 3 each independently represents a single bond or a linking group
  • X 3 each independently represents an acidic group, a basic group, or a group having a salt structure.
  • M represents an integer of 1 or more
  • n represents an integer of 1 or more.
  • Dye structure in P 3 pyrrolo pyrrole pigment structure, squarylium dye structure, croconium dye structure, diimmonium dye structure, oxonol dye structure, diketopyrrolopyrrole dye structures, quinacridone dye structures, anthraquinone dye structures, dianthraquinone dye structure, Benzoiso Indole dye structure, thiazineindigo dye structure, azo dye structure, quinophthalone dye structure, phthalocyanine dye structure, naphthalocyanine dye structure, dioxazine dye structure, pyromethene dye structure, perylene dye structure, perinone dye structure and benzimidazolinone dye structure At least one member selected from the group is preferable, and a pyrrolopyrrole dye structure, a diketopyrrolopyrrole dye structure, a quinacridone dye structure, a squarylium dye structure, a croconium dye structure, At least one member selected from the
  • the linking group for L 3 includes 1 to 100 carbon atoms, 0 to 10 nitrogen atoms, 0 to 50 oxygen atoms, 1 to 200 hydrogen atoms, and 0 to 20 Groups consisting of one sulfur atom are preferred, and may be unsubstituted or further have a substituent.
  • a substituent an alkyl group, an aryl group, a hydroxy group or a halogen atom is preferable.
  • the linking group is an alkylene group, an arylene group, a nitrogen-containing heterocyclic group, —NR′—, —SO 2 —, —S—, —O—, —CO—, —COO—, —CONR′—, or Are preferable, and an alkylene group, an arylene group, —SO 2 —, —COO—, or a group obtained by combining two or more thereof is more preferable.
  • R ′ represents a hydrogen atom, an alkyl group (preferably having 1 to 30 carbon atoms) or an aryl group (preferably having 6 to 30 carbon atoms).
  • the number of carbon atoms of the alkylene group is preferably 1 to 30, more preferably 1 to 15, and still more preferably 1 to 10.
  • the alkylene group may have a substituent.
  • the alkylene group may be linear, branched, or cyclic. Further, the cyclic alkylene group may be either monocyclic or polycyclic.
  • the carbon number of the arylene group is preferably from 6 to 18, more preferably from 6 to 14, still more preferably from 6 to 10, and particularly preferably a phenylene group.
  • the nitrogen-containing heterocyclic group is preferably a 5- or 6-membered ring.
  • the nitrogen-containing heterocyclic group is preferably a single ring or a condensed ring, more preferably a single ring or a condensed ring having 2 to 8 condensed numbers, and even more preferably a single ring or a condensed ring having 2 to 4 condensed numbers.
  • the number of nitrogen atoms contained in the nitrogen-containing heterocyclic group is preferably from 1 to 3, more preferably 1 or 2.
  • the nitrogen-containing heterocyclic group may contain a hetero atom other than a nitrogen atom. Examples of the hetero atom other than the nitrogen atom include an oxygen atom and a sulfur atom.
  • the number of heteroatoms other than a nitrogen atom is preferably 0 to 3, and more preferably 0 or 1.
  • nitrogen-containing heterocyclic group examples include a piperazine ring group, a pyrrolidine ring group, a pyrrole ring group, a piperidine ring group, a pyridine ring group, an imidazole ring group, a pyrazole ring group, an oxazole ring group, a thiazole ring group, a pyrazine ring group, and a morpholine ring.
  • R represents a hydrogen atom or a substituent.
  • substituents include a substituent T.
  • substituent T include an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, a thioalkoxy group having 1 to 10 carbon atoms, a hydroxyl group, a carboxy group, an acetyl group, a cyano group, and a halogen atom. Atoms (fluorine atom, chlorine atom, bromine atom, iodine atom) and the like. These substituents may further have a substituent.
  • linking group examples include an alkylene group, an arylene group, -SO 2- , a group represented by the above formula (L-1), a group represented by the above formula (L-5), -O- and alkylene.
  • a group consisting of a combination of -NR'- and an alkylene group; a group consisting of a combination of -NR'- and -CO- and an alkylene group; -NR'- and -CO- and an alkylene A group consisting of a combination of a group and an arylene group, a group consisting of a combination of -NR'- and -CO- and an arylene group, a group consisting of a combination of -NR'- and -SO 2 -and an alkylene group, -NR ' -, -SO 2- , a group consisting of a combination of an alkylene group and an arylene group, a group consisting of a combination of a group represented by the formula (L-1) and an
  • X 3 represents an acidic group, a basic group or a group having a salt structure.
  • the acidic group include a carboxy group, a sulfo group, a phospho group, and a sulfonimide group.
  • the basic group include groups represented by the following formulas (X-3) to (X-8).
  • the group having a salt structure include salts of the above-described acidic groups and salts of the basic groups.
  • the atoms or atomic groups constituting the salt include a metal atom and tetrabutylammonium.
  • the metal atom an alkali metal atom or an alkaline earth metal atom is more preferable.
  • the alkali metal atom include lithium, sodium, potassium and the like.
  • the alkaline earth metal atom include calcium and magnesium.
  • X 3 is preferably at least one group selected from the group consisting of a carboxy group, a sulfo group, a sulfonimide group, and a group represented by any of the following formulas (X-1) to (X-11). .
  • R 100 to R 106 each independently represent a hydrogen atom, an alkyl group, or an alkenyl group. Or an aryl group, R 100 and R 101 may be linked to each other to form a ring, and M represents an atom or an atomic group constituting a salt with an anion.
  • the alkyl group may be linear, branched or cyclic.
  • the carbon number of the linear alkyl group is preferably 1 to 20, more preferably 1 to 12, and still more preferably 1 to 8.
  • the number of carbon atoms in the branched alkyl group is preferably 3 to 20, more preferably 3 to 12, and still more preferably 3 to 8.
  • the cyclic alkyl group may be monocyclic or polycyclic.
  • the number of carbon atoms in the cyclic alkyl group is preferably from 3 to 20, more preferably from 4 to 10, and even more preferably from 6 to 10.
  • the carbon number of the alkenyl group is preferably 2 to 10, more preferably 2 to 8, and even more preferably 2 to 4.
  • the carbon number of the aryl group is preferably from 6 to 18, more preferably from 6 to 14, and even more preferably from 6 to 10.
  • R 100 and R 101 may be linked to each other to form a ring.
  • the ring may be an alicyclic ring or an aromatic ring.
  • the ring may be a single ring or a multiple ring.
  • the linking group includes —CO—, —O—, —NH—, a divalent aliphatic group, a divalent aromatic group, and a combination thereof.
  • a divalent linking group selected from the group consisting of Specific examples include, for example, piperazine ring, pyrrolidine ring, pyrrole ring, piperidine ring, pyridine ring, imidazole ring, pyrazole ring, oxazole ring, thiazole ring, pyrazine ring, morpholine ring, thiazine ring, indole ring, isoindole ring, Examples include a benzimidazole ring, a purine ring, a quinoline ring, an isoquinoline ring, a quinoxaline ring, a cinnoline ring, and a carbazole ring.
  • R 107 , R 108 and R 109 each independently represent a halogen atom, a hydroxy group or a hydrocarbon group having 1 or more carbon atoms which may contain a substituent.
  • the hydrocarbon group represented by R 107 , R 108 , and R 109 may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group. Further, the aliphatic hydrocarbon group may be linear, branched or cyclic.
  • the aliphatic hydrocarbon group preferably has 1 to 30 carbon atoms. The upper limit is preferably 20 or less, more preferably 10 or less, and even more preferably 5 or less.
  • the aromatic hydrocarbon group preferably has 6 to 20 carbon atoms.
  • the upper limit is preferably 18 or less, more preferably 15 or less, and even more preferably 12 or less.
  • substituents which the hydrocarbon group represented by R 107 , R 108 and R 109 may include include a halogen atom, a hydroxyl group, a carboxyl group, an alkoxy group, a phenoxy group, an acyl group, a sulfo group and the like.
  • alkoxy group at least a part of a hydrogen atom may be substituted with a halogen atom.
  • the above-mentioned substituent is preferably an alkoxy group in which at least a part of a halogen atom or a hydrogen atom may be substituted with a halogen atom, and more preferably a halogen atom.
  • a halogen atom a chlorine atom, a fluorine atom, or a bromine atom is preferable, and a fluorine atom is more preferable.
  • M represents an atom or an atomic group constituting an anion and a salt. These include those described above, and the preferred range is also the same.
  • the upper limit of m represents the number of substituents that the dye structure P can have, and is, for example, preferably 10 or less, more preferably 5 or less.
  • n is preferably an integer of 1 to 3, and more preferably 1 or 2.
  • n is 2 or more, a plurality of Xs may be different from each other. Specific examples include the following groups.
  • the dye derivative is preferably a dye derivative represented by the following formula (4).
  • the dye derivative represented by the following formula (4) is a compound in which P in the formula (3) has a pyrrolopyrrole dye structure.
  • R 43 to R 46 each independently represent a cyano group, an acyl group, an alkoxycarbonyl group, an alkylsulfinyl group, an arylsulfinyl group or a heteroaryl group
  • R 47 and R 48 each independently represent hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, a -BR 49 R 50 or a metal atom
  • R 47 is a R 43 or R 45, may be linked covalently or coordinate
  • R 48 is , R 44 or R 46 may be covalently bonded or coordinated
  • R 49 and R 50 each independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, group, an aryloxy group, or represents a heteroaryl group, may form a ring
  • R 49 and R 50 are each other, 41 and L 42 are each independently a single bond or an alkylene group, an
  • R 43 to R 48 in the formula (4) have the same meanings as R 3 to R 8 in the formula (1), and preferred embodiments are also the same.
  • X 41 and X 42 in the formula (4) have the same meanings as X 3 in the formula (3), and preferred embodiments are also the same.
  • L 41 and L 42 have the same meanings as L 3 in Formula (3), and the preferred embodiments are also the same. Further, the following linking groups are particularly preferable from the viewpoint of synthesis suitability and visible transparency.
  • L 41 preferably has 1 to 20 atoms constituting a chain connecting X 41 to a benzene ring directly connected to a pyrrolopyrrole structure which is a mother nucleus structure of the pigment derivative.
  • the lower limit is more preferably two or more, and still more preferably three or more.
  • the upper limit is more preferably 15 or less and still more preferably 10 or less.
  • L 42 preferably has 1 to 20 atoms constituting a chain connecting X 42 with a benzene ring directly connected to a pyrrolopyrrole structure which is a core structure of the pigment derivative.
  • the lower limit is more preferably two or more, and still more preferably three or more.
  • the upper limit is more preferably 15 or less and still more preferably 10 or less.
  • the dispersibility of the pigment can be further improved.
  • the pyrrolopyrrole structure is the mother nucleus structure of the pigment derivative, by increasing the distance between X 41 and X 42, X 41 and X 42 is a resin becomes less susceptible to steric hindrance and It is presumed that the interaction of the compound became easier, and as a result, the dispersibility of the pigment could be improved.
  • the compound represented by the formula (4) preferably has a solubility in a solvent (25 ° C.) contained in the composition of 0 g / L to 0.1 g / L, and more preferably 0 g / L to 0.01 g / L. Is more preferable. According to this aspect, the dispersibility of the pigment can be further improved.
  • the compound represented by the formula (1) is preferably a compound having a maximum absorption wavelength in a range from 700 nm to 1200 nm. Further, the ratio A1 / A2 of the absorbance A1 at a wavelength of 500 nm and the absorbance A2 at the maximum absorption wavelength is preferably 0.1 or less, more preferably 0.05 or less.
  • the absorbance of a compound in the present disclosure is a value determined from an absorption spectrum of a solution of the compound.
  • chloroform, dimethyl sulfoxide, tetrahydrofuran and the like can be mentioned.
  • chloroform When the compound represented by the formula (4) is dissolved in chloroform, chloroform is used as a measuring solvent. In addition, when it does not dissolve in chloroform but dissolves in dimethylsulfoxide or tetrahydrofuran, dimethylsulfoxide or tetrahydrofuran is used as a measuring solvent.
  • dye derivative represented by the formula (3) include the following (3-1) to (3-25).
  • m, m1, m2 and m3 each independently represent an integer of 1 or more.
  • the composition according to the present disclosure may contain the dye derivative alone, or may contain two or more kinds.
  • the content of the pigment derivative is preferably from 0.1% by mass to 30% by mass, and more preferably from 0.5% by mass to 25% by mass, based on the total solid content of the composition, from the viewpoint of infrared absorption and dispersibility.
  • the content is more preferably 1% by mass, and further preferably 1% by mass to 20% by mass.
  • the content of the dye derivative is preferably 1% by mass to 80% by mass with respect to the total mass of the compound represented by the formula (1) from the viewpoint of infrared absorption and dispersibility. It is more preferably from 50% by mass to 50% by mass, and still more preferably from 5% by mass to 40% by mass.
  • the composition according to the present disclosure can contain at least one selected from the group consisting of a chromatic colorant and a black colorant (hereinafter, the chromatic colorant and the black colorant are combined to form a visible colorant. Also called).
  • a chromatic colorant means a colorant other than a white colorant and a black colorant.
  • the chromatic colorant is preferably a colorant having absorption in a wavelength range of 400 nm or more and less than 650 nm.
  • the chromatic colorant may be a pigment or a dye.
  • the pigment preferably has an average particle size (r) satisfying 20 nm ⁇ r ⁇ 300 nm, more preferably satisfying 25 nm ⁇ r ⁇ 250 nm, and still more preferably satisfying 30 nm ⁇ r ⁇ 200 nm.
  • the “average particle size” here means an average particle size of secondary particles in which primary particles of the pigment are aggregated.
  • the particle size distribution of the secondary particles of the pigment that can be used is such that 70% by mass or more of the secondary particles falling within (average particle size ⁇ 100) nm, Preferably, it is 80% by mass or more.
  • the particle size distribution of the secondary particles can be measured using a scattering intensity distribution.
  • the average particle diameter of the primary particles is observed by a scanning electron microscope (SEM) or a transmission electron microscope (TEM), and 100 particles are measured at a portion where the particles are not aggregated, and an average value is calculated.
  • SEM scanning electron microscope
  • TEM transmission electron microscope
  • the pigment is preferably an organic pigment.
  • examples of the pigment include the following. However, the present disclosure is not limited to these.
  • pigments I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, etc. (above, purple pigment), C. I. Pigment Blue 1,2,15,15: 1,15: 2,15: 3,15: 4,15: 6,16,22,29,60,64,66,79,80,87 (monoazo type), 88 (methine / polymethine-based) and the like (all blue pigments). These pigments can be used alone or in various combinations.
  • the dye is not particularly limited, and a known dye can be used.
  • Chemical structures include pyrazole azo, anilino azo, triphenylmethane, anthraquinone, anthrapyridone, benzylidene, oxonol, pyrazolotriazole azo, pyridone azo, cyanine, phenothiazine, pyrrolopyrazole azomethine, Xanthene-based, phthalocyanine-based, benzopyran-based, indigo-based, and pyrromethene-based dyes can be used. Further, a multimer of these dyes may be used. Further, the dyes described in JP-A-2015-28144 and JP-A-2015-34966 can also be used.
  • the dye at least one of an acid dye and a derivative thereof may be suitably used.
  • a direct dye, a basic dye, a mordant dye, an acidic mordant dye, an azoic dye, a disperse dye, an oil-soluble dye, a food dye, a derivative thereof, and the like can be usefully used.
  • acid alizarin violet N acid blue 1, 7, 9, 15, 18, 23, 25, 27, 29, 40 to 45, 62, 70, 74, 80, 83, 86, 87, 90, 92, 103, 112, 113, 120, 129, 138, 147, 158, 171, 182, 192, 243, 324: 1, acid chroma violet K, acid Fuchsin; acid green 1,3,5,9,16,25,27,50, acid orange 6,7,8,10,12,50,51,52,56,63,74,95, acid red 1,4,8,14,17,18,26,27,29,31,34,35,37,42,44,50,51,52,57,66,73,80,87,88, 91, 92, 94, 97, 103, 111, 114, 129, 133, 134
  • azo, xanthene and phthalocyanine acid dyes are also preferable, and C.I. I. Solvent Blue 44, 38; C.I. I. Acid dyes such as Solvent orange 45; Rhodamine B and Rhodamine 110, and derivatives of these dyes are also preferably used.
  • the coloring agent is selected from the group consisting of anilinoazo, pyrazolotriazoleazo, pyridoneazo, anthrapyridone, and pyrromethene. Further, a pigment and a dye may be used in combination.
  • a black colorant as a colorant that blocks visible light means a material that absorbs visible light but transmits at least part of infrared light. Therefore, in the present disclosure, the black colorant as a colorant that blocks visible light does not include carbon black and titanium black.
  • a black colorant as a colorant that blocks visible light a bisbenzofuranone compound, an azomethine compound, a perylene compound, an azo compound, or the like can also be used.
  • Examples of the bisbenzofuranone compound include those described in JP-T-2010-534726, JP-T-2012-515233, JP-T-2012-515234, and the like. For example, it is available as "Irgaphor Black” manufactured by BASF. Examples of perylene compounds include C.I. I. Pigment Black 31, 32 and the like.
  • azomethine-based compound examples include those described in JP-A-1-170601 and JP-A-2-34664. For example, it can be obtained as "Chromofine Black A1103" manufactured by Dainichi Seika Kogyo Co., Ltd. .
  • the azo compound is not particularly limited, but is preferably a compound represented by the following formula (A-1).
  • the composition according to the present disclosure When using the composition according to the present disclosure to manufacture an infrared transmission filter that transmits infrared in a region where the contained infrared absorbing dye does not absorb, it is preferable to include a colorant that blocks visible light.
  • the colorant that blocks visible light preferably presents black, gray, or a color close thereto, depending on the combination of the plurality of colorants. Further, the colorant that blocks visible light is preferably a material that absorbs light in a violet to red wavelength range.
  • the colorant that blocks visible light is preferably a colorant that blocks light in the wavelength range of 450 nm to 650 nm.
  • the colorant that blocks visible light preferably satisfies at least one of the following requirements (1) and (2), and more preferably satisfies the requirement (1).
  • a black colorant as a colorant that blocks visible light means a material that absorbs visible light but transmits at least part of infrared light. Therefore, in the present disclosure, the organic black colorant as a colorant that blocks visible light does not include a black colorant that absorbs both visible light and infrared light, such as carbon black and titanium black.
  • the colorant that blocks visible light has a ratio A / B of 4 between the minimum value A of the absorbance in the wavelength range of 450 nm to 650 nm and the minimum value B of the absorbance in the wavelength range of 900 nm to 1,300 nm. It is preferably at least 0.5.
  • the above characteristics may be satisfied by one kind of material, or may be satisfied by a combination of a plurality of materials.
  • it is preferable that the above-mentioned spectral characteristics are satisfied by combining a plurality of chromatic colorants.
  • the chromatic colorants include a red colorant, a green colorant, a blue colorant, a yellow colorant, a purple colorant, and an orange colorant.
  • the coloring agent is selected from the group consisting of:
  • chromatic colorant When a chromatic colorant is used to form a colorant that blocks visible light with a combination of two or more chromatic colorants, examples of the combination of chromatic colorants include the following. (1) An embodiment containing a yellow colorant, a blue colorant, a purple colorant, and a red colorant.
  • An embodiment containing a yellow colorant, a blue colorant and a red colorant (3) An embodiment containing a yellow colorant, a purple colorant, and a red colorant (4) An embodiment containing a yellow colorant and a purple colorant (5) An embodiment containing a green colorant, a blue colorant, a purple colorant, and a red colorant (6) An embodiment containing a purple colorant and an orange colorant (7) An embodiment containing a green colorant, a purple colorant, and a red colorant (8) An embodiment containing a green colorant and a red colorant
  • Specific examples of the above embodiment (1) include C.I. I. Pigment Yellow 139 or 185, and C.I. I. Pigment Blue 15: 6 and C.I. I. Pigment Violet 23 and C.I. I. Pigment Red 254 or 224.
  • Specific examples of the above embodiment (2) include C.I. I. Pigment Yellow 139 or 185, and C.I. I. Pigment Blue 15: 6 and C.I. I. Pigment Red 254 or 224.
  • Specific examples of the above embodiment (3) include C.I. I. Pigment Yellow 139 or 185, and C.I. I. Pigment Violet 23 and C.I. I. Pigment Red 254 or 224.
  • Specific examples of the above embodiment (4) include C.I. I.
  • Pigment Yellow 139 or 185 and C.I. I. Pigment Violet 23.
  • Specific examples of the above embodiment (5) include C.I. I. Pigment Green 7 or 36, and C.I. I. Pigment Blue 15: 6 and C.I. I. Pigment Violet 23 and C.I. I. Pigment Red 254 or 224.
  • Specific examples of the above embodiment (6) include C.I. I. Pigment Violet 23 and C.I. I. Pigment Orange 71.
  • Specific examples of the above (7) include C.I. I. Pigment Green 7 or 36, and C.I. I. Pigment Violet 23 and C.I. I. Pigment Red 254 or 224.
  • Specific examples of the above (8) include C.I. I. Pigment Green 7 or 36, and C.I. I. Pigment Red 254 or 224.
  • ratio (mass ratio) of each colorant examples include the following.
  • the composition according to the present disclosure can contain a silane coupling agent.
  • the silane coupling agent means a silane compound having a hydrolyzable group and another functional group.
  • the term "hydrolyzable group" refers to a substituent that is directly bonded to a silicon atom and can form a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, an acyloxy group and the like, and an alkoxy group is preferable. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group.
  • the functional group other than the hydrolyzable group is preferably a group which forms an interaction or a bond with a resin or the like and exhibits an affinity.
  • a vinyl group, a styryl group, a (meth) acryloyl group, a mercapto group, an epoxy group, an oxetanyl group, an amino group, a ureide group, a sulfide group, an isocyanate group and the like are mentioned, and a (meth) acryloyl group and an epoxy group are preferable.
  • silane coupling agent examples include compounds described in paragraphs 0018 to 0036 of JP-A-2009-288703, compounds described in paragraphs 0056 to 0066 of JP-A-2009-242604, and paragraph 0229 of WO2015 / 166779. No. 0236, the contents of which are incorporated herein.
  • the content of the silane coupling agent is preferably 0.01% by mass to 15.0% by mass, more preferably 0.05% by mass to 10.0% by mass, based on the total solid content of the composition. .
  • the silane coupling agent may be only one kind or two or more kinds. When two or more types are used, the total amount is preferably within the above range.
  • the composition according to the present disclosure may contain a surfactant from the viewpoint of further improving coatability.
  • a surfactant various surfactants such as a fluorine-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone-based surfactant can be used.
  • paragraphs 0238 to 0245 of WO 2015/166779 can be referred to, and the contents thereof are incorporated herein.
  • the liquid properties (particularly, fluidity) when prepared as a coating liquid are further improved, and the uniformity of the coating thickness and the liquid saving property are further improved. be able to. Further, it is possible to more suitably form a film having a uniform thickness with small thickness unevenness.
  • the fluorine atom content in the fluorinated surfactant is preferably 3% by mass to 40% by mass, more preferably 5% by mass to 30% by mass, and particularly preferably 7% by mass to 25% by mass.
  • a fluorine-based surfactant having a fluorine content within this range is effective in terms of uniformity of the thickness of the coating film and liquid saving properties, and has good solubility in the composition.
  • fluorine-based surfactant examples include surfactants described in paragraphs 0060 to 0064 of JP-A-2014-41318 (paragraphs 0060 to 0064 of the corresponding WO 2014/17669), and JP-A-2011-2011. Surfactants described in paragraphs 0117 to 0132 of JP-A-132503, the contents of which are incorporated herein.
  • fluorosurfactants include, for example, Megafac F171, F172, F173, F176, F177, F141, F142, F143, F144, R30, F437, F475, F479, F482, F554, F780 (above, DIC) Co., Ltd.), Florado FC430, FC431, FC171 (all manufactured by Sumitomo 3M Limited), Surflon S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC- 381, SC-383, S-393, KH-40 (all manufactured by Asahi Glass Co., Ltd.), PolyFox PF636, PF656, PF6320, PF6520, PF7002 (all manufactured by OMNOVA).
  • the fluorine-based surfactant is a molecular structure having a functional group containing a fluorine atom, and an acrylic compound in which a portion of the functional group containing a fluorine atom is cut off when heat is applied to volatilize the fluorine atom is also preferable.
  • a fluorinated surfactant include Megafac DS series (manufactured by DIC Corporation, Chemical Daily, February 22, 2016) (Nikkei Sangyo Shimbun, February 23, 2016), for example, Megafac DS. -21.
  • a block polymer can also be used.
  • the fluorine-based surfactant has a repeating unit derived from a (meth) acrylate compound having a fluorine atom, and has 2 or more (preferably 5 or more) alkyleneoxy groups (preferably ethyleneoxy group and propyleneoxy group) (meth).
  • a fluorine-containing polymer compound containing a repeating unit derived from an acrylate compound can also be preferably used.
  • the weight average molecular weight of the block polymer is preferably from 3,000 to 50,000.
  • a fluorine-based surfactant a fluorine-containing polymer having an ethylenically unsaturated group in a side chain can also be used.
  • Specific examples thereof include compounds described in paragraphs 0050 to 0090 and paragraphs 0289 to 0295 of JP-A-2010-164965, for example, Megafac RS-101, RS-102, RS-718K, RS manufactured by DIC Corporation. -72-K and the like.
  • the fluorine-based surfactant compounds described in paragraphs 0015 to 0158 of JP-A-2015-117327 can also be used.
  • nonionic surfactant examples include glycerol, trimethylolpropane, trimethylolethane, and ethoxylates and propoxylates thereof (for example, glycerol propoxylate and glycerol ethoxylate), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, Polyoxyethylene oleyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene nonyl phenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester, pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2 (BASF Tetronic 304, 701, 704, 901, 904, 150R1 (BASF) Solsperse 20000 (manufactured by Nippon Lubrizol Co., Ltd.), NCW-101, NCW-1001, NCW-1002 (manufactured by Wako Pure Chemical Industries
  • the content of the surfactant is preferably from 0.001% to 5.0% by mass, more preferably from 0.005% to 3.0% by mass, based on the total solid content of the composition.
  • the surfactant may be only one kind or two or more kinds. In the case of two or more types, the total amount is preferably within the above range.
  • the composition according to the present disclosure preferably contains an ultraviolet absorber.
  • the ultraviolet absorber include a conjugated diene compound and a diketone compound, and a conjugated diene compound is preferable.
  • the conjugated diene compound is more preferably a compound represented by the following formula (UV-1).
  • R U1 and R U2 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms or an aryl group having 6 to 20 carbon atoms, and R U1 and R U2 are They may be the same or different, but do not represent a hydrogen atom at the same time.
  • R U1 and R U2, together with the nitrogen atom to which R U1 and R U2 are attached, may form a cyclic amino group.
  • the cyclic amino group include a piperidino group, a morpholino group, a pyrrolidino group, a hexahydroazepino group, a piperazino group, and the like.
  • R U1 and R U2 are each independently preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 10 carbon atoms, and still more preferably an alkyl group having 1 to 5 carbon atoms.
  • RU3 and RU4 represent an electron-withdrawing group.
  • R U3 and R U4 each are preferably an acyl group, a carbamoyl group, an alkyloxycarbonyl group, an aryloxycarbonyl group, a cyano group, a nitro group, an alkylsulfonyl group, an arylsulfonyl group, a sulfonyloxy group or a sulfamoyl group, Groups, alkyloxycarbonyl groups, aryloxycarbonyl groups, cyano groups, alkylsulfonyl groups, arylsulfonyl groups, sulfonyloxy groups or sulfamoyl groups are more preferred.
  • RU3 and RU4 may combine with each other to form a cyclic electron withdrawing group.
  • Examples of the cyclic electron withdrawing group formed by combining RU3 and RU4 with each other include a 6-membered ring containing two carbonyl groups.
  • At least one of the above R U1 , R U2 , R U3 and R U4 may be in the form of a polymer derived from a monomer bonded to a vinyl group via a linking group. It may be a copolymer with another monomer.
  • UV-1 For the description of the substituent of the ultraviolet absorbent represented by the formula (UV-1), the description of paragraphs 0320 to 0327 of JP-A-2013-68814 can be referred to, and the contents thereof are incorporated herein.
  • Commercially available UV absorbers represented by the formula (UV-1) include, for example, UV503 (manufactured by Daito Chemical Co., Ltd.).
  • the diketone compound used as the ultraviolet absorber is preferably a compound represented by the following formula (UV-2).
  • R 101 and R 102 each independently represent a substituent
  • m1 and m2 each independently represent an integer of 0 to 4.
  • the substituent is an alkyl group, an alkenyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a heteroaryloxy group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a heteroaryloxycarbonyl group, an acyloxy group, Amino group, acylamino group, alkoxycarbonylamino group, aryloxycarbonylamino group, heteroaryloxycarbonylamino group, sulfonylamino group, sulfamoyl group, carbamoyl group, alkylthio group, arylthio group, heteroarylthio group, alkylsulfonyl group, aryl Sulfonyl group, heteroarylsulfon
  • the alkyl group preferably has 1 to 20 carbon atoms.
  • the alkyl group may be linear, branched, or cyclic, preferably linear or branched, and more preferably branched.
  • the alkoxy group preferably has 1 to 20 carbon atoms.
  • the alkoxy group may be linear, branched, or cyclic, preferably linear or branched, and more preferably branched.
  • a combination in which one of R 101 and R 102 is an alkyl group and the other is an alkoxy group is preferred.
  • m1 and m2 are each independently preferably an integer of 0 to 2, more preferably 0 or 1, and particularly preferably 1.
  • Examples of the compound represented by the formula (UV-2) include the following compounds.
  • Ubinal A (manufactured by BASF) can also be used as the ultraviolet absorber.
  • an ultraviolet absorber such as an aminodiene compound, a salicylate compound, a benzophenone compound, a benzotriazole compound, an acrylonitrile compound, and a triazine compound can be used, and specific examples thereof are described in JP-A-2013-68814.
  • Compounds As the benzotriazole compound, MYUA series (manufactured by Miyoshi Oil & Fats Co., Ltd., Chemical Daily, February 1, 2016) may be used.
  • the content of the ultraviolet absorber is preferably from 0.01% by mass to 10% by mass, more preferably from 0.01% by mass to 5% by mass, based on the total solid content of the composition.
  • the composition according to the present disclosure may contain a polymerization inhibitor.
  • the polymerization inhibitor include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4′-thiobis (3-methyl-6-tert-butylphenol), 2,2'-methylenebis (4-methyl-6-tert-butylphenol) and N-nitrosophenylhydroxyamine salts (ammonium salts, cerous salts).
  • p-methoxyphenol is preferable.
  • the polymerization inhibitor sometimes functions as an antioxidant.
  • the content of the polymerization inhibitor is preferably 0.01% by mass to 5% by mass based on the total solid content of the composition.
  • the composition according to the present disclosure may include a sensitizer, a crosslinking agent, a curing accelerator, a filler, a thermosetting accelerator, a plasticizer, and other auxiliaries (for example, conductive particles, fillers, Foaming agents, flame retardants, leveling agents, release accelerators, antioxidants, fragrances, surface tension regulators, chain transfer agents, etc.).
  • auxiliaries for example, conductive particles, fillers, Foaming agents, flame retardants, leveling agents, release accelerators, antioxidants, fragrances, surface tension regulators, chain transfer agents, etc.
  • JP-A-2008-250074 paragraphs 0101 to 000 of JP-A-2008-250074. Descriptions of 0104 and 0107 to 0109 can be referred to, and the contents thereof are incorporated in the present specification.
  • the antioxidant for example, a phenol compound, a phosphorus compound (for example, a compound described in paragraph 0042 of JP-A-2011-90147), a thioether compound, or the like can be used.
  • Commercial products include, for example, ADK STAB series (AO-20, AO-30, AO-40, AO-50, AO-50F, AO-60, AO-60G, AO-80, AO- 330 etc.).
  • the content of the antioxidant is preferably from 0.01% by mass to 20% by mass, more preferably from 0.3% by mass to 15% by mass, based on the total solid content of the composition.
  • the antioxidant may be only one kind or two or more kinds. When two or more types are used, the total amount is preferably within the above range.
  • the composition according to the present disclosure can be prepared by mixing the components described above.
  • the filter can be used without any particular limitation as long as it has been conventionally used for filtration or the like.
  • fluorine resins such as polytetrafluoroethylene (PTFE), polyamide resins such as nylon (eg, nylon-6, nylon-6,6), and polyolefin resins such as polyethylene and polypropylene (PP) (high-density, ultra-high molecular weight And the like).
  • PTFE polytetrafluoroethylene
  • nylon eg, nylon-6, nylon-6,6)
  • polyolefin resins such as polyethylene and polypropylene (PP) (high-density, ultra-high molecular weight And the like).
  • PP polypropylene
  • nylon is preferable.
  • the pore size of the filter is preferably 0.01 ⁇ m to 7.0 ⁇ m, more preferably 0.01 ⁇ m to 3.0 ⁇ m, and even more preferably 0.05 ⁇ m to 0.5 ⁇ m. Within this range, it is possible to reliably remove fine foreign matter that hinders preparation of a uniform and smooth composition in a subsequent step. It is also preferable to use a fibrous filter medium.
  • the filter medium include a polypropylene fiber, a nylon fiber, and a glass fiber.
  • filters When using filters, different filters may be combined. At that time, the filtration with the first filter may be performed only once, or may be performed twice or more. Further, first filters having different hole diameters within the above-described range may be combined.
  • the pore diameter here can refer to the nominal value of the filter manufacturer.
  • Commercially available filters can be selected from various filters provided by, for example, Nippon Pall Co., Ltd. (DFA4201NIEY, etc.), Advantech Toyo Co., Ltd., Nippon Integris Co., Ltd. or Kitz Micro Filter Co., Ltd. .
  • the viscosity of the composition according to the present disclosure is preferably 1 mPa ⁇ s to 100 mPa ⁇ s from the viewpoint of coatability.
  • the lower limit is more preferably 2 mPa ⁇ s or more, and even more preferably 3 mPa ⁇ s or more.
  • the upper limit is more preferably 50 mPa ⁇ s or less, further preferably 30 mPa ⁇ s or less, and particularly preferably 15 mPa ⁇ s or less.
  • the total solid content of the composition according to the present disclosure varies depending on the application method, but is preferably, for example, 1% by mass to 50% by mass.
  • the lower limit is more preferably 10% by mass or more.
  • the upper limit is more preferably 30% by mass or less.
  • composition according to the present disclosure is not particularly limited.
  • it can be preferably used for forming an infrared cut filter or the like.
  • it is preferably used as an infrared cut filter on the light receiving side of the solid-state imaging device (for example, for an infrared cut filter for a wafer level lens), an infrared cut filter on the back surface side (opposite to the light receiving side) of the solid-state imaging device, and the like.
  • it can.
  • it can be preferably used as an infrared cut filter on the light receiving side of the solid-state imaging device.
  • composition according to the present disclosure may further include a coloring agent that blocks visible light to form an infrared transmission filter that can transmit infrared light having a specific wavelength or more.
  • a coloring agent that blocks visible light to form an infrared transmission filter that can transmit infrared light having a specific wavelength or more.
  • composition according to the present disclosure is preferably stored in a storage container.
  • a container a multi-layer bottle in which the inner wall of the container is composed of six kinds of resins and a seven-layered bottle of six kinds of resins may be used for the purpose of preventing impurities from being mixed into raw materials and compositions. preferable.
  • these containers include the containers described in JP-A-2015-123351.
  • the film according to the present disclosure is a film formed of the composition according to the present disclosure or obtained by curing the composition. When the composition contains a solvent, drying may be performed.
  • the film according to the present disclosure can be preferably used as an infrared cut filter. Further, it can be used as a heat ray shielding filter or an infrared transmission filter.
  • the film according to the present disclosure may be used by being laminated on a support, or may be used after being separated from the support.
  • the film according to the present disclosure may have a pattern, or may be a film having no pattern (flat film).
  • “Drying” in the present disclosure may be performed by removing at least a part of the solvent, and it is not necessary to completely remove the solvent, and the amount of the solvent to be removed can be set as desired.
  • the above-mentioned curing may be carried out as long as the hardness of the film is improved, but curing by polymerization is preferable.
  • the thickness of the film according to the present disclosure can be appropriately adjusted depending on the purpose.
  • the thickness of the film is preferably 20 ⁇ m or less, more preferably 10 ⁇ m or less, and still more preferably 5 ⁇ m or less.
  • the lower limit of the thickness of the film is preferably at least 0.1 ⁇ m, more preferably at least 0.2 ⁇ m, even more preferably at least 0.3 ⁇ m.
  • the film according to the present disclosure preferably has a maximum absorption wavelength in the range of 650 nm to 1,500 nm, more preferably has a maximum absorption wavelength in the range of 680 nm to 1,300 nm, and has a wavelength of 700 nm to 1,100 nm. It is more preferable to have a maximum absorption wavelength in the range.
  • the film according to the present disclosure preferably satisfies at least one of the following conditions (1) to (4). It is more preferable that all the conditions are satisfied.
  • the transmittance at a wavelength of 400 nm is preferably at least 70%, more preferably at least 80%, further preferably at least 85%, particularly preferably at least 90%.
  • the transmittance at a wavelength of 500 nm is preferably 70% or more, more preferably 80% or more, further preferably 90% or more, and particularly preferably 95% or more.
  • the transmittance at a wavelength of 600 nm is preferably 70% or more, more preferably 80% or more, still more preferably 90% or more, and particularly preferably 95% or more.
  • the transmittance at a wavelength of 650 nm is preferably 70% or more, more preferably 80% or more, further preferably 90% or more, and particularly preferably 95% or more.
  • the film according to the present disclosure can also be used in combination with a color filter containing a chromatic colorant.
  • a color filter can be manufactured using a coloring composition containing a chromatic colorant.
  • the chromatic colorant includes the chromatic colorants described in the section of the composition according to the present disclosure.
  • the coloring composition can further contain a resin, a polymerizable compound, a polymerization initiator, a surfactant, a solvent, a polymerization inhibitor, an ultraviolet absorber and the like.
  • the above-described materials can be used, and these can be used.
  • the color filter be disposed on the optical path of the film according to the present disclosure.
  • the film according to the present disclosure and a color filter can be stacked and used as a laminate.
  • the film according to the present disclosure and the color filter may be adjacent to each other in the thickness direction, or may not be adjacent to each other.
  • the film according to the present disclosure may be formed on a support different from the support on which the color filter is formed.
  • Another member for example, a microlens, a flattening layer, or the like included in the solid-state imaging device may be interposed between the film and the color filter according to the disclosure.
  • an infrared cut filter refers to a filter that transmits light (visible light) having a wavelength in the visible region and blocks at least a part of light (infrared light) having a wavelength in the near infrared region.
  • the infrared cut filter may be one that transmits all light having a wavelength in the visible region, and among light having a wavelength in the visible region, allows light in a specific wavelength region to pass therethrough and blocks light in a specific wavelength region. It may be something.
  • a color filter refers to a filter that allows light in a specific wavelength region to pass therethrough and blocks light in a specific wavelength region out of light having a wavelength in the visible region.
  • an infrared transmission filter refers to a filter that blocks visible light and transmits at least a part of infrared light.
  • the film according to the present disclosure can be used for various devices such as a solid-state imaging device such as a CCD (charge coupled device) and CMOS (complementary metal oxide semiconductor), an infrared sensor, and an image display device.
  • a solid-state imaging device such as a CCD (charge coupled device) and CMOS (complementary metal oxide semiconductor)
  • CMOS complementary metal oxide semiconductor
  • an infrared sensor and an image display device.
  • the film according to the present disclosure can be manufactured through a step of applying the composition according to the present disclosure.
  • the composition is preferably applied onto a support.
  • the support include a substrate made of a material such as silicon, non-alkali glass, soda glass, Pyrex (registered trademark) glass, and quartz glass.
  • An organic film or an inorganic film may be formed on these substrates.
  • the material of the organic film include the above-described resins.
  • a substrate made of the above-described resin can be used as the support.
  • a charge-coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a transparent conductive film, or the like may be formed on the support.
  • a black matrix for isolating each pixel is formed on the support.
  • the support may be provided with an undercoat layer for improving adhesion to an upper layer, preventing diffusion of a substance, or flattening the substrate surface.
  • an inorganic film be formed over the glass substrate, or that the glass substrate be dealkalized. According to this aspect, it is easy to manufacture a film in which the generation of foreign substances is further suppressed.
  • a known method can be used as a method for applying the composition.
  • a dropping method drop casting
  • a slit coating method for example, a spraying method; a roll coating method; a spin coating method (spin coating); a casting coating method; a slit and spin method; a pre-wetting method (for example, JP-A-2009-145395).
  • Publications inkjet (eg, on-demand method, piezo method, thermal method), discharge printing such as nozzle jet, flexographic printing, screen printing, gravure printing, reverse offset printing, metal mask printing method, etc.
  • Various printing methods a transfer method using a mold or the like; a nanoimprint method, and the like.
  • the application method in the ink jet is not particularly limited, and for example, a method shown in “Spread and usable ink jets—infinite possibilities seen in patents”, published in February 2005, Sumibe Techno Research (especially from page 115). 133 page), JP-A-2003-262716, JP-A-2003-185831, JP-A-2003-261828, JP-A-2012-126830, JP-A-2006-169325, and the like. No.
  • the composition layer formed by applying the composition may be dried (prebaked).
  • prebaking may not be performed.
  • the prebaking temperature is preferably 150 ° C or lower, more preferably 120 ° C or lower, and even more preferably 110 ° C or lower.
  • the lower limit is, for example, preferably 50 ° C. or higher, and more preferably 80 ° C. or higher.
  • the prebake time is preferably from 10 seconds to 3,000 seconds, more preferably from 40 seconds to 2,500 seconds, and still more preferably from 80 seconds to 220 seconds. Drying can be performed on a hot plate, an oven, or the like.
  • the method for manufacturing a film according to the present disclosure may further include a step of forming a pattern.
  • the pattern forming method include a pattern forming method using a photolithography method and a pattern forming method using a dry etching method.
  • the step of forming a pattern may not be performed.
  • the step of forming a pattern will be described in detail.
  • the pattern forming method by the photolithography method includes a step of exposing the composition layer formed by applying the composition according to the present disclosure in a pattern (exposure step), and a step of developing and removing the unexposed portion of the composition layer. And forming a pattern (development step). If necessary, a step (post-bake step) of baking the developed pattern may be provided. Hereinafter, each step will be described.
  • Exposure Step the composition layer is exposed in a pattern.
  • the composition layer can be subjected to pattern exposure. Thereby, the exposed portion can be cured.
  • radiation light
  • ultraviolet rays such as g-rays and i-rays are preferable, and i-rays are more preferable.
  • Irradiation dose for example, preferably 0.03J / cm 2 ⁇ 2.5J / cm 2, more preferably 0.05J / cm 2 ⁇ 1.0J / cm 2, 0.08J / cm 2 ⁇ 0.5 J / cm 2 is particularly preferred.
  • the oxygen concentration at the time of exposure can be appropriately selected.
  • the exposure intensity is can be set appropriately, preferably 1,000W / m 2 ⁇ 100,000W / m 2 ( e.g., 5,000W / m 2, 15,000W / m 2, 35,000W / m 2 ).
  • Oxygen concentration and exposure illuminance may appropriately combined conditions, for example, illuminance 10,000 W / m 2 at an oxygen concentration of 10 vol%, oxygen concentration of 35 vol% can be such illuminance 20,000W / m 2.
  • a pattern is formed by developing and removing an unexposed portion of the composition layer in the composition layer after exposure.
  • the development and removal of the unexposed portion of the composition layer can be performed using a developer.
  • the unexposed portion of the composition layer in the exposure step elutes into the developer, and only the photocured portion remains on the support.
  • As the developing solution an alkali developing solution that does not damage the underlying solid-state imaging device or circuit is desirable.
  • the temperature of the developer is preferably, for example, 20 ° C. to 30 ° C.
  • the development time is preferably from 20 seconds to 180 seconds. Further, in order to improve the residue removal property, the step of shaking off the developer every 60 seconds and further supplying a new developer may be repeated several times.
  • alkaline agent used in the developer examples include aqueous ammonia, ethylamine, diethylamine, dimethylethanolamine, diglycolamine, diethanolamine, hydroxyamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, Organic alkali such as tetrabutylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis (2-hydroxyethyl) ammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo [5.4.0] -7-undecene Compounds, sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium silicate, sodium metasilicate And inorganic alkaline compounds such as.
  • an alkaline aqueous solution obtained by diluting these alkaline agents with pure water is preferably used.
  • the concentration of the alkaline agent in the alkaline aqueous solution is preferably from 0.001% by mass to 10% by mass, more preferably from 0.01% by mass to 1% by mass.
  • a surfactant may be used for the developer. Examples of the surfactant include the surfactant described in the above-mentioned composition, and a nonionic surfactant is preferable.
  • the developer may be once produced as a concentrated solution and diluted to a necessary concentration at the time of use, from the viewpoint of convenience of transportation and storage.
  • the dilution ratio is not particularly limited, but can be set, for example, in the range of 1.5 to 100 times. When a developer composed of such an alkaline aqueous solution is used, it is preferable to wash (rinse) with pure water after development.
  • post baking is a heat treatment after development to complete the curing of the film.
  • the post-baking temperature is preferably, for example, 100 ° C. to 240 ° C. From the viewpoint of film curing, the temperature is more preferably from 200 ° C to 230 ° C.
  • the post-bake temperature is preferably 150 ° C. or lower, more preferably 120 ° C. or lower. Preferably, it is 100 ° C. or lower, more preferably 90 ° C.
  • Post baking should be performed on the film after development in a continuous or batch manner using a heating means such as a hot plate, convection oven (hot air circulation dryer), or high frequency heater so that the above conditions are satisfied. Can be. When a pattern is formed by a low-temperature process, post-baking may not be performed, and a step of exposing again (post-exposure step) may be added.
  • a heating means such as a hot plate, convection oven (hot air circulation dryer), or high frequency heater
  • the pattern formation by the dry etching method is performed by applying the composition on a support or the like, curing the formed composition layer to form a cured product layer, and then forming a patterned photoresist layer on the cured product layer. And then dry-etching the cured product layer with an etching gas using the patterned photoresist layer as a mask.
  • a pre-bake treatment an embodiment in which a heat treatment after exposure and a heat treatment after development (post-bake treatment) is desirable.
  • the description in paragraphs 0010 to 0067 of JP-A-2013-64993 can be referred to, and the contents thereof are incorporated herein.
  • An optical filter according to the present disclosure has a film according to the present disclosure.
  • the optical filter according to the present disclosure can be preferably used as at least one kind of optical filter selected from the group consisting of an infrared cut filter and an infrared transmission filter, and can be more preferably used as an infrared cut filter.
  • a preferred embodiment of the optical filter according to the present disclosure includes a mode including the film according to the present disclosure and pixels selected from the group consisting of red, green, blue, magenta, yellow, cyan, black, and colorless.
  • a laminate according to the present disclosure is a laminate including the film according to the present disclosure and a color filter containing a chromatic colorant.
  • an infrared cut filter according to the present disclosure has the film according to the present disclosure.
  • the infrared cut filter according to the present disclosure may be a filter that cuts only infrared light of a part of the wavelength in the infrared region or a filter that cuts the entire infrared region.
  • a filter that cuts only infrared rays of a part of the wavelength in the infrared region for example, a near-infrared cut filter can be used.
  • the near-infrared rays include infrared rays having a wavelength of 750 nm to 2,500 nm.
  • the infrared cut filter according to the present disclosure is preferably a filter that cuts infrared rays in a wavelength range of 750 nm to 1,000 nm, and more preferably a filter that cuts infrared rays in a wavelength range of 750 nm to 1,200 nm. More preferably, the filter cuts infrared rays having a wavelength of 750 nm to 1,500 nm.
  • the infrared cut filter according to the present disclosure may further include a layer containing copper, a dielectric multilayer film, an ultraviolet absorbing layer, and the like, in addition to the above film.
  • the infrared cut filter according to the present disclosure further includes at least a layer containing copper or a dielectric multilayer film, an infrared cut filter having a wide viewing angle and excellent infrared shielding properties is easily obtained. Further, since the infrared cut filter according to the present disclosure further includes an ultraviolet absorbing layer, an infrared cut filter having excellent ultraviolet shielding properties can be obtained.
  • the ultraviolet absorbing layer for example, the absorbing layers described in paragraphs 0040 to 0070 and 0119 to 0145 of WO 2015/099906 can be referred to, and the contents thereof are incorporated herein.
  • a glass substrate made of glass containing copper or a layer containing a copper complex (copper complex-containing layer) can also be used.
  • the copper-containing glass substrate include a phosphate glass containing copper and a fluorophosphate glass containing copper.
  • Commercially available copper-containing glasses include NF-50 (manufactured by AGC Techno Glass Co., Ltd.), BG-60, BG-61 (all manufactured by Shot Co., Ltd.), and CD5000 (manufactured by HOYA CORPORATION).
  • the infrared cut filter according to the present disclosure can be used for various devices such as a solid-state imaging device such as a CCD (charge coupled device) and a CMOS (complementary metal oxide semiconductor), an infrared sensor, and an image display device.
  • a solid-state imaging device such as a CCD (charge coupled device) and a CMOS (complementary metal oxide semiconductor)
  • an infrared sensor and an image display device.
  • the infrared cut filter according to the present disclosure includes a pixel (pattern) of a film obtained using the composition according to the present disclosure, and at least one selected from the group consisting of red, green, blue, magenta, yellow, cyan, black, and colorless.
  • a pixel (pattern) of a film obtained using the composition according to the present disclosure and at least one selected from the group consisting of red, green, blue, magenta, yellow, cyan, black, and colorless.
  • An embodiment having one type of pixel (pattern) is also a preferable embodiment.
  • the method for producing the optical filter according to the present disclosure is not particularly limited, but includes a step of forming a composition layer by applying the composition according to the present disclosure on a support, and exposing the composition layer to a pattern. And forming a pattern by developing and removing unexposed portions, or forming a composition layer by applying the composition according to the present disclosure on a support, and cured to form a layer Forming a photoresist layer on the layer, patterning the photoresist layer by exposing and developing to obtain a resist pattern, and drying the layer using the resist pattern as an etching mask.
  • the method preferably includes an etching step.
  • each step in the method for manufacturing an optical filter according to the present disclosure each step in the method for manufacturing a film according to the present disclosure can be referred to.
  • a solid-state imaging device has a film according to the present disclosure.
  • the configuration of the solid-state imaging device is a configuration including the film according to the present disclosure, and is not particularly limited as long as the configuration functions as a solid-state imaging device. For example, the following configuration is included.
  • a plurality of photodiodes constituting a light receiving area of the solid-state imaging device and a transfer electrode made of polysilicon or the like are provided on the support, and light shielding made of tungsten or the like is provided only on the light receiving portion of the photodiode and the photodiode on the transfer electrode.
  • a device protection film made of silicon nitride or the like formed on the light shielding film so as to cover the entire light shielding film and the photodiode light receiving portion, and having the film according to the present disclosure on the device protection film. It is.
  • a configuration having a light condensing means (for example, a micro lens or the like; the same applies hereinafter) on the device protective film and below the film according to the present disclosure (on the side close to the support), or on the film according to the present disclosure
  • a configuration having a light condensing means may be used.
  • the color filter used in the solid-state imaging device may have a structure in which a film forming each pixel is embedded in a space partitioned by a partition into, for example, a lattice.
  • the partition walls preferably have a lower refractive index than each pixel. Examples of the imaging device having such a structure include the devices described in JP-A-2012-227478 and JP-A-2014-179577.
  • An image display device has the film according to the present disclosure.
  • the image display device include a liquid crystal display device and an organic electroluminescence (organic EL) display device.
  • organic EL organic electroluminescence
  • the definition and details of the image display device see, for example, “Electronic Display Devices (by Akio Sasaki, published by the Industrial Research Institute, Inc., 1990)” and “Display Devices (by Junsho Ibuki, published by Sangyo Tosho, 1989). ) ").
  • the liquid crystal display device is described in, for example, “Next-generation liquid crystal display technology (edited by Tatsuo Uchida, published by the Industrial Research Institute, Inc., 1994)”. There is no particular limitation on the liquid crystal display device applicable to the present disclosure.
  • the image display device may have a white organic EL element.
  • the white organic EL element preferably has a tandem structure.
  • JP-A-2003-45676 supervised by Akiyoshi Mikami, "The Forefront of Organic EL Technology Development-High Brightness, High Accuracy, Long Life, Know-how Collection", Technical Information Association, 326-328, 2008 and the like.
  • the spectrum of white light emitted from the organic EL element preferably has strong maximum emission peaks in a blue region (430 nm to 485 nm), a green region (530 nm to 580 nm), and a yellow region (580 nm to 620 nm). Those having a maximum emission peak in a red region (650 nm to 700 nm) in addition to these emission peaks are more preferable.
  • An infrared sensor according to the present disclosure has a film according to the present disclosure.
  • the configuration of the infrared sensor is not particularly limited as long as it functions as an infrared sensor.
  • an embodiment of an infrared sensor according to the present disclosure will be described with reference to the drawings.
  • reference numeral 110 denotes a solid-state imaging device.
  • the imaging area provided on the solid-state imaging device 110 has an infrared cut filter 111 and an infrared transmission filter 114. Further, a color filter 112 is laminated on the infrared cut filter 111.
  • a micro lens 115 is arranged on the side of the incident light h ⁇ of the color filter 112 and the infrared transmission filter 114.
  • a flattening layer 116 is formed so as to cover the microlenses 115.
  • the infrared cut filter 111 can be formed using the composition according to the present disclosure.
  • the spectral characteristics of the infrared cut filter 111 are selected according to the emission wavelength of an infrared light emitting diode (infrared LED) to be used.
  • the color filter 112 is a color filter in which pixels transmitting and absorbing light of a specific wavelength in the visible region are formed, and is not particularly limited, and a conventionally known color filter for forming pixels can be used.
  • a color filter having red (R), green (G), and blue (B) pixels is used.
  • R red
  • G green
  • B blue
  • the description in paragraphs 0214 to 0263 of JP-A-2014-43556 can be referred to, and the contents thereof are incorporated in the present specification.
  • the characteristics of the infrared transmission filter 114 are selected according to the emission wavelength of the infrared LED used.
  • the infrared transmission filter 114 preferably has a maximum light transmittance in the thickness direction of the film in the range of 400 nm to 650 nm of 30% or less. %, More preferably 10% or less, particularly preferably 0.1% or less. This transmittance preferably satisfies the above condition over the entire range of wavelengths from 400 nm to 650 nm.
  • the minimum value of the light transmittance in the thickness direction of the film in the wavelength range of 800 nm or more is preferably 70% or more, and more preferably 80% or more. More preferably, it is even more preferably 90% or more.
  • the transmittance preferably satisfies the above condition in a part of the wavelength range of 800 nm or more, and more preferably satisfies the above condition at a wavelength corresponding to the emission wavelength of the infrared LED.
  • the thickness of the infrared transmitting filter 114 is preferably 100 ⁇ m or less, more preferably 15 ⁇ m or less, further preferably 5 ⁇ m or less, and particularly preferably 1 ⁇ m or less.
  • the lower limit is preferably 0.1 ⁇ m.
  • the film thickness is measured on the dried substrate having the film using a stylus type surface shape measuring device (DEKTAK150 manufactured by ULVAC).
  • the spectral characteristics of the film are values obtained by measuring the transmittance in a wavelength range of 300 nm to 1,300 nm using an ultraviolet-visible-near-infrared spectrophotometer (U-4100 manufactured by Hitachi High-Technologies Corporation).
  • the infrared transmission filter 114 has a maximum light transmittance in the thickness direction of the film in the range of 450 nm to 650 nm of 20% or less.
  • the transmittance of light having a wavelength of 835 nm in the thickness direction of the film is 20% or less, and the minimum value of the transmittance of light in the thickness direction of the film in the range of 1,000 nm to 1,300 nm is 70% or more. Is preferred.
  • an infrared cut filter (another infrared cut filter) different from the infrared cut filter 111 may be further arranged on the flattening layer 116.
  • an infrared cut filter a layer containing at least copper or a layer having at least a dielectric multilayer film is exemplified. These details are as described above.
  • a dual band pass filter may be used as another infrared cut filter.
  • the absorption wavelengths of the infrared transmission filter and the infrared cut filter used in the present disclosure are used in an appropriate combination in accordance with the light source used.
  • a camera module according to the present disclosure has a solid-state imaging device and an infrared cut filter according to the present disclosure.
  • the camera module according to the present disclosure preferably further includes a lens and a circuit that processes an image obtained from the solid-state imaging device.
  • the solid-state imaging device used in the camera module according to the present disclosure may be the solid-state imaging device according to the present disclosure or a known solid-state imaging device.
  • a known circuit can be used as the lens used in the camera module according to the present disclosure and a circuit that processes an image obtained from the solid-state image sensor.
  • a known circuit can be used as examples of the camera module, a camera module described in JP-A-2016-6476 or JP-A-2014-197190 can be referred to, and the contents thereof are incorporated in the present specification.
  • the compound according to the present disclosure is a compound having a structure represented by the above formula (1), and is preferably a compound represented by the following formula (P1) from the viewpoints of light resistance and heat resistance.
  • the compound according to the present disclosure can be suitably used as an infrared absorbing dye.
  • R P1 and R P2 each independently represent an alkyl group, an aryl group, a heteroaryl group or a group represented by the following formula (P2)
  • R P3 to R P6 each independently represent a cyano group, an acyl group, an alkoxy group, A carbonyl group, an alkyl group, an arylsulfinyl group or a heteroaryl group
  • R P7 to R P10 each independently represent a hydrogen atom or a substituent
  • R P11 represents a hydrogen atom, an alkyl group or an aryl group
  • To p4 each independently represent an integer of 0 to 4.
  • X P11 represents an m-phenylene group, a p-phenylene group, a divalent fused polycyclic aromatic ring group in which two or more aromatic rings are fused, or a divalent heteroaromatic ring group
  • L P11 represents Represents a single bond or a divalent linking group
  • Y P11 represents a substituent
  • * represents a linking site to a pyrrolopyrrole ring in formula (P1).
  • the compound having the structure represented by the formula (1) and the compound represented by the formula (P1) in the compound according to the present disclosure have the structure represented by the formula (1) described above in the composition according to the present disclosure.
  • the compound represented by the formula (P1) have the same meanings, and preferred embodiments are also the same.
  • the method for producing the compound according to the present disclosure is not particularly limited, and the compound can be appropriately produced with reference to a known production method.
  • a method in which a compound having a dye structure is reacted with a boron compound to produce the compound is preferably exemplified.
  • the dispersion composition according to the present disclosure includes a compound having a structure represented by the following formula (1), and at least one compound selected from the group consisting of a solvent, a binder, and a curable compound.
  • X each independently represents a single bond or a linking group
  • Z 1 and Z 2 each independently represent a group forming an aliphatic ring or an aromatic ring
  • R 9 and R 10 In at least one selected from the group, a group having a dye structure is bonded or coordinated, and R 9 or R 10 in which the group having the dye structure is not bonded or coordinated represents a substituent, Further, R 9 and R 10 may combine with each other to form a ring together with the boron atom.
  • the compound having the structure represented by the formula (1), the solvent, the binder, and the curable compound in the dispersion composition according to the present disclosure include the structure represented by the formula (1) described above in the composition according to the present disclosure.
  • a solvent, a binder, and a curable compound, and the preferred embodiments are also the same.
  • components other than those described above can preferably include the components described above in the composition according to the present disclosure.
  • the dispersion composition according to the present disclosure preferably includes a dispersant from the viewpoints of dispersibility and dispersion stability.
  • the dispersion composition according to the present disclosure preferably includes a dye derivative from the viewpoint of dispersibility and dispersion stability, More preferably, it contains a pigment derivative.
  • the dispersant and the dye derivative in the dispersion composition according to the present disclosure have the same meanings as the dispersant and the dye derivative described above in the composition according to the present disclosure, and the preferred embodiments are also the same.
  • SQ-D-1 is a compound described in JP-A-2017-165857.
  • the numerical value attached to the side chain represents the number of repeating units.
  • E-1 Acrybase FF-426 (Fujikura Kasei Co., Ltd., alkali-soluble resin)
  • E-2 ARTON F4520 (Cyclic polyolefin resin manufactured by JSR Corporation)
  • ⁇ Polymerizable compound> M-1 Aronix M-305 (manufactured by Toagosei Co., Ltd., a mixture of the following two compounds. The content of triacrylate is 55% by mass to 63% by mass.)
  • M-2 KAYARAD RP-1040 (manufactured by Nippon Kayaku Co., Ltd., ethylene oxide-modified pentaerythritol tetraacrylate)
  • M-3 Aronix M-510 (manufactured by Toagosei Co., Ltd., polybasic acid-modified acrylic oligomer)
  • ⁇ Preparation of pigment dispersion 10 parts by mass of a pigment shown in Table 3 or 5 below, 3 parts by mass of a derivative shown in Table 3 or 5 below, 7.8 parts by mass of a dispersant shown in Table 3 or 5 below, propylene glycol methyl ether acetate ( 150 parts by mass of PGMEA) and 230 parts by mass of zirconia beads having a diameter of 0.3 mm were mixed, subjected to a dispersion treatment using a paint shaker for 5 hours, and the beads were separated by filtration to produce a dispersion.
  • PGMEA propylene glycol methyl ether acetate
  • the average particle diameter of the pigment in the dispersion was measured on a volume basis using MICROTRACUPA 150 manufactured by Nikkiso Co., Ltd.
  • ⁇ Preparation of cured film 1 The curable composition was applied on a glass substrate by spin coating, and then heated at 100 ° C. for 2 minutes using a hot plate to obtain a composition layer. The obtained composition layer was exposed at an exposure of 500 mJ / cm 2 using an i-line stepper. Next, the composition layer after the exposure was subjected to a curing treatment at 220 ° C. for 5 minutes using a hot plate to obtain a cured film having a thickness of 0.7 ⁇ m.
  • ⁇ heat resistance evaluation >> The obtained film was heated at 260 ° C. for 300 seconds using a hot plate.
  • the change in transmittance at the wavelength where the change in transmittance before and after heating was the largest was calculated from the following equation, and the change in transmittance was evaluated based on the following criteria.
  • Transmittance change
  • Residual rate (%) ⁇ (absorbance after heating) / (absorbance before heating) ⁇ ⁇ 100
  • Residual rate is 80% or less
  • the obtained film was set in a discoloration tester equipped with a super xenon lamp (100,000 lux), and irradiated with 100,000 lux of light for 50 hours under the condition where no ultraviolet cut filter was used.
  • the transmission spectrum of the film after light irradiation was measured using a spectrophotometer U-4100 (manufactured by Hitachi High-Technologies Corporation). In the wavelength range of 400 nm to 1200 nm, the change in transmittance at the wavelength where the change in transmittance before and after light irradiation was the largest was calculated from the following equation, and the heat resistance was evaluated based on the following criteria.
  • Transmittance change
  • Residual rate (%) ⁇ (absorbance after light irradiation) / (absorbance before light irradiation) ⁇ ⁇ 100
  • F-1 Glycidyl methacrylate skeleton random polymer (manufactured by NOF Corporation, Marproof G-0150M, weight average molecular weight 10,000)
  • F-2 EPICLON HP-4700 (Naphthalene epoxy resin, manufactured by DIC Corporation)
  • F-3 JER1031S (manufactured by Mitsubishi Chemical Corporation, polyfunctional epoxy resin)
  • F-4 EHPE3150 (manufactured by Daicel Corporation, 1,2-epoxy-4- (2-oxiranyl) cyclohexane adduct of 2,2-bis (hydroxymethyl) -1-butanol)
  • G-1 Trimellitic acid
  • G-2 Pyromellitic anhydride
  • G-3 N, N-dimethyl-4-aminopyridine
  • G-4 Pentaerythritol tetrakis (3-mercaptopropionate)
  • Example 1 the same results as in Example 1 were obtained even when no polymerization inhibitor was added. In Example 1, the same results as in Example 1 were obtained even when no surfactant was added. In Example 1, the same result as that of Example 1 was obtained even when the half of the weight of the dispersion 1 was replaced with the dispersion 3.
  • Example 101 to 139 Using the compositions obtained in Examples 1 to 39, a 2 ⁇ m square pattern (infrared cut filter) was formed by the following method.
  • compositions obtained in Examples 1 to 22 or 27 to 38 were applied by spin coating so that the film thickness after film formation was 1.0 ⁇ m. Next, it was heated at 100 ° C. for 2 minutes using a hot plate. Then, exposure was performed at 1,000 mJ / cm 2 through a 2 ⁇ m square dot pattern mask using an i-line stepper exposure apparatus FPA-3000i5 + (manufactured by Canon Inc.). Next, paddle development was performed at 23 ° C. for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH). Thereafter, the substrate was rinsed with a spin shower and further washed with pure water. Next, a 2 ⁇ m square pattern (infrared cut filter) was formed by heating at 200 ° C. for 5 minutes using a hot plate.
  • TMAH tetramethylammonium hydroxide
  • compositions obtained in Examples 23 to 26 or 39 were applied onto a silicon wafer by spin coating so that the film thickness after film formation was 1.0 ⁇ m. Then, it heated at 100 degreeC for 2 minutes using the hot plate. Next, it heated at 200 degreeC for 5 minutes using the hot plate. Next, a 2 ⁇ m square pattern (infrared cut filter) was formed by dry etching.
  • the Red composition was applied by spin coating so that the film thickness after film formation was 1.0 ⁇ m.
  • it was heated at 100 ° C. for 2 minutes using a hot plate.
  • exposure was performed at 1,000 mJ / cm 2 through a 2 ⁇ m square dot pattern mask using an i-line stepper exposure apparatus FPA-3000i5 + (manufactured by Canon Inc.).
  • paddle development was performed at 23 ° C. for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH). Thereafter, the substrate was rinsed with a spin shower and further washed with pure water.
  • TMAH tetramethylammonium hydroxide
  • the red composition was patterned on the pattern of the infrared cut filter by heating at 200 ° C. for 5 minutes using a hot plate.
  • the Green composition and the Blue composition were sequentially patterned to form red, green, and blue coloring patterns (Bayer patterns).
  • the Bayer pattern is defined as one red (Red) element, two green (Green) elements, and one blue (Blue) element as disclosed in US Pat. No. 3,971,065. In this embodiment, one red (Red) element, one green (Green) element, and one blue (Blue) element are used. 2.)
  • a Bayer pattern was formed by repeating a 2 ⁇ 2 array of the element and a filter element having one infrared transmission filter element.
  • composition for forming an infrared transmission filter (the following composition 100 or composition 101) was applied on the patterned film by a spin coating method so that the film thickness after the film formation was 2.0 ⁇ m.
  • it was heated at 100 ° C. for 2 minutes using a hot plate.
  • exposure was performed at 1,000 mJ / cm 2 through a 2 ⁇ m square Bayer pattern mask using an i-line stepper exposure apparatus FPA-3000i5 + (manufactured by Canon Inc.).
  • paddle development was performed at 23 ° C. for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH). Thereafter, the substrate was rinsed with a spin shower and further washed with pure water.
  • TMAH tetramethylammonium hydroxide
  • the infrared transmitting filter was patterned in the missing portion where the coloring pattern was not formed in the Bayer pattern of the infrared cut filter.
  • the obtained solid-state imaging device was irradiated with infrared rays from an infrared light-emitting diode (infrared LED) in a low-illuminance environment (0.001 lux) to capture an image and evaluate image performance.
  • infrared LED infrared light-emitting diode
  • the Red composition, Green composition, Blue composition, and composition for forming an infrared transmission filter used in Examples 101 to 139 are as follows.
  • Red pigment dispersion 51.7 parts by mass Resin 4 (40% by mass PGMEA solution): 0.6 part by mass Polymerizable compound 4: 0.6 parts by mass Photopolymerization initiator 1: 0.3 parts by mass Surfactant 1: 4.2 parts by mass PGMEA: 42.6 parts by mass
  • Green pigment dispersion 73.7 parts by mass Resin 4 (40% by mass PGMEA solution): 0.3 part by mass Polymerizable compound 1: 1.2 parts by mass Photopolymerization initiator 1: 0.6 parts by mass Surfactant 1: 4.2 parts by mass UV absorber (UV-503, manufactured by Daito Chemical Co., Ltd.): 0.5 parts by mass PGMEA: 19.5 parts by mass
  • Blue pigment dispersion 44.9 parts by mass Resin 4 (40% by mass PGMEA solution): 2.1 parts by mass Polymerizable compound 1: 1.5 parts by mass Polymerizable compound 4: 0.7 parts by mass Photopolymerization initiator 1: 0.8 parts by mass Surfactant 1: 4.2 parts by mass PGMEA: 45.8 parts by mass
  • composition for forming an infrared transmission filter The components in the following composition were mixed, stirred, and then filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 ⁇ m to prepare a composition for forming an infrared transmission filter.
  • Pigment dispersion liquid 1-1 46.5 parts by mass Pigment dispersion liquid 1-2: 37.1 parts by mass Polymerizable compound 5: 1.8 parts by mass Resin 4: 1.1 parts by mass Photopolymerization initiator 2: 0.9 parts by mass Surfactant 1: 4.2 parts by mass Polymerization inhibitor (p-methoxyphenol): 0.001 parts by mass Silane coupling agent: 0.6 parts by mass PGMEA: 7.8 parts by mass
  • Pigment dispersion 2-1 1,000 parts by mass Polymerizable compound (dipentaerythritol hexaacrylate): 50 parts by mass Resin: 17 parts by mass Photopolymerization initiator (1- [4- (phenylthio)]-1,2-octanedione-2- (O-benzoyloxime)): 10 parts by mass PGMEA: 179 parts by mass Alkali-soluble polymer F-1: 17 parts by mass (solids concentration: 35 parts by mass)
  • alkali-soluble polymer F-1 solid content: 35% by mass.
  • This polymer had a polystyrene-equivalent weight average molecular weight of 9,700, a number average molecular weight of 5,700, and Mw / Mn of 1.70.
  • the raw materials used for the Red composition, the Green composition, the Blue composition, and the composition for forming an infrared transmission filter are as follows.
  • Red pigment dispersion C. I. Pigment Red 254, 9.6 parts by mass, C.I. I. Pigment Yellow 139 (4.3 parts by mass), a dispersant (Disperbyk-161, manufactured by BYK Chemie), 6.8 parts by mass, and PGMEA (79.3 parts by mass) were mixed in a bead mill (zirconia beads 0.3 mm in diameter). ) For 3 hours to prepare a pigment dispersion. Thereafter, further, a dispersion treatment was performed using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a pressure reducing mechanism at a flow rate of 500 g / min under a pressure of 2,000 kg / cm 3 . This dispersion treatment was repeated 10 times to obtain a red pigment dispersion.
  • NANO-3000-10 manufactured by Nippon BEE Co., Ltd.
  • Green pigment dispersion C. I. Pigment Green 36, 6.4 parts by mass, C.I. I. Pigment Yellow 150 (5.3 parts by mass), a dispersant (Disperbyk-161, manufactured by BYK Chemie) 5.2 parts by mass, and a mixed solution consisting of PGMEA 83.1 parts by mass were mixed with a bead mill (0.3 mm diameter zirconia beads). For 3 hours to prepare a pigment dispersion. Thereafter, further, a dispersion treatment was performed using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a pressure reducing mechanism at a flow rate of 500 g / min under a pressure of 2,000 kg / cm 3 . This dispersion treatment was repeated 10 times to obtain a Green pigment dispersion.
  • NANO-3000-10 manufactured by Nippon BEE Co., Ltd.
  • Blue pigment dispersion C. I. Pigment Blue 15: 6 at 9.7 parts by mass, C.I. I. Pigment Violet 23 (2.4 parts by mass), a dispersant (Disperbyk-161, manufactured by BYK Chemie), 5.5 parts, and a mixed solution consisting of 82.4 parts of PGMEA were mixed with a bead mill (zirconia beads having a diameter of 0.3 mm). After mixing and dispersion for a time, a pigment dispersion was prepared.
  • a dispersion treatment was performed using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a pressure reducing mechanism at a flow rate of 500 g / min under a pressure of 2,000 kg / cm 3 . This dispersion treatment was repeated 10 times to obtain a Blue pigment dispersion.
  • NANO-3000-10 manufactured by Nippon BEE Co., Ltd.
  • ⁇ Pigment dispersion liquid 1-1 Using a 0.3 mm diameter zirconia bead, a mixed solution having the following composition was mixed and dispersed in a bead mill (a high-pressure dispersing machine NANO-3000-10 with a decompression mechanism (manufactured by Nippon BEE Co., Ltd.)) for 3 hours. Thus, a pigment dispersion liquid 1-1 was prepared.
  • Pigment dispersion liquid 1-2 Using a 0.3 mm diameter zirconia bead, a mixed solution having the following composition was mixed and dispersed in a bead mill (a high-pressure dispersing machine NANO-3000-10 with a decompression mechanism (manufactured by Nippon BEE Co., Ltd.)) for 3 hours. Thus, a pigment dispersion liquid 1-2 was prepared.
  • Polymerizable compound 1 KAYARAD DPHA (mixture of dipentaerythritol hexaacrylate and dipentaerythritol pentaacrylate, manufactured by Nippon Kayaku Co., Ltd.)
  • Polymerizable compound 4 the following structure
  • Polymerizable compound 5 the following structure (a mixture of the left compound and the right compound having a molar ratio of 7: 3)
  • Photopolymerization initiator 1 IRGACURE-OXE01 (1- [4- (phenylthio)]-1,2-octanedione-2- (O-benzoyloxime), manufactured by BASF) -Photopolymerization initiator 2: The following structure
  • -Silane coupling agent a compound having the following structure.
  • Et represents an ethyl group.
  • Example 201 After mixing and stirring the following components, the mixture was filtered through a nylon filter (manufactured by Nippon Pole Co., Ltd.) having a pore size of 0.45 ⁇ m to prepare a pattern-forming composition of Example 201.
  • Pattern forming composition of Example 1 22.67 parts by mass Pigment dispersion 2-1: 51.23 parts by mass
  • the cured film obtained by using the composition for pattern formation of Example 201 shields light having a wavelength in the visible region and transmits at least part of light having a wavelength in the near infrared region (near infrared light). I was able to.
  • Example 202 After mixing and stirring the following components, the mixture was filtered through a nylon filter (manufactured by Nippon Pall Co., Ltd.) having a pore size of 0.45 ⁇ m to prepare a pattern-forming composition of Example 202.
  • Pattern forming composition of Example 1 36.99 parts by mass Pigment dispersion liquid 1-1: 46.5 parts by mass Pigment dispersion liquid 1-2: 37.1 parts by mass
  • the heat resistance, the pattern shape, and the development residue were evaluated using the pattern forming composition of Example 202 in the same manner as in Example 1, the same effects as in Example 1 were obtained.
  • the cured film obtained using the composition for pattern formation of Example 202 shields light having a wavelength in the visible region and transmits at least a portion of light having a wavelength in the near infrared region (near infrared light). I was able to.
  • Example 301 Using the compositions obtained in the above Examples 1 to 39, using a glass substrate as a substrate, and applying the above composition on a glass substrate, the same procedure as in Example 1 was carried out except for the infrared shielding property, heat resistance, pattern shape, Even when the evaluation of the development residue is performed, the same effects as in Examples 1 to 39 can be obtained.
  • Example 302 Using the compositions obtained in Example 201 and Example 202, a glass substrate was used as the substrate, and the heat resistance and pattern were the same as in Example 201 or Example 202 except that the composition was applied on the glass substrate. Even when the shape and the development residue are evaluated, the same effects as in the example 201 and the example 202 can be obtained.
  • 110 solid-state imaging device
  • 111 infrared cut filter
  • 112 color filter
  • 114 infrared transmission filter
  • 115 microlens
  • 116 flattening layer

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Cited By (4)

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US20210066598A1 (en) * 2019-08-28 2021-03-04 Universal Display Corporation Organic electroluminescent materials and devices
JP2021518850A (ja) * 2019-02-28 2021-08-05 エルジー・ケム・リミテッド 化合物、これを含む色変換フィルム、バックライトユニットおよびディスプレイ装置
JPWO2022014236A1 (zh) * 2020-07-15 2022-01-20
US20220348770A1 (en) * 2021-04-07 2022-11-03 Becton, Dickinson And Company Water-soluble yellow green absorbing dyes

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