JP2004212472A5 - - Google Patents

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Publication number: JP2004212472A5
Authority: JP; Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP2002379496A

Other versions

JP4294311B2 (ja

JP2004212472A (ja

Filing date

2002-12-27

Publication date

2006-03-02

2002-12-27 Application filed filed Critical

2002-12-27 Priority claimed from JP2002379496A external-priority patent/JP4294311B2/ja

2002-12-27 Priority to JP2002379496A priority Critical patent/JP4294311B2/ja

2003-11-26 Priority to US10/721,470 priority patent/US7209208B2/en

2003-12-08 Priority to TW092134604A priority patent/TWI336500B/zh

2003-12-26 Priority to CNB2003101235612A priority patent/CN100504599C/zh

2003-12-27 Priority to KR1020030098020A priority patent/KR101065598B1/ko

2004-07-29 Publication of JP2004212472A publication Critical patent/JP2004212472A/ja

2006-03-02 Publication of JP2004212472A5 publication Critical patent/JP2004212472A5/ja

2007-03-22 Priority to US11/723,794 priority patent/US7535535B2/en

2009-07-08 Publication of JP4294311B2 publication Critical patent/JP4294311B2/ja

2009-07-08 Application granted granted Critical

2022-12-27 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

JP2002379496A 2002-12-27 2002-12-27 表示装置の作製方法および表示装置の加工基板 Expired - Fee Related JP4294311B2 (ja)

Priority Applications (6)

Application Number	Priority Date	Filing Date	Title
JP2002379496A JP4294311B2 (ja)	2002-12-27	2002-12-27	表示装置の作製方法および表示装置の加工基板
US10/721,470 US7209208B2 (en)	2002-12-27	2003-11-26	Manufacturing method of display device
TW092134604A TWI336500B (en)	2002-12-27	2003-12-08	Manufacturing method of display device
CNB2003101235612A CN100504599C (zh)	2002-12-27	2003-12-26	显示器件的制作方法
KR1020030098020A KR101065598B1 (ko)	2002-12-27	2003-12-27	표시 장치의 제조 방법
US11/723,794 US7535535B2 (en)	2002-12-27	2007-03-22	Manufacturing method of display device

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2002379496A JP4294311B2 (ja)	2002-12-27	2002-12-27	表示装置の作製方法および表示装置の加工基板

Publications (3)

Publication Number	Publication Date
JP2004212472A JP2004212472A (ja)	2004-07-29
JP2004212472A5 true JP2004212472A5 (ja)	2006-03-02
JP4294311B2 JP4294311B2 (ja)	2009-07-08

Family

ID=32652745

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP2002379496A Expired - Fee Related JP4294311B2 (ja)	2002-12-27	2002-12-27	表示装置の作製方法および表示装置の加工基板

Country Status (5)

Country	Link
US (2)	US7209208B2 (ja)
JP (1)	JP4294311B2 (ja)
KR (1)	KR101065598B1 (ja)
CN (1)	CN100504599C (ja)
TW (1)	TWI336500B (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
KR101255310B1 (ko) *	2006-06-29	2013-04-15	엘지디스플레이 주식회사	Ｇｉｐ 구조의 액정표시장치용 기판 및 ｇｉｐ 구조의 액정표시장치의 제조 방법
KR101327491B1 (ko) *	2006-11-28	2013-11-08	엘지디스플레이 주식회사	영상표시장치의 전원전압생성회로
US8354724B2 (en) *	2007-03-26	2013-01-15	Semiconductor Energy Laboratory Co., Ltd.	Semiconductor device and electronic device
US8576370B1 (en) *	2010-06-30	2013-11-05	Rockwell Collins, Inc.	Systems and methods for nonplanar laminated assemblies
KR102150881B1 (ko) *	2019-03-21	2020-09-02	동우 화인켐 주식회사	터치센서 및 이를 형성하는 노광 마스크
KR20220022647A (ko) *	2020-08-19	2022-02-28	엘지디스플레이 주식회사	타일링 표시 장치

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JPH03166521A (ja)	1989-11-24	1991-07-18	Seiko Instr Inc	液晶電気光学装置の製造方法
JP2834935B2 (ja)	1992-06-11	1998-12-14	シャープ株式会社	アクティブマトリクス型表示素子及びその製造方法
US5437946A (en) *	1994-03-03	1995-08-01	Nikon Precision Inc.	Multiple reticle stitching for scanning exposure system
JPH08152652A (ja)	1994-09-30	1996-06-11	Toshiba Corp	フラットパネル表示装置用アレイ基板
US5657139A (en) *	1994-09-30	1997-08-12	Kabushiki Kaisha Toshiba	Array substrate for a flat-display device including surge protection circuits and short circuit line or lines
JPH08110526A (ja)	1994-10-07	1996-04-30	Matsushita Electric Ind Co Ltd	薄膜トランジスタ基板の集合基板
JP3642876B2 (ja) *	1995-08-04	2005-04-27	株式会社半導体エネルギー研究所	プラズマを用いる半導体装置の作製方法及びプラズマを用いて作製された半導体装置
JPH0950951A (ja) *	1995-08-04	1997-02-18	Nikon Corp	リソグラフィ方法およびリソグラフィ装置
JPH09138418A (ja)	1995-09-14	1997-05-27	Citizen Watch Co Ltd	液晶マトリックス表示パネルの検査方法
JPH09113921A (ja) *	1995-10-16	1997-05-02	Toshiba Corp	液晶表示器の電極基板
JPH09113562A (ja)	1995-10-20	1997-05-02	Citizen Watch Co Ltd	液晶マトリックス表示パネルの検査方法
US5859690A (en) *	1996-03-28	1999-01-12	Nikon Corporation	Method of dividing and exposing patterns
JPH09266168A (ja) *	1996-03-28	1997-10-07	Nikon Corp	露光方法及びレチクル
KR100468234B1 (ko) *	1996-05-08	2005-06-22	가부시키가이샤 니콘	노광방법,노광장치및디스크
JPH1012544A (ja) *	1996-06-26	1998-01-16	Nikon Corp	位置計測方法及び露光方法
US6097361A (en) *	1997-01-29	2000-08-01	Advanced Micro Devices, Inc.	Photolithographic exposure system and method employing a liquid crystal display (LCD) panel as a configurable mask
JP3250142B2 (ja) *	1997-02-06	2002-01-28	三菱電機株式会社	マトリックス型液晶表示装置およびその製造方法
TW493096B (en) *	1997-08-29	2002-07-01	Toshiba Corp	Liquid crystal display device and method for manufacturing the same
JPH1184353A (ja) *	1997-09-12	1999-03-26	Sharp Corp	液晶パネルの製造方法
TW432469B (en) *	1998-02-06	2001-05-01	Nippon Kogaku Kk	Exposure apparatus, exposure method, and recording medium
JP3667548B2 (ja) *	1998-03-27	2005-07-06	シャープ株式会社	アクティブマトリクス型液晶表示パネル及びその検査方法
JP3807096B2 (ja)	1998-05-15	2006-08-09	セイコーエプソン株式会社	アクティブマトリクス基板及びこれを備えた電気光学パネル
JP3481465B2 (ja) *	1998-07-14	2003-12-22	シャープ株式会社	アクティブマトリクス基板の集合基板
US6677171B1 (en) *	1998-07-14	2004-01-13	Sharp Kabushiki Kaisha	Manufacturing method of collective substrate of active-matrix substrates, manufacturing method of active-matrix substrates, and inspecting method of collective substrates of active-matrix substrates
JP2000180885A (ja)	1998-12-17	2000-06-30	Toshiba Corp	アレイ基板およびその検査方法
US6346979B1 (en) *	1999-03-17	2002-02-12	International Business Machines Corporation	Process and apparatus to adjust exposure dose in lithography systems
JP2001100167A (ja)	1999-09-29	2001-04-13	Seiko Epson Corp	液晶表示装置の製造方法
JP3888013B2 (ja)	1999-12-10	2007-02-28	セイコーエプソン株式会社	電気光学装置の製造方法
US6844910B2 (en) *	1999-12-28	2005-01-18	Semiconductor Energy Laboratory Co., Ltd.	Liquid crystal display device and manufacturing method thereof
JP2001249344A (ja)	1999-12-28	2001-09-14	Semiconductor Energy Lab Co Ltd	液晶表示装置及びその製造方法
JP2002344097A (ja)	2001-05-14	2002-11-29	Matsushita Electric Ind Co Ltd	実装用基板及びこの基板を有する表示装置
JP2002341377A (ja)	2001-05-15	2002-11-27	Matsushita Electric Ind Co Ltd	薄膜トランジスタアレイ基板

2002
- 2002-12-27 JP JP2002379496A patent/JP4294311B2/ja not_active Expired - Fee Related
2003
- 2003-11-26 US US10/721,470 patent/US7209208B2/en not_active Expired - Fee Related
- 2003-12-08 TW TW092134604A patent/TWI336500B/zh not_active IP Right Cessation
- 2003-12-26 CN CNB2003101235612A patent/CN100504599C/zh not_active Expired - Fee Related
- 2003-12-27 KR KR1020030098020A patent/KR101065598B1/ko not_active Expired - Fee Related
2007
- 2007-03-22 US US11/723,794 patent/US7535535B2/en not_active Expired - Fee Related

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