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FR2480504B1 - Transistor programmable et effacable electriquement - Google Patents

Transistor programmable et effacable electriquement

Info

Publication number
FR2480504B1
FR2480504B1 FR8107043A FR8107043A FR2480504B1 FR 2480504 B1 FR2480504 B1 FR 2480504B1 FR 8107043 A FR8107043 A FR 8107043A FR 8107043 A FR8107043 A FR 8107043A FR 2480504 B1 FR2480504 B1 FR 2480504B1
Authority
FR
France
Prior art keywords
electrically programmable
erasable
transistor
erasable transistor
programmable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8107043A
Other languages
English (en)
Other versions
FR2480504A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Raytheon Co
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of FR2480504A1 publication Critical patent/FR2480504A1/fr
Application granted granted Critical
Publication of FR2480504B1 publication Critical patent/FR2480504B1/fr
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0425Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing a merged floating gate and select transistor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/68Floating-gate IGFETs
    • H10D30/681Floating-gate IGFETs having only two programming levels
    • H10D30/683Floating-gate IGFETs having only two programming levels programmed by tunnelling of carriers, e.g. Fowler-Nordheim tunnelling
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/351Substrate regions of field-effect devices
    • H10D62/357Substrate regions of field-effect devices of FETs
    • H10D62/364Substrate regions of field-effect devices of FETs of IGFETs
    • H10D62/378Contact regions to the substrate regions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3011Impedance
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S257/00Active solid-state devices, e.g. transistors, solid-state diodes
    • Y10S257/901MOSFET substrate bias

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Read Only Memory (AREA)
  • Non-Volatile Memory (AREA)
FR8107043A 1980-04-09 1981-04-08 Transistor programmable et effacable electriquement Expired FR2480504B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06138806 US4375087C1 (en) 1980-04-09 1980-04-09 Electrically erasable programmable read-only memory

Publications (2)

Publication Number Publication Date
FR2480504A1 FR2480504A1 (fr) 1981-10-16
FR2480504B1 true FR2480504B1 (fr) 1985-07-12

Family

ID=22483738

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8107043A Expired FR2480504B1 (fr) 1980-04-09 1981-04-08 Transistor programmable et effacable electriquement

Country Status (5)

Country Link
US (1) US4375087C1 (fr)
JP (1) JPS5718087A (fr)
DE (1) DE3113595A1 (fr)
FR (1) FR2480504B1 (fr)
GB (1) GB2073488B (fr)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1209227B (it) * 1980-06-04 1989-07-16 Sgs Microelettronica Spa Cella di memoria non volatile a 'gate' flottante elettricamente alterabile.
US4495427A (en) * 1980-12-05 1985-01-22 Rca Corporation Programmable logic gates and networks
DE3171836D1 (en) * 1980-12-08 1985-09-19 Toshiba Kk Semiconductor memory device
DE3174858D1 (en) * 1980-12-25 1986-07-24 Fujitsu Ltd Nonvolatile semiconductor memory device
US4479203A (en) * 1981-11-16 1984-10-23 Motorola, Inc. Electrically erasable programmable read only memory cell
WO1983003166A1 (fr) * 1982-03-09 1983-09-15 Rca Corp Dispositif de memoire remanente a porte flottante et modifiable electriquement
JPS5955071A (ja) * 1982-09-24 1984-03-29 Hitachi Micro Comput Eng Ltd 不揮発性半導体装置
JPS6038799A (ja) * 1983-08-11 1985-02-28 Seiko Instr & Electronics Ltd 半導体不揮発性メモリ用読み出し回路
US4769340A (en) * 1983-11-28 1988-09-06 Exel Microelectronics, Inc. Method for making electrically programmable memory device by doping the floating gate by implant
JPS61123169A (ja) * 1984-11-20 1986-06-11 Fujitsu Ltd 半導体集積回路
US4783766A (en) * 1986-05-30 1988-11-08 Seeq Technology, Inc. Block electrically erasable EEPROM
JPH0772996B2 (ja) * 1987-01-31 1995-08-02 株式会社東芝 不揮発性半導体メモリ
JPS63249375A (ja) * 1987-04-06 1988-10-17 Oki Electric Ind Co Ltd 半導体記憶装置のデ−タ消去方法
JP2633252B2 (ja) * 1987-06-11 1997-07-23 沖電気工業株式会社 半導体記憶装置
JP2685770B2 (ja) * 1987-12-28 1997-12-03 株式会社東芝 不揮発性半導体記憶装置
FR2621737B1 (fr) * 1987-10-09 1991-04-05 Thomson Semiconducteurs Memoire en circuit integre
USRE35838E (en) * 1987-12-28 1998-07-07 Kabushiki Kaisha Toshiba Electrically erasable programmable read-only memory with NAND cell structure
US4953928A (en) * 1989-06-09 1990-09-04 Synaptics Inc. MOS device for long-term learning
JP2609332B2 (ja) * 1989-10-19 1997-05-14 シャープ株式会社 半導体記憶装置
US5094968A (en) * 1990-11-21 1992-03-10 Atmel Corporation Fabricating a narrow width EEPROM with single diffusion electrode formation
US5086325A (en) * 1990-11-21 1992-02-04 Atmel Corporation Narrow width EEPROM with single diffusion electrode formation
JP2655765B2 (ja) * 1991-05-29 1997-09-24 ローム株式会社 半導体装置
US5396459A (en) * 1992-02-24 1995-03-07 Sony Corporation Single transistor flash electrically programmable memory cell in which a negative voltage is applied to the nonselected word line
US5379253A (en) * 1992-06-01 1995-01-03 National Semiconductor Corporation High density EEPROM cell array with novel programming scheme and method of manufacture
DE19518728C2 (de) * 1995-05-22 1998-12-24 Siemens Ag Konstantstromquelle mit einer EEPROM-Zelle
US5930171A (en) * 1995-05-22 1999-07-27 Siemens Aktiengesellschaft Constant-current source with an EEPROM cell
EP0752721B1 (fr) * 1995-06-29 2009-04-29 Sharp Kabushiki Kaisha Mémoire semi-conductrice non-volatile et méthode de commande et procédé de fabrication
US5877054A (en) * 1995-06-29 1999-03-02 Sharp Kabushiki Kaisha Method of making nonvolatile semiconductor memory
JP3366173B2 (ja) * 1995-07-31 2003-01-14 シャープ株式会社 不揮発性半導体メモリの製造方法
DE19614010C2 (de) * 1996-04-09 2002-09-19 Infineon Technologies Ag Halbleiterbauelement mit einstellbarer, auf einem tunnelstromgesteuerten Lawinendurchbruch basierender Stromverstärkung und Verfahren zu dessen Herstellung
US5717635A (en) * 1996-08-27 1998-02-10 International Business Machines Corporation High density EEPROM for solid state file
US5768186A (en) * 1996-10-25 1998-06-16 Ma; Yueh Yale High density single poly metal-gate non-volatile memory cell
US6906376B1 (en) * 2002-06-13 2005-06-14 A Plus Flash Technology, Inc. EEPROM cell structure and array architecture
TWI244165B (en) * 2002-10-07 2005-11-21 Infineon Technologies Ag Single bit nonvolatile memory cell and methods for programming and erasing thereof
EP1727152B1 (fr) * 2005-05-18 2008-12-24 STMicroelectronics SA Architecture de mémoire EEPROM
US8320191B2 (en) 2007-08-30 2012-11-27 Infineon Technologies Ag Memory cell arrangement, method for controlling a memory cell, memory array and electronic device

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3881180A (en) * 1971-11-30 1975-04-29 Texas Instruments Inc Non-volatile memory cell
JPS5516375B2 (fr) * 1973-05-18 1980-05-01
JPS507440A (fr) * 1973-05-18 1975-01-25
JPS5532031B2 (fr) * 1973-05-18 1980-08-22
JPS5613029B2 (fr) * 1973-09-21 1981-03-25
DE2525097C3 (de) * 1975-06-05 1982-08-05 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Betrieb eines n-Kanal-Speicher-FET
US4051464A (en) * 1975-09-08 1977-09-27 Honeywell Inc. Semiconductor memory cell
US4099196A (en) * 1977-06-29 1978-07-04 Intel Corporation Triple layer polysilicon cell
US4162504A (en) * 1977-12-27 1979-07-24 Rca Corp. Floating gate solid-state storage device
US4184207A (en) * 1978-01-27 1980-01-15 Texas Instruments Incorporated High density floating gate electrically programmable ROM
JPS5412275A (en) * 1978-06-01 1979-01-29 Sanyo Electric Co Ltd Charge releasing method in semiconductor memory

Also Published As

Publication number Publication date
US4375087A (en) 1983-02-22
GB2073488B (en) 1984-08-22
FR2480504A1 (fr) 1981-10-16
DE3113595C2 (fr) 1992-04-02
JPH0152840B2 (fr) 1989-11-10
US4375087C1 (en) 2002-01-01
JPS5718087A (en) 1982-01-29
DE3113595A1 (de) 1982-02-11
GB2073488A (en) 1981-10-14

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Legal Events

Date Code Title Description
CA Change of address
CD Change of name or company name
TP Transmission of property
ST Notification of lapse