FR2480504B1 - Transistor programmable et effacable electriquement - Google Patents
Transistor programmable et effacable electriquementInfo
- Publication number
- FR2480504B1 FR2480504B1 FR8107043A FR8107043A FR2480504B1 FR 2480504 B1 FR2480504 B1 FR 2480504B1 FR 8107043 A FR8107043 A FR 8107043A FR 8107043 A FR8107043 A FR 8107043A FR 2480504 B1 FR2480504 B1 FR 2480504B1
- Authority
- FR
- France
- Prior art keywords
- electrically programmable
- erasable
- transistor
- erasable transistor
- programmable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
- G11C16/0408—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
- G11C16/0425—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing a merged floating gate and select transistor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/68—Floating-gate IGFETs
- H10D30/681—Floating-gate IGFETs having only two programming levels
- H10D30/683—Floating-gate IGFETs having only two programming levels programmed by tunnelling of carriers, e.g. Fowler-Nordheim tunnelling
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
- H10D62/351—Substrate regions of field-effect devices
- H10D62/357—Substrate regions of field-effect devices of FETs
- H10D62/364—Substrate regions of field-effect devices of FETs of IGFETs
- H10D62/378—Contact regions to the substrate regions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3011—Impedance
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S257/00—Active solid-state devices, e.g. transistors, solid-state diodes
- Y10S257/901—MOSFET substrate bias
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Read Only Memory (AREA)
- Non-Volatile Memory (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06138806 US4375087C1 (en) | 1980-04-09 | 1980-04-09 | Electrically erasable programmable read-only memory |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2480504A1 FR2480504A1 (fr) | 1981-10-16 |
FR2480504B1 true FR2480504B1 (fr) | 1985-07-12 |
Family
ID=22483738
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8107043A Expired FR2480504B1 (fr) | 1980-04-09 | 1981-04-08 | Transistor programmable et effacable electriquement |
Country Status (5)
Country | Link |
---|---|
US (1) | US4375087C1 (fr) |
JP (1) | JPS5718087A (fr) |
DE (1) | DE3113595A1 (fr) |
FR (1) | FR2480504B1 (fr) |
GB (1) | GB2073488B (fr) |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1209227B (it) * | 1980-06-04 | 1989-07-16 | Sgs Microelettronica Spa | Cella di memoria non volatile a 'gate' flottante elettricamente alterabile. |
US4495427A (en) * | 1980-12-05 | 1985-01-22 | Rca Corporation | Programmable logic gates and networks |
DE3171836D1 (en) * | 1980-12-08 | 1985-09-19 | Toshiba Kk | Semiconductor memory device |
DE3174858D1 (en) * | 1980-12-25 | 1986-07-24 | Fujitsu Ltd | Nonvolatile semiconductor memory device |
US4479203A (en) * | 1981-11-16 | 1984-10-23 | Motorola, Inc. | Electrically erasable programmable read only memory cell |
WO1983003166A1 (fr) * | 1982-03-09 | 1983-09-15 | Rca Corp | Dispositif de memoire remanente a porte flottante et modifiable electriquement |
JPS5955071A (ja) * | 1982-09-24 | 1984-03-29 | Hitachi Micro Comput Eng Ltd | 不揮発性半導体装置 |
JPS6038799A (ja) * | 1983-08-11 | 1985-02-28 | Seiko Instr & Electronics Ltd | 半導体不揮発性メモリ用読み出し回路 |
US4769340A (en) * | 1983-11-28 | 1988-09-06 | Exel Microelectronics, Inc. | Method for making electrically programmable memory device by doping the floating gate by implant |
JPS61123169A (ja) * | 1984-11-20 | 1986-06-11 | Fujitsu Ltd | 半導体集積回路 |
US4783766A (en) * | 1986-05-30 | 1988-11-08 | Seeq Technology, Inc. | Block electrically erasable EEPROM |
JPH0772996B2 (ja) * | 1987-01-31 | 1995-08-02 | 株式会社東芝 | 不揮発性半導体メモリ |
JPS63249375A (ja) * | 1987-04-06 | 1988-10-17 | Oki Electric Ind Co Ltd | 半導体記憶装置のデ−タ消去方法 |
JP2633252B2 (ja) * | 1987-06-11 | 1997-07-23 | 沖電気工業株式会社 | 半導体記憶装置 |
JP2685770B2 (ja) * | 1987-12-28 | 1997-12-03 | 株式会社東芝 | 不揮発性半導体記憶装置 |
FR2621737B1 (fr) * | 1987-10-09 | 1991-04-05 | Thomson Semiconducteurs | Memoire en circuit integre |
USRE35838E (en) * | 1987-12-28 | 1998-07-07 | Kabushiki Kaisha Toshiba | Electrically erasable programmable read-only memory with NAND cell structure |
US4953928A (en) * | 1989-06-09 | 1990-09-04 | Synaptics Inc. | MOS device for long-term learning |
JP2609332B2 (ja) * | 1989-10-19 | 1997-05-14 | シャープ株式会社 | 半導体記憶装置 |
US5094968A (en) * | 1990-11-21 | 1992-03-10 | Atmel Corporation | Fabricating a narrow width EEPROM with single diffusion electrode formation |
US5086325A (en) * | 1990-11-21 | 1992-02-04 | Atmel Corporation | Narrow width EEPROM with single diffusion electrode formation |
JP2655765B2 (ja) * | 1991-05-29 | 1997-09-24 | ローム株式会社 | 半導体装置 |
US5396459A (en) * | 1992-02-24 | 1995-03-07 | Sony Corporation | Single transistor flash electrically programmable memory cell in which a negative voltage is applied to the nonselected word line |
US5379253A (en) * | 1992-06-01 | 1995-01-03 | National Semiconductor Corporation | High density EEPROM cell array with novel programming scheme and method of manufacture |
DE19518728C2 (de) * | 1995-05-22 | 1998-12-24 | Siemens Ag | Konstantstromquelle mit einer EEPROM-Zelle |
US5930171A (en) * | 1995-05-22 | 1999-07-27 | Siemens Aktiengesellschaft | Constant-current source with an EEPROM cell |
EP0752721B1 (fr) * | 1995-06-29 | 2009-04-29 | Sharp Kabushiki Kaisha | Mémoire semi-conductrice non-volatile et méthode de commande et procédé de fabrication |
US5877054A (en) * | 1995-06-29 | 1999-03-02 | Sharp Kabushiki Kaisha | Method of making nonvolatile semiconductor memory |
JP3366173B2 (ja) * | 1995-07-31 | 2003-01-14 | シャープ株式会社 | 不揮発性半導体メモリの製造方法 |
DE19614010C2 (de) * | 1996-04-09 | 2002-09-19 | Infineon Technologies Ag | Halbleiterbauelement mit einstellbarer, auf einem tunnelstromgesteuerten Lawinendurchbruch basierender Stromverstärkung und Verfahren zu dessen Herstellung |
US5717635A (en) * | 1996-08-27 | 1998-02-10 | International Business Machines Corporation | High density EEPROM for solid state file |
US5768186A (en) * | 1996-10-25 | 1998-06-16 | Ma; Yueh Yale | High density single poly metal-gate non-volatile memory cell |
US6906376B1 (en) * | 2002-06-13 | 2005-06-14 | A Plus Flash Technology, Inc. | EEPROM cell structure and array architecture |
TWI244165B (en) * | 2002-10-07 | 2005-11-21 | Infineon Technologies Ag | Single bit nonvolatile memory cell and methods for programming and erasing thereof |
EP1727152B1 (fr) * | 2005-05-18 | 2008-12-24 | STMicroelectronics SA | Architecture de mémoire EEPROM |
US8320191B2 (en) | 2007-08-30 | 2012-11-27 | Infineon Technologies Ag | Memory cell arrangement, method for controlling a memory cell, memory array and electronic device |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3881180A (en) * | 1971-11-30 | 1975-04-29 | Texas Instruments Inc | Non-volatile memory cell |
JPS5516375B2 (fr) * | 1973-05-18 | 1980-05-01 | ||
JPS507440A (fr) * | 1973-05-18 | 1975-01-25 | ||
JPS5532031B2 (fr) * | 1973-05-18 | 1980-08-22 | ||
JPS5613029B2 (fr) * | 1973-09-21 | 1981-03-25 | ||
DE2525097C3 (de) * | 1975-06-05 | 1982-08-05 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum Betrieb eines n-Kanal-Speicher-FET |
US4051464A (en) * | 1975-09-08 | 1977-09-27 | Honeywell Inc. | Semiconductor memory cell |
US4099196A (en) * | 1977-06-29 | 1978-07-04 | Intel Corporation | Triple layer polysilicon cell |
US4162504A (en) * | 1977-12-27 | 1979-07-24 | Rca Corp. | Floating gate solid-state storage device |
US4184207A (en) * | 1978-01-27 | 1980-01-15 | Texas Instruments Incorporated | High density floating gate electrically programmable ROM |
JPS5412275A (en) * | 1978-06-01 | 1979-01-29 | Sanyo Electric Co Ltd | Charge releasing method in semiconductor memory |
-
1980
- 1980-04-09 US US06138806 patent/US4375087C1/en not_active Expired - Lifetime
-
1981
- 1981-03-27 GB GB8109683A patent/GB2073488B/en not_active Expired
- 1981-04-03 DE DE19813113595 patent/DE3113595A1/de active Granted
- 1981-04-08 JP JP5190881A patent/JPS5718087A/ja active Granted
- 1981-04-08 FR FR8107043A patent/FR2480504B1/fr not_active Expired
Also Published As
Publication number | Publication date |
---|---|
US4375087A (en) | 1983-02-22 |
GB2073488B (en) | 1984-08-22 |
FR2480504A1 (fr) | 1981-10-16 |
DE3113595C2 (fr) | 1992-04-02 |
JPH0152840B2 (fr) | 1989-11-10 |
US4375087C1 (en) | 2002-01-01 |
JPS5718087A (en) | 1982-01-29 |
DE3113595A1 (de) | 1982-02-11 |
GB2073488A (en) | 1981-10-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
CA | Change of address | ||
CD | Change of name or company name | ||
TP | Transmission of property | ||
ST | Notification of lapse |