ES535239A0 - Un circuito integrado fotodetector - Google Patents
Un circuito integrado fotodetectorInfo
- Publication number
- ES535239A0 ES535239A0 ES535239A ES535239A ES535239A0 ES 535239 A0 ES535239 A0 ES 535239A0 ES 535239 A ES535239 A ES 535239A ES 535239 A ES535239 A ES 535239A ES 535239 A0 ES535239 A0 ES 535239A0
- Authority
- ES
- Spain
- Prior art keywords
- photodetector circuit
- integrated photodetector
- integrated
- circuit
- photodetector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/103—Integrated devices the at least one element covered by H10F30/00 having potential barriers, e.g. integrated devices comprising photodiodes or phototransistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
- H01L21/30612—Etching of AIIIBV compounds
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/02—Manufacture or treatment characterised by using material-based technologies
- H10D84/05—Manufacture or treatment characterised by using material-based technologies using Group III-V technology
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
- H10F30/21—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
- H10F30/22—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
- H10F30/223—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier being a PIN barrier
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Light Receiving Elements (AREA)
- Junction Field-Effect Transistors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB08322236A GB2145279B (en) | 1983-08-18 | 1983-08-18 | Photodetector integrated circuit |
Publications (2)
Publication Number | Publication Date |
---|---|
ES535239A0 true ES535239A0 (es) | 1985-11-16 |
ES8603113A1 ES8603113A1 (es) | 1985-11-16 |
Family
ID=10547489
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES535239A Expired ES8603113A1 (es) | 1983-08-18 | 1984-08-17 | Un circuito integrado fotodetector |
Country Status (6)
Country | Link |
---|---|
US (1) | US4636829A (es) |
EP (1) | EP0133709A3 (es) |
JP (1) | JPS60106183A (es) |
KR (1) | KR850002178A (es) |
ES (1) | ES8603113A1 (es) |
GB (1) | GB2145279B (es) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2145558A (en) * | 1983-08-23 | 1985-03-27 | Standard Telephones Cables Ltd | Field effect transistor |
JPS6161457A (ja) * | 1984-09-01 | 1986-03-29 | Canon Inc | 光センサおよびその製造方法 |
US5268309A (en) * | 1984-09-01 | 1993-12-07 | Canon Kabushiki Kaisha | Method for manufacturing a photosensor |
US4771325A (en) * | 1985-02-11 | 1988-09-13 | American Telephone & Telegraph Co., At&T Bell Laboratories | Integrated photodetector-amplifier device |
US4745446A (en) * | 1985-02-11 | 1988-05-17 | American Telephone And Telegraph Company, At&T Bell Laboratories | Photodetector and amplifier integration |
GB2172742B (en) * | 1985-03-21 | 1988-08-24 | Stc Plc | Photoconductor |
JPS62159477A (ja) * | 1986-01-08 | 1987-07-15 | Fujitsu Ltd | 光半導体装置 |
JPS62190779A (ja) * | 1986-02-18 | 1987-08-20 | Nippon Telegr & Teleph Corp <Ntt> | 集積形受光器 |
DE3751243T2 (de) * | 1986-02-18 | 1995-08-31 | Toshiba Kawasaki Kk | Opto-elektronisches Bauelement und Verfahren zu seiner Herstellung. |
DE3706252A1 (de) * | 1986-02-28 | 1987-09-03 | Canon Kk | Halbleiterfotosensor |
DE3606471A1 (de) * | 1986-02-28 | 1987-09-03 | Standard Elektrik Lorenz Ag | Monolithisch integriert aufgebaute eingangsstufe eines optischen empfaengers |
US4833512A (en) * | 1986-04-11 | 1989-05-23 | Itt Gallium Arsenide Technology Center, A Division Of Itt Corporation | Heterojunction photo-detector with transparent gate |
JPS6351681A (ja) * | 1986-08-20 | 1988-03-04 | Agency Of Ind Science & Technol | 半導体装置 |
DE3629681A1 (de) * | 1986-09-01 | 1988-03-10 | Licentia Gmbh | Photoempfaenger |
DE3629684A1 (de) * | 1986-09-01 | 1988-03-10 | Licentia Gmbh | Photoempfaenger |
DE3712864C2 (de) * | 1986-09-01 | 2001-05-17 | Daimler Chrysler Ag | Monolithisch integrierter Photoempfänger |
DE3629685C2 (de) * | 1986-09-01 | 2000-08-10 | Daimler Chrysler Ag | Photoempfänger |
DE3644408A1 (de) * | 1986-12-24 | 1988-07-07 | Licentia Gmbh | Photoempfaenger |
DE3644410A1 (de) * | 1986-12-24 | 1988-07-07 | Licentia Gmbh | Photoempfaenger |
DE3709301C2 (de) * | 1987-03-20 | 2001-12-06 | Daimler Chrysler Ag | Monolithisch integrierte Senderanordnung |
DE3711617A1 (de) * | 1987-04-07 | 1988-10-27 | Siemens Ag | Monolithisch integrierte wellenleiter-fotodioden-fet-kombination |
DE3903699A1 (de) * | 1988-02-08 | 1989-08-17 | Ricoh Kk | Bildsensor |
US4996163A (en) * | 1988-02-29 | 1991-02-26 | Sumitomo Electric Industries, Ltd. | Method for producing an opto-electronic integrated circuit |
US5170228A (en) * | 1988-02-29 | 1992-12-08 | Sumitomo Electric Industries, Ltd. | Opto-electronic integrated circuit |
FR2634066A1 (fr) * | 1988-07-05 | 1990-01-12 | Thomson Csf | Dispositif optoelectronique realise en optique integree et procede de realisation |
EP0400399A3 (de) * | 1989-05-31 | 1991-05-29 | Siemens Aktiengesellschaft | Monolithisch integrierte Photodiode-FET-Kombination |
EP0405214A3 (en) * | 1989-06-27 | 1991-06-05 | Siemens Aktiengesellschaft | Pin-fet combination with buried p-type layer |
ES2078863B1 (es) * | 1993-09-10 | 1996-08-01 | Telefonica Nacional Espana Co | Cabeza optica fotodetectora. |
US6407440B1 (en) | 2000-02-25 | 2002-06-18 | Micron Technology Inc. | Pixel cell with high storage capacitance for a CMOS imager |
US6583469B1 (en) * | 2002-01-28 | 2003-06-24 | International Business Machines Corporation | Self-aligned dog-bone structure for FinFET applications and methods to fabricate the same |
JP4453561B2 (ja) * | 2005-01-26 | 2010-04-21 | パナソニック電工株式会社 | タイマスイッチ |
KR101371401B1 (ko) * | 2010-11-03 | 2014-03-10 | 한국전자통신연구원 | 애벌런치 광다이오드 및 그 형성방법 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2048181A1 (de) * | 1970-09-30 | 1972-04-06 | Siemens Ag | Fototransistor |
EP0067566A3 (en) * | 1981-06-13 | 1985-08-07 | Plessey Overseas Limited | Integrated light detection or generation means and amplifying means |
DE3135462A1 (de) * | 1981-09-08 | 1983-09-01 | AEG-Telefunken Nachrichtentechnik GmbH, 7150 Backnang | Monolithische eingangsstufe eines optischen empfaengers |
GB2109991B (en) * | 1981-11-17 | 1985-05-15 | Standard Telephones Cables Ltd | Photodetector |
US4442445A (en) * | 1981-11-23 | 1984-04-10 | The United States Of America As Represented By The Secretary Of The Army | Planar doped barrier gate field effect transistor |
US4517581A (en) * | 1982-11-16 | 1985-05-14 | Itt Industries, Inc. | Photodetector |
-
1983
- 1983-08-18 GB GB08322236A patent/GB2145279B/en not_active Expired
-
1984
- 1984-08-11 EP EP84109598A patent/EP0133709A3/en not_active Withdrawn
- 1984-08-16 JP JP59170096A patent/JPS60106183A/ja active Pending
- 1984-08-16 US US06/641,881 patent/US4636829A/en not_active Expired - Fee Related
- 1984-08-17 ES ES535239A patent/ES8603113A1/es not_active Expired
- 1984-08-18 KR KR1019840004981A patent/KR850002178A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
EP0133709A2 (en) | 1985-03-06 |
ES8603113A1 (es) | 1985-11-16 |
GB8322236D0 (en) | 1983-09-21 |
KR850002178A (ko) | 1985-05-06 |
GB2145279B (en) | 1987-10-21 |
US4636829A (en) | 1987-01-13 |
EP0133709A3 (en) | 1985-07-10 |
GB2145279A (en) | 1985-03-20 |
JPS60106183A (ja) | 1985-06-11 |
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