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ES2127365T5 - Composicion liquida reticulable por radiacion, destinada en especial a la estereolitografia. - Google Patents

Composicion liquida reticulable por radiacion, destinada en especial a la estereolitografia.

Info

Publication number
ES2127365T5
ES2127365T5 ES94810474T ES94810474T ES2127365T5 ES 2127365 T5 ES2127365 T5 ES 2127365T5 ES 94810474 T ES94810474 T ES 94810474T ES 94810474 T ES94810474 T ES 94810474T ES 2127365 T5 ES2127365 T5 ES 2127365T5
Authority
ES
Spain
Prior art keywords
group
image
radiation
stereolitography
reticulable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES94810474T
Other languages
English (en)
Other versions
ES2127365T3 (es
Inventor
Jean-Pierre Dr Wolf
Adrian Dr Schulthess
Bettina Dr Steinmann
Max Dr Hunziker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huntsman Advanced Materials Switzerland GmbH
Original Assignee
Vantico GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=25690718&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ES2127365(T5) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Vantico GmbH filed Critical Vantico GmbH
Application granted granted Critical
Publication of ES2127365T3 publication Critical patent/ES2127365T3/es
Publication of ES2127365T5 publication Critical patent/ES2127365T5/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Silicon Polymers (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

SE DESCRIBEN COMPOSICIONES LIQUIDAS ENDURECIBLE CON RADIACION, EN PARTICULAR PARA ESTEREOLITOGRAFIA, SOBRE LA BASE AL MENOS DE UN COMPUESTO, QUE MUESTRA GRUPOS POLIMERIZABLES RADICALMENTE, Y AL MENOS UN FOTOINICIADOR APROPIADO PARA ESTA POLIMERIZACION, QUE ESTA CARACTERIZADO PORQUE CONTIENEN ADICIONALMENTE UN COPOLIMERO DE BLOQUE POLIOXIALQUILENO LAS FORMULAS QUIMICAS: DONDE R1 REPRESENTA UN ATOMO DE HIDROGENO O UN GRUPO C1 FENIL; [T] ES UN GRUPO [PS] POLISILOXANO DETERMINADO, ESPECIFICADOR EN EL TEXTO SEGUN FORMA DESCRITA; [PS] REPRESENTA GRUPOS DE LA FORMULA Y [ALQ] REPRESENTA UN GRUPO ALQUILENO CON 3 HASTA 10 ATOMOS DE CARBONO, ASI COMO NUEVO COPOLIMERO DE BLOQUE DE LAS FORMULAS (I) Y (II). LAS COMPOSICIONES ENDURECIDAS MUESTRAN POR EJEMPLO UNA ALTA TENACIDAD DE IMPACTO.
ES94810474T 1993-08-26 1994-08-17 Composicion liquida reticulable por radiacion, destinada en especial a la estereolitografia. Expired - Lifetime ES2127365T5 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH254193 1993-08-26
US08/292,654 US5461088A (en) 1993-08-26 1994-08-18 Liquid radiation-curable formulation, in particular for use in stereolithography

Publications (2)

Publication Number Publication Date
ES2127365T3 ES2127365T3 (es) 1999-04-16
ES2127365T5 true ES2127365T5 (es) 2002-08-16

Family

ID=25690718

Family Applications (1)

Application Number Title Priority Date Filing Date
ES94810474T Expired - Lifetime ES2127365T5 (es) 1993-08-26 1994-08-17 Composicion liquida reticulable por radiacion, destinada en especial a la estereolitografia.

Country Status (8)

Country Link
US (2) US5461088A (es)
EP (1) EP0643329B2 (es)
JP (1) JP3581936B2 (es)
AT (1) ATE175034T1 (es)
AU (1) AU674247B2 (es)
CA (1) CA2117572C (es)
DE (1) DE59407524D1 (es)
ES (1) ES2127365T5 (es)

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CN108291011B (zh) 2015-09-09 2021-03-02 卡本有限公司 用于增材制造的环氧双重固化树脂
FI129702B (en) 2015-10-09 2022-07-15 Inkron Ltd A material suitable for three-dimensional printing and a method for making a 3D-printed product
US10647873B2 (en) 2015-10-30 2020-05-12 Carbon, Inc. Dual cure article of manufacture with portions of differing solubility
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CN108475008B (zh) 2015-12-22 2020-11-06 卡本有限公司 一种形成三维物体的方法
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JP6894015B2 (ja) 2017-06-21 2021-06-23 カーボン，インコーポレイテッド 積層造形の方法
CN112004862A (zh) 2018-04-25 2020-11-27 汉高股份有限及两合公司 用于制备羟基官能化聚醚-聚硅氧烷嵌段共聚物的方法
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Also Published As

Publication number Publication date
AU7149094A (en) 1995-03-09
AU674247B2 (en) 1996-12-12
CA2117572C (en) 1998-10-13
CA2117572A1 (en) 1995-02-27
EP0643329B1 (de) 1998-12-23
US5461088A (en) 1995-10-24
US5629133A (en) 1997-05-13
ES2127365T3 (es) 1999-04-16
JPH0797403A (ja) 1995-04-11
EP0643329B2 (de) 2002-02-06
JP3581936B2 (ja) 2004-10-27
DE59407524D1 (de) 1999-02-04
EP0643329A3 (de) 1995-11-02
EP0643329A2 (de) 1995-03-15
ATE175034T1 (de) 1999-01-15

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