EP2601280A1 - Trägerflüssigkeiten für abrasiva - Google Patents
Trägerflüssigkeiten für abrasivaInfo
- Publication number
- EP2601280A1 EP2601280A1 EP11738239.0A EP11738239A EP2601280A1 EP 2601280 A1 EP2601280 A1 EP 2601280A1 EP 11738239 A EP11738239 A EP 11738239A EP 2601280 A1 EP2601280 A1 EP 2601280A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- cutting
- carrier liquid
- cutting fluid
- wafers
- grains
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000003082 abrasive agent Substances 0.000 title claims abstract description 21
- 239000012530 fluid Substances 0.000 title abstract description 11
- 239000002173 cutting fluid Substances 0.000 claims abstract description 42
- 238000005520 cutting process Methods 0.000 claims abstract description 34
- 235000012431 wafers Nutrition 0.000 claims abstract description 28
- 238000000034 method Methods 0.000 claims abstract description 9
- 238000004519 manufacturing process Methods 0.000 claims abstract description 7
- 150000001875 compounds Chemical class 0.000 claims description 37
- 239000007788 liquid Substances 0.000 claims description 37
- -1 AO Chemical class 0.000 claims description 32
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 20
- 125000004432 carbon atom Chemical group C* 0.000 claims description 17
- 239000002002 slurry Substances 0.000 claims description 17
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 15
- 229910052710 silicon Inorganic materials 0.000 claims description 15
- 239000010703 silicon Substances 0.000 claims description 15
- 238000010521 absorption reaction Methods 0.000 claims description 8
- 229910000831 Steel Inorganic materials 0.000 claims description 7
- 238000005498 polishing Methods 0.000 claims description 7
- 239000010959 steel Substances 0.000 claims description 7
- 238000005299 abrasion Methods 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 229920003023 plastic Polymers 0.000 claims description 4
- 239000004033 plastic Substances 0.000 claims description 4
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 claims description 3
- 239000010432 diamond Substances 0.000 claims description 3
- 229910003460 diamond Inorganic materials 0.000 claims description 3
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 claims description 3
- 150000004767 nitrides Chemical class 0.000 claims description 3
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 claims description 3
- 238000000926 separation method Methods 0.000 claims description 3
- 239000010431 corundum Substances 0.000 claims 1
- 229910052593 corundum Inorganic materials 0.000 claims 1
- 229910044991 metal oxide Inorganic materials 0.000 claims 1
- 150000004706 metal oxides Chemical class 0.000 claims 1
- 239000000203 mixture Substances 0.000 description 37
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 24
- 239000000080 wetting agent Substances 0.000 description 18
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 15
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical class C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 14
- 229920000642 polymer Polymers 0.000 description 12
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical class CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 11
- 125000002947 alkylene group Chemical group 0.000 description 11
- 239000000654 additive Substances 0.000 description 10
- 150000001298 alcohols Chemical class 0.000 description 10
- 239000003112 inhibitor Substances 0.000 description 10
- 239000000178 monomer Substances 0.000 description 10
- 125000000217 alkyl group Chemical group 0.000 description 9
- 150000003839 salts Chemical class 0.000 description 9
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 8
- 229920001577 copolymer Polymers 0.000 description 8
- 235000014113 dietary fatty acids Nutrition 0.000 description 8
- 239000000194 fatty acid Substances 0.000 description 8
- 229930195729 fatty acid Natural products 0.000 description 8
- 239000002562 thickening agent Substances 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 7
- 239000002253 acid Substances 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 238000005260 corrosion Methods 0.000 description 7
- 230000007797 corrosion Effects 0.000 description 7
- 239000002270 dispersing agent Substances 0.000 description 7
- 150000004665 fatty acids Chemical class 0.000 description 7
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 238000000227 grinding Methods 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 6
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 6
- 239000004698 Polyethylene Substances 0.000 description 5
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 5
- 150000001735 carboxylic acids Chemical class 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 239000002736 nonionic surfactant Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 229910010271 silicon carbide Inorganic materials 0.000 description 5
- 229920000428 triblock copolymer Polymers 0.000 description 5
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 4
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 4
- 229920000805 Polyaspartic acid Polymers 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- 229920002125 Sokalan® Polymers 0.000 description 4
- 125000003158 alcohol group Chemical group 0.000 description 4
- 150000008064 anhydrides Chemical class 0.000 description 4
- 229920001400 block copolymer Polymers 0.000 description 4
- QARVLSVVCXYDNA-UHFFFAOYSA-N bromobenzene Chemical compound BrC1=CC=CC=C1 QARVLSVVCXYDNA-UHFFFAOYSA-N 0.000 description 4
- 125000002843 carboxylic acid group Chemical group 0.000 description 4
- 239000008139 complexing agent Substances 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 229920000570 polyether Polymers 0.000 description 4
- 229920000573 polyethylene Polymers 0.000 description 4
- 239000007858 starting material Substances 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- PQHYOGIRXOKOEJ-UHFFFAOYSA-N 2-(1,2-dicarboxyethylamino)butanedioic acid Chemical compound OC(=O)CC(C(O)=O)NC(C(O)=O)CC(O)=O PQHYOGIRXOKOEJ-UHFFFAOYSA-N 0.000 description 3
- SXQCPXKZTFJHQI-UHFFFAOYSA-N 2-hydroxy-2-methylbut-3-enoic acid Chemical compound C=CC(O)(C)C(O)=O SXQCPXKZTFJHQI-UHFFFAOYSA-N 0.000 description 3
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical group CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 229920002266 Pluriol® Polymers 0.000 description 3
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical compound OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 238000005882 aldol condensation reaction Methods 0.000 description 3
- 125000005529 alkyleneoxy group Chemical group 0.000 description 3
- 125000000129 anionic group Chemical group 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229920002678 cellulose Polymers 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 229920001519 homopolymer Polymers 0.000 description 3
- 238000005984 hydrogenation reaction Methods 0.000 description 3
- 229940080260 iminodisuccinate Drugs 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229920000058 polyacrylate Polymers 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 239000002455 scale inhibitor Substances 0.000 description 3
- 239000004334 sorbic acid Substances 0.000 description 3
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical class OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 2
- OBETXYAYXDNJHR-UHFFFAOYSA-N 2-Ethylhexanoic acid Chemical compound CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 description 2
- KXXIUSPPIOSKAZ-UHFFFAOYSA-N 2-hydroxy-2,3-dimethylbut-3-enoic acid Chemical compound CC(=C)C(C)(O)C(O)=O KXXIUSPPIOSKAZ-UHFFFAOYSA-N 0.000 description 2
- NEAQRZUHTPSBBM-UHFFFAOYSA-N 2-hydroxy-3,3-dimethyl-7-nitro-4h-isoquinolin-1-one Chemical compound C1=C([N+]([O-])=O)C=C2C(=O)N(O)C(C)(C)CC2=C1 NEAQRZUHTPSBBM-UHFFFAOYSA-N 0.000 description 2
- OAOABCKPVCUNKO-UHFFFAOYSA-N 8-methyl Nonanoic acid Chemical compound CC(C)CCCCCCC(O)=O OAOABCKPVCUNKO-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 2
- 239000004435 Oxo alcohol Substances 0.000 description 2
- RVGRUAULSDPKGF-UHFFFAOYSA-N Poloxamer Chemical compound C1CO1.CC1CO1 RVGRUAULSDPKGF-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 239000002318 adhesion promoter Substances 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 235000012216 bentonite Nutrition 0.000 description 2
- AQNQQHJNRPDOQV-UHFFFAOYSA-N bromocyclohexane Chemical compound BrC1CCCCC1 AQNQQHJNRPDOQV-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 239000007859 condensation product Substances 0.000 description 2
- 239000010730 cutting oil Substances 0.000 description 2
- DTDMYWXTWWFLGJ-UHFFFAOYSA-N decan-4-ol Chemical compound CCCCCCC(O)CCC DTDMYWXTWWFLGJ-UHFFFAOYSA-N 0.000 description 2
- 150000008050 dialkyl sulfates Chemical class 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 150000002191 fatty alcohols Chemical class 0.000 description 2
- 125000004395 glucoside group Chemical group 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- UQDUPQYQJKYHQI-UHFFFAOYSA-N methyl laurate Chemical compound CCCCCCCCCCCC(=O)OC UQDUPQYQJKYHQI-UHFFFAOYSA-N 0.000 description 2
- 150000002763 monocarboxylic acids Chemical class 0.000 description 2
- UNFUYWDGSFDHCW-UHFFFAOYSA-N monochlorocyclohexane Chemical compound ClC1CCCCC1 UNFUYWDGSFDHCW-UHFFFAOYSA-N 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical class C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- HGBOYTHUEUWSSQ-UHFFFAOYSA-N pentanal Chemical compound CCCCC=O HGBOYTHUEUWSSQ-UHFFFAOYSA-N 0.000 description 2
- 229960003330 pentetic acid Drugs 0.000 description 2
- 229920001983 poloxamer Polymers 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 229920005646 polycarboxylate Polymers 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 230000004580 weight loss Effects 0.000 description 2
- DRAWQKGUORNASA-UHFFFAOYSA-N (2-hydroxy-3-octadec-9-enoyloxypropyl) octadec-9-enoate Chemical compound CCCCCCCCC=CCCCCCCCC(=O)OCC(O)COC(=O)CCCCCCCC=CCCCCCCCC DRAWQKGUORNASA-UHFFFAOYSA-N 0.000 description 1
- VKZRWSNIWNFCIQ-WDSKDSINSA-N (2s)-2-[2-[[(1s)-1,2-dicarboxyethyl]amino]ethylamino]butanedioic acid Chemical compound OC(=O)C[C@@H](C(O)=O)NCCN[C@H](C(O)=O)CC(O)=O VKZRWSNIWNFCIQ-WDSKDSINSA-N 0.000 description 1
- DCCWEYXHEXDZQW-BYPYZUCNSA-N (2s)-2-[bis(carboxymethyl)amino]butanedioic acid Chemical compound OC(=O)C[C@@H](C(O)=O)N(CC(O)=O)CC(O)=O DCCWEYXHEXDZQW-BYPYZUCNSA-N 0.000 description 1
- GGAUUQHSCNMCAU-ZXZARUISSA-N (2s,3r)-butane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C[C@H](C(O)=O)[C@H](C(O)=O)CC(O)=O GGAUUQHSCNMCAU-ZXZARUISSA-N 0.000 description 1
- NMRPBPVERJPACX-UHFFFAOYSA-N (3S)-octan-3-ol Natural products CCCCCC(O)CC NMRPBPVERJPACX-UHFFFAOYSA-N 0.000 description 1
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- ZORQXIQZAOLNGE-UHFFFAOYSA-N 1,1-difluorocyclohexane Chemical compound FC1(F)CCCCC1 ZORQXIQZAOLNGE-UHFFFAOYSA-N 0.000 description 1
- ZPFAVCIQZKRBGF-UHFFFAOYSA-N 1,3,2-dioxathiolane 2,2-dioxide Chemical compound O=S1(=O)OCCO1 ZPFAVCIQZKRBGF-UHFFFAOYSA-N 0.000 description 1
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
- VBICKXHEKHSIBG-UHFFFAOYSA-N 1-monostearoylglycerol Chemical class CCCCCCCCCCCCCCCCCC(=O)OCC(O)CO VBICKXHEKHSIBG-UHFFFAOYSA-N 0.000 description 1
- RUFPHBVGCFYCNW-UHFFFAOYSA-N 1-naphthylamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1 RUFPHBVGCFYCNW-UHFFFAOYSA-N 0.000 description 1
- LWEAHXKXKDCSIE-UHFFFAOYSA-M 2,3-di(propan-2-yl)naphthalene-1-sulfonate Chemical compound C1=CC=C2C(S([O-])(=O)=O)=C(C(C)C)C(C(C)C)=CC2=C1 LWEAHXKXKDCSIE-UHFFFAOYSA-M 0.000 description 1
- 239000000263 2,3-dihydroxypropyl (Z)-octadec-9-enoate Substances 0.000 description 1
- MPJQXAIKMSKXBI-UHFFFAOYSA-N 2,7,9,14-tetraoxa-1,8-diazabicyclo[6.6.2]hexadecane-3,6,10,13-tetrone Chemical compound C1CN2OC(=O)CCC(=O)ON1OC(=O)CCC(=O)O2 MPJQXAIKMSKXBI-UHFFFAOYSA-N 0.000 description 1
- CIEZZGWIJBXOTE-UHFFFAOYSA-N 2-[bis(carboxymethyl)amino]propanoic acid Chemical compound OC(=O)C(C)N(CC(O)=O)CC(O)=O CIEZZGWIJBXOTE-UHFFFAOYSA-N 0.000 description 1
- XMVBHZBLHNOQON-UHFFFAOYSA-N 2-butyl-1-octanol Chemical compound CCCCCCC(CO)CCCC XMVBHZBLHNOQON-UHFFFAOYSA-N 0.000 description 1
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- RZRNAYUHWVFMIP-GDCKJWNLSA-N 3-oleoyl-sn-glycerol Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OC[C@H](O)CO RZRNAYUHWVFMIP-GDCKJWNLSA-N 0.000 description 1
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 description 1
- XZIIFPSPUDAGJM-UHFFFAOYSA-N 6-chloro-2-n,2-n-diethylpyrimidine-2,4-diamine Chemical compound CCN(CC)C1=NC(N)=CC(Cl)=N1 XZIIFPSPUDAGJM-UHFFFAOYSA-N 0.000 description 1
- XZOYHFBNQHPJRQ-UHFFFAOYSA-N 7-methyloctanoic acid Chemical compound CC(C)CCCCCC(O)=O XZOYHFBNQHPJRQ-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- GJCOSYZMQJWQCA-UHFFFAOYSA-N 9H-xanthene Chemical compound C1=CC=C2CC3=CC=CC=C3OC2=C1 GJCOSYZMQJWQCA-UHFFFAOYSA-N 0.000 description 1
- 241001550224 Apha Species 0.000 description 1
- 239000005635 Caprylic acid (CAS 124-07-2) Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- 229910004613 CdTe Inorganic materials 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical class NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 229920001503 Glucan Polymers 0.000 description 1
- WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 description 1
- 235000010469 Glycine max Nutrition 0.000 description 1
- 244000068988 Glycine max Species 0.000 description 1
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 1
- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- 241001082241 Lythrum hyssopifolia Species 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- JYXGIOKAKDAARW-UHFFFAOYSA-N N-(2-hydroxyethyl)iminodiacetic acid Chemical compound OCCN(CC(O)=O)CC(O)=O JYXGIOKAKDAARW-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical class OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
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- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
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- 229920002367 Polyisobutene Polymers 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000004147 Sorbitan trioleate Substances 0.000 description 1
- PRXRUNOAOLTIEF-ADSICKODSA-N Sorbitan trioleate Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OC[C@@H](OC(=O)CCCCCCC\C=C/CCCCCCCC)[C@H]1OC[C@H](O)[C@H]1OC(=O)CCCCCCC\C=C/CCCCCCCC PRXRUNOAOLTIEF-ADSICKODSA-N 0.000 description 1
- 229920002359 Tetronic® Polymers 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- PHYFQTYBJUILEZ-UHFFFAOYSA-N Trioleoylglycerol Natural products CCCCCCCCC=CCCCCCCCC(=O)OCC(OC(=O)CCCCCCCC=CCCCCCCCC)COC(=O)CCCCCCCC=CCCCCCCCC PHYFQTYBJUILEZ-UHFFFAOYSA-N 0.000 description 1
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- 238000006668 aldol addition reaction Methods 0.000 description 1
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
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- 125000005233 alkylalcohol group Chemical group 0.000 description 1
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- 150000001408 amides Chemical group 0.000 description 1
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- 239000002585 base Substances 0.000 description 1
- OGBUMNBNEWYMNJ-UHFFFAOYSA-N batilol Chemical class CCCCCCCCCCCCCCCCCCOCC(O)CO OGBUMNBNEWYMNJ-UHFFFAOYSA-N 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
- 150000001649 bromium compounds Chemical class 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N butene Natural products CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 239000004359 castor oil Substances 0.000 description 1
- 235000019438 castor oil Nutrition 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 229920003086 cellulose ether Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003240 coconut oil Substances 0.000 description 1
- 235000019864 coconut oil Nutrition 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical group [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 229940071087 ethylenediamine disuccinate Drugs 0.000 description 1
- 235000019387 fatty acid methyl ester Nutrition 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000012362 glacial acetic acid Substances 0.000 description 1
- 235000013922 glutamic acid Nutrition 0.000 description 1
- 239000004220 glutamic acid Substances 0.000 description 1
- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 description 1
- 150000002314 glycerols Chemical class 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 238000010559 graft polymerization reaction Methods 0.000 description 1
- HSEMFIZWXHQJAE-UHFFFAOYSA-N hexadecanamide Chemical compound CCCCCCCCCCCCCCCC(N)=O HSEMFIZWXHQJAE-UHFFFAOYSA-N 0.000 description 1
- 238000007037 hydroformylation reaction Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- 150000002462 imidazolines Chemical class 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000011089 mechanical engineering Methods 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- RZRNAYUHWVFMIP-UHFFFAOYSA-N monoelaidin Natural products CCCCCCCCC=CCCCCCCCC(=O)OCC(O)CO RZRNAYUHWVFMIP-UHFFFAOYSA-N 0.000 description 1
- QEALYLRSRQDCRA-UHFFFAOYSA-N myristamide Chemical compound CCCCCCCCCCCCCC(N)=O QEALYLRSRQDCRA-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 150000004005 nitrosamines Chemical class 0.000 description 1
- 229960002446 octanoic acid Drugs 0.000 description 1
- FATBGEAMYMYZAF-KTKRTIGZSA-N oleamide Chemical compound CCCCCCCC\C=C/CCCCCCCC(N)=O FATBGEAMYMYZAF-KTKRTIGZSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 125000005702 oxyalkylene group Chemical group 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 229920001992 poloxamer 407 Polymers 0.000 description 1
- 229920000141 poly(maleic anhydride) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 229940113115 polyethylene glycol 200 Drugs 0.000 description 1
- 229920000151 polyglycol Polymers 0.000 description 1
- 239000010695 polyglycol Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- YLQLIQIAXYRMDL-UHFFFAOYSA-N propylheptyl alcohol Chemical compound CCCCCC(CO)CCC YLQLIQIAXYRMDL-UHFFFAOYSA-N 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000012958 reprocessing Methods 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 229940035044 sorbitan monolaurate Drugs 0.000 description 1
- 239000001593 sorbitan monooleate Substances 0.000 description 1
- 235000011069 sorbitan monooleate Nutrition 0.000 description 1
- 229940035049 sorbitan monooleate Drugs 0.000 description 1
- 235000019337 sorbitan trioleate Nutrition 0.000 description 1
- 229960000391 sorbitan trioleate Drugs 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 239000003760 tallow Substances 0.000 description 1
- UZVUJVFQFNHRSY-OUTKXMMCSA-J tetrasodium;(2s)-2-[bis(carboxylatomethyl)amino]pentanedioate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]C(=O)CC[C@@H](C([O-])=O)N(CC([O-])=O)CC([O-])=O UZVUJVFQFNHRSY-OUTKXMMCSA-J 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- PHYFQTYBJUILEZ-IUPFWZBJSA-N triolein Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OCC(OC(=O)CCCCCCC\C=C/CCCCCCCC)COC(=O)CCCCCCC\C=C/CCCCCCCC PHYFQTYBJUILEZ-IUPFWZBJSA-N 0.000 description 1
- 229940117972 triolein Drugs 0.000 description 1
- JSPLKZUTYZBBKA-UHFFFAOYSA-N trioxidane Chemical compound OOO JSPLKZUTYZBBKA-UHFFFAOYSA-N 0.000 description 1
- 229920003169 water-soluble polymer Polymers 0.000 description 1
- 238000010626 work up procedure Methods 0.000 description 1
- 229920001285 xanthan gum Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M107/00—Lubricating compositions characterised by the base-material being a macromolecular compound
- C10M107/20—Lubricating compositions characterised by the base-material being a macromolecular compound containing oxygen
- C10M107/30—Macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
- C10M107/32—Condensation polymers of aldehydes or ketones; Polyesters; Polyethers
- C10M107/34—Polyoxyalkylenes
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M107/00—Lubricating compositions characterised by the base-material being a macromolecular compound
- C10M107/20—Lubricating compositions characterised by the base-material being a macromolecular compound containing oxygen
- C10M107/30—Macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2201/00—Inorganic compounds or elements as ingredients in lubricant compositions
- C10M2201/04—Elements
- C10M2201/041—Carbon; Graphite; Carbon black
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2201/00—Inorganic compounds or elements as ingredients in lubricant compositions
- C10M2201/04—Elements
- C10M2201/05—Metals; Alloys
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2201/00—Inorganic compounds or elements as ingredients in lubricant compositions
- C10M2201/06—Metal compounds
- C10M2201/061—Carbides; Hydrides; Nitrides
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2201/00—Inorganic compounds or elements as ingredients in lubricant compositions
- C10M2201/06—Metal compounds
- C10M2201/062—Oxides; Hydroxides; Carbonates or bicarbonates
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2209/00—Organic macromolecular compounds containing oxygen as ingredients in lubricant compositions
- C10M2209/10—Macromolecular compoundss obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
- C10M2209/103—Polyethers, i.e. containing di- or higher polyoxyalkylene groups
- C10M2209/104—Polyethers, i.e. containing di- or higher polyoxyalkylene groups of alkylene oxides containing two carbon atoms only
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2209/00—Organic macromolecular compounds containing oxygen as ingredients in lubricant compositions
- C10M2209/10—Macromolecular compoundss obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
- C10M2209/103—Polyethers, i.e. containing di- or higher polyoxyalkylene groups
- C10M2209/104—Polyethers, i.e. containing di- or higher polyoxyalkylene groups of alkylene oxides containing two carbon atoms only
- C10M2209/1045—Polyethers, i.e. containing di- or higher polyoxyalkylene groups of alkylene oxides containing two carbon atoms only used as base material
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2209/00—Organic macromolecular compounds containing oxygen as ingredients in lubricant compositions
- C10M2209/10—Macromolecular compoundss obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
- C10M2209/103—Polyethers, i.e. containing di- or higher polyoxyalkylene groups
- C10M2209/107—Polyethers, i.e. containing di- or higher polyoxyalkylene groups of two or more specified different alkylene oxides covered by groups C10M2209/104 - C10M2209/106
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2020/00—Specified physical or chemical properties or characteristics, i.e. function, of component of lubricating compositions
- C10N2020/01—Physico-chemical properties
- C10N2020/02—Viscosity; Viscosity index
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2020/00—Specified physical or chemical properties or characteristics, i.e. function, of component of lubricating compositions
- C10N2020/09—Characteristics associated with water
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2030/00—Specified physical or chemical properties which is improved by the additive characterising the lubricating composition, e.g. multifunctional additives
- C10N2030/02—Pour-point; Viscosity index
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2040/00—Specified use or application for which the lubricating composition is intended
- C10N2040/20—Metal working
- C10N2040/22—Metal working with essential removal of material, e.g. cutting, grinding or drilling
Definitions
- the invention relates to the use of modified polyglycols for the production of carrier liquids for abrasives, new carrier liquids for abrasives, in particular cutting fluids, the use of the carrier liquid in the removal of material, in particular when cutting wafers, and wafers produced with the aid of the cutting fluid.
- Abrasives also called abrasives or abrasives, are substances, preferably hard-material grains, which are used for the removal of a material. It is known to use abrasives as a dispersion in liquids, for example grinding or cutting fluids. Abrasives can be used in this way for polishing wafers, for example made of silicon, but also for polishing plastics, for example for lenses. It is also known to use abrasives in cutting fluids for cutting wafers. Wafers are thin slices of semiconductors that are used, for example, in photovoltaic. From wafers electronic components, especially integrated circuits can be produced.
- the wafers are usually made of brittle material, such as silicon, but also of gallium arsenide or cadmium telluride, etc.
- Basis for the wafer production are usually cylindrical or cubic single or polycrystals, which are sawed into the individual slices, the wafer.
- Sawing also referred to as cutting or lapping
- This is a separation process using a thin wire as a cutting edge and using unbound cutting grains in a carrier liquid.
- the wire usually has a diameter of 80 to 180 ⁇ . He immersed in a slurry of carrier liquid and cutting grain and pulls the hanging on the wire surface cutting grains in the kerf.
- the cutting grains are used to cut the object to be sawn / lapped / silicon ingots into wafers, with particles being removed from the solid to be cut.
- the carrier liquid for the cutting grains is applied as a slurry via a dipping bath, through which the wire runs, as well as generally via nozzles together with the cutting grain.
- the carrier liquid has the task of ensuring that the cutting grains adhere to the wire and removing removed particles from the solid to be broken up.
- the carrier liquid has the task to provide for cooling and the transport of the abrasion through the shegeschlitz.
- EP 1 757 419 A1 a method for separating a workpiece, for example a wafer, by means of wire saws is already known, one on the wire applied slurry is used and the water content of at least a portion of the slurry surrounded gaseous medium is regulated or controlled. It is further known from EP 1 757 419 A1 to use glycols as the carrier substance.
- DE 199 83 092 B4 and US Pat. No. 6,383,991 B1 disclose a cutting oil comprising a) a polyether compound and b) silica particles, and the use of this cutting oil composition for cutting a billet using a wire saw, in particular for cutting silicon ingots.
- 4,828,735 disclose water-based lubricants based on polyethers. From the Chinese patent application CN 101205498 A cutting fluids are also known, while a reduction in water absorption is not specified.
- the compounds specifically mentioned are polyalkyleneoxy compounds etherified with alcohols having 1 to 4 carbon atoms.
- a sawing suspension consisting of an abrasive in an aqueous phase which contains one or more water-soluble polymers as thickener.
- US 2007/0010406 A1 discloses hydroxypolyethers as additives for aqueous cutting fluids which can be used inter alia for the production of silicon wafers.
- the known cutting fluids are generally based on an aqueous or a water-soluble basis.
- water is disadvantageous because it both causes corrosion and, for example, when cutting silicon wafers by reaction of water and silicon hydrogen evolution can take place.
- silicate or polysilicate formation there is a silicate or polysilicate formation on the wafer and in the slurry.
- the known water-soluble systems can also contain water and, because of their microscopic properties, attract water, so that the same disadvantages can occur as with aqueous systems.
- the object of the invention was to provide improved carrier fluids for abrasives, in particular cutting fluids, which in particular lead to a reduction in water absorption and a reduction in the energy required for sawing.
- the invention relates to the use of compounds of the formula I.
- x is a number from 3 to 12, in particular 5 to 10
- y is a number from 0 to 10, in particular 4 to 8
- z is a number from 1 to 6, in particular 1 to 3 for the production of carrier liquids for abrasives, in particular cutting fluids with reduced water absorption for removing material, in particular for sawing wafers with a wire saw.
- the invention further relates to carrier liquids for abrasives, in particular cutting fluids, containing at least one compound of the formula I.
- R is a z-valent alkyl radical having 5 to 10 carbon atoms
- x is a number from 3 to 12, in particular 5 to 10
- y is a number from 0.5 to 10, in particular 4 to 8
- z is a number from 1 to 6, in particular 1 to 3.
- the invention further relates to novel compounds II of the formula
- R 1 is 2-methylbutyl or 3-methylbutyl
- x is a number from 3 to 12, in particular 5 to 10
- y is a number from 0 to 10, in particular 4 to 8
- z is a number from 1 to 6, in particular 1 to 3
- at least as many EO units as PO units are present.
- Very particularly preferred compounds of the formula II are given in the following table:
- the ratio x to y in the compound of the formula I and II is equal to or less than 1.
- compounds of the formula II are particularly preferred embodiments of compounds of the formula I.
- R 1 is pentyl, preferably
- the recurring units (EO) and (AO) can be present as a block or randomly distributed (random). In a preferred embodiment, they are statistically distributed. Surprisingly, it has been found that in the case of statistical distribution of the recurring units (AO) and (EO), the viscosity of the compounds is largely independent of temperature.
- the compounds of the formula I to be used according to the invention are distinguished by a viscosity index in a slurry with 40% by weight of Carborex F 800 PV silicon carbide from Washington Mills AS, NO -7300 Orkanger, Norway, of not more than 45%, preferably less than 30%, in particular less than 20%, the viscosity index being defined as follows:
- the viscosity index in the context of the present invention denotes the percentage decrease in the viscosity of the compounds of the formula I. at 50 ° C compared to the viscosity at 30 ° C.
- the viscosity here is the dynamic viscosity (Brookfield, spindle V-73) determined according to DIN EN 12092.
- the carrier liquids according to the invention may contain not only a compound of the formula I but also mixtures of compounds of the formula I.
- the carrier liquids for abrasives consist of the compound of the formula I.
- the molecular weight of the compound of the formula I is preferably from 200 to 1200 g / mol.
- alkylene alcohols based on ethylene oxides, propylene oxides or copolymers of ethylene and propylene oxides are present, preferably having a molecular weight of from 200 to 800 g / mol.
- the cutting fluid in use for sawing contains abrasives, in particular cutting grains.
- the carrier liquids for abrasives are combined with at least one further additive, in particular with at least one
- carrier fluid carrier fluid
- At least one of the following additives is added to the following parts by weight per 100 parts by weight of the compound I: alkylene glycols: 10 to 90, in particular 20 to 60 parts by weight
- Wetting agent 1 to 100, especially 10 to 40 parts by weight
- Thickener 0.5 to 20, in particular 1 to 10 parts by weight
- Dispersant 0.1 to 20, especially 0.5 to 10 parts by weight
- Corrosion inhibitor 0.1 to 10, in particular 0.1 to 3 parts by weight
- Complexing agent 0.1 to 10, in particular 1 to 5 parts by weight
- Other additives 0.05 to 10, in particular 0.1 to 5 parts by weight
- the water content of the composition according to the invention is, based on the total composition, not more than 10, preferably not more than 5, in particular less than 1 wt .-%.
- sorbitan esters e.g. Poly (oxyethylene) sorbitan monolaurate, poly (oxyethylene) sorbitan monooleate, (poly (oxyethylene) sorbitan trioleate)
- fatty amines e.g. Tallow aminooxyethylates, soya aminooxyethylates,
- castor oil e.g. Rizinusöloxyethylate
- alkanolamides e.g. coconut oil alkanolamidooxyethylates
- fatty acids e.g., oleic acid oxyethylates, lauric acid oxyethylates, oxyethylated oxyethylates
- glycerol compounds e.g. B.
- Quaternary compounds e.g. B. quaternary ammonium ethosulfate.
- Suitable nonionic, cationic, anionic or amphoteric wetting agents are in particular alkoxylated C 4 - to C 2 2 alcohols such as fatty alcohol alkoxylates or oxoalcohol alkoxylates. These may be alkoxylated with ethylene oxide, propylene oxide and / or butylene oxide. Suitable wetting agents here are all alkoxylated alcohols which contain at least two molecules of one of the abovementioned alkylene oxides added. Here are block polymers of ethylene oxide,
- the nonionic wetting agents generally contain from 2 to 50, preferably from 3 to 20, moles of at least one alkylene oxide per mole of alcohol.
- the alcohols preferably have 10 to 18 carbon atoms.
- the alkoxylates have a broad or narrow alkylene oxide homolog distribution;
- Alkylphenolalkoxylate such as Alkylphenolethoxylate with C 6 - to C 4 alkyl chains and 5 to 30 alkylene oxide units;
- Alkylpolyglucosides having 8 to 22, preferably 10 to 18 carbon atoms in the alkyl chain and generally 1 to 20, preferably 1, 1 to 5, glucoside units Sorbitanalkanoate, also alkoxylated;
- N-alkylglucamides fatty acid alkoxylates, FettTexreaminalkoxylate, FettTexreamidalkoxylate, FettTexrealkanolamidalkoxylate, alkoxylated, block copolymers of ethylene oxide, propylene oxide and / or butylene oxide, polyisobutene ethoxylates, polyisobutene-maleic anhydride derivatives, optionally alkoxylated monoglycerides, glycerol monostearates, sorbitan esters and bisglycerides.
- Particularly suitable nonionic wetting agents are alkyl alkoxylates or mixtures of alkyl alkoxylates, as described, for example, in DE-A 102 43 363, DE-A 102 43 361, DE-A 102 43 360, DE-A 102 43 365, DE-A 102 43 366, DE-A 102 43 362 or in DE-A 43 25 237 are described. These are alkoxylation products obtained by reacting alkanols with alkylene oxides in the presence of alkoxylation catalysts or mixtures of alkoxylation products.
- Particularly suitable starter alcohols are the so-called Guerbet alcohols, in particular ethylhexanol, propylheptanol and butyloctanol.
- propylheptanol Particularly preferred is propylheptanol.
- Preferred alkylene oxides are propylene oxide and ethylene oxide, with alkyl alkoxylates with direct attachment of a preferably short Poylypropylenoxidblocks to the starter alcohol, as described for example in DE-A 102 43 365, are particularly preferred because of their low residual alcohol content and their good biodegradability.
- a preferred class of suitable nonionic wetting agents are the alcohol alkoxylates of the general formula (Nl)
- R at least single branched C 4 . 22 -alkyl or -alkylphenol
- R 2 C 3 4- alkyl
- R 5 is C 1-4 -alkyl
- R 6 is methyl or ethyl
- n mean value from 1 to 50
- m mean value from 0 to 20, preferably 0.5 to 20
- r mean value from 0 to 50
- s mean value from 0 to 50
- m is at least 0.5 when R 5 is methyl or ethyl or r is 0.
- It may also be a mixture of 20 to 95 wt .-%, preferably 30 to 95 wt .-% of at least one above alcohol alkoxylate and 5 to 80 wt .-%, preferably 5 to 70 wt .-%, of a corresponding alcohol alkoxylate, in which R 1, however, is an unbranched alkyl radical having the same carbon number act.
- R 3 branched or unbranched C 4 . 22 -alkyl or -alkylphenol,
- N branched alcohol alkoxylate
- R 2 is preferably propyl, in particular n-propyl.
- n has an average value of 4 to 15, particularly preferably 6 to 12, in particular 7 to 10.
- m has an average value of 0.5 to 4, particularly preferably 0.5 to 2, in particular 1 to 2.
- the radical R 1 is preferably C 8 -15, particularly preferably C 8 -13, in particular C 8 .i 2 -alkyl radical which is branched at least once. There may also be multiple branches.
- R 5 is preferably methyl or ethyl, especially methyl.
- R 6 is preferably ethyl.
- oxo alcohols which have a proportion of linear and a proportion of branched alcohol chains.
- a Ci 3 / i 5 -Oxoalkohol often about 60 wt .-% of completely linear alcohol chains, but also about 40 wt .-% ⁇ -methyl branched and C> 2 -branched alcohol chains.
- R3 is preferably a branched or unbranched C 8 -15 alkyl group, more preferably a branched or unbranched C 8 .i 3 alkyl radical and especially a branched or unbranched C. 8 12- alkyl radical.
- R 4 is preferably propyl, especially n-propyl.
- p preferably has an average value of 4 to 15, particularly preferably an average value of 6 to 12 and in particular a mean value of 7 to 10.
- q preferably has an average value of 0.5 to 4, particularly preferably 0.5 to 2, in particular 1 to 2.
- the alcohol alkoxylates of the general formula (NN) may also be present as mixtures with unbranched and branched alcohol radicals.
- Alcohol components on which the alcohol alkoxylates are based are not only pure alkanols, but also homologous mixtures having a range of carbon atoms. Examples are C 8 / i o-alkanols, Ci o / 12-alkanols, Ci 3 / i 5 alkanols, Ci 2 / i 5-alkanols. It is also possible to mix several alkanols.
- the above alkanol alkoxylates or mixtures according to the invention are preferably prepared by reacting alcohols of the general formula R 1 -OH or R 3 -OH or mixtures of corresponding branched and unbranched alcohols, optionally first with C 3 . 6 -alkylene oxide, then with ethylene oxide and subsequently optionally with C 3 . 4 -alkylene oxide and then with a corresponding C 5 . 6 - Alkylene oxide.
- the alkoxylations are preferably carried out in the presence of alkoxylation catalysts.
- basic catalysts such as potassium hydroxide are used.
- alkoxylation catalysts such as modified bentonites or hydrotalcites, as described, for example, in WO 95/04024, the statistical distribution of the amounts of the incorporated alkylene oxides can be greatly reduced, so that one obtains "narrow-range" alkoxylates.
- alkoxylate mixtures containing alkoxylates of the general formula (NIM) are provided.
- alkoxylates A2 1 to 30 wt .-% alkoxylates A2, in which C 5 Hn has the meaning CaHsCl-KCl-yCHz and / or CH 3 CH (CH 3 ) CH 2 CH 2 , present in a mixture.
- p is a number from 0 to 10, preferably 0 to 5, in particular 0 to 3. If blocks (B) p are present, p is preferably a number from 0.1 to 10, particularly preferably 0, 5 to 5, in particular 1 to 3.
- n is preferably a number in the range of 0.25 to 10, especially 0.5 to 7
- m is preferably a number in the range of 2 to 10, especially 3 to 6.
- B is preferably propyleneoxy and / or butyleneoxy, especially propyleneoxy at both positions.
- q is preferably a number in the range of 1 to 5, more preferably in the range of 2 to 3.
- the sum p + n + m + q is at least 1, preferably 3 to 25, more preferably 5 to 15, in particular 7 to 13.
- the alkoxylates preferably contain 3 or 4 alkylene oxide blocks.
- the alcohol residue is then initially followed by ethyleneoxy units, followed by propylene oxide units and subsequently ethyleneoxy units.
- the alcohol radical is then initially followed by propyleneoxy units, then ethyleneoxy units, then propyleneoxy units and finally ethyleneoxy units.
- the other indicated alkyleneoxy units may also be present.
- p, n, m and q denote an average value, which results as an average for the alkoxylates. Therefore, p, n, m, q can also differ from integer values.
- alkoxylation of alkanols a distribution of the degree of alkoxylation is generally obtained, which can be adjusted to some extent by using different alkoxylation catalysts.
- suitable ter amounts of groups A and B the property spectrum of the alkoxylate mixtures according to the invention can be adjusted depending on the practical requirements.
- the alkoxylate mixtures are obtained by alkoxylation of the parent alcohols C5H 11 CH (C 3 H7) CH 2 OH.
- the starting alcohols can be mixed from the individual components, resulting in the ratio according to the invention. They can be prepared by aldol condensation of valeraldehyde and subsequent hydrogenation.
- the preparation of valeraldehyde and the corresponding isomers is carried out by hydroformylation of butene, as described for example in US 4,287,370; Beilstein E IV 1, 32 68, Ullmann's Encyclopedia of Industrial Chemistry, 5th Edition, Volume A1, pages 323 and 328 f.
- the subsequent aldol condensation is described, for example, in US Pat. No. 5,434,313 and Römpp, Chemie Lexikon, 9th edition, keyword "Aldol addition” on page 91.
- the hydrogenation of the aldol condensation product follows general hydrogenation conditions.
- 2-propylheptanol can be prepared by condensation of 1-pentanol (as a mixture of the corresponding methylbutanols-1) in the presence of KOH at elevated temperatures, see e.g. Marcel Guerbet, CR. Acad Be Paris 128, 511, 1002 (1899). Furthermore, Römpp, Chemie Lexikon, 9th edition, Georg Thieme Verlag Stuttgart, and the quotations mentioned therein and Tetrahedron, Vol. 23, pages 1723-1733, should be noted.
- the radical C the meaning nC 5 H n, C 2 H 5 CH (CH 3) CH 2 or CH 3 CH 5 Hn (CH 3) CH 2 CH 2 have.
- the alkoxylates are mixtures in which
- the radical C 3 H 7 preferably has the meaning nC 3 H 7 . It may also be block-shaped iso Tridecanolalkoxylate the general formula (NV)
- R denotes an iso-tridecyl radical
- m is the number 2 and at the same time
- n is the number 3 or 4
- m is the number 3 or 4 and at the same time
- n is the number 2 and
- x and y independently of one another represent numbers from 1 to 20,
- Another suitable nonionic surfactant class is end-capped alcohol alkoxylates, especially of the aforementioned alcohol alkoxylates.
- these are the corresponding end-capped alcohol alkoxylates of the alcohol alkoxylates of the general formulas (III), (NN), (NIM) and (NV).
- the end group closure can be carried out, for example, using dialkyl sulfate, C 1-10 -alkyl halides, C 1-10 -halohalides, preferably -chlorides, -bromides, particularly preferably cyclohexyl chloride, cyclohexyl bromide, phenyl chloride or phenyl bromide.
- R ' is hydrogen or CC 2 o-alkyl
- R "and R m are the same or different and are each independently of one another hydrogen, methyl or ethyl,
- R IV is C 1 -C 4 -alkyl, preferably C 4 -alkyl, or cyclohexyl or phenyl, m 'and n' are the same or different and are greater than or equal to 0,
- alkyl polyglucosides having preferably 6 to 22, more preferably 10 to 18, carbon atoms in the alkyl chain. These compounds generally contain 1 to 20, preferably 1, 1 to 5 glucoside units.
- nonionic wetting agents are the end-capped fatty acid amide alkoxides of the general formula ## STR4 ## known from WO-A 95/1 1225 R'-CO-NH- (CH 2 ) y -O- (A 1 O) x -R 2 in the
- R 1 denotes a C 5 - to C 2 -alkyl or alkenyl radical
- R 2 is a C 1 to C 4 alkyl group
- a ' is C 2 - to C 4 -alkylene
- y denotes the number 2 or 3
- x has a value of 1 to 6.
- Examples of such compounds are the reaction products of n-butyltriglycolamine of the formula H 2 N- (CH 2 -CH 2 -O) 3-C 4 H 9 with dodecanoic acid methyl ester or the reaction products of ethyltetraglycolamine of the formula H 2 N- (CH 2 -CH 2 -O) 4 - C 2 H 5 with a commercially available mixture of saturated C 8 - to C 8 fatty acid methyl esters.
- nonionic wetting agents are polyhydroxy or polyalkoxy fatty acid derivatives such as polyhydroxy fatty acid amides, N-alkoxy or N-aryloxy polyhydroxy fatty acid amides, fatty acid amide ethoxylates, in particular end-capped, and fatty acid alkanolamide alkoxylates.
- block copolymers suitable for use as nonionic surfactants of ethylene oxide, propylene oxide and / or butylene oxide (Pluronic ® - and Tetronic ® BASF SE BASF Corp. or grades).
- block copolymers of ethylene oxide, propylene oxide and / or butylene oxide which are closed on one or two sides, can preferably also be used.
- a one-sided closure can be achieved, for example, by using as starting compound for the reaction with an alkylene oxide an alcohol, in particular a Ci- 22 alkyl alcohol, for example methanol used.
- nonionic wetting agents or a combination of different nonionic surfactants. It is possible to use nonionic wetting agents of only one class, in particular only alkoxylated C 4 - to C 22 -alcohols. Alternatively, one can also use wetting agent mixtures from different classes.
- the concentration of nonionic wetting agent in the composition of the invention may vary depending on the conditions of leaching, in particular depending on the material to be leached.
- Suitable anionic wetting agents are alkanesulfonates such as C 8 to C 24 , preferably cio to cis alkanesulfonates and soaps such as the Na and K salts of saturated and / or unsaturated C 8 . to C 24 carboxylic acids.
- Suitable anionic wetting agents are linear C 8 - to C 2 o-alkylbenzenesulfonates ("LAS"), preferably linear C 9 - to C -alkylbenzenesulfonates and -alkyltoluenesulfonates
- LAS o-alkylbenzenesulfonates
- Thickeners are compounds that increase the viscosity of the chemical composition. Non-limiting examples are for. As specified in WO 2009/090169 A1: polyacrylates and hydrophobically modified polyacrylates.
- the advantage of using thickeners is that higher viscosity fluids on inclined or vertical surfaces have a longer residence time than lower viscosity fluids. This increases the interaction time between composition and surface.
- Further particularly suitable thickeners are, for example, bentonite, xanthan and cellulose and also cellulose derivatives, in particular cellulose ethers and cellulose esters, in particular methylcellulose, hydroxyethylcellulose and carboxymethylcellulose.
- Further examples of thickeners are polyacrylamides, polyethers or associative polyurethane thickeners, polyvinyl alcohols and polyvinylpyrrolidones. Dispersants / scale inhibitors
- At least one dispersing agent for example selected from the group consisting of salts of naphthalenesulfonic acids, condensation products of naphthalenesulfonic acids and formaldehyde and also polycarboxylates, can additionally be used.
- Appropriate dispersing agents are commercially available for example under the trade name Tamol ®, Sokalan ® and Nekal ® from BASF SE as well as under the trade name Solsperse ® from Lubrizol.
- these dispersants can also act as scale inhibitors (coating inhibitors), since they disperse the calcium carbonate CaCO 3 forming in the alkaline medium and thus prevent, for example, clogging of nozzles or deposit formation in pipelines.
- the composition according to the invention may additionally contain at least one further scaling inhibitor. Suitable scale inhibitors are described, for example, in WO 04/099092 which describes (meth) acrylic acid copolymers which
- the (meth) acrylic acid copolymers provided according to WO 04/099092 preferably have a weight-average molecular weight of the sulfone-containing polymer of from 1,000 to 20,000 g / mol and can preferably be prepared by the following process steps:
- scaling inhibitors are, for example:
- Formulations containing complexing agents such as ethylenediaminetetraacetic acid (EDTA) and / or diethylenetriaminepentaacetic acid (DTPA) (according to US Pat
- Naphthylamine polycarboxylates (according to EP 0 538 969),
- polyacrylic acid such as Sokalan from BASF SE ® types and polyaspartic acids, in particular .beta.-polyaspartic acids with a molecular weight of 2,000 to 10,000 g / mol.
- polymeric compounds containing carboxylic acid groups are the acrylic acid homopolymers specified in EP 2 083 067 A1. These preferably have a number-average molecular weight in the range from 1000 to 50,000, more preferably from 1,500 to 20,000.
- homopolymers of acrylic acid which are particularly suitable as polymeric compounds containing carboxylic acid groups are the Sokalan® PA grades from BASF SE.
- Suitable polymeric compounds containing carboxylic acid groups are also oligomaleic acids, as described, for example, in EP-A 451 508 and EP-A 396 303.
- polymeric compounds containing carboxylic acid groups are copolymers which comprise in copolymerized form as monomer A) at least one unsaturated mono- or dicarboxylic acid or a dicarboxylic acid anhydride or a salt thereof and at least one comonomer B).
- the monomer A) is chosen from C 3 -C 0 monocarboxylic acids, salts of C 3 -C 0 monocarboxylic acids, C 4 -C 8 - dicarboxylic acids, anhydrides of C 4 -C 8 dicarboxylic acids, salts of C 4 -C 8 - dicarboxylic acids and mixtures thereof.
- Monomers A) in salt form are preferably used in the form of their water-soluble salts, in particular the alkali metal salts, such as potassium and especially sodium salts or ammonium salts.
- the monomers A) can each be completely or partially in anhydride form. Of course, it is also possible to use mixtures of the monomers A).
- the monomers (A) are preferably selected from acrylic, methacrylic, crotonic, vinylacetic, maleic, maleic, fumaric, citraconic, citraconic, itaconic and mixtures thereof. Particularly preferred monomers (A) are acrylic acid, methacrylic acid, maleic acid, maleic anhydride and mixtures thereof. These copolymers preferably comprise at least one monomer A) in an amount of from 5 to 95% by weight, particularly preferably from 20 to 80% by weight, in particular from 30 to 70% by weight, based on the total weight of the monomers used for the polymerization, in copolymerized form.
- carboxylic acids As corrosion inhibitors z. B. in WO 2008/071582 A1 specified means, for. B. carboxylic acids. These can be straight-chain or branched. mixtures various carboxylic acids may be particularly preferred. Caprylic acid, ethylhexanoic acid, isononanoic acid and isodecanoic acid are particularly preferred carboxylic acids. Since anticorrosive emulsions are often neutral to slightly alkaline, it may be advantageous to use the carboxylic acids at least partially in neutralized form, ie as a salt. Particularly suitable for neutralization are sodium and / or potassium hydroxide, as well as alkanolamines. Particularly preferred is the use of mono- and / or trialkanolamines. The use of dialkanolamines is less preferred because of the danger of formation of nitrosamines. However, dialkanolamines can also be used alone or together with mono- and / or trialkanolamines for neutralization.
- Suitable corrosion inhibitors are in particular: aliphatic carboxylic acid amides having 14 to 36 carbon atoms, for example myristic acid amide, palmitic acid amide and oleic acid amide; Alkenylsuccinamides having 6 to 36 carbon atoms, for example octenylsuccinamide, dodecenylsuccinamide; Mercatobenzothiazole.
- Particularly preferred corrosion inhibitors are alkylene oxide adducts with aliphatic amines, particularly triethanolamine and ethylenediamine adducts with 2 to 8 mol% of propylene oxide.
- Complexing agents are compounds that bind cations. Typical examples are: EDTA ( ⁇ , ⁇ , ⁇ ', ⁇ '-ethylenediaminetetraacetic acid), NTA ( ⁇ , ⁇ , ⁇ -nitrilotriacetic acid), MGDA (2-methyl-glycine-N, N-diacetic acid), GLDA (glutamic acid diacetate), AS DA (aspartic acid diacetate), IDS (iminodisuccinate), HEIDA (hydroxyethylimine diacetate), EDDS (ethylenediamine disuccinate), citric acid, oxodisuccinic acid and butanetetracarboxylic acid or their fully or partially neutralized alkali metal or ammonium salts.
- EDTA ⁇ , ⁇ , ⁇ ', ⁇ '-ethylenediaminetetraacetic acid
- NTA ⁇ , ⁇ , ⁇ -nitrilotriacetic acid
- MGDA 2-methyl-g
- adhesion promoters are, for example, the amphiphilic water-soluble alkoxylated polyalkyleneimines of the general formula AI given in WO 2006/108856 A2 B
- R is the same or different, linear or branched C 2 -C 6 -alkylene radicals
- E is an alkyleneoxy unit of the formula
- R1 is 1, 2-propylene, 1, 2-butylene and / or 1, 2-isobutylene
- R3 1, 2-propylene
- R4 is the same or different radicals: hydrogen; C1-C4 alkyl;
- x, y, z are each a number from 2 to 150, where the sum x + y + z is a number from
- Alkyleniminhimen means the average molecular weight Mw of
- n is a rational number from 0 to 2;
- n is a rational number from 6 to 18;
- p is a rational number from 3 to 12, where 0.8 ⁇ n / p ⁇ 1, 0 (x + y + z) is 1/2.
- the invention further relates to a slurry of the carrier liquid, in particular cutting fluid, abrasives, in particular grinding and / or cutting grains, and optionally additives.
- the usual abrasives in particular grinding and / or cutting grains, can be used, for example metal, metal or semimetal, carbide, nitride, oxide, boride or diamond grains.
- Particularly preferred cutting grains are carbide and boride, in particular silicon carbide (SiC) grains.
- the cutting grains preferably have an adapted geometry depending on the materials and the wafers to be cut; a preferred particle size is between 0.5 and 50 ⁇ m.
- the cutting grains may be in heterodisperse or homodisperse form.
- the cutting grains are preferably contained in the cutting fluid composition in a concentration of 25 to 60% by weight, especially 40 to 50% by weight.
- the carrier liquid in particular cutting fluid, a contact angle against V2A steel from 5 to 40 °, in particular from 10 to 30 °.
- the contact angle is determined here at 25 ° C on a steel plate made of V2A steel, the surface was rinsed with water and acetone.
- the carrier fluids according to the invention lead on average to a balance of the designation MDD2, Hermann Reichert Maschinenbau, Heidenhof Backnang, at a loading of 300 N and a running distance of 110 m and two repeated tests Weight loss of a maximum of 20 to 60 mg in one minute on a stainless steel cylinder of the designation M1 M6 / 05R, Torrington with a diameter of 12 mm.
- the carrier liquids according to the invention, in particular cutting fluids, after storage in a Heraeus BBD 6220 CO 2 incubator at 38 ° C. and 78% relative humidity take a maximum of 30, preferably a maximum of 15% water after a time of 10 hours on.
- a slurry of a carrier liquid according to the invention, in particular cutting fluid, and of 40 wt .-% of Abrasiva specified below, in particular grinding and / or cutting grains, preferably has a viscosity, measured at 30 ° C with a Brookfield LVDV-III Ultravorraum (Spindle V-73), from 140 to 200 mPas, in particular from 150 to 190 mPas, being used as Carborex BWF 800 PV silicon carbide grains from Washington Mills.
- the invention further relates to a method for cutting wafers from in particular inorganic semiconductors, such as silicon ingots or silicon ingots, with a wire saw using a slurry based on the cutting fluid according to the invention and of cutting grains.
- inorganic semiconductors such as silicon ingots or silicon ingots
- the invention further relates to a method for grinding or polishing materials from, for example, silicon ingots or ingots by, for example, chemical mechanical polishing (CMP) or for grinding plastics, in particular for lenses, using abrasives which are dispersed in a carrier liquid to be used according to the invention.
- CMP chemical mechanical polishing
- the carrier liquid according to the invention in particular cutting fluid and the method according to the invention for cutting is particularly suitable for sawing ingots, ingots or cylinders (ingots) of monocrystalline or polycrystalline silicon single crystals or polycrystals, GaAs, CdTe and other semiconductors and ceramics.
- the carrier liquid according to the invention in particular cutting fluid, is characterized in that it has little or no foaming, requires no additives, is pH-neutral and is not toxic. In addition, it contains no volatile organic components. Furthermore, the carrier liquid according to the invention, in particular cutting fluid, is outstandingly suitable for reprocessing by chemical-technical wet processing, for example in accordance with WO 02/40407 A1 and EP 1 390 184 A1.
- the wetting agents or alkylene glycols Pluronic® PE 6200 or Plurafac® LF 401 added in Examples C6 and C7 are commercial products of BASF SE, Ludwigshafen.
- the indicated analytical data refer to the component of the invention pentanol + 1, 5 PO + 6EO, block mode. Properties / Determination of the characteristic values
- the water uptake of the cutting fluids was determined after storage in a Heraeus BBD 6220 C02 incubator at 38 ° C. and 78% relative humidity after 10 hours and 24 hours, respectively.
- 1 g of cutting fluid was used in Petri dishes of an inner diameter of 60 mm. In each case, the mean value of a duplicate determination was determined.
- the water absorption is given in percent by weight increase based on weight.
- slurry viscosity a mixture of 60% by weight of the sawing liquid and 40% by weight of Carborex BW F 800 PV SiC manufactured by Washington Mills and the viscosity at 30 ° C and optionally 50 ° C with a viscometer from Brookfield, Model LVDV-III Ultra (Spindle V-73). The slurry viscosity is given in mPas.
- the contact angle of the cutting fluids was determined at 25 ° C. one second after drop application on a steel plate made of V2A steel, the surface of which was rinsed with water and acetone and then dried in air for 1 h.
- a video-assisted high-speed contact angle measuring device from Dataphysics Instruments GmbH, Raiffeisenstrasse 34, Filderstadt was used. The unit of the contact angle is given in °.
- the abrasion behavior was on a Rebverschl adoptedwaage the designation MDD2, company Hermann Reichert mechanical engineering, Heidenhof Backnang, at a load of 300 N and a running distance of 100 m in 54.5 seconds on a stainless steel cylinder of the designation M1 M6 / 05R, Torrington with a diameter determined by 12 mm. A double determination was carried out in each case and the mean value of the weight decrease of the cylinder was determined. The weight loss is given in mg. Table 2
- Pluriol® E 200 is a medium molecular weight polyethylene glycol 200 from BASF SE, Ludwigshafen. The example represents the prior art and is not according to the invention. Compounds 11.1 and II.2 gave comparable results to compounds C2 and C3. field trial
- composition of the slurry 60% by weight of sawing fluid, 40% by weight of SiC
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Abstract
Description
Claims
Priority Applications (2)
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PL11738239T PL2601280T3 (pl) | 2010-08-03 | 2011-08-02 | Ciecze nośne do ścierniw |
EP11738239.0A EP2601280B1 (de) | 2010-08-03 | 2011-08-02 | Trägerflüssigkeiten für abrasiva |
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EP10171716 | 2010-08-03 | ||
PCT/EP2011/063276 WO2012016976A1 (de) | 2010-08-03 | 2011-08-02 | Trägerflüssigkeiten für abrasiva |
EP11738239.0A EP2601280B1 (de) | 2010-08-03 | 2011-08-02 | Trägerflüssigkeiten für abrasiva |
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EP2601280A1 true EP2601280A1 (de) | 2013-06-12 |
EP2601280B1 EP2601280B1 (de) | 2014-10-08 |
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EP (1) | EP2601280B1 (de) |
JP (1) | JP5543030B2 (de) |
KR (1) | KR101505334B1 (de) |
CN (1) | CN103154214B (de) |
AU (1) | AU2011287623B9 (de) |
BR (1) | BR112013002486A2 (de) |
CA (1) | CA2806936A1 (de) |
ES (1) | ES2525017T3 (de) |
PL (1) | PL2601280T3 (de) |
RU (1) | RU2542974C2 (de) |
SG (1) | SG187691A1 (de) |
WO (1) | WO2012016976A1 (de) |
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WO2013113859A1 (de) * | 2012-02-01 | 2013-08-08 | Basf Se | Kühl- und/oder schmierflüssigkeiten zur waferherstellung |
JP6266337B2 (ja) * | 2013-12-25 | 2018-01-24 | ニッタ・ハース株式会社 | 半導体基板用濡れ剤及び研磨用組成物 |
US20190062670A1 (en) * | 2016-02-10 | 2019-02-28 | B Food Science Co., Ltd. | Cutting fluid, cutting method, and smoothness improver for cut surface |
CN108998188A (zh) * | 2018-09-10 | 2018-12-14 | 洛阳阿特斯光伏科技有限公司 | 一种金刚线切割硅片冷却液及其制备方法和应用 |
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2011
- 2011-08-02 PL PL11738239T patent/PL2601280T3/pl unknown
- 2011-08-02 WO PCT/EP2011/063276 patent/WO2012016976A1/de active Application Filing
- 2011-08-02 BR BR112013002486A patent/BR112013002486A2/pt not_active IP Right Cessation
- 2011-08-02 AU AU2011287623A patent/AU2011287623B9/en not_active Ceased
- 2011-08-02 KR KR1020137005241A patent/KR101505334B1/ko not_active Expired - Fee Related
- 2011-08-02 SG SG2013008172A patent/SG187691A1/en unknown
- 2011-08-02 RU RU2013109141/04A patent/RU2542974C2/ru not_active IP Right Cessation
- 2011-08-02 ES ES11738239.0T patent/ES2525017T3/es active Active
- 2011-08-02 CA CA2806936A patent/CA2806936A1/en not_active Abandoned
- 2011-08-02 EP EP11738239.0A patent/EP2601280B1/de not_active Not-in-force
- 2011-08-02 JP JP2013522230A patent/JP5543030B2/ja not_active Expired - Fee Related
- 2011-08-02 CN CN201180046812.4A patent/CN103154214B/zh not_active Expired - Fee Related
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See references of WO2012016976A1 * |
Also Published As
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CN103154214B (zh) | 2016-02-03 |
ES2525017T3 (es) | 2014-12-16 |
JP2013534262A (ja) | 2013-09-02 |
RU2013109141A (ru) | 2014-09-10 |
SG187691A1 (en) | 2013-03-28 |
CN103154214A (zh) | 2013-06-12 |
AU2011287623B2 (en) | 2014-10-30 |
EP2601280B1 (de) | 2014-10-08 |
KR20130048245A (ko) | 2013-05-09 |
WO2012016976A1 (de) | 2012-02-09 |
PL2601280T3 (pl) | 2015-03-31 |
BR112013002486A2 (pt) | 2016-05-31 |
AU2011287623A1 (en) | 2013-02-21 |
JP5543030B2 (ja) | 2014-07-09 |
AU2011287623B9 (en) | 2014-11-06 |
RU2542974C2 (ru) | 2015-02-27 |
KR101505334B1 (ko) | 2015-03-23 |
CA2806936A1 (en) | 2012-02-09 |
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