EP2067061A1 - TRANSPARENTE PORÖSE SiO2-BESCHICHTUNG FÜR EIN TRANSPARENTES SUBSTRATMATERIAL - Google Patents
TRANSPARENTE PORÖSE SiO2-BESCHICHTUNG FÜR EIN TRANSPARENTES SUBSTRATMATERIALInfo
- Publication number
- EP2067061A1 EP2067061A1 EP07820582A EP07820582A EP2067061A1 EP 2067061 A1 EP2067061 A1 EP 2067061A1 EP 07820582 A EP07820582 A EP 07820582A EP 07820582 A EP07820582 A EP 07820582A EP 2067061 A1 EP2067061 A1 EP 2067061A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- coating
- transparent
- sol
- gel process
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31507—Of polycarbonate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31667—Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
Definitions
- the present invention relates to the field of transparent materials, especially the transparent materials whose reflection has been reduced.
- a transparent coating for a transparent substrate material which is characterized in that the coating is based on SiO 2 and has a porosity of ⁇ 35% to ⁇ 65%.
- the term "based on SiO 2" in the sense of the present invention means or comprises in particular that the coating contains SiO 2 as the main component, preferably ⁇ 70%, more preferably ⁇ 80% and most preferably> 90% to ⁇ 100% of the coating made of SiO 2 .
- transparent in the sense of the present invention means or in particular includes a permeability of ⁇ 90% in the respectively used wavelength range, in particular in the visible wavelength range.
- the coating is substantially homogeneous, and for many applications, a single coating is sufficient (unlike the multilayer systems listed above).
- the coating can - as will be described below - be applied in most applications within the present invention by simple dipping, so that consuming and to be carried out in particular at high temperature application steps can be avoided.
- the thickness of the coating produced is - as will be described below - in many applications in the range of 50-200 nanometers. It is therefore largely insensitive to thermal and mechanical stress (in particular bending stress) and has only insignificant effects on component dimensions and tolerances.
- the porosity of the coating is ⁇ 40% to ⁇ 60%, more preferably ⁇ 45% to ⁇ 55%.
- a preferred embodiment of the invention is characterized in that the thickness of the coating is ⁇ 95 nm to ⁇ 135 nm. This has proven to be particularly favorable for many applications. Preferably, the thickness of the coating is ⁇ IOO nm to ⁇ 130 nm.
- a preferred embodiment of the invention is characterized in that the refractive index ni of the coating at ⁇ 0.8 * to ⁇ 1.2 * is wherein n is 2 the Brechungsin ⁇ dex of the substrate. In this case, for many applications within the present invention, the reflection can be further reduced.
- the refractive index ni of the coating is preferably ⁇ O, 9 * up to ⁇ 1,1 * •
- a preferred embodiment of the invention is characterized in that the coating is essentially a porous solid shaped article, in particular a homogeneous porous shaped article or forms such a body.
- the term "essentially” designates in particular ⁇ 90 vol%, preferably ⁇ 95 vol% of the coating.
- a preferred embodiment of the invention is characterized in that the coating has transmission-increasing properties, in particular for light in the visible wavelength range.
- the coating is preferably capable of increasing the transmission of the substrate by ⁇ 2%, preferably by ⁇ 4%, in the respective wavelength range used, in particular in the visible wavelength range.
- a preferred embodiment of the invention is characterized in that the average diameter of the pores is from ⁇ 5 nm to ⁇ 50 nm. This has been found in many applications of the present invention to be particularly favorable for the antireflective properties of the coating.
- the average diameter of the pores is preferably from ⁇ 10 nm to ⁇ 40 nm, more preferably ⁇ 10 nm to ⁇ 25 nm.
- a preferred embodiment of the invention is characterized in that the diameter of ⁇ 90% of the pores is from ⁇ 5 nm to ⁇ 50 nm.
- a preferred embodiment of the invention is characterized in that the diameter distribution of the pores of the coating according to the invention essentially follows a log-normal distribution with a half-value width of ⁇ IO nm, preferably ⁇ 8 nm, more preferably ⁇ 5 nm.
- Essentially means that ⁇ 90% of the pores, preferably ⁇ 95% of the pores and most preferably ⁇ 98% of the pores follow this distribution.
- a preferred embodiment of the invention is characterized in that the coating is produced by means of a sol-gel process.
- the present invention also relates to a method for producing a transparent coating for a transparent substrate material, characterized in that the method is based on a sol-gel process.
- sol-gel process or sol-gel process in the sense of the present invention means or comprises in particular all processes and / or processes in which silicon precursor materials, in particular silicon halides and / or silicon alkoxides in solution, are subjected to hydrolysis and subsequent condensation become.
- a preferred embodiment of the invention is characterized in that at least one porosity-causing component is present during at least part of the sol-gel process, which component is removed and / or destroyed after completion of the sol-gel process.
- a preferred embodiment of the invention is characterized in that the at least one porosity-causing component is a polymer, wherein the average molecular weight of the polymer is preferably ⁇ 5,000 Da to ⁇ 50,000 Da, more preferably ⁇ 10,000 Da to ⁇ 20,000 Da.
- a preferred embodiment of the invention is characterized in that the polymer is an organic polymer, preferably selected from the group comprising polyethylene glycol, polypropylene glycol, copolymers of polyethylene glycol and polypropylene glycol, polyvinylpyrrolidone, polyether, alkyl, cycloalkyl and / or aryl-substituted polyethers, polyesters alkyl-, cycloalkyl- and / or aryl-substituted polyesters, in particular polyhydroxybutyric acid or mixtures thereof.
- General Groups / Molecule Definition Within the specification and claims, general groups or molecules such as alkyl, alkoxy, aryl, etc. are claimed and described. Unless otherwise described, the following groups within the generally described groups / molecules are preferably used in the context of the present invention:
- Alkyl linear and branched C 1 -C 8 -alkyls
- long-chain alkyls linear and branched C5-C20 alkyls
- Alkenyl C2-C6-alkenyl
- Cycloalkyl C3-C8-cycloalkyl
- Alkoxide / alkoxy C 1 -C 6 alkoxy, linear and branched
- long-chain alkoxide / alkoxy linear and branched C5-C20 alkoxy
- Aryl selected from aromatics with a molecular weight below 300 Da.
- Polyether selected from the group consisting of H- (O-CH 2 - CH (R)) n-OH and H- (0-CH 2 -CH (R)) n -H wherein R is independently selected from: hydrogen, alkyl , Aryl, halogen and n from 1 to 250
- substituted polyethers selected from the group consisting of R 2 - (O-CH 2 -CH (R 1 M n -OR 3 and R 2 - (O-CH 2 -CH (R 2 )) n -R 3 where R i, R 2 , R 3 is independently selected from: hydrogen, alkyl, long chain alkyl, aryl, halogen and n is from 1 to 250
- Ether The compound Ri-OR 2 , wherein each Ri and R 2 are independently selected from the group consisting of hydrogen, halogen, alkyl, cycloalkyl, aryl, long chain alkyl Unless otherwise stated, the following groups / molecules are more preferred groups / molecules within the general group / molecule definition:
- Alkyl linear and branched C 1 -C 6 -alkyl
- Alkenyl C3-C6 alkenyl
- Cycloalkyl C6-C8-cycloalkyl
- long-chain alkoxy linear and branched C5-C10 alkoxy, preferably linear C6-C8 alkoxy
- Polyether selected from the group consisting of H- (O-CH 2 - CH (R)) n-OH and H- (0-CH 2 -CH (R)) n -H wherein R is independently selected from: hydrogen, alkyl , aryl, halogen and n is from 10 to 250.
- substituted polyethers selected from the group consisting of R 2 - (O-CH 2 -CH (R 1 )) n -OR 3 and R 2 - (O-CH 2 -CH (R 2 )) n -R 3 where R i, R 2 , R 3 is independently selected from hydrogen, alkyl, long chain alkyl, aryl, halogen and n is from 10 to 250.
- a preferred embodiment of the invention is characterized in that the polymer is washed out after completion of the sol-gel process.
- a preferred embodiment of the invention is characterized in that the polymer is washed out by means of tempering, in particular at a temperature of ⁇ 80 ° C to ⁇ 100 ° C, preferably with water after completion of the sol-gel process.
- a preferred embodiment of the invention is characterized in that the polymer is terminated after termination of the sol-gel reaction. Burned out process especially at a temperature of ⁇ 250 ° C is burned out.
- a preferred embodiment of the invention is characterized in that the silicon is added in the form of a silicon alkoxide precursor solution.
- a preferred embodiment of the invention is characterized in that the pH of the silicon-containing precursor solution is from ⁇ 1 to ⁇ 4.
- the invention also relates to a transparent coating for a transparent substrate produced by the process according to the invention.
- the invention also relates to an optical component comprising a transparent substrate and a coating applied and / or arranged on the substrate according to the present invention
- a preferred embodiment of the invention is characterized in that the substrate is selected from the group comprising glass, transparent plastics, preferably selected from the group consisting of polycarbonate, polyacrylic and mixtures thereof, as well as mixtures thereof.
- the present invention also relates to a method for producing an optical component according to the invention, characterized in that the coating is applied to the substrate by dipping and / or spin-coating.
- the present invention also relates to the use of a coating according to the invention and / or an optical component according to the invention for
- FIG. 1 shows a diagram with two transmission measurements of a polycarbonate substrate coated according to a first embodiment of the invention and of an uncoated polycarbonate substrate; such as
- FIG. 2 shows a photograph of a polycarbonate substrate coated in half according to a first embodiment of the invention.
- FIGS. 1 and 2 refer to Example I described below:
- a polycarbonate based optical device was prepared as follows:
- Solution 1 4 g of polyethylene glycol were provided in 50 ml of ethanol and while stirring slowly added water until complete solution occurs. Then 4 drops of IN HCl are added.
- Solution 2 was then made up to 50 ml with solution 1 and stirred for 2 h.
- the polycarbonate substrate was pretreated by flame silanization to increase the bond between substrate and coating.
- the polycarbonate substrate was then dip-coated with the solution (rate 50 mm / min). It was then dried in air and annealed at 100 0 C for 2h in the oven. After cooling, it was stored in water for 1 min.
- the porosity of the coating was 55%.
- Example 1 shows a diagram with two transmission measurements of the polycarbonate substrate coated according to Example I and of the uncoated polycarbonate substrate. One sees an improvement of the transmission by approx. 5%.
- FIG. 2 shows a photograph of a polycarbonate substrate half coated according to Example I. FIG. It can be seen clearly that the reflection was significantly reduced.
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Paints Or Removers (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE200610046308 DE102006046308A1 (de) | 2006-09-29 | 2006-09-29 | Transparente poröse SiO2-Beschichtung für ein transparentes Substratmaterial |
PCT/EP2007/060187 WO2008040666A1 (de) | 2006-09-29 | 2007-09-26 | TRANSPARENTE PORÖSE SiO2-BESCHICHTUNG FÜR EIN TRANSPARENTES SUBSTRATMATERIAL |
Publications (1)
Publication Number | Publication Date |
---|---|
EP2067061A1 true EP2067061A1 (de) | 2009-06-10 |
Family
ID=38670751
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP07820582A Ceased EP2067061A1 (de) | 2006-09-29 | 2007-09-26 | TRANSPARENTE PORÖSE SiO2-BESCHICHTUNG FÜR EIN TRANSPARENTES SUBSTRATMATERIAL |
Country Status (6)
Country | Link |
---|---|
US (1) | US8664310B2 (de) |
EP (1) | EP2067061A1 (de) |
JP (1) | JP2010505016A (de) |
CN (1) | CN101517437B (de) |
DE (1) | DE102006046308A1 (de) |
WO (1) | WO2008040666A1 (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102007043653A1 (de) * | 2007-09-13 | 2009-04-02 | Siemens Ag | Transparente poröse SiO2-Beschichtung für ein transparentes Substratmaterial mit verbesserten optischen Eigenschaften |
KR101704536B1 (ko) * | 2010-10-08 | 2017-02-09 | 삼성전자주식회사 | 슬림형 터치 패널 및 이를 포함하는 휴대 단말기 |
US20160168035A1 (en) | 2014-12-15 | 2016-06-16 | Cpfilms Inc. | Abrasion-resistant optical product with improved gas permeability |
CN111913337A (zh) | 2019-05-09 | 2020-11-10 | 中强光电股份有限公司 | 波长转换元件及其制作方法 |
DE102020135064B4 (de) | 2020-12-29 | 2022-12-22 | Ara-Coatings GmbH & Co. KG | Beschichtung und Verfahren zum Beschichten eines Substrats |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050195486A1 (en) * | 2004-03-03 | 2005-09-08 | Hiroshi Sasaki | Anti-reflecting membrane, and display apparatus, optical storage medium and solar energy converting device having the same, and production method of the membrane |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4943542A (en) * | 1987-10-31 | 1990-07-24 | Hitachi Chemical Company, Ltd. | Process for producing silica glass |
US5009688A (en) * | 1988-09-28 | 1991-04-23 | Asahi Glass Company, Ltd. | Process for producing porous glass |
US5392156A (en) | 1992-03-31 | 1995-02-21 | Canon Kabushiki Kaisha | Optical device |
WO1997006896A1 (en) * | 1995-08-14 | 1997-02-27 | Central Glass Company Limited | Porous metal-oxide thin film and method of forming same on glass substrate |
FR2756293B1 (fr) * | 1996-11-26 | 1998-12-31 | Kodak Pathe | Composite organique/inorganique et produit photographique contenant un tel composite |
WO1999029635A1 (fr) * | 1997-12-09 | 1999-06-17 | Nippon Sheet Glass Co., Ltd. | Plaque de verre antireflet, son procede de production et composition de revetement antireflet |
DE19918811A1 (de) | 1999-04-26 | 2000-11-02 | Fraunhofer Ges Forschung | Vorgespanntes, mit einer wischfesten, porösen SiO¶2¶-Antireflex-Schicht versehenes Sicherheitsglas u. Verfahren z. d. Herstellung |
DE10196026B4 (de) * | 2000-04-04 | 2011-02-10 | Asahi Kasei Kabushiki Kaisha | Überzugs-Zusammensetzung, dünner Film, zur Verwendung des dünnen Films und Verfahren zur Herstellung eines dünnen porösen Kieselsäure-Films |
DE10051724A1 (de) | 2000-10-18 | 2002-05-02 | Flabeg Gmbh & Co Kg | Thermisch vorgespanntes Glas mit einer abriebfesten, porösen SiO¶2¶-Antireflexschicht |
AU2002354487A1 (en) | 2001-12-14 | 2003-06-30 | Asahi Kasei Kabushiki Kaisha | Coating composition for forming low-refractive index thin layers |
DE10209949A1 (de) | 2002-03-06 | 2003-09-25 | Schott Glas | Glaskörper mit poröser Beschichtung |
CN1167959C (zh) * | 2002-07-19 | 2004-09-22 | 中国科学院山西煤炭化学研究所 | 抗激光损伤宽谱带减反膜的制备方法 |
JP4040396B2 (ja) | 2002-08-29 | 2008-01-30 | キヤノン株式会社 | 通知方法、情報処理装置及び制御プログラム |
JPWO2004113966A1 (ja) * | 2003-06-18 | 2006-08-03 | 旭化成株式会社 | 反射防止膜 |
WO2005095102A1 (ja) * | 2004-03-31 | 2005-10-13 | Nippon Sheet Glass Company, Limited | シリカ系膜が形成された物品およびその製造方法 |
JP2006215542A (ja) * | 2005-01-07 | 2006-08-17 | Pentax Corp | 反射防止膜及びこれを有する撮像系光学素子 |
US20060154044A1 (en) * | 2005-01-07 | 2006-07-13 | Pentax Corporation | Anti-reflection coating and optical element having such anti-reflection coating for image sensors |
US8029871B2 (en) * | 2005-06-09 | 2011-10-04 | Hoya Corporation | Method for producing silica aerogel coating |
JP5437662B2 (ja) * | 2008-03-03 | 2014-03-12 | 学校法人慶應義塾 | 反射防止膜及びその形成方法 |
JP5313587B2 (ja) * | 2008-07-31 | 2013-10-09 | 学校法人慶應義塾 | 反射防止膜及びこれを有する光学部品、交換レンズ及び撮像装置 |
JP2010132485A (ja) * | 2008-12-03 | 2010-06-17 | Keio Gijuku | メソポーラスシリカ多孔質膜の形成方法、その多孔質膜、反射防止膜及び光学素子 |
-
2006
- 2006-09-29 DE DE200610046308 patent/DE102006046308A1/de not_active Ceased
-
2007
- 2007-09-26 JP JP2009529692A patent/JP2010505016A/ja active Pending
- 2007-09-26 CN CN2007800357892A patent/CN101517437B/zh not_active Expired - Fee Related
- 2007-09-26 WO PCT/EP2007/060187 patent/WO2008040666A1/de active Application Filing
- 2007-09-26 EP EP07820582A patent/EP2067061A1/de not_active Ceased
- 2007-09-26 US US12/443,248 patent/US8664310B2/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050195486A1 (en) * | 2004-03-03 | 2005-09-08 | Hiroshi Sasaki | Anti-reflecting membrane, and display apparatus, optical storage medium and solar energy converting device having the same, and production method of the membrane |
Also Published As
Publication number | Publication date |
---|---|
DE102006046308A1 (de) | 2008-04-03 |
CN101517437A (zh) | 2009-08-26 |
WO2008040666A1 (de) | 2008-04-10 |
US8664310B2 (en) | 2014-03-04 |
US20100009195A1 (en) | 2010-01-14 |
JP2010505016A (ja) | 2010-02-18 |
CN101517437B (zh) | 2012-07-04 |
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