EP2067061A1 - TRANSPARENT POROUS SiO2 COATING FOR A TRANSPARENT SUBSTRATE MATERIAL - Google Patents
TRANSPARENT POROUS SiO2 COATING FOR A TRANSPARENT SUBSTRATE MATERIALInfo
- Publication number
- EP2067061A1 EP2067061A1 EP07820582A EP07820582A EP2067061A1 EP 2067061 A1 EP2067061 A1 EP 2067061A1 EP 07820582 A EP07820582 A EP 07820582A EP 07820582 A EP07820582 A EP 07820582A EP 2067061 A1 EP2067061 A1 EP 2067061A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- coating
- transparent
- sol
- gel process
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 53
- 239000011248 coating agent Substances 0.000 title claims abstract description 52
- 239000000758 substrate Substances 0.000 title claims abstract description 30
- 239000000463 material Substances 0.000 title claims abstract description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title abstract 4
- 229910052681 coesite Inorganic materials 0.000 title abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 title abstract 2
- 239000000377 silicon dioxide Substances 0.000 title abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 title abstract 2
- 229910052682 stishovite Inorganic materials 0.000 title abstract 2
- 229910052905 tridymite Inorganic materials 0.000 title abstract 2
- 238000003980 solgel method Methods 0.000 claims abstract description 17
- 239000004417 polycarbonate Substances 0.000 claims abstract description 13
- 229920000515 polycarbonate Polymers 0.000 claims abstract description 13
- 229920000642 polymer Polymers 0.000 claims abstract description 13
- 125000000217 alkyl group Chemical group 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 14
- 230000003287 optical effect Effects 0.000 claims description 10
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 9
- 229920000570 polyether Polymers 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 239000010703 silicon Substances 0.000 claims description 8
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- 239000002202 Polyethylene glycol Substances 0.000 claims description 5
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 5
- 229920001223 polyethylene glycol Polymers 0.000 claims description 5
- -1 silicon alkoxide Chemical class 0.000 claims description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 229920000728 polyester Polymers 0.000 claims description 4
- 229920001451 polypropylene glycol Polymers 0.000 claims description 4
- 239000002243 precursor Substances 0.000 claims description 4
- 238000007598 dipping method Methods 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 3
- 229920003023 plastic Polymers 0.000 claims description 3
- 229920001577 copolymer Polymers 0.000 claims description 2
- 238000005516 engineering process Methods 0.000 claims description 2
- 229920000620 organic polymer Polymers 0.000 claims description 2
- 239000001267 polyvinylpyrrolidone Substances 0.000 claims description 2
- 229920000036 polyvinylpyrrolidone Polymers 0.000 claims description 2
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 claims description 2
- 239000007787 solid Substances 0.000 claims description 2
- 238000004528 spin coating Methods 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims 1
- 230000003667 anti-reflective effect Effects 0.000 abstract description 2
- 125000003545 alkoxy group Chemical group 0.000 description 7
- 125000003118 aryl group Chemical group 0.000 description 7
- 239000011148 porous material Substances 0.000 description 7
- 229910052736 halogen Inorganic materials 0.000 description 5
- 150000002367 halogens Chemical class 0.000 description 5
- 150000002431 hydrogen Chemical class 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 239000012780 transparent material Substances 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 4
- 125000003342 alkenyl group Chemical group 0.000 description 3
- 150000004703 alkoxides Chemical class 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000005496 tempering Methods 0.000 description 2
- 125000006552 (C3-C8) cycloalkyl group Chemical group 0.000 description 1
- 125000000882 C2-C6 alkenyl group Chemical group 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000002444 silanisation Methods 0.000 description 1
- 239000012686 silicon precursor Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31507—Of polycarbonate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31667—Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
Definitions
- the present invention relates to the field of transparent materials, especially the transparent materials whose reflection has been reduced.
- a transparent coating for a transparent substrate material which is characterized in that the coating is based on SiO 2 and has a porosity of ⁇ 35% to ⁇ 65%.
- the term "based on SiO 2" in the sense of the present invention means or comprises in particular that the coating contains SiO 2 as the main component, preferably ⁇ 70%, more preferably ⁇ 80% and most preferably> 90% to ⁇ 100% of the coating made of SiO 2 .
- transparent in the sense of the present invention means or in particular includes a permeability of ⁇ 90% in the respectively used wavelength range, in particular in the visible wavelength range.
- the coating is substantially homogeneous, and for many applications, a single coating is sufficient (unlike the multilayer systems listed above).
- the coating can - as will be described below - be applied in most applications within the present invention by simple dipping, so that consuming and to be carried out in particular at high temperature application steps can be avoided.
- the thickness of the coating produced is - as will be described below - in many applications in the range of 50-200 nanometers. It is therefore largely insensitive to thermal and mechanical stress (in particular bending stress) and has only insignificant effects on component dimensions and tolerances.
- the porosity of the coating is ⁇ 40% to ⁇ 60%, more preferably ⁇ 45% to ⁇ 55%.
- a preferred embodiment of the invention is characterized in that the thickness of the coating is ⁇ 95 nm to ⁇ 135 nm. This has proven to be particularly favorable for many applications. Preferably, the thickness of the coating is ⁇ IOO nm to ⁇ 130 nm.
- a preferred embodiment of the invention is characterized in that the refractive index ni of the coating at ⁇ 0.8 * to ⁇ 1.2 * is wherein n is 2 the Brechungsin ⁇ dex of the substrate. In this case, for many applications within the present invention, the reflection can be further reduced.
- the refractive index ni of the coating is preferably ⁇ O, 9 * up to ⁇ 1,1 * •
- a preferred embodiment of the invention is characterized in that the coating is essentially a porous solid shaped article, in particular a homogeneous porous shaped article or forms such a body.
- the term "essentially” designates in particular ⁇ 90 vol%, preferably ⁇ 95 vol% of the coating.
- a preferred embodiment of the invention is characterized in that the coating has transmission-increasing properties, in particular for light in the visible wavelength range.
- the coating is preferably capable of increasing the transmission of the substrate by ⁇ 2%, preferably by ⁇ 4%, in the respective wavelength range used, in particular in the visible wavelength range.
- a preferred embodiment of the invention is characterized in that the average diameter of the pores is from ⁇ 5 nm to ⁇ 50 nm. This has been found in many applications of the present invention to be particularly favorable for the antireflective properties of the coating.
- the average diameter of the pores is preferably from ⁇ 10 nm to ⁇ 40 nm, more preferably ⁇ 10 nm to ⁇ 25 nm.
- a preferred embodiment of the invention is characterized in that the diameter of ⁇ 90% of the pores is from ⁇ 5 nm to ⁇ 50 nm.
- a preferred embodiment of the invention is characterized in that the diameter distribution of the pores of the coating according to the invention essentially follows a log-normal distribution with a half-value width of ⁇ IO nm, preferably ⁇ 8 nm, more preferably ⁇ 5 nm.
- Essentially means that ⁇ 90% of the pores, preferably ⁇ 95% of the pores and most preferably ⁇ 98% of the pores follow this distribution.
- a preferred embodiment of the invention is characterized in that the coating is produced by means of a sol-gel process.
- the present invention also relates to a method for producing a transparent coating for a transparent substrate material, characterized in that the method is based on a sol-gel process.
- sol-gel process or sol-gel process in the sense of the present invention means or comprises in particular all processes and / or processes in which silicon precursor materials, in particular silicon halides and / or silicon alkoxides in solution, are subjected to hydrolysis and subsequent condensation become.
- a preferred embodiment of the invention is characterized in that at least one porosity-causing component is present during at least part of the sol-gel process, which component is removed and / or destroyed after completion of the sol-gel process.
- a preferred embodiment of the invention is characterized in that the at least one porosity-causing component is a polymer, wherein the average molecular weight of the polymer is preferably ⁇ 5,000 Da to ⁇ 50,000 Da, more preferably ⁇ 10,000 Da to ⁇ 20,000 Da.
- a preferred embodiment of the invention is characterized in that the polymer is an organic polymer, preferably selected from the group comprising polyethylene glycol, polypropylene glycol, copolymers of polyethylene glycol and polypropylene glycol, polyvinylpyrrolidone, polyether, alkyl, cycloalkyl and / or aryl-substituted polyethers, polyesters alkyl-, cycloalkyl- and / or aryl-substituted polyesters, in particular polyhydroxybutyric acid or mixtures thereof.
- General Groups / Molecule Definition Within the specification and claims, general groups or molecules such as alkyl, alkoxy, aryl, etc. are claimed and described. Unless otherwise described, the following groups within the generally described groups / molecules are preferably used in the context of the present invention:
- Alkyl linear and branched C 1 -C 8 -alkyls
- long-chain alkyls linear and branched C5-C20 alkyls
- Alkenyl C2-C6-alkenyl
- Cycloalkyl C3-C8-cycloalkyl
- Alkoxide / alkoxy C 1 -C 6 alkoxy, linear and branched
- long-chain alkoxide / alkoxy linear and branched C5-C20 alkoxy
- Aryl selected from aromatics with a molecular weight below 300 Da.
- Polyether selected from the group consisting of H- (O-CH 2 - CH (R)) n-OH and H- (0-CH 2 -CH (R)) n -H wherein R is independently selected from: hydrogen, alkyl , Aryl, halogen and n from 1 to 250
- substituted polyethers selected from the group consisting of R 2 - (O-CH 2 -CH (R 1 M n -OR 3 and R 2 - (O-CH 2 -CH (R 2 )) n -R 3 where R i, R 2 , R 3 is independently selected from: hydrogen, alkyl, long chain alkyl, aryl, halogen and n is from 1 to 250
- Ether The compound Ri-OR 2 , wherein each Ri and R 2 are independently selected from the group consisting of hydrogen, halogen, alkyl, cycloalkyl, aryl, long chain alkyl Unless otherwise stated, the following groups / molecules are more preferred groups / molecules within the general group / molecule definition:
- Alkyl linear and branched C 1 -C 6 -alkyl
- Alkenyl C3-C6 alkenyl
- Cycloalkyl C6-C8-cycloalkyl
- long-chain alkoxy linear and branched C5-C10 alkoxy, preferably linear C6-C8 alkoxy
- Polyether selected from the group consisting of H- (O-CH 2 - CH (R)) n-OH and H- (0-CH 2 -CH (R)) n -H wherein R is independently selected from: hydrogen, alkyl , aryl, halogen and n is from 10 to 250.
- substituted polyethers selected from the group consisting of R 2 - (O-CH 2 -CH (R 1 )) n -OR 3 and R 2 - (O-CH 2 -CH (R 2 )) n -R 3 where R i, R 2 , R 3 is independently selected from hydrogen, alkyl, long chain alkyl, aryl, halogen and n is from 10 to 250.
- a preferred embodiment of the invention is characterized in that the polymer is washed out after completion of the sol-gel process.
- a preferred embodiment of the invention is characterized in that the polymer is washed out by means of tempering, in particular at a temperature of ⁇ 80 ° C to ⁇ 100 ° C, preferably with water after completion of the sol-gel process.
- a preferred embodiment of the invention is characterized in that the polymer is terminated after termination of the sol-gel reaction. Burned out process especially at a temperature of ⁇ 250 ° C is burned out.
- a preferred embodiment of the invention is characterized in that the silicon is added in the form of a silicon alkoxide precursor solution.
- a preferred embodiment of the invention is characterized in that the pH of the silicon-containing precursor solution is from ⁇ 1 to ⁇ 4.
- the invention also relates to a transparent coating for a transparent substrate produced by the process according to the invention.
- the invention also relates to an optical component comprising a transparent substrate and a coating applied and / or arranged on the substrate according to the present invention
- a preferred embodiment of the invention is characterized in that the substrate is selected from the group comprising glass, transparent plastics, preferably selected from the group consisting of polycarbonate, polyacrylic and mixtures thereof, as well as mixtures thereof.
- the present invention also relates to a method for producing an optical component according to the invention, characterized in that the coating is applied to the substrate by dipping and / or spin-coating.
- the present invention also relates to the use of a coating according to the invention and / or an optical component according to the invention for
- FIG. 1 shows a diagram with two transmission measurements of a polycarbonate substrate coated according to a first embodiment of the invention and of an uncoated polycarbonate substrate; such as
- FIG. 2 shows a photograph of a polycarbonate substrate coated in half according to a first embodiment of the invention.
- FIGS. 1 and 2 refer to Example I described below:
- a polycarbonate based optical device was prepared as follows:
- Solution 1 4 g of polyethylene glycol were provided in 50 ml of ethanol and while stirring slowly added water until complete solution occurs. Then 4 drops of IN HCl are added.
- Solution 2 was then made up to 50 ml with solution 1 and stirred for 2 h.
- the polycarbonate substrate was pretreated by flame silanization to increase the bond between substrate and coating.
- the polycarbonate substrate was then dip-coated with the solution (rate 50 mm / min). It was then dried in air and annealed at 100 0 C for 2h in the oven. After cooling, it was stored in water for 1 min.
- the porosity of the coating was 55%.
- Example 1 shows a diagram with two transmission measurements of the polycarbonate substrate coated according to Example I and of the uncoated polycarbonate substrate. One sees an improvement of the transmission by approx. 5%.
- FIG. 2 shows a photograph of a polycarbonate substrate half coated according to Example I. FIG. It can be seen clearly that the reflection was significantly reduced.
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Paints Or Removers (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
Beschreibungdescription
Transparente poröse Siθ2-Beschichtung für ein transparentes Substratmaterial,Transparent porous SiO 2 coating for a transparent substrate material,
Die vorliegende Erfindung bezieht sich auf das Gebiet der transparenten Materialien, insbesondere der transparenten Materialien, deren Reflexion vermindert wurde.The present invention relates to the field of transparent materials, especially the transparent materials whose reflection has been reduced.
Bei vielen transparenten Materialen, insbesondere transparenten Materialien auf Kunststoffbasis, wie beispielsweise PoIy- carbonat etc. ergibt sich die Schwierigkeit, dass diese z.T. unerwünschte Reflektionseigenschaften haben, welche den Einsatz bei vielen Anwendungen erschweren oder sogar unmöglich machen.In the case of many transparent materials, in particular transparent materials based on plastics, such as, for example, polycarbonate, etc., there is the difficulty that these are in some cases have unwanted reflection properties that make use in many applications difficult or even impossible.
Daher wurden zahlreiche Versuche unternommen, transparente Materialien insbesondere durch Aufbringen weiterer Schichten weniger reflektiv zu gestalten.Therefore, numerous attempts have been made to make transparent materials, in particular by applying further layers less reflective.
Hierzu wurde z.B. vorgeschlagen, durch eine sog ,,flower-like alumina"-Schicht die Reflexion zu vermindern (siehe Yamaguchi et al, Journal of Sol-Gel Science & Technology, 2005, 33, 117-120). Diese Herangehensweise erfordert jedoch einen Tem- perschritt bei erhöhten Temperaturen (ca. 400 0C).For example, it has been proposed to reduce reflection through a so-called "flower-like alumina" layer (see Yamaguchi et al, Journal of Sol-Gel Science & Technology, 2005, 33, 117-120), but this approach requires one TEM Perschmann rode at elevated temperatures (400 0 C).
Andere vorgeschlagene Beschichtungen umfassen Mehrschichtsysteme mit wechselnden Brechungsindices, z.B. Multischichtsys- teme aus Siθ2 und TiÜ2. Auch hier sind jedoch Temperschritte, meist bei Temperaturen über 4000C notwendig (siehe M. Walther, OTTI-Seminar Regensburg, September 2005) . Andere Systeme verwenden Schichten aus Tiθ2 und MgF2 (siehe EP 564 134 Bl), bei denen zusätzlich Fluorkohlenwasserstoffharze vorgesehen sind. Der Nachteil dieses Systems liegt wiederum in der schlechten Aufbringbarkeit .Other proposed coatings include multilayer systems with varying refractive indices, eg multi-layer systems of SiO 2 and TiO 2. Here, too, however, tempering steps, usually at temperatures above 400 0 C are necessary (see M. Walther, OTTI Seminar Regensburg, September 2005). Other systems use layers of TiO 2 and MgF 2 (see EP 564 134 B1), in which fluorohydrocarbon resins are additionally provided. The disadvantage of this system is in turn the poor applicability.
Es stellt sich somit die Aufgabe, eine transparente Beschich- tung für ein transparentes Substratmaterial zu schaffen, wel- che die oben angesprochenen Nachteile zumindest teilweise überwindet und insbesondere auf einfache Weise aufbringbar ist .It is therefore the object to provide a transparent coating for a transparent substrate material, which At least partially overcomes the above-mentioned disadvantages and in particular can be applied in a simple manner.
Diese Aufgabe wird durch eine transparente Beschichtung nach Anspruch 1 sowie durch das Verfahren nach Anspruch 6 gelöst.This object is achieved by a transparent coating according to claim 1 and by the method according to claim 6.
Demgemäß wird eine transparente Beschichtung für ein transparentes Substratmaterial vorgeschlagen, welche dadurch gekenn- zeichnet ist, dass die Beschichtung auf Siθ2 basiert und eine Porosität von ≥35% bis ≤65% aufweist.Accordingly, a transparent coating for a transparent substrate material is proposed, which is characterized in that the coating is based on SiO 2 and has a porosity of ≥35% to ≤65%.
Die Bezeichnung „basierend auf SiO2" im Sinne der vorliegenden Erfindung bedeutet oder umfasst insbesondere, dass die Beschichtung Siθ2 als Hauptkomponente enthält. Bevorzugt sind dabei ≥70%, noch bevorzugt ≥80% sowie am meisten bevorzugt >90% bis <100 der Beschichtung aus SiO2.The term "based on SiO 2 " in the sense of the present invention means or comprises in particular that the coating contains SiO 2 as the main component, preferably ≥70%, more preferably ≥80% and most preferably> 90% to <100% of the coating made of SiO 2 .
Die Bezeichnung „transparent" im Sinne der vorliegenden Er- findung bedeutet oder umfasst dabei insbesondere eine Durchlässigkeit von ≥90% im jeweilig verwendeten Wellenlängenbereich, insbesondere im sichtbaren Wellenlängenbereich.The term "transparent" in the sense of the present invention means or in particular includes a permeability of ≥90% in the respectively used wavelength range, in particular in the visible wavelength range.
Durch eine solche erfindungsgemäße Siθ2-Beschichtung kann in vielen Anwendungen innerhalb der vorliegenden Erfindung einer oder mehrere der folgenden Vorteile erzielt werden:By means of such an SiO 2 coating according to the invention, one or more of the following advantages can be achieved in many applications within the present invention:
Die Beschichtung ist im Wesentlichen homogen und für viele Anwendungen reicht eine einzige Beschichtung aus (anders als bei den oben aufgeführten Mehrschichtsystemen) .The coating is substantially homogeneous, and for many applications, a single coating is sufficient (unlike the multilayer systems listed above).
Die Beschichtung kann - wie im Folgenden noch beschrieben wird - bei den meisten Anwendungen innerhalb der vorliegenden Erfindung durch einfaches Tauchen aufgebracht werden, so dass aufwendige und insbesondere bei hoher Temperatur durchzuführende Aufbringungsschritte vermieden werden können. Die Dicke der hergestellten Beschichtung beträgt - wie im Folgenden noch beschrieben wird - bei vielen Anwendungen im Bereich von 50- 200 Nanometern. Sie ist daher weitgehend unempfindlich gegenüber thermischem und mechanischem Stress (insbesondere Biegebelastung) und be- einflusst Bauteilabmessungen und Toleranzen nur unwesentlich.The coating can - as will be described below - be applied in most applications within the present invention by simple dipping, so that consuming and to be carried out in particular at high temperature application steps can be avoided. The thickness of the coating produced is - as will be described below - in many applications in the range of 50-200 nanometers. It is therefore largely insensitive to thermal and mechanical stress (in particular bending stress) and has only insignificant effects on component dimensions and tolerances.
Gemäß einer mehr bevorzugten Ausführungsform beträgt die Porosität der Beschichtung ≥40% bis ≤60%, noch bevorzugt ≥45% bis <55%.According to a more preferred embodiment, the porosity of the coating is ≥40% to ≤60%, more preferably ≥45% to <55%.
Eine bevorzugte Ausführungsform der Erfindung ist dadurch ge- kennzeichnet, dass die Dicke der Beschichtung bei ≥95 nm bis ≤135 nm liegt. Dies hat sich für viele Anwendungen als besonders günstig herausgestellt. Bevorzugt liegt die Dicke der Beschichtung bei ≥IOO nm bis ≤130 nm.A preferred embodiment of the invention is characterized in that the thickness of the coating is ≥95 nm to ≤135 nm. This has proven to be particularly favorable for many applications. Preferably, the thickness of the coating is ≥IOO nm to ≤ 130 nm.
Eine bevorzugte Ausführungsform der Erfindung ist dadurch gekennzeichnet, dass der Brechungsindex ni der Beschichtung bei ≥0,8 * bis ≤1,2 * liegt, wobei n2 der Brechungsin¬ dex des Substrats ist. In diesem Fall kann für viele Anwendungen innerhalb der vorliegenden Erfindung die Reflexion nochmals vermindert werden. Bevorzugt liegt der Brechungsindex ni der Beschichtung bei ≥O, 9 * bis ≤1,1 * •A preferred embodiment of the invention is characterized in that the refractive index ni of the coating at ≥0.8 * to ≤1.2 * is wherein n is 2 the Brechungsin ¬ dex of the substrate. In this case, for many applications within the present invention, the reflection can be further reduced. The refractive index ni of the coating is preferably ≥O, 9 * up to ≤1,1 * •
Eine bevorzugte Ausführungsform der Erfindung ist dadurch gekennzeichnet, dass die Beschichtung im Wesentlichen ein porö- ser Vollformkörper, insbesondere ein homogener poröser Vollformkörper ist bzw. einen solchen Körper bildet.A preferred embodiment of the invention is characterized in that the coating is essentially a porous solid shaped article, in particular a homogeneous porous shaped article or forms such a body.
Der Term „im wesentlichen" bezeichnet dabei insbesondere ≥90 Vol-%, bevorzugt ≥95 Vol-% der Beschichtung.The term "essentially" designates in particular ≥90 vol%, preferably ≥95 vol% of the coating.
Dadurch kann bei vielen Anwendungen innerhalb der vorliegenden Erfindung eine einfach herstellbare und noch weiter re- flektionsmindernde Beschichtung erreicht werden. Eine bevorzugte Ausführungsform der Erfindung ist dadurch gekennzeichnet, dass die Beschichtung transmissionserhöhende Eigenschaften, insbesondere für Licht im sichtbaren Wellen- längenbereich, aufweist.As a result, in many applications within the present invention, an easily producible and even further reflection-reducing coating can be achieved. A preferred embodiment of the invention is characterized in that the coating has transmission-increasing properties, in particular for light in the visible wavelength range.
Bevorzugt ist die Beschichtung in der Lage, die Transmission des Substrates um ≥2%, bevorzugt um ≥4% im jeweilig verwendeten Wellenlängenbereich, insbesondere im sichtbaren Wellen- längenbereich zu erhöhen.The coating is preferably capable of increasing the transmission of the substrate by ≥ 2%, preferably by ≥ 4%, in the respective wavelength range used, in particular in the visible wavelength range.
Eine bevorzugte Ausführungsform der Erfindung ist dadurch gekennzeichnet, dass der durchschnittliche Durchmesser der Poren von ≥5 nm bis ≤50 nm beträgt. Dies hat sich bei vielen Anwendungen der vorliegenden Erfindung als besonders günstig für die antireflektiven Eigenschaften der Beschichtung herausgestellt. Bevorzugt beträgt der durchschnittliche Durchmesser der Poren von ≥IO nm bis ≤40 nm, noch bevorzugt ≥IO nm bis ≤25 nm.A preferred embodiment of the invention is characterized in that the average diameter of the pores is from ≥ 5 nm to ≦ 50 nm. This has been found in many applications of the present invention to be particularly favorable for the antireflective properties of the coating. The average diameter of the pores is preferably from ≥10 nm to ≦ 40 nm, more preferably ≥10 nm to ≦ 25 nm.
Eine bevorzugte Ausführungsform der Erfindung ist dadurch gekennzeichnet, dass der Durchmesser von ≥90% der Poren von ≥5 nm bis ≤50 nm beträgt.A preferred embodiment of the invention is characterized in that the diameter of ≥90% of the pores is from ≥5 nm to ≤50 nm.
Eine bevorzugte Ausführungsform der Erfindung ist dadurch gekennzeichnet, dass die Durchmesserverteilung der Poren der erfindungsgemäßen Beschichtung im wesentlichen einer log-norm Verteilung mit einer Halbwertsbreite von ≤IO nm, bevorzugt ≤8 nm, noch bevorzugt ≤5 nm folgt.A preferred embodiment of the invention is characterized in that the diameter distribution of the pores of the coating according to the invention essentially follows a log-normal distribution with a half-value width of ≦ IO nm, preferably ≦ 8 nm, more preferably ≦ 5 nm.
„Im wesentlichen" bedeutet dabei, dass ≥90% der Poren, bevorzugt ≥95% der Poren sowie am meisten bevorzugt ≥98% der Poren dieser Verteilung folgen."Essentially" means that ≥90% of the pores, preferably ≥95% of the pores and most preferably ≥98% of the pores follow this distribution.
Eine derartige Verteilung hat sich für viele Anwendungen der vorliegenden Erfindung als besonders günstig herausgestellt, da so eine optisch besonders homogene Beschichtung erreicht werden kann. Eine bevorzugte Ausführungsform der Erfindung ist dadurch gekennzeichnet, dass die Beschichtung mittels eines Sol-Gel- Verfahrens hergestellt wird.Such a distribution has been found to be particularly favorable for many applications of the present invention, since an optically highly homogeneous coating can be achieved in this way. A preferred embodiment of the invention is characterized in that the coating is produced by means of a sol-gel process.
Die vorliegende Erfindung bezieht sich außerdem auf ein Verfahren zur Herstellung einer transparenten Beschichtung für ein transparentes Substratmaterial, dadurch gekennzeichnet, dass das Verfahren auf einem Sol-Gel-Prozess beruht.The present invention also relates to a method for producing a transparent coating for a transparent substrate material, characterized in that the method is based on a sol-gel process.
Die Bezeichnung „Sol-Gel-Prozess oder Sol-Gel-Verfahren" im Sinne der vorliegenden Erfindung bedeutet oder umfasst insbesondere alle Prozesse und/oder Verfahren bei denen Silizi- umprecursormaterialien, insbesondere Siliziumhalogenide und/oder Siliziumalkoxide in Lösung einer Hydrolyse und anschließenden Kondensation unterworfen werden.The term "sol-gel process or sol-gel process" in the sense of the present invention means or comprises in particular all processes and / or processes in which silicon precursor materials, in particular silicon halides and / or silicon alkoxides in solution, are subjected to hydrolysis and subsequent condensation become.
Eine bevorzugte Ausführungsform der Erfindung ist dadurch gekennzeichnet, dass während zumindest eines Teils des Sol-Gel- Prozesses mindestens eine porositätsverursachende Komponente vorhanden ist, die nach Beendigung des Sol-Gel-Prozesses entfernt und/oder zerstört wird.A preferred embodiment of the invention is characterized in that at least one porosity-causing component is present during at least part of the sol-gel process, which component is removed and / or destroyed after completion of the sol-gel process.
Eine bevorzugte Ausführungsform der Erfindung ist dadurch ge- kennzeichnet, dass die mindestens eine porositätsverursachende Komponente ein Polymer ist, wobei die durchschnittliche Molmasse des Polymers bevorzugt ≥5.000 Da bis ≤50.000 Da, noch bevorzugt ≥IO.OOO Da bis <20.000 Da beträgt.A preferred embodiment of the invention is characterized in that the at least one porosity-causing component is a polymer, wherein the average molecular weight of the polymer is preferably ≥5,000 Da to ≤50,000 Da, more preferably ≥10,000 Da to <20,000 Da.
Eine bevorzugte Ausführungsform der Erfindung ist dadurch gekennzeichnet, dass das Polymer ein organisches Polymer, bevorzugt ausgewählt aus der Gruppe enthaltend Polyethylengly- kol, Polypropylenglykol, Copolymere aus Polyethylenglykol und Polypropylenglykol, Polyvinylpyrrolidon, Polyether, alkyl-, cycloalkyl- und/oder arylsubstituierte Polyether, Polyester, alkyl-, cycloalkyl- und/oder arylsubstituierte Polyester, insbesondere Polyhydroxybuttersäure oder Mischungen daraus. allgemeine Gruppen/ Moleküldefinition: Innerhalb der Beschreibung und den Ansprüchen werden allgemeine Gruppen oder Moleküle, wie z.B. Alkyl, Alkoxy, Aryl etc. beansprucht und beschrieben. Wenn nicht anders beschrieben, werden bevorzugt die folgenden Gruppen innerhalb der allgemein beschriebenen Gruppen/Moleküle im Rahmen der vorliegenden Erfindung verwendet:A preferred embodiment of the invention is characterized in that the polymer is an organic polymer, preferably selected from the group comprising polyethylene glycol, polypropylene glycol, copolymers of polyethylene glycol and polypropylene glycol, polyvinylpyrrolidone, polyether, alkyl, cycloalkyl and / or aryl-substituted polyethers, polyesters alkyl-, cycloalkyl- and / or aryl-substituted polyesters, in particular polyhydroxybutyric acid or mixtures thereof. General Groups / Molecule Definition: Within the specification and claims, general groups or molecules such as alkyl, alkoxy, aryl, etc. are claimed and described. Unless otherwise described, the following groups within the generally described groups / molecules are preferably used in the context of the present invention:
Alkyl: lineare und verzweigte Cl-C8-Alkyle,Alkyl: linear and branched C 1 -C 8 -alkyls,
langkettige Alkyle: lineare und verzweigte C5-C20 Alkylelong-chain alkyls: linear and branched C5-C20 alkyls
Alkenyl: C2-C6-alkenyl,Alkenyl: C2-C6-alkenyl,
Cycloalkyl: C3-C8-cycloalkyl,Cycloalkyl: C3-C8-cycloalkyl,
Alkoxid/Alkoxy : Cl-C6-alkoxy, linear und verzweigtAlkoxide / alkoxy: C 1 -C 6 alkoxy, linear and branched
langkettig Alkoxid/Alkoxy: lineare und verzweigte C5-C20 Al- koxylong-chain alkoxide / alkoxy: linear and branched C5-C20 alkoxy
Aryl: ausgewählt aus Aromaten mit einem Molekulargewicht unter 300 Da.Aryl: selected from aromatics with a molecular weight below 300 Da.
Polyether: ausgewählt aus der Gruppe enthaltend H-(O-CH2- CH(R))n-OH and H- (0-CH2-CH (R) ) n-H wobei R unabhängig ausgewählt ist aus: Wasserstoff, Alkyl, Aryl, Halogen und n von 1 to 250Polyether selected from the group consisting of H- (O-CH 2 - CH (R)) n-OH and H- (0-CH 2 -CH (R)) n -H wherein R is independently selected from: hydrogen, alkyl , Aryl, halogen and n from 1 to 250
substitutierte Polyether: ausgewählt aus der Gruppe enthaltend R2 -(0-CH2-CH(R1 Mn-OR3 and R2 -(0-CH2-CH(R2 ) ) n-R3 wobei Ri, R2, R3 unabhängig ausgewählt ist aus: Wasserstoff, Alkyl, langkettige Alkyle, Aryl, Halogen und n von 1 to 250 beträgtsubstituted polyethers: selected from the group consisting of R 2 - (O-CH 2 -CH (R 1 M n -OR 3 and R 2 - (O-CH 2 -CH (R 2 )) n -R 3 where R i, R 2 , R 3 is independently selected from: hydrogen, alkyl, long chain alkyl, aryl, halogen and n is from 1 to 250
Ether: Die Verbindung Ri-O-R2, wobei jedes Ri und R2 unabhängig ausgewählt sind aus der Gruppe enthaltend Wasserstoff, Halogen, Alkyl, Cycloalkyl, Aryl, langkettiges Alkyl Soweit nicht anders erwähnt, sind die folgenden Gruppen/Moleküle mehr bevorzugte Gruppen/Moleküle innerhalb der allgemeinen Gruppen/Moleküldefinition :Ether: The compound Ri-OR 2 , wherein each Ri and R 2 are independently selected from the group consisting of hydrogen, halogen, alkyl, cycloalkyl, aryl, long chain alkyl Unless otherwise stated, the following groups / molecules are more preferred groups / molecules within the general group / molecule definition:
Alkyl: lineare und verzweigte Cl-C6-alkyl,Alkyl: linear and branched C 1 -C 6 -alkyl,
Alkenyl: C3-C6-alkenyl,Alkenyl: C3-C6 alkenyl,
Cycloalkyl: C6-C8-cycloalkyl,Cycloalkyl: C6-C8-cycloalkyl,
Alkoxy, Alkoxid: Cl-C4-alkoxy, insbesondere IsopropyloxidAlkoxy, alkoxide: C 1 -C 4 -alkoxy, especially isopropyl oxide
langkettig Alkoxy: lineare und verzweigte C5-C10 Alkoxy, vorzugsweise lineare C6-C8 Alkoxylong-chain alkoxy: linear and branched C5-C10 alkoxy, preferably linear C6-C8 alkoxy
Polyether: ausgewählt aus der Gruppe enthaltend H-(O-CH2- CH(R))n-OH and H- (0-CH2-CH (R) ) n-H wobei R unabhängig ausgewählt ist aus: Wasserstoff, alkyl, aryl, halogen und n von 10 bis 250 beträgt.Polyether selected from the group consisting of H- (O-CH 2 - CH (R)) n-OH and H- (0-CH 2 -CH (R)) n -H wherein R is independently selected from: hydrogen, alkyl , aryl, halogen and n is from 10 to 250.
substitutierte Polyether: ausgewählt aus der Gruppe enthaltend R2 -(0-CH2-CH(R1 )) n-OR3 and R2 -(0-CH2-CH(R2 ) ) n-R3 wobei Ri, R2, R3 unabhängig ausgewählt ist aus: Wasserstoff, Alkyl, langkettige Alkyle, Aryl, halogen und n von 10 bis 250.substituted polyethers: selected from the group consisting of R 2 - (O-CH 2 -CH (R 1 )) n -OR 3 and R 2 - (O-CH 2 -CH (R 2 )) n -R 3 where R i, R 2 , R 3 is independently selected from hydrogen, alkyl, long chain alkyl, aryl, halogen and n is from 10 to 250.
Eine bevorzugte Ausführungsform der Erfindung ist dadurch gekennzeichnet, dass das Polymer nach Beenden des Sol-Gel- Prozesses ausgewaschen wird.A preferred embodiment of the invention is characterized in that the polymer is washed out after completion of the sol-gel process.
Eine bevorzugte Ausführungsform der Erfindung ist dadurch gekennzeichnet, dass das Polymer nach Beenden des Sol-Gel- Prozesses mittels Temperung, insbesondere bei einer Temperatur von ≥80°C bis ≤100°C, bevorzugt mit Wasser ausgewaschen wird.A preferred embodiment of the invention is characterized in that the polymer is washed out by means of tempering, in particular at a temperature of ≥80 ° C to ≤100 ° C, preferably with water after completion of the sol-gel process.
Eine bevorzugte Ausführungsform der Erfindung ist dadurch gekennzeichnet, dass das Polymer nach Beenden des Sol-Gel- Prozesses ausgebrannt insbesondere bei einer Temperatur von ≥250°C ausgebrannt wird.A preferred embodiment of the invention is characterized in that the polymer is terminated after termination of the sol-gel reaction. Burned out process especially at a temperature of ≥250 ° C is burned out.
Eine bevorzugte Ausführungsform der Erfindung ist dadurch ge- kennzeichnet, dass das Silizium in Form einer Silizium- Alkoxid-Precursor-Lösung zugegeben wird.A preferred embodiment of the invention is characterized in that the silicon is added in the form of a silicon alkoxide precursor solution.
Eine bevorzugte Ausführungsform der Erfindung ist dadurch gekennzeichnet, dass der pH-Wert der Silizium enthaltenden Pre- cursor-Lösung von ≥l bis ≤4 beträgt.A preferred embodiment of the invention is characterized in that the pH of the silicon-containing precursor solution is from ≥ 1 to ≦ 4.
Die Erfindung bezieht sich außerdem auf eine transparente Be- schichtung für ein transparentes Substrat, hergestellt nach dem erfindungsgemäßen Verfahren.The invention also relates to a transparent coating for a transparent substrate produced by the process according to the invention.
Die Erfindung bezieht sich außerdem auf ein optisches Bauelement umfassend ein transparentes Substrat sowie eine auf dem Substrat aufgebrachte und/oder angeordnete Beschichtung gemäß der vorliegenden ErfindungThe invention also relates to an optical component comprising a transparent substrate and a coating applied and / or arranged on the substrate according to the present invention
Eine bevorzugte Ausführungsform der Erfindung ist dadurch gekennzeichnet, dass das Substrat ausgewählt ist aus der Gruppe enthaltend Glas, transparente Kunststoffe, bevorzugt ausgewählt aus der Gruppe enthaltend Polycarbonat, Polyacryl und Mischungen daraus, sowie Mischungen daraus.A preferred embodiment of the invention is characterized in that the substrate is selected from the group comprising glass, transparent plastics, preferably selected from the group consisting of polycarbonate, polyacrylic and mixtures thereof, as well as mixtures thereof.
Die vorliegende Erfindung bezieht sich außerdem auf ein Verfahren zur Herstellung eines erfindungsgemäßen optischen Bauelements, dadurch gekennzeichnet, dass die Beschichtung auf das Substrat durch Tauchen und/ oder Spin-coating aufgebracht wird.The present invention also relates to a method for producing an optical component according to the invention, characterized in that the coating is applied to the substrate by dipping and / or spin-coating.
Die vorliegende Erfindung bezieht sich außerdem auf die Verwendung einer erfindungsgemäßen Beschichtung und/oder eines erfindungsgemäßen optischen Bauelements fürThe present invention also relates to the use of a coating according to the invention and / or an optical component according to the invention for
optische Instrumente - Brillen Scheinwerfergehäuse in der Automobiltechnik Scheiben, besonders in der Automobiltechnik Cockpitverglasungenoptical instruments - glasses Headlamp housing in the automotive industry. Panels, especially in the automotive engineering cockpit glazings
Die vorgenannten sowie die beanspruchten und in den Anwendungsbeispielen beschriebenen erfindungsgemäß zu verwendenden Bauteile unterliegen in ihrer Größe, Formgestaltung, Materialauswahl und technischen Konzeption keinen besonderen Ausnahmebedingungen, so dass die in dem Anwendungsgebiet bekann- ten Auswahlkriterien uneingeschränkt Anwendung finden können.The above-mentioned and the claimed components to be used according to the invention described in the application examples are not subject to special exceptions in terms of their size, shape, material selection and technical design, so that the selection criteria known in the field of application can be used without restriction.
Weitere Einzelheiten, Merkmale und Vorteile des Gegenstandes der Erfindung ergeben sich aus den Unteransprüchen sowie aus der nachfolgenden Beschreibung der zugehörigen Zeichnungen, in denen - beispielhaft - ein Ausführungsbeispiel einer erfindungsgemäßen Beschichtung dargestellt ist. In den Zeichnungen zeigt:Further details, features and advantages of the subject matter of the invention will become apparent from the subclaims and from the following description of the accompanying drawings, in which - by way of example - an embodiment of a coating according to the invention is shown. In the drawings shows:
Fig. 1 ein Diagramm mit zwei Transmissionsmessungen einer gemäß einer ersten Ausführungsform der Erfindung beschichteten Polycarbonatsubstrats und eines unbeschichteten Polycarbonatsubstrates; sowie1 shows a diagram with two transmission measurements of a polycarbonate substrate coated according to a first embodiment of the invention and of an uncoated polycarbonate substrate; such as
Fig. 2 ein Foto eines zur Hälfte gemäß einer ersten Ausfüh- rungsform der Erfindung beschichteten Polycarbonatsubstrats .2 shows a photograph of a polycarbonate substrate coated in half according to a first embodiment of the invention.
Fig.l und 2 beziehen sich auf das im Folgenden beschriebene Beispiel I:FIGS. 1 and 2 refer to Example I described below:
BEISPIEL I:EXAMPLE I:
Ein optisches Bauelement auf Polycarbonatbasis wurde wie folgt hergestellt:A polycarbonate based optical device was prepared as follows:
Zunächst wurden zwei Lösungen bereitgestellt: Lösung 1: 4g Polyethylenglykol wurden in 50ml Ethanol bereitgestellt und solange unter Rühren langsam Wasser zugegeben, bis vollständige Lösung eintritt. Anschließend werden 4 Tropfen IN HCl zugesetzt.Initially, two solutions were provided: Solution 1: 4 g of polyethylene glycol were provided in 50 ml of ethanol and while stirring slowly added water until complete solution occurs. Then 4 drops of IN HCl are added.
Lösung 2: 4ml Tetraethoxysilan in 20 ml EtOHSolution 2: 4 ml tetraethoxysilane in 20 ml EtOH
Lösung 2 wurde dann mit Lösung 1 auf 50 ml aufgefüllt und 2h gerührt .Solution 2 was then made up to 50 ml with solution 1 and stirred for 2 h.
Das Polycarbonatsubstrat wurde durch Flammsilanisierung vorbehandelt, um die Bindung zwischen Substrat und Beschichtung zu erhöhen.The polycarbonate substrate was pretreated by flame silanization to increase the bond between substrate and coating.
Das Polycarbonatsubstrat wurde anschließend mit der Lösung tauchbeschichtet (Geschwindigkeit 50 mm/min) . Danach wurde an der Luft getrocknet und bei 1000C für 2h im Ofen getempert. Nach dem Abkühlen wurde 1 min in Wasser gelagert.The polycarbonate substrate was then dip-coated with the solution (rate 50 mm / min). It was then dried in air and annealed at 100 0 C for 2h in the oven. After cooling, it was stored in water for 1 min.
Die Porosität der Beschichtung betrug dabei 55 %.The porosity of the coating was 55%.
Fig. 1 ein Diagramm mit zwei Transmissionsmessungen des gemäß Beispiel I beschichteten Polycarbonatsubstrats und des unbeschichteten Polycarbonatsubstrates . Man sieht eine Verbesse- rung der Transmission um ca. 5%.1 shows a diagram with two transmission measurements of the polycarbonate substrate coated according to Example I and of the uncoated polycarbonate substrate. One sees an improvement of the transmission by approx. 5%.
Fig. 2 zeigt ein Foto eines zur Hälfte gemäß Beispiel I beschichteten Polycarbonatsubstrats. Man erkennt deutlich, dass die Reflexion deutlich vermindert wurde. FIG. 2 shows a photograph of a polycarbonate substrate half coated according to Example I. FIG. It can be seen clearly that the reflection was significantly reduced.
Claims
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE200610046308 DE102006046308A1 (en) | 2006-09-29 | 2006-09-29 | Transparent coating used for optical instruments, spectacles, headlamp housings, windscreens and cockpit glazing is based on silicon dioxide and has a specified porosity |
| PCT/EP2007/060187 WO2008040666A1 (en) | 2006-09-29 | 2007-09-26 | TRANSPARENT POROUS SiO2 COATING FOR A TRANSPARENT SUBSTRATE MATERIAL |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP2067061A1 true EP2067061A1 (en) | 2009-06-10 |
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ID=38670751
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP07820582A Ceased EP2067061A1 (en) | 2006-09-29 | 2007-09-26 | TRANSPARENT POROUS SiO2 COATING FOR A TRANSPARENT SUBSTRATE MATERIAL |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8664310B2 (en) |
| EP (1) | EP2067061A1 (en) |
| JP (1) | JP2010505016A (en) |
| CN (1) | CN101517437B (en) |
| DE (1) | DE102006046308A1 (en) |
| WO (1) | WO2008040666A1 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| DE102007043653A1 (en) * | 2007-09-13 | 2009-04-02 | Siemens Ag | Transparent porous SiO 2 coating for a transparent substrate material with improved optical properties |
| KR101704536B1 (en) * | 2010-10-08 | 2017-02-09 | 삼성전자주식회사 | Touch Panel type of Slim and Portable Device including the same |
| US20160168035A1 (en) | 2014-12-15 | 2016-06-16 | Cpfilms Inc. | Abrasion-resistant optical product with improved gas permeability |
| CN111913337A (en) | 2019-05-09 | 2020-11-10 | 中强光电股份有限公司 | Wavelength conversion element and manufacturing method thereof |
| DE102020135064B4 (en) | 2020-12-29 | 2022-12-22 | Ara-Coatings GmbH & Co. KG | Coating and method of coating a substrate |
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| US20050195486A1 (en) * | 2004-03-03 | 2005-09-08 | Hiroshi Sasaki | Anti-reflecting membrane, and display apparatus, optical storage medium and solar energy converting device having the same, and production method of the membrane |
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| US5009688A (en) * | 1988-09-28 | 1991-04-23 | Asahi Glass Company, Ltd. | Process for producing porous glass |
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| WO1997006896A1 (en) * | 1995-08-14 | 1997-02-27 | Central Glass Company Limited | Porous metal-oxide thin film and method of forming same on glass substrate |
| FR2756293B1 (en) * | 1996-11-26 | 1998-12-31 | Kodak Pathe | ORGANIC / INORGANIC COMPOSITE AND PHOTOGRAPHIC PRODUCT CONTAINING SUCH A COMPOSITE |
| WO1999029635A1 (en) * | 1997-12-09 | 1999-06-17 | Nippon Sheet Glass Co., Ltd. | Antireflection glass plate, process for producing the same, and antireflection coating composition |
| DE19918811A1 (en) | 1999-04-26 | 2000-11-02 | Fraunhofer Ges Forschung | Tempered safety glass with a smudge-proof, porous SiO¶2¶ anti-reflective layer u. Process z. d. Manufacturing |
| US6787191B2 (en) * | 2000-04-04 | 2004-09-07 | Asahi Kasei Kabushiki Kaisha | Coating composition for the production of insulating thin films |
| DE10051724A1 (en) | 2000-10-18 | 2002-05-02 | Flabeg Gmbh & Co Kg | Thermally tempered safety glass used for covers of solar collectors, for photovoltaic cells, for vehicle windscreens and/or for glazing has a porous silicon dioxide layer having a specified refractive index |
| CN1288214C (en) * | 2001-12-14 | 2006-12-06 | 旭化成株式会社 | Coating composition for forming low-refractive index thin layers |
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| CN1167959C (en) * | 2002-07-19 | 2004-09-22 | 中国科学院山西煤炭化学研究所 | Preparation method of anti-laser damage broadband anti-reflection film |
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- 2007-09-26 WO PCT/EP2007/060187 patent/WO2008040666A1/en active Application Filing
- 2007-09-26 CN CN2007800357892A patent/CN101517437B/en not_active Expired - Fee Related
- 2007-09-26 EP EP07820582A patent/EP2067061A1/en not_active Ceased
- 2007-09-26 JP JP2009529692A patent/JP2010505016A/en active Pending
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| US20050195486A1 (en) * | 2004-03-03 | 2005-09-08 | Hiroshi Sasaki | Anti-reflecting membrane, and display apparatus, optical storage medium and solar energy converting device having the same, and production method of the membrane |
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| US20100009195A1 (en) | 2010-01-14 |
| US8664310B2 (en) | 2014-03-04 |
| JP2010505016A (en) | 2010-02-18 |
| DE102006046308A1 (en) | 2008-04-03 |
| CN101517437A (en) | 2009-08-26 |
| CN101517437B (en) | 2012-07-04 |
| WO2008040666A1 (en) | 2008-04-10 |
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