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DE69625093D1 - Belichtungsverfahren, Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung - Google Patents

Belichtungsverfahren, Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung

Info

Publication number
DE69625093D1
DE69625093D1 DE69625093T DE69625093T DE69625093D1 DE 69625093 D1 DE69625093 D1 DE 69625093D1 DE 69625093 T DE69625093 T DE 69625093T DE 69625093 T DE69625093 T DE 69625093T DE 69625093 D1 DE69625093 D1 DE 69625093D1
Authority
DE
Germany
Prior art keywords
exposure
manufacturing
exposure apparatus
exposure method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69625093T
Other languages
English (en)
Other versions
DE69625093T2 (de
Inventor
Kazuhiro Takahashi
Takahisa Shiozawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP25283695A external-priority patent/JP3167101B2/ja
Priority claimed from JP26702895A external-priority patent/JP3245026B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69625093D1 publication Critical patent/DE69625093D1/de
Publication of DE69625093T2 publication Critical patent/DE69625093T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69625093T 1995-09-29 1996-09-27 Belichtungsverfahren, Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung Expired - Fee Related DE69625093T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP25283695A JP3167101B2 (ja) 1995-09-29 1995-09-29 露光装置及びそれを用いたデバイスの製造方法
JP26702895A JP3245026B2 (ja) 1995-10-16 1995-10-16 露光方法及び露光装置及びそれを用いたデバイスの製造方法

Publications (2)

Publication Number Publication Date
DE69625093D1 true DE69625093D1 (de) 2003-01-09
DE69625093T2 DE69625093T2 (de) 2003-07-31

Family

ID=26540905

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69625093T Expired - Fee Related DE69625093T2 (de) 1995-09-29 1996-09-27 Belichtungsverfahren, Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung
DE69621547T Expired - Lifetime DE69621547T2 (de) 1995-09-29 1996-09-27 Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE69621547T Expired - Lifetime DE69621547T2 (de) 1995-09-29 1996-09-27 Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung

Country Status (4)

Country Link
US (1) US5892573A (de)
EP (2) EP0766144B1 (de)
KR (1) KR100210569B1 (de)
DE (2) DE69625093T2 (de)

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JP2001110710A (ja) 1999-10-08 2001-04-20 Nikon Corp 露光装置、露光方法、および半導体デバイスの製造方法
JP2001267239A (ja) * 2000-01-14 2001-09-28 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
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US20020041377A1 (en) * 2000-04-25 2002-04-11 Nikon Corporation Aerial image measurement method and unit, optical properties measurement method and unit, adjustment method of projection optical system, exposure method and apparatus, making method of exposure apparatus, and device manufacturing method
JP2002134393A (ja) * 2000-10-24 2002-05-10 Mitsubishi Electric Corp 露光装置、露光方法およびその露光方法を用いて製造した半導体装置
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WO2002063664A1 (fr) * 2001-02-06 2002-08-15 Nikon Corporation Systeme et procede d'exposition et procede de production de dispositif
US7283208B2 (en) * 2001-02-14 2007-10-16 Asml Netherlands B.V. Lithographic apparatus, method of manufacturing a device, and device manufactured thereby
EP1233304A1 (de) * 2001-02-14 2002-08-21 Asm Lithography B.V. Lithographischer Apparat
US7236154B1 (en) 2002-12-24 2007-06-26 Apple Inc. Computer light adjustment
JP4652667B2 (ja) * 2003-02-13 2011-03-16 キヤノン株式会社 面位置計測方法及び走査型露光装置
EP1455337A1 (de) * 2003-03-05 2004-09-08 Matsushita Electric Industrial Co., Ltd. Vorrichtung und Verfahren zur automatischen Helligkeitseinstellung von der Rückbeleuchtung einer Flüssigkristallanzeige
US7894177B2 (en) * 2005-12-29 2011-02-22 Apple Inc. Light activated hold switch
US7521623B2 (en) * 2004-11-24 2009-04-21 Apple Inc. Music synchronization arrangement
US7616097B1 (en) 2004-07-12 2009-11-10 Apple Inc. Handheld devices as visual indicators
JP2005109304A (ja) * 2003-10-01 2005-04-21 Canon Inc 照明光学系及び露光装置
JP4262566B2 (ja) * 2003-10-16 2009-05-13 株式会社日立製作所 車載用撮像装置及びカメラ
US7061586B2 (en) * 2004-03-02 2006-06-13 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7443486B2 (en) * 2005-02-25 2008-10-28 Asml Netherlands B.V. Method for predicting a critical dimension of a feature imaged by a lithographic apparatus
JP2006303196A (ja) * 2005-04-20 2006-11-02 Canon Inc 測定装置及びそれを有する露光装置
DE102006060368B3 (de) 2006-12-16 2008-07-31 Xtreme Technologies Gmbh Verfahren und Anordnung zur Stabilisierung der mittleren abgegebenen Strahlungsleistung einer gepulst betriebenen Strahlungsquelle
JP2008159695A (ja) 2006-12-21 2008-07-10 Canon Inc 露光装置
JP2009164355A (ja) * 2008-01-07 2009-07-23 Canon Inc 走査露光装置およびデバイス製造方法
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DE102013218991A1 (de) 2013-09-20 2015-03-26 Carl Zeiss Smt Gmbh Vorrichtung zum Bestimmen einer optischen Eigenschaft eines optischen Abbildungssystems
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Also Published As

Publication number Publication date
DE69621547T2 (de) 2003-01-16
DE69625093T2 (de) 2003-07-31
EP0957401A1 (de) 1999-11-17
US5892573A (en) 1999-04-06
EP0957401B1 (de) 2002-11-27
KR970016828A (ko) 1997-04-28
EP0766144B1 (de) 2002-06-05
KR100210569B1 (ko) 1999-07-15
EP0766144A1 (de) 1997-04-02
DE69621547D1 (de) 2002-07-11

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