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DE69838154D1 - Belichtungseinheit, Belichtungssystem und Verfahren zur Herstellung einer Vorrichtung - Google Patents

Belichtungseinheit, Belichtungssystem und Verfahren zur Herstellung einer Vorrichtung

Info

Publication number
DE69838154D1
DE69838154D1 DE69838154T DE69838154T DE69838154D1 DE 69838154 D1 DE69838154 D1 DE 69838154D1 DE 69838154 T DE69838154 T DE 69838154T DE 69838154 T DE69838154 T DE 69838154T DE 69838154 D1 DE69838154 D1 DE 69838154D1
Authority
DE
Germany
Prior art keywords
exposure
making
exposure unit
unit
exposure system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69838154T
Other languages
English (en)
Other versions
DE69838154T2 (de
Inventor
Takashi Nakamura
Yasuyoshi Yamada
Satoshi Kyotoku
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP6398497A external-priority patent/JP3472066B2/ja
Priority claimed from JP9320625A external-priority patent/JPH11145050A/ja
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE69838154D1 publication Critical patent/DE69838154D1/de
Application granted granted Critical
Publication of DE69838154T2 publication Critical patent/DE69838154T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69838154T 1997-03-04 1998-02-25 Belichtungseinheit, Belichtungssystem und Verfahren zur Herstellung einer Vorrichtung Expired - Lifetime DE69838154T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP6398497 1997-03-04
JP6398497A JP3472066B2 (ja) 1997-03-04 1997-03-04 露光装置、半導体生産システム及び半導体製造方法
JP32062597 1997-11-07
JP9320625A JPH11145050A (ja) 1997-11-07 1997-11-07 半導体露光装置システム、半導体露光装置およびデバイス製造方法

Publications (2)

Publication Number Publication Date
DE69838154D1 true DE69838154D1 (de) 2007-09-13
DE69838154T2 DE69838154T2 (de) 2008-04-17

Family

ID=26405115

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69838154T Expired - Lifetime DE69838154T2 (de) 1997-03-04 1998-02-25 Belichtungseinheit, Belichtungssystem und Verfahren zur Herstellung einer Vorrichtung

Country Status (5)

Country Link
US (1) US6185474B1 (de)
EP (1) EP0863439B1 (de)
KR (1) KR19980079878A (de)
DE (1) DE69838154T2 (de)
TW (1) TW376542B (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100315912B1 (ko) * 1998-04-27 2002-02-19 윤종용 파일서버를이용한자동화시스템과그제어방법
US6094605A (en) * 1998-07-06 2000-07-25 Storage Technology Corporation Virtual automated cartridge system
JP4365934B2 (ja) * 1999-05-10 2009-11-18 キヤノン株式会社 露光装置、半導体製造装置およびデバイス製造方法
KR100510065B1 (ko) * 1999-06-22 2005-08-26 주식회사 하이닉스반도체 반도체 제조를 위한 오버레이 장비 자동화 방법
JP2002075820A (ja) * 2000-08-24 2002-03-15 Hitachi Ltd 半導体製造装置の使用許諾システムおよび使用許諾方法
JP2002252161A (ja) * 2001-02-23 2002-09-06 Hitachi Ltd 半導体製造システム
US20040111339A1 (en) * 2001-04-03 2004-06-10 Asyst Technologies, Inc. Distributed control system architecture and method for a material transport system
JP2003031639A (ja) * 2001-07-17 2003-01-31 Canon Inc 基板処理装置、基板の搬送方法及び露光装置
JP2003045947A (ja) 2001-07-27 2003-02-14 Canon Inc 基板処理装置及び露光装置
CN1996553A (zh) * 2001-08-31 2007-07-11 阿赛斯特技术公司 用于半导体材料处理系统的一体化机架
US6978284B2 (en) * 2002-03-21 2005-12-20 International Business Machines Corporation System and method for designating and deleting expired files
JP4126189B2 (ja) * 2002-04-10 2008-07-30 株式会社日立ハイテクノロジーズ 検査条件設定プログラム、検査装置および検査システム
KR100478730B1 (ko) * 2002-07-30 2005-03-24 주식회사 제일 기판 주변 노광 장치
US6735493B1 (en) 2002-10-21 2004-05-11 Taiwan Semiconductor Manufacturing Co., Ltd. Recipe management system
JP5035423B2 (ja) * 2008-09-30 2012-09-26 株式会社Ｓｕｍｃｏ 半導体製造工場
US11449394B2 (en) 2010-06-04 2022-09-20 Commvault Systems, Inc. Failover systems and methods for performing backup operations, including heterogeneous indexing and load balancing of backup and indexing resources
US8504526B2 (en) 2010-06-04 2013-08-06 Commvault Systems, Inc. Failover systems and methods for performing backup operations
CN103186052B (zh) * 2011-12-28 2015-04-22 无锡华润上华科技有限公司 一种光刻参数优化方法
US9811427B2 (en) 2014-04-02 2017-11-07 Commvault Systems, Inc. Information management by a media agent in the absence of communications with a storage manager
JP6671387B2 (ja) * 2015-10-19 2020-03-25 ギガフォトン株式会社 レーザ装置管理システム
US10747630B2 (en) 2016-09-30 2020-08-18 Commvault Systems, Inc. Heartbeat monitoring of virtual machines for initiating failover operations in a data storage management system, including operations by a master monitor node
US11200124B2 (en) 2018-12-06 2021-12-14 Commvault Systems, Inc. Assigning backup resources based on failover of partnered data storage servers in a data storage management system
US11099956B1 (en) 2020-03-26 2021-08-24 Commvault Systems, Inc. Snapshot-based disaster recovery orchestration of virtual machine failover and failback operations
US11645175B2 (en) 2021-02-12 2023-05-09 Commvault Systems, Inc. Automatic failover of a storage manager

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0616475B2 (ja) * 1987-04-03 1994-03-02 三菱電機株式会社 物品の製造システム及び物品の製造方法
US4974166A (en) * 1987-05-18 1990-11-27 Asyst Technologies, Inc. Processing systems with intelligent article tracking
EP0346801B1 (de) * 1988-06-17 1996-12-27 Siemens Aktiengesellschaft Verfahren und Anordnung zur Ausführung eines Programms in einem heterogenen Mehrrechnersystem
US5091849A (en) * 1988-10-24 1992-02-25 The Walt Disney Company Computer image production system utilizing first and second networks for separately transferring control information and digital image data
JPH04286311A (ja) 1991-03-15 1992-10-12 Canon Inc 半導体露光装置
JP3336436B2 (ja) * 1991-04-02 2002-10-21 株式会社ニコン リソグラフィシステム、情報収集装置、露光装置、及び半導体デバイス製造方法
JP2877998B2 (ja) 1991-09-03 1999-04-05 キヤノン株式会社 半導体製造装置
JP3309478B2 (ja) * 1993-02-26 2002-07-29 ソニー株式会社 チップ管理システムおよびその入力処理方法とロット処理方法およびチップ管理システムによるチップ製造方法
JPH07141005A (ja) * 1993-06-21 1995-06-02 Hitachi Ltd 半導体集積回路装置の製造方法および製造装置
US5432702A (en) * 1994-06-17 1995-07-11 Advanced Micro Devices Inc. Bar code recipe selection system using workstation controllers
JP3892493B2 (ja) * 1995-11-29 2007-03-14 大日本スクリーン製造株式会社 基板処理システム

Also Published As

Publication number Publication date
EP0863439B1 (de) 2007-08-01
KR19980079878A (ko) 1998-11-25
EP0863439A3 (de) 2000-01-19
EP0863439A2 (de) 1998-09-09
US6185474B1 (en) 2001-02-06
TW376542B (en) 1999-12-11
DE69838154T2 (de) 2008-04-17

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Legal Events

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8364 No opposition during term of opposition