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DE3689824D1 - Kathoden- und Erdschirmvorrichtung in einem Target für ein Beschichtungsgerät durch Zerstäubung. - Google Patents

Kathoden- und Erdschirmvorrichtung in einem Target für ein Beschichtungsgerät durch Zerstäubung.

Info

Publication number
DE3689824D1
DE3689824D1 DE3689824T DE3689824T DE3689824D1 DE 3689824 D1 DE3689824 D1 DE 3689824D1 DE 3689824 T DE3689824 T DE 3689824T DE 3689824 T DE3689824 T DE 3689824T DE 3689824 D1 DE3689824 D1 DE 3689824D1
Authority
DE
Germany
Prior art keywords
sputtering
cathode
target
ground shield
coating device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE3689824T
Other languages
English (en)
Inventor
Albert Daniel Glasser
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CBS Corp
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Application granted granted Critical
Publication of DE3689824D1 publication Critical patent/DE3689824D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3441—Dark space shields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DE3689824T 1985-07-05 1986-07-03 Kathoden- und Erdschirmvorrichtung in einem Target für ein Beschichtungsgerät durch Zerstäubung. Expired - Lifetime DE3689824D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US75191485A 1985-07-05 1985-07-05

Publications (1)

Publication Number Publication Date
DE3689824D1 true DE3689824D1 (de) 1994-06-09

Family

ID=25024060

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3689824T Expired - Lifetime DE3689824D1 (de) 1985-07-05 1986-07-03 Kathoden- und Erdschirmvorrichtung in einem Target für ein Beschichtungsgerät durch Zerstäubung.

Country Status (5)

Country Link
EP (1) EP0207801B1 (de)
JP (1) JPH0772343B2 (de)
CN (1) CN86104429A (de)
DE (1) DE3689824D1 (de)
ES (1) ES2002466A6 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4974680A (en) * 1988-11-14 1990-12-04 Tokyo Electric Co., Ltd. Sheet-feeding mechanism
US5084492A (en) * 1989-09-28 1992-01-28 Standard Register Company High solids cf printing ink
US5102856A (en) * 1990-11-07 1992-04-07 The Standard Register Company High solids self-contained printing ink
DE4305748A1 (de) * 1993-02-25 1994-09-01 Leybold Ag Vorrichtung zum Beschichten und/oder Ätzen von Substraten in einer Vakuumkammer
KR100765939B1 (ko) 2006-05-26 2007-10-11 주식회사 에이브이엠에스 스퍼터링 장치
JP6359901B2 (ja) * 2014-07-16 2018-07-18 三菱マテリアル株式会社 スパッタリングターゲット

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5513411U (de) * 1978-07-12 1980-01-28
US4362611A (en) * 1981-07-27 1982-12-07 International Business Machines Corporation Quadrupole R.F. sputtering system having an anode/cathode shield and a floating target shield
JPS5850313A (ja) * 1981-09-21 1983-03-24 Toshiba Corp 予圧調整装置
US4391697A (en) * 1982-08-16 1983-07-05 Vac-Tec Systems, Inc. High rate magnetron sputtering of high permeability materials
US4462333A (en) * 1982-10-27 1984-07-31 Energy Conversion Devices, Inc. Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus
JPS6010107A (ja) * 1983-06-29 1985-01-19 Koyo Seiko Co Ltd 物体選別装置

Also Published As

Publication number Publication date
JPS6210271A (ja) 1987-01-19
JPH0772343B2 (ja) 1995-08-02
EP0207801A2 (de) 1987-01-07
EP0207801B1 (de) 1994-05-04
CN86104429A (zh) 1987-01-07
ES2002466A6 (es) 1988-08-16
EP0207801A3 (en) 1989-02-01

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Legal Events

Date Code Title Description
8332 No legal effect for de