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DE2420372A1 - Lichtempfindliches material und verfahren zu dessen herstellung - Google Patents

Lichtempfindliches material und verfahren zu dessen herstellung

Info

Publication number
DE2420372A1
DE2420372A1 DE2420372A DE2420372A DE2420372A1 DE 2420372 A1 DE2420372 A1 DE 2420372A1 DE 2420372 A DE2420372 A DE 2420372A DE 2420372 A DE2420372 A DE 2420372A DE 2420372 A1 DE2420372 A1 DE 2420372A1
Authority
DE
Germany
Prior art keywords
group
polymer
acid
groups
photosensitive material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE2420372A
Other languages
German (de)
English (en)
Inventor
Allen Peter Gates
Allan Saunderson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vickers Ltd
Original Assignee
Vickers Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vickers Ltd filed Critical Vickers Ltd
Publication of DE2420372A1 publication Critical patent/DE2420372A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • C08G59/4223—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof aromatic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1483—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
DE2420372A 1973-04-26 1974-04-26 Lichtempfindliches material und verfahren zu dessen herstellung Withdrawn DE2420372A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1999473A GB1466252A (en) 1973-04-26 1973-04-26 Light-sensitive material

Publications (1)

Publication Number Publication Date
DE2420372A1 true DE2420372A1 (de) 1974-11-07

Family

ID=10138567

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2420372A Withdrawn DE2420372A1 (de) 1973-04-26 1974-04-26 Lichtempfindliches material und verfahren zu dessen herstellung

Country Status (16)

Country Link
JP (1) JPS5842460B2 (fr)
AT (1) AT344998B (fr)
BE (1) BE814282A (fr)
CA (1) CA1023491A (fr)
CH (2) CH607100A5 (fr)
DE (1) DE2420372A1 (fr)
FI (1) FI62911C (fr)
FR (1) FR2227556B1 (fr)
GB (1) GB1466252A (fr)
IE (1) IE39231B1 (fr)
IT (1) IT1010118B (fr)
LU (1) LU69940A1 (fr)
NL (1) NL175631C (fr)
NO (1) NO148794C (fr)
SE (1) SE418191B (fr)
ZA (1) ZA742559B (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6841335B2 (en) 2002-07-29 2005-01-11 Kodak Polychrome Graphics Llc Imaging members with ionic multifunctional epoxy compounds

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2053186A1 (de) * 1969-10-30 1971-11-04 Fuji Photo Film Co. Ltd., Ashigara-Kamigun, Kanagawa (Japan) Verbindungen von hohem Molekular gewicht sowie Verfahren zu deren Herstellung
DE2124047A1 (de) * 1970-05-15 1971-11-25 Fuji Chemicals Industrial Co., Ltd., Tokio Photosensitive Polymere, Verfahren zur Herstellung derselben und diese Polymeren enthaltende Zusammensetzungen
BE790383A (fr) * 1971-10-22 1973-02-15 Howson Algraphy Ltd Matière sensibles à la lumière

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2053186A1 (de) * 1969-10-30 1971-11-04 Fuji Photo Film Co. Ltd., Ashigara-Kamigun, Kanagawa (Japan) Verbindungen von hohem Molekular gewicht sowie Verfahren zu deren Herstellung
DE2124047A1 (de) * 1970-05-15 1971-11-25 Fuji Chemicals Industrial Co., Ltd., Tokio Photosensitive Polymere, Verfahren zur Herstellung derselben und diese Polymeren enthaltende Zusammensetzungen
BE790383A (fr) * 1971-10-22 1973-02-15 Howson Algraphy Ltd Matière sensibles à la lumière

Also Published As

Publication number Publication date
NL175631B (nl) 1984-07-02
NO148794C (no) 1983-12-14
FR2227556B1 (fr) 1980-08-29
FI62911B (fi) 1982-11-30
LU69940A1 (fr) 1974-08-06
BE814282A (fr) 1974-08-16
CA1023491A (fr) 1977-12-27
FR2227556A1 (fr) 1974-11-22
IT1010118B (it) 1977-01-10
SE418191B (sv) 1981-05-11
JPS5842460B2 (ja) 1983-09-20
CH607100A5 (fr) 1978-11-30
NL7405575A (fr) 1974-10-29
AT344998B (de) 1978-08-25
NL175631C (nl) 1984-12-03
ZA742559B (en) 1975-04-30
JPS5031819A (fr) 1975-03-28
IE39231L (en) 1974-10-26
NO741505L (no) 1974-10-29
ATA349474A (de) 1977-12-15
FI62911C (fi) 1983-03-10
GB1466252A (en) 1977-03-02
IE39231B1 (en) 1978-08-30
AU6823074A (en) 1975-10-30
CH598621A5 (fr) 1978-05-12
NO148794B (no) 1983-09-05

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Legal Events

Date Code Title Description
8126 Change of the secondary classification
8139 Disposal/non-payment of the annual fee