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AU6823074A - Improvements in or relating to light-sensitive materials - Google Patents

Improvements in or relating to light-sensitive materials

Info

Publication number
AU6823074A
AU6823074A AU68230/74A AU6823074A AU6823074A AU 6823074 A AU6823074 A AU 6823074A AU 68230/74 A AU68230/74 A AU 68230/74A AU 6823074 A AU6823074 A AU 6823074A AU 6823074 A AU6823074 A AU 6823074A
Authority
AU
Australia
Prior art keywords
relating
light
sensitive materials
sensitive
materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU68230/74A
Other versions
AU491658B2 (en
Inventor
Peter Gates Allan Saunderson Allen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vickers Ltd
Original Assignee
Vickers Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vickers Ltd filed Critical Vickers Ltd
Application granted granted Critical
Publication of AU491658B2 publication Critical patent/AU491658B2/en
Publication of AU6823074A publication Critical patent/AU6823074A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • C08G59/4223Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof aromatic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14Polycondensates modified by chemical after-treatment
    • C08G59/1433Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1483Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing sulfur
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00General processes for preparing compounds provided for in this subclass
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
AU68230/74A 1973-04-26 1974-04-24 Improvements in or relating to light-sensitive materials Expired AU491658B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB19994/73 1973-04-26
GB1999473A GB1466252A (en) 1973-04-26 1973-04-26 Light-sensitive material

Publications (2)

Publication Number Publication Date
AU491658B2 AU491658B2 (en) 1975-10-30
AU6823074A true AU6823074A (en) 1975-10-30

Family

ID=

Also Published As

Publication number Publication date
NL175631B (en) 1984-07-02
NO148794C (en) 1983-12-14
FR2227556B1 (en) 1980-08-29
FI62911B (en) 1982-11-30
LU69940A1 (en) 1974-08-06
BE814282A (en) 1974-08-16
CA1023491A (en) 1977-12-27
FR2227556A1 (en) 1974-11-22
IT1010118B (en) 1977-01-10
SE418191B (en) 1981-05-11
JPS5842460B2 (en) 1983-09-20
CH607100A5 (en) 1978-11-30
NL7405575A (en) 1974-10-29
DE2420372A1 (en) 1974-11-07
AT344998B (en) 1978-08-25
NL175631C (en) 1984-12-03
ZA742559B (en) 1975-04-30
JPS5031819A (en) 1975-03-28
IE39231L (en) 1974-10-26
NO741505L (en) 1974-10-29
ATA349474A (en) 1977-12-15
FI62911C (en) 1983-03-10
GB1466252A (en) 1977-03-02
IE39231B1 (en) 1978-08-30
CH598621A5 (en) 1978-05-12
NO148794B (en) 1983-09-05

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