DE1905732A1 - Vorrichtung zum Herstellen von Halbleitern - Google Patents
Vorrichtung zum Herstellen von HalbleiternInfo
- Publication number
- DE1905732A1 DE1905732A1 DE19691905732 DE1905732A DE1905732A1 DE 1905732 A1 DE1905732 A1 DE 1905732A1 DE 19691905732 DE19691905732 DE 19691905732 DE 1905732 A DE1905732 A DE 1905732A DE 1905732 A1 DE1905732 A1 DE 1905732A1
- Authority
- DE
- Germany
- Prior art keywords
- acid
- temperature
- shell
- etching
- bowl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims description 9
- 238000004519 manufacturing process Methods 0.000 title description 3
- 239000002253 acid Substances 0.000 claims description 21
- 238000005530 etching Methods 0.000 claims description 11
- 239000003518 caustics Substances 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 4
- 239000000523 sample Substances 0.000 claims description 4
- 230000002378 acidificating effect Effects 0.000 claims description 2
- 239000002826 coolant Substances 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D23/00—Control of temperature
- G05D23/19—Control of temperature characterised by the use of electric means
- G05D23/1919—Control of temperature characterised by the use of electric means characterised by the type of controller
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Automation & Control Theory (AREA)
- Weting (AREA)
- ing And Chemical Polishing (AREA)
- Dicing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB646268 | 1968-02-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE1905732A1 true DE1905732A1 (de) | 1969-11-20 |
Family
ID=9814926
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19691905732 Pending DE1905732A1 (de) | 1968-02-09 | 1969-02-06 | Vorrichtung zum Herstellen von Halbleitern |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3632462A (xx) |
| DE (1) | DE1905732A1 (xx) |
| GB (1) | GB1239573A (xx) |
| NL (1) | NL6901837A (xx) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4950872A (xx) * | 1972-09-18 | 1974-05-17 | ||
| US3964957A (en) * | 1973-12-19 | 1976-06-22 | Monsanto Company | Apparatus for processing semiconductor wafers |
| US4142893A (en) * | 1977-09-14 | 1979-03-06 | Raytheon Company | Spray etch dicing method |
| US4740249A (en) * | 1984-05-21 | 1988-04-26 | Christopher F. McConnell | Method of treating wafers with fluid |
| US4984597B1 (en) * | 1984-05-21 | 1999-10-26 | Cfmt Inc | Apparatus for rinsing and drying surfaces |
| US4911761A (en) * | 1984-05-21 | 1990-03-27 | Cfm Technologies Research Associates | Process and apparatus for drying surfaces |
| US4856544A (en) * | 1984-05-21 | 1989-08-15 | Cfm Technologies, Inc. | Vessel and system for treating wafers with fluids |
| US4633893A (en) * | 1984-05-21 | 1987-01-06 | Cfm Technologies Limited Partnership | Apparatus for treating semiconductor wafers |
| US4778532A (en) * | 1985-06-24 | 1988-10-18 | Cfm Technologies Limited Partnership | Process and apparatus for treating wafers with process fluids |
| US4738272A (en) * | 1984-05-21 | 1988-04-19 | Mcconnell Christopher F | Vessel and system for treating wafers with fluids |
| US5090432A (en) * | 1990-10-16 | 1992-02-25 | Verteq, Inc. | Single wafer megasonic semiconductor wafer processing system |
| DE69233293T2 (de) | 1991-10-04 | 2004-11-18 | CFMT, Inc., Wilmington | Superreinigung von komplizierten Mikroteilchen |
| US6039059A (en) * | 1996-09-30 | 2000-03-21 | Verteq, Inc. | Wafer cleaning system |
| US6328809B1 (en) | 1998-10-09 | 2001-12-11 | Scp Global Technologies, Inc. | Vapor drying system and method |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3095463A (en) * | 1958-03-12 | 1963-06-25 | Crucible Steel Co America | Temperature control apparatus |
-
1968
- 1968-02-09 GB GB646268A patent/GB1239573A/en not_active Expired
-
1969
- 1969-02-05 NL NL6901837A patent/NL6901837A/xx unknown
- 1969-02-06 DE DE19691905732 patent/DE1905732A1/de active Pending
- 1969-02-07 US US797610A patent/US3632462A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| NL6901837A (xx) | 1969-08-12 |
| GB1239573A (xx) | 1971-07-21 |
| US3632462A (en) | 1972-01-04 |
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