NL6901837A - - Google Patents
Info
- Publication number
- NL6901837A NL6901837A NL6901837A NL6901837A NL6901837A NL 6901837 A NL6901837 A NL 6901837A NL 6901837 A NL6901837 A NL 6901837A NL 6901837 A NL6901837 A NL 6901837A NL 6901837 A NL6901837 A NL 6901837A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D23/00—Control of temperature
- G05D23/19—Control of temperature characterised by the use of electric means
- G05D23/1919—Control of temperature characterised by the use of electric means characterised by the type of controller
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Weting (AREA)
- Dicing (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB646268 | 1968-02-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL6901837A true NL6901837A (xx) | 1969-08-12 |
Family
ID=9814926
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL6901837A NL6901837A (xx) | 1968-02-09 | 1969-02-05 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3632462A (xx) |
| DE (1) | DE1905732A1 (xx) |
| GB (1) | GB1239573A (xx) |
| NL (1) | NL6901837A (xx) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4950872A (xx) * | 1972-09-18 | 1974-05-17 | ||
| US3964957A (en) * | 1973-12-19 | 1976-06-22 | Monsanto Company | Apparatus for processing semiconductor wafers |
| US4142893A (en) * | 1977-09-14 | 1979-03-06 | Raytheon Company | Spray etch dicing method |
| US4778532A (en) * | 1985-06-24 | 1988-10-18 | Cfm Technologies Limited Partnership | Process and apparatus for treating wafers with process fluids |
| US4633893A (en) * | 1984-05-21 | 1987-01-06 | Cfm Technologies Limited Partnership | Apparatus for treating semiconductor wafers |
| US4984597B1 (en) * | 1984-05-21 | 1999-10-26 | Cfmt Inc | Apparatus for rinsing and drying surfaces |
| US4856544A (en) * | 1984-05-21 | 1989-08-15 | Cfm Technologies, Inc. | Vessel and system for treating wafers with fluids |
| US4911761A (en) * | 1984-05-21 | 1990-03-27 | Cfm Technologies Research Associates | Process and apparatus for drying surfaces |
| US4738272A (en) * | 1984-05-21 | 1988-04-19 | Mcconnell Christopher F | Vessel and system for treating wafers with fluids |
| US4740249A (en) * | 1984-05-21 | 1988-04-26 | Christopher F. McConnell | Method of treating wafers with fluid |
| US5090432A (en) * | 1990-10-16 | 1992-02-25 | Verteq, Inc. | Single wafer megasonic semiconductor wafer processing system |
| DE69233293T2 (de) * | 1991-10-04 | 2004-11-18 | CFMT, Inc., Wilmington | Superreinigung von komplizierten Mikroteilchen |
| US6039059A (en) | 1996-09-30 | 2000-03-21 | Verteq, Inc. | Wafer cleaning system |
| US6328809B1 (en) | 1998-10-09 | 2001-12-11 | Scp Global Technologies, Inc. | Vapor drying system and method |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3095463A (en) * | 1958-03-12 | 1963-06-25 | Crucible Steel Co America | Temperature control apparatus |
-
1968
- 1968-02-09 GB GB646268A patent/GB1239573A/en not_active Expired
-
1969
- 1969-02-05 NL NL6901837A patent/NL6901837A/xx unknown
- 1969-02-06 DE DE19691905732 patent/DE1905732A1/de active Pending
- 1969-02-07 US US797610A patent/US3632462A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| DE1905732A1 (de) | 1969-11-20 |
| US3632462A (en) | 1972-01-04 |
| GB1239573A (xx) | 1971-07-21 |