DD253648A1 - Verfahren zur herstellung einer kathode mit niedriger wasserstoffueberspannung - Google Patents
Verfahren zur herstellung einer kathode mit niedriger wasserstoffueberspannung Download PDFInfo
- Publication number
- DD253648A1 DD253648A1 DD84263577A DD26357784A DD253648A1 DD 253648 A1 DD253648 A1 DD 253648A1 DD 84263577 A DD84263577 A DD 84263577A DD 26357784 A DD26357784 A DD 26357784A DD 253648 A1 DD253648 A1 DD 253648A1
- Authority
- DD
- German Democratic Republic
- Prior art keywords
- metal oxide
- metal
- substrate
- coating
- cathode
- Prior art date
Links
- 229910052739 hydrogen Inorganic materials 0.000 title claims abstract description 15
- 239000001257 hydrogen Substances 0.000 title claims abstract description 14
- -1 LOW HYDROGEN Chemical class 0.000 title claims description 17
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 238000000576 coating method Methods 0.000 claims abstract description 78
- 229910052751 metal Inorganic materials 0.000 claims abstract description 76
- 239000002184 metal Substances 0.000 claims abstract description 76
- 239000000758 substrate Substances 0.000 claims abstract description 61
- 239000011248 coating agent Substances 0.000 claims abstract description 52
- 238000000034 method Methods 0.000 claims abstract description 26
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000012702 metal oxide precursor Substances 0.000 claims abstract description 13
- 150000001875 compounds Chemical class 0.000 claims abstract description 11
- 238000005868 electrolysis reaction Methods 0.000 claims abstract description 11
- 238000005530 etching Methods 0.000 claims abstract description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000001301 oxygen Substances 0.000 claims abstract description 5
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 5
- 239000007800 oxidant agent Substances 0.000 claims abstract description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 61
- 229910044991 metal oxide Inorganic materials 0.000 claims description 35
- 150000004706 metal oxides Chemical group 0.000 claims description 32
- 229910052759 nickel Inorganic materials 0.000 claims description 32
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 16
- 238000010438 heat treatment Methods 0.000 claims description 12
- 229910052742 iron Inorganic materials 0.000 claims description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical group Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 10
- 229910052719 titanium Inorganic materials 0.000 claims description 7
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 6
- 239000003513 alkali Substances 0.000 claims description 6
- 229910052707 ruthenium Inorganic materials 0.000 claims description 6
- 229910052721 tungsten Inorganic materials 0.000 claims description 6
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 229910000480 nickel oxide Inorganic materials 0.000 claims description 5
- 230000003647 oxidation Effects 0.000 claims description 5
- 238000007254 oxidation reaction Methods 0.000 claims description 5
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims description 5
- 229910001925 ruthenium oxide Inorganic materials 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 229910052746 lanthanum Inorganic materials 0.000 claims description 4
- 229910052748 manganese Inorganic materials 0.000 claims description 4
- 150000002736 metal compounds Chemical class 0.000 claims description 4
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- 239000002243 precursor Substances 0.000 claims description 4
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 claims description 4
- 229910052715 tantalum Inorganic materials 0.000 claims description 4
- 229910052718 tin Inorganic materials 0.000 claims description 4
- 229910052796 boron Inorganic materials 0.000 claims description 3
- 229910052793 cadmium Inorganic materials 0.000 claims description 3
- 229910052741 iridium Inorganic materials 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 229910052762 osmium Inorganic materials 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- 229910052703 rhodium Inorganic materials 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- 239000003039 volatile agent Substances 0.000 claims description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 2
- 229910017604 nitric acid Inorganic materials 0.000 claims description 2
- 229910019142 PO4 Inorganic materials 0.000 claims 1
- 229910001510 metal chloride Inorganic materials 0.000 claims 1
- 150000002823 nitrates Chemical class 0.000 claims 1
- 235000021317 phosphate Nutrition 0.000 claims 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 claims 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 claims 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract description 70
- 150000002739 metals Chemical class 0.000 abstract description 20
- 239000000126 substance Substances 0.000 abstract description 9
- 238000002360 preparation method Methods 0.000 abstract description 4
- 230000007774 longterm Effects 0.000 abstract description 3
- 239000003518 caustics Substances 0.000 abstract 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 19
- 239000012528 membrane Substances 0.000 description 19
- 239000000243 solution Substances 0.000 description 19
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 18
- 239000000203 mixture Substances 0.000 description 14
- 239000000460 chlorine Substances 0.000 description 13
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 10
- 238000002386 leaching Methods 0.000 description 10
- 229910052801 chlorine Inorganic materials 0.000 description 9
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 8
- 238000007750 plasma spraying Methods 0.000 description 6
- 239000010959 steel Substances 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 229910000831 Steel Inorganic materials 0.000 description 5
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000010285 flame spraying Methods 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 239000007772 electrode material Substances 0.000 description 4
- 239000003792 electrolyte Substances 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000011780 sodium chloride Substances 0.000 description 4
- 230000003442 weekly effect Effects 0.000 description 4
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000003197 catalytic effect Effects 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- 229910000497 Amalgam Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 229910001508 alkali metal halide Inorganic materials 0.000 description 2
- 150000008045 alkali metal halides Chemical class 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical class [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 239000012266 salt solution Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- 229920000557 Nafion® Polymers 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 229910001080 W alloy Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 229910007926 ZrCl Inorganic materials 0.000 description 1
- DOBZZOPBAIMPRH-UHFFFAOYSA-L [Na+].[Cl-].[Cl-].[Ag+] Chemical compound [Na+].[Cl-].[Cl-].[Ag+] DOBZZOPBAIMPRH-UHFFFAOYSA-L 0.000 description 1
- ROZSPJBPUVWBHW-UHFFFAOYSA-N [Ru]=O Chemical class [Ru]=O ROZSPJBPUVWBHW-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000012267 brine Substances 0.000 description 1
- 229940075397 calomel Drugs 0.000 description 1
- 238000005341 cation exchange Methods 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- XTEGARKTQYYJKE-UHFFFAOYSA-M chlorate Inorganic materials [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 description 1
- 229910001902 chlorine oxide Inorganic materials 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- ZOMNIUBKTOKEHS-UHFFFAOYSA-L dimercury dichloride Chemical compound Cl[Hg][Hg]Cl ZOMNIUBKTOKEHS-UHFFFAOYSA-L 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000010411 electrocatalyst Substances 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011874 heated mixture Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011872 intimate mixture Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical class [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910003446 platinum oxide Inorganic materials 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 239000011833 salt mixture Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- 230000003381 solubilizing effect Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910003452 thorium oxide Inorganic materials 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/052—Electrodes comprising one or more electrocatalytic coatings on a substrate
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Secondary Cells (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Control Of El Displays (AREA)
- Hydrogen, Water And Hydrids (AREA)
- Measuring Pulse, Heart Rate, Blood Pressure Or Blood Flow (AREA)
- Ultra Sonic Daignosis Equipment (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Catalysts (AREA)
- Micro-Organisms Or Cultivation Processes Thereof (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US49962683A | 1983-05-31 | 1983-05-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
DD232514A5 DD232514A5 (de) | 1986-01-29 |
DD253648A1 true DD253648A1 (de) | 1988-01-27 |
Family
ID=23986028
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DD84263577A DD253648A1 (de) | 1983-05-31 | 1984-05-30 | Verfahren zur herstellung einer kathode mit niedriger wasserstoffueberspannung |
Country Status (16)
Country | Link |
---|---|
EP (1) | EP0129734B1 (pl) |
JP (1) | JPS59232284A (pl) |
KR (1) | KR870001769B1 (pl) |
AT (1) | ATE50003T1 (pl) |
AU (1) | AU580002B2 (pl) |
BR (1) | BR8402693A (pl) |
CA (1) | CA1246008A (pl) |
CS (1) | CS273157B2 (pl) |
DD (1) | DD253648A1 (pl) |
DE (1) | DE3481203D1 (pl) |
FI (1) | FI75872C (pl) |
HU (1) | HU201124B (pl) |
IN (1) | IN161186B (pl) |
NO (1) | NO164487C (pl) |
PL (1) | PL143728B1 (pl) |
ZA (1) | ZA844069B (pl) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3322169A1 (de) * | 1983-06-21 | 1985-01-10 | Sigri Elektrographit Gmbh, 8901 Meitingen | Kathode fuer waesserige elektrolysen |
DE3344416A1 (de) * | 1983-12-08 | 1985-12-05 | Sigri GmbH, 8901 Meitingen | Verfahren zur herstellung einer kathode fuer die waesserige elektrolyse |
IN164233B (pl) * | 1984-12-14 | 1989-02-04 | Oronzio De Nora Impianti | |
FR2579628A1 (fr) * | 1985-03-29 | 1986-10-03 | Atochem | Cathode pour electrolyse et un procede de fabrication de ladite cathode |
MX169643B (es) * | 1985-04-12 | 1993-07-16 | Oronzio De Nora Impianti | Electrodo para procesos electroquimicos, procedimiento para su produccion y cuba de electrolisis conteniendo dicho electrodo |
CN1012970B (zh) * | 1987-06-29 | 1991-06-26 | 耐用电极株式会社 | 用于电解的阴极及其制备方法 |
WO1992022909A1 (en) * | 1991-06-13 | 1992-12-23 | Purdue Research Foundation | Solid state surface micro-plasma fusion device |
JP4142191B2 (ja) * | 1999-02-24 | 2008-08-27 | ペルメレック電極株式会社 | 活性化陰極の製造方法 |
TW200304503A (en) | 2002-03-20 | 2003-10-01 | Asahi Chemical Ind | Electrode for generation of hydrogen |
EP1739208B1 (en) | 2004-04-23 | 2018-08-15 | Tosoh Corporation | Electrode for hydrogen generation, process for producing the same and method of electrolysis therewith |
JP4578348B2 (ja) * | 2005-03-24 | 2010-11-10 | 旭化成ケミカルズ株式会社 | 水素発生用電極 |
JP5317012B2 (ja) * | 2009-03-11 | 2013-10-16 | ダイソー株式会社 | 低水素過電圧陰極の製法 |
JP5429789B2 (ja) * | 2009-04-21 | 2014-02-26 | 国立大学法人東北大学 | 電気透析装置 |
JP6515509B2 (ja) * | 2013-12-26 | 2019-05-22 | 東ソー株式会社 | 水素発生用電極およびその製造方法並びにこれを用いた電気分解方法 |
JP6609913B2 (ja) * | 2013-12-26 | 2019-11-27 | 東ソー株式会社 | 水素発生用電極およびその製造方法並びにこれを用いた電気分解方法 |
WO2023037010A2 (en) * | 2021-09-13 | 2023-03-16 | Magneto Special Anodes B.V. | An electrolyzer electrocatalyst comprising cobalt (co) oxide, zirconium (zr) and a noble metal, an electrode comprising the electrocatalyst and the use of the electrocatalyst in an electrolysis process |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5228106B2 (pl) * | 1973-08-20 | 1977-07-25 | ||
US4300992A (en) * | 1975-05-12 | 1981-11-17 | Hodogaya Chemical Co., Ltd. | Activated cathode |
US3990957A (en) * | 1975-11-17 | 1976-11-09 | Ppg Industries, Inc. | Method of electrolysis |
US4100049A (en) * | 1977-07-11 | 1978-07-11 | Diamond Shamrock Corporation | Coated cathode for electrolysis cells |
JPS56130485A (en) * | 1980-02-26 | 1981-10-13 | Vladimir Reonidouitsuchi Kubas | Electrode for electrochemical process and method |
CA1190186A (en) * | 1980-08-18 | 1985-07-09 | Henri B. Beer | Electrode with mixed oxide interface on valve metal base and stable outer coating |
-
1984
- 1984-05-28 CA CA000455237A patent/CA1246008A/en not_active Expired
- 1984-05-28 AU AU28749/84A patent/AU580002B2/en not_active Ceased
- 1984-05-29 AT AT84106102T patent/ATE50003T1/de not_active IP Right Cessation
- 1984-05-29 DE DE8484106102T patent/DE3481203D1/de not_active Expired - Lifetime
- 1984-05-29 FI FI842145A patent/FI75872C/fi not_active IP Right Cessation
- 1984-05-29 EP EP84106102A patent/EP0129734B1/en not_active Expired - Lifetime
- 1984-05-29 IN IN393/MAS/84A patent/IN161186B/en unknown
- 1984-05-29 ZA ZA844069A patent/ZA844069B/xx unknown
- 1984-05-30 PL PL1984247951A patent/PL143728B1/pl unknown
- 1984-05-30 NO NO842156A patent/NO164487C/no unknown
- 1984-05-30 BR BR8402693A patent/BR8402693A/pt unknown
- 1984-05-30 HU HU842109A patent/HU201124B/hu unknown
- 1984-05-30 DD DD84263577A patent/DD253648A1/de not_active IP Right Cessation
- 1984-05-30 KR KR1019840002998A patent/KR870001769B1/ko not_active Expired
- 1984-05-31 JP JP59109775A patent/JPS59232284A/ja active Granted
- 1984-05-31 CS CS409284A patent/CS273157B2/cs unknown
Also Published As
Publication number | Publication date |
---|---|
FI842145L (fi) | 1984-12-01 |
FI75872C (fi) | 1988-08-08 |
AU2874984A (en) | 1984-12-06 |
NO164487C (no) | 1990-10-10 |
IN161186B (pl) | 1987-10-17 |
BR8402693A (pt) | 1985-05-07 |
PL143728B1 (en) | 1988-03-31 |
DE3481203D1 (de) | 1990-03-08 |
PL247951A1 (en) | 1985-02-27 |
KR840009124A (ko) | 1984-12-24 |
JPS59232284A (ja) | 1984-12-27 |
DD232514A5 (de) | 1986-01-29 |
KR870001769B1 (ko) | 1987-10-06 |
JPH0375635B2 (pl) | 1991-12-02 |
ATE50003T1 (de) | 1990-02-15 |
CS409284A2 (en) | 1990-07-12 |
FI842145A0 (fi) | 1984-05-29 |
AU580002B2 (en) | 1988-12-22 |
NO842156L (no) | 1984-12-03 |
CA1246008A (en) | 1988-12-06 |
EP0129734A3 (en) | 1985-06-05 |
FI75872B (fi) | 1988-04-29 |
NO164487B (no) | 1990-07-02 |
ZA844069B (en) | 1986-01-29 |
CS273157B2 (en) | 1991-03-12 |
EP0129734A2 (en) | 1985-01-02 |
HU201124B (en) | 1990-09-28 |
EP0129734B1 (en) | 1990-01-31 |
HUT34562A (en) | 1985-03-28 |
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